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JPS62149218A - High breakdown strength cmos circuit - Google Patents

High breakdown strength cmos circuit

Info

Publication number
JPS62149218A
JPS62149218A JP60291133A JP29113385A JPS62149218A JP S62149218 A JPS62149218 A JP S62149218A JP 60291133 A JP60291133 A JP 60291133A JP 29113385 A JP29113385 A JP 29113385A JP S62149218 A JPS62149218 A JP S62149218A
Authority
JP
Japan
Prior art keywords
voltage
mos transistor
type mos
channel mos
gate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP60291133A
Other languages
Japanese (ja)
Inventor
Michitoku Kamatani
鎌谷 道徳
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP60291133A priority Critical patent/JPS62149218A/en
Publication of JPS62149218A publication Critical patent/JPS62149218A/en
Pending legal-status Critical Current

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  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
  • Electronic Switches (AREA)
  • Logic Circuits (AREA)

Abstract

PURPOSE:To attain the operation at a high voltage at the time of write or the like by providing a series connection of a P-channel MOS transistor (TR) and an N-channel MOS TR between a P-channel MOS TR and an N-channel MOS TR constituting an inverter. CONSTITUTION:A P-channel MOS TR 1 and an N-channel MOS TR 2 using a voltage VF being the division of a power voltage VP by resistors 5, 6 as a gate voltage is provided between a P-channel MOS TR 3 and an N-channel MOS TR 4 constituting the inverter. Only a voltage being the sum of the voltage VF and a threshold value of the TR 3 at VI=VP is fed to a connecting point S1 of the TRs 1, 3 and only a voltage being the subtraction of a threshold value of the TR 2 from the voltage VF is fed to a connection point S2 of the TRs 2, 4 at VI=0. Even when a voltage is applied at an output (0V-VP), since a voltage VF is fed as a gate voltage of the TRs 1, 2, the dielectric strength of the drain voltage is increased. Thus, a high voltage operation is attained at the time of the write of a CMOSEPROM.

Description

【発明の詳細な説明】 (発明の目的) 本発明の目的はCMO8EFROMにおける書き込み時
、などに高い電圧で動作する回路を提供することである
DETAILED DESCRIPTION OF THE INVENTION (Object of the Invention) An object of the present invention is to provide a circuit that operates at a high voltage during writing in a CMO8EFROM.

(発明の構成) 相補型絶縁ゲート半導体(CMOS)集積回路において
、高い電源電圧VPにて動作する基本ゲートがP型MO
SトランジスタとN型MOSトランジスタ間に、はぼ1
 / 2 VP を圧VFをゲート電圧としたP型MO
Sトランジスタ1とN型MOSトランジスタ2を直列に
接続し、前記P型MO8トランジスタ1とN型MOSト
ランジスタ2の接続点を出力とする構成を特徴とした高
電圧用CMOS回路。
(Structure of the Invention) In a complementary insulated gate semiconductor (CMOS) integrated circuit, the basic gate that operates at a high power supply voltage VP is a P-type MO.
Between the S transistor and the N type MOS transistor, there is approximately 1
P-type MO with gate voltage set to /2 VP and voltage VF
A high-voltage CMOS circuit characterized by a configuration in which an S transistor 1 and an N-type MOS transistor 2 are connected in series, and a connection point between the P-type MO8 transistor 1 and the N-type MOS transistor 2 is used as an output.

(作用) 基本ゲートのP型MOSトランジスタとN型MOSトラ
ンジスタのドレイン電圧はグー1圧VFのP型MOSト
ランジスタ1とN型MOSトランジスタ2によってクラ
ンプされ、またMOSトランジスタ1と2のドレインの
ブレークダウン電圧はこれらのゲートにVFの電圧が印
加されているために高くなっている。
(Function) The drain voltages of the basic gate P-type MOS transistor and N-type MOS transistor are clamped by the P-type MOS transistor 1 and N-type MOS transistor 2 of 1 voltage VF, and the breakdown of the drains of MOS transistors 1 and 2 The voltage is high because the voltage of VF is applied to these gates.

