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JPS60211071A - Vacuum depositing apparatus - Google Patents

Vacuum depositing apparatus

Info

Publication number
JPS60211071A
JPS60211071A JP6693184A JP6693184A JPS60211071A JP S60211071 A JPS60211071 A JP S60211071A JP 6693184 A JP6693184 A JP 6693184A JP 6693184 A JP6693184 A JP 6693184A JP S60211071 A JPS60211071 A JP S60211071A
Authority
JP
Japan
Prior art keywords
wire
evaporation source
pipe
wire rod
vapor depositing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6693184A
Other languages
Japanese (ja)
Inventor
Yoichi Onishi
陽一 大西
Tanejiro Ikeda
池田 種次郎
Masahide Yokoyama
政秀 横山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP6693184A priority Critical patent/JPS60211071A/en
Publication of JPS60211071A publication Critical patent/JPS60211071A/en
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • C23C14/246Replenishment of source material

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

PURPOSE:To make a wire to pass through a pipe easily without causing the buckling by removing plastic hysteresis through a leveler in case of supplying the metallic wire as vapor depositing material to an evaporation source through the pipe in a vapor depositing apparatus. CONSTITUTION:Metallic wire 12 such as Cu and Al as vapor depositing material in a vapor depositing apparatus is unwound from a bobbin 15 and supplied to an evaporation source 13 to be heated and evaporated through a guide pipe 11 by means of rotation of driving rollers 14, 14'. Since the wire 12 is received with plastic hysteresis because it has been wound on the bobbin 15, it is impossible to be fed into the pipe 11 by causing buckling at the neighborhood of an inlet 11C of the guide pipe 11 and the vapor depositing operation may be interrupted, the plastic hysteresis is removed through a leveler 16 consisting of plural rollers. The wire 12 is supplied to the evaporation source 13 by passing through the pipe 11 easily and the vapor depositing operation is stably performed.

Description

【発明の詳細な説明】 産業上の利用分野 本発明は、乾式メッキ、例えば蒸着等を行なう際、蒸発
源となる加熱用るつぼ上に、蒸発させる材料を線材とし
て連続供給するための線材供給装置を有した真空蒸着装
置に関するものである。
DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application The present invention relates to a wire rod feeding device for continuously feeding material to be evaporated as a wire onto a heating crucible that serves as an evaporation source during dry plating, such as vapor deposition. The present invention relates to a vacuum evaporation apparatus having the following.

従来例の構成とその問題点 ポリエステルフィルムやポリイミドフィルムの表面に連
続して、アルミニウムや銅の薄膜を形成する方法として
、例えば、フィルム巻取り装置と蒸発源となる加熱るつ
ぼに、気密容器内に蒸発材料を線材状態で連続供給する
ことが可能な線材供給装置を配設した真空蒸着装置が利
用されている。
Conventional structure and problems There is a method for forming a thin film of aluminum or copper continuously on the surface of a polyester film or polyimide film. A vacuum evaporation apparatus is used which is equipped with a wire supply device that can continuously supply evaporation material in the form of a wire.

以下、図面を参照しながら、従来の真空蒸着装置につい
て説明する。
Hereinafter, a conventional vacuum evaporation apparatus will be described with reference to the drawings.

第1図に従来の真空蒸着装置の構成である線材供給装置
を示す。第1図において、1は中空円筒形状の線材ガイ
ド用のパイプ、2は金属あるいは化合物より成る蒸発材
料である線材、3は供給された線材2を加熱し、蒸発す
るだめの蒸発源、4.4′は線材2を挾んで、搬送する
だめの1対の駆動ローラ、5は線材2が巻かれたボビン
である。
FIG. 1 shows a wire supply device that is a configuration of a conventional vacuum evaporation device. In FIG. 1, 1 is a hollow cylindrical wire guide pipe, 2 is a wire that is an evaporation material made of metal or a compound, 3 is an evaporation source for heating and evaporating the supplied wire 2, and 4. Reference numeral 4' denotes a pair of drive rollers for pinching and conveying the wire 2, and 5 is a bobbin around which the wire 2 is wound.

1対の駆動ローラ4,4′から搬送される線材2はパイ
プ1に案内されて、蒸発源3に至る。
A wire rod 2 conveyed from a pair of driving rollers 4 and 4' is guided by a pipe 1 and reaches an evaporation source 3.

高真空中で線材2を蒸発源3に供給し、線材2を溶融及
び蒸発させ、その蒸発原子または分子を基材に飛来させ
、基材表面に金属または、化合物の薄膜を形成させる真
空蒸着装置において、線材2を駆動ローラ4,4′によ
って、パイプ1に導き、蒸発源3に供給している。
A vacuum evaporation device that supplies the wire 2 to the evaporation source 3 in a high vacuum, melts and evaporates the wire 2, and causes the evaporated atoms or molecules to fly to the base material to form a thin film of metal or compound on the surface of the base material. , the wire 2 is guided into the pipe 1 by driving rollers 4, 4' and is supplied to the evaporation source 3.

しかしながら、上記の構成では、線材2がパイプ1内を
搬送させる際、線材2はボビンに巻かれているため、す
なわち線材2が塑性履歴を受けているため、スプリング
バック等の回復現象に起因して、パイプ1の内壁に対し
、線材1はその弾性力によって抗力を与え、パイプ1の
内壁から線材2は、搬送方向と反対方向に摩擦力が生じ
、バイブ10入口1C付近で線材2が座屈して、線材2
がパイパ1内へ搬送できなくなり、線材2を蒸発源3上
へ長時間連続して供給することが不可能となる問題があ
った。我々の試みでは、線材2供給後20分以内に座屈
が生じた。
However, in the above configuration, when the wire rod 2 is conveyed inside the pipe 1, since the wire rod 2 is wound around the bobbin, that is, the wire rod 2 is subjected to a plastic history, recovery phenomena such as springback may occur. Then, the wire rod 1 exerts a drag force against the inner wall of the pipe 1 due to its elastic force, and a friction force is generated on the wire rod 2 from the inner wall of the pipe 1 in the opposite direction to the conveying direction, causing the wire rod 2 to sit near the inlet 1C of the vibrator 10. Give in, wire rod 2
There was a problem in that it became impossible to convey the wire rod 2 into the piper 1, and it became impossible to continuously supply the wire rod 2 onto the evaporation source 3 for a long time. In our attempt, buckling occurred within 20 minutes after feeding wire 2.

このように、従来の真空蒸着装置では、蒸着材料である
線材2を一定の搬送速度で長時間連続して蒸発源3に供
給することが困難であるという欠点を有していた。7 発明の目的 本発明は、上記欠点に鑑み、蒸着材料である線材を蒸発
源に、はぼ一定の搬送速度で長時間連続して供給するこ
とが可能な真空蒸着装置を提供するものである。
As described above, the conventional vacuum evaporation apparatus has the drawback that it is difficult to continuously supply the wire rod 2, which is the evaporation material, to the evaporation source 3 at a constant conveyance speed for a long time. 7. Purpose of the Invention In view of the above drawbacks, the present invention provides a vacuum evaporation apparatus capable of continuously supplying a wire rod as an evaporation material to an evaporation source at a nearly constant conveyance speed for a long period of time. .

発明の構成 本発明の真空蒸着装置は、金属あるいは、化合物よシな
るワイヤ状蒸着材料の線材と、前記線材を挾んで送り出
す一対の駆動ローラと、この駆動ローラにより送り出さ
れる線材を高真空度の圧力状態で被加工物である基材に
加熱蒸発させて蒸着するための蒸発源と、前記一対の駆
動ローラによって送り出される線材を蒸発源に案内する
ガイド用のパイプと、回転中心の位置が、線材の搬送方
向に一定の間隔をおき、かつ、線材の搬送方向に対して
相対に配置し、線材に搬送方向に対し垂直に変形力が発
生するように配設した少なくとも一対の搬送ローラを有
するレベラーとから構成されており、蒸着材料である線
材を蒸発源に、はぼ一定の供給速度で、長時間連続して
供給することが可能であるという特有の効果を有するも
のである。
Composition of the Invention The vacuum evaporation apparatus of the present invention comprises a wire of a wire-like evaporation material made of metal or a compound, a pair of drive rollers that sandwich and send out the wire, and a wire that is sent out by the drive roller under a high degree of vacuum. An evaporation source for heating and evaporating the substrate material to be processed under pressure, a guide pipe for guiding the wire sent out by the pair of drive rollers to the evaporation source, and a rotation center position. At least a pair of conveyance rollers are arranged at a constant interval in the conveyance direction of the wire rod, and are arranged relative to the conveyance direction of the wire rod so as to generate a deforming force perpendicular to the conveyance direction on the wire rod. It has the unique effect of being able to continuously supply the wire rod, which is the evaporation material, to the evaporation source at a nearly constant supply rate for a long period of time.

実施例の説明 以下本発明の一実施例について、図面を参照しながら説
明する。
DESCRIPTION OF EMBODIMENTS An embodiment of the present invention will be described below with reference to the drawings.

第2図は、本発明の第1の実施例における真空蒸着装置
を示すものである。第2図において、11は中空円筒形
状の線材ガイド用のパイプ、12は材質がアルミニウム
または銅で、線径がφ1.2敲の蒸発材料であるところ
の線材、13は供給される線材12を抵抗加熱方式で加
熱し、蒸発するだめの蒸発源、14および14′は線材
12を挾んで、搬送するための1対の駆動ローラで、少
なくとも一方の駆動ローラ14,14’は、線材12と
の接触抵抗を大きくするために表面加工されている。1
5は線材12が巻かれたボビン、16は回転中心の位置
が線材12の搬送方向に対して垂直に、変形力が発生す
るように配設した搬送ローラを有したレベラーであり、
断面がV溝の形状である。
FIG. 2 shows a vacuum evaporation apparatus in a first embodiment of the present invention. In Fig. 2, 11 is a hollow cylindrical wire guide pipe, 12 is a wire made of aluminum or copper and has a wire diameter of φ1.2 and is an evaporation material, and 13 is the wire 12 to be supplied. The evaporation sources 14 and 14' are a pair of drive rollers for sandwiching and conveying the wire 12, and at least one of the drive rollers 14, 14' is connected to the wire 12. The surface has been treated to increase the contact resistance. 1
5 is a bobbin around which the wire rod 12 is wound; 16 is a leveler having a conveying roller arranged so that the center of rotation is perpendicular to the conveying direction of the wire rod 12 and a deforming force is generated;
The cross section has a V-groove shape.

以上のように構成された真空蒸着装置について以下その
動作を説明する。
The operation of the vacuum evaporation apparatus configured as described above will be explained below.

駆動ローラ14,14’に適当な負荷を与えることによ
って、線材12の表面に接触抗力を生じさせ、駆動ロー
ラ14,14’を回転させることにより、線材12表面
と駆動ローラ14.i4’の表面部との間で生じる摩擦
力で線材12が蒸発源13方向に供給される。また、ボ
ビン15に巻かれた線材12は、冷間塑性加工等の塑性
履歴を受けてイルカ、レベラー16の搬送ローラによっ
て、線材12の搬送方向と垂直に応力が加えられ、スプ
リングバンク等が生じないように、伸線および加工硬化
された後、駆動ローラ14,14’に供給される。従が
って、ボビン15に巻かれた線材12を蒸発源13に搬
送供給する際、スプリングバック等の回復現象に起因す
るパイプ11内壁と線材12間の抗力を抑制することが
可能であり、線材12とパイプ11の内壁との摩擦力が
大巾に低減できるため、パイプ11の入口11C付近で
線材12が座屈することがなくなり、線材12を蒸発源
13上へ長時間連続して供給することができた。
By applying an appropriate load to the drive rollers 14, 14', a contact force is generated on the surface of the wire 12, and by rotating the drive rollers 14, 14', the surface of the wire 12 and the drive roller 14. The wire 12 is supplied in the direction of the evaporation source 13 due to the frictional force generated between it and the surface of i4'. In addition, the wire rod 12 wound around the bobbin 15 undergoes a plastic history such as cold plastic working, and stress is applied perpendicularly to the conveyance direction of the wire rod 12 by the conveyance roller of the dolphin and leveler 16, causing spring banks and the like. After being wire-drawn and work-hardened so as not to cause any damage, the wire is supplied to the drive rollers 14, 14'. Therefore, when the wire rod 12 wound around the bobbin 15 is transported and supplied to the evaporation source 13, it is possible to suppress the drag between the inner wall of the pipe 11 and the wire rod 12 due to recovery phenomena such as springback. Since the frictional force between the wire 12 and the inner wall of the pipe 11 can be greatly reduced, the wire 12 will not buckle near the inlet 11C of the pipe 11, and the wire 12 can be continuously supplied onto the evaporation source 13 for a long time. I was able to do that.

すなわち、線材12供給後280分連続供給しても、1
1C付近で座屈が生じなかった。
In other words, even if the wire rod 12 is continuously supplied for 280 minutes after being supplied, 1
No buckling occurred near 1C.

以上のように、回転中心の位置が線材12の搬送方向に
一定の間隔をおき、線材12の搬送方向に対して、相対
に配置し、線材12の搬送方向に対して、垂直方向に線
材12に変形応力を負荷可能な搬送ローラを有したレベ
ラー16を設けることにより、線材12の材質や塑性履
歴に依存せず、はぼ一定の搬送速度で線材12を蒸発源
13に長時間安定して供給することができる。
As described above, the positions of the rotation centers are spaced apart from each other in the conveyance direction of the wire rod 12, are arranged relative to the conveyance direction of the wire rod 12, and the wire rod By providing the leveler 16 with a conveyance roller capable of applying deformation stress to the wire rod 12, the wire rod 12 can be stably transferred to the evaporation source 13 for a long time at a constant conveyance speed, regardless of the material and plastic history of the wire rod 12. can be supplied.

発明の効果 以上のように、本発明の真空蒸着装置は、金属あるいは
、化合物よりなるワイヤ状蒸着材料の線材と、前記線材
を挾んで送り出す一対の駆動ローラと、この駆動ローラ
により送り出される線材を高真空度の圧力状態で被加工
物である基材に加熱蒸発させて蒸着するための蒸発源と
、前記一対の駆動ローラによって送り出される線材を蒸
発源に案内するガイド用のパイプと、回転中心の位置が
線材の搬送方向に一定の間隔をおき、かつ、線材の搬送
方向に対して相対に配置し、線材に搬送方向に対し垂直
に、変形応力が発生するように配設した少なくとも一対
の搬送ローラを有するレベラーを設けることによって、
蒸発材料である線材の材質や塑性履歴に依存せず、はぼ
一定の搬送速度で線材を蒸発源に長時間連続して安定に
供給することが可能であり、その実用的効果は大なるも
のがある。
Effects of the Invention As described above, the vacuum evaporation apparatus of the present invention comprises a wire of a wire-like evaporation material made of metal or a compound, a pair of drive rollers that sandwich and send out the wire, and a wire that is sent out by the drive roller. An evaporation source for heating and evaporating the substrate