(発明の効果) 従来CMO8EFROMの書き込み回路には高い12〜
25Vプログラム電圧電源を必要とし、このプログラム
電源で動作するトランジスタには高耐圧トランジスタが
使用されていた。このために使用マスク枚数の増大を伴
なっていた。本発明は以上の高耐圧トランジスタを使用
しないで高い電圧で動作する回路を提供するものである
(Effect of the invention) Conventional CMO8EFROM write circuit has a high 12~
A 25V program voltage power supply is required, and high voltage transistors are used as transistors operated by this program power supply. This has resulted in an increase in the number of masks used. The present invention provides a circuit that operates at high voltage without using the above-mentioned high voltage transistors.

(実施例) 本発明の実施例を第1図に示す。基本ゲートであるイン
バータ回路に適用したものである。電源電圧VPを抵抗
5と6によって分割した電圧VFをゲート電圧としたP
型MOSトランジスタ1とN型MOSトランジスタ2が
インバータを構成するP型MOSトランジスタ3とN型
MOSトランジスタ40間に直列に配置されている。
(Example) An example of the present invention is shown in FIG. This is applied to an inverter circuit, which is a basic gate. The gate voltage is P, which is the voltage VF obtained by dividing the power supply voltage VP by resistors 5 and 6.
A type MOS transistor 1 and an N type MOS transistor 2 are arranged in series between a P type MOS transistor 3 and an N type MOS transistor 40 forming an inverter.

第2図に第1図の回路の動作波型を示す。P型MO8h
ランジスタ1と3の接続点S■にはvI =VP”RV
F+lVTPl(PmMO8) ラ:yジスタノしきい
値VTP)の電圧しか印加されず、N型MOSトランジ
スタ2と4の接続点S2にはvI = o v(D時V
F−VTn (N型〜10Sトランジスタのしきい値)
の宿、圧しか印加されず、また出力0■〜VPまで電圧
が印加されてもMOSトランジスタ1と2のゲート電圧
がvpが印加されているためドレイン宵圧の耐圧は上昇
する。第3図(a)にレベルシフター回路に本発明を適
用した実施例を示す。出力b、D端子に接するN型MO
Sトランジスタ23.24のゲート電圧は電源電圧VP
の1/2はどの電圧VFNであシ、出力り、 D端子に
接するP型MOSトランジスタ25.26のゲート電圧
VFPは電源電圧の1/2はどの電圧であり、VFP=
VFNでなくてもよい。第3図(b)にVFN、VFP
霜、圧を抵抗用P型MOSトランジスタ31とN型MO
Sトランジスタ32及び抵抗33によって発生する一例
を示している。
FIG. 2 shows the operating waveforms of the circuit of FIG. 1. P type MO8h
At the connection point S■ of transistors 1 and 3, vI = VP”RV
Only a voltage of F+lVTPl (PmMO8) is applied, and vI = o v (V at D) is applied to the connection point S2 between the N-type MOS transistors 2 and 4.
F-VTn (Threshold value of N type to 10S transistor)
Even if voltages from 0 to VP are applied, the withstand voltage of the drain voltage increases because the gate voltage of MOS transistors 1 and 2 is VP. FIG. 3(a) shows an embodiment in which the present invention is applied to a level shifter circuit. N-type MO connected to output b and D terminals
The gate voltage of S transistors 23 and 24 is the power supply voltage VP
At what voltage VFN is 1/2 of the power supply voltage, and at what voltage is the output voltage VFP of the P-type MOS transistors 25 and 26 in contact with the D terminal?
It does not have to be VFN. Figure 3(b) shows VFN and VFP.
P-type MOS transistor 31 and N-type MOS transistor for frost and pressure resistance
An example of occurrence caused by an S transistor 32 and a resistor 33 is shown.

(発明のまとめ) 以上本発明によって、書き込み時に高い電圧を必要トス
ル紫外線消去uFROM(UV−BFROM)や電気的
消去可能なPROM(EEPR,OM)のCMO8製品
などに対して、高耐圧トランジスタを使用しなくてもよ
くなり、従って使用マスク枚数がこの分食なくなり、製
造工程が短縮される。
(Summary of the Invention) According to the present invention, high voltage transistors are used for CMO8 products such as toss ultraviolet erasable uFROM (UV-BFROM) and electrically erasable PROM (EEPR, OM) that require high voltage during writing. Therefore, the number of masks used is reduced by this amount, and the manufacturing process is shortened.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明の実施例を示す。P型MOSトランジス
タ1.3、N型MOSトランジスタ2.4、抵抗5.6
である。第2図は入力第1図の動作波形を示す。第3図
(a)も本発明の実施例を示す。 N型MOSトランジスタ21.22.23.24、P型
MoSトランジスタ25.26.27.28、入カニ、
逆相式カニ、出力り、D、一定入力電圧VFP1VFN
s電源VPである。第3図(b)は分圧回路である。抵
抗用P型MOSトランジ2夕31、抵抗用N型MOSト
ランジスタ32、抵抗33である。 代理人 弁理士  内 原   晋 第2 図 第3図
FIG. 1 shows an embodiment of the invention. P-type MOS transistor 1.3, N-type MOS transistor 2.4, resistance 5.6
It is. FIG. 2 shows the operating waveform of the input shown in FIG. FIG. 3(a) also shows an embodiment of the present invention. N-type MOS transistor 21.22.23.24, P-type MoS transistor 25.26.27.28, input crab,
Reverse phase type crab, output, D, constant input voltage VFP1VFN
s power supply VP. FIG. 3(b) shows a voltage dividing circuit. They are a P-type MOS transistor 31 for resistance, an N-type MOS transistor 32 for resistance, and a resistor 33. Agent Patent Attorney Susumu Uchihara Figure 2 Figure 3

Claims (1)

【特許請求の範囲】[Claims] 相補型絶縁ゲート半導体(CMOS)集積回路において
、高い電源電圧V_Pにて動作する基本ゲートがP型M
OSトランジスタとN型MOSトランジスタ間にほぼ1
/2V_P電圧V_Fをゲート電圧としたP型MOSト
ランジスタ1とN型MOSトランジスタ2を直列に接続
し、前記P型MOSトランジスタ1とN型MOSトラン
ジスタ2の接続点を出力とする構成を特徴とした高耐圧
CMOS回路。
In complementary insulated gate semiconductor (CMOS) integrated circuits, the basic gate that operates at a high power supply voltage V_P is P-type M
Approximately 1 between the OS transistor and the N-type MOS transistor
A P-type MOS transistor 1 and an N-type MOS transistor 2 with a gate voltage of /2V_P voltage V_F are connected in series, and the connection point between the P-type MOS transistor 1 and the N-type MOS transistor 2 is an output. High voltage CMOS circuit.
JP60291133A 1985-12-23 1985-12-23 High breakdown strength cmos circuit Pending JPS62149218A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60291133A JPS62149218A (en) 1985-12-23 1985-12-23 High breakdown strength cmos circuit

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60291133A JPS62149218A (en) 1985-12-23 1985-12-23 High breakdown strength cmos circuit

Publications (1)

Publication Number Publication Date
JPS62149218A true JPS62149218A (en) 1987-07-03

Family

ID=17764875

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60291133A Pending JPS62149218A (en) 1985-12-23 1985-12-23 High breakdown strength cmos circuit

Country Status (1)

Country Link
JP (1) JPS62149218A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07161853A (en) * 1993-12-01 1995-06-23 Nec Corp Nonvolatile semiconductor memory, its erasing method and manufacturing method
EP0703665A2 (en) 1994-09-21 1996-03-27 Nec Corporation Voltage level shift circuit
US6249169B1 (en) 1998-06-01 2001-06-19 Fujitsu Limited Transistor output circuit

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5628412A (en) * 1979-08-15 1981-03-20 Furukawa Electric Co Ltd Fireeresisting electric wire

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5628412A (en) * 1979-08-15 1981-03-20 Furukawa Electric Co Ltd Fireeresisting electric wire

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07161853A (en) * 1993-12-01 1995-06-23 Nec Corp Nonvolatile semiconductor memory, its erasing method and manufacturing method
US5535158A (en) * 1993-12-01 1996-07-09 Nec Corporation Non-volatile semiconductor memory device and method for erasure and production thereof
EP0703665A2 (en) 1994-09-21 1996-03-27 Nec Corporation Voltage level shift circuit
US5729155A (en) * 1994-09-21 1998-03-17 Nec Corporation High voltage CMOS circuit which protects the gate oxides from excessive voltages
US6249169B1 (en) 1998-06-01 2001-06-19 Fujitsu Limited Transistor output circuit

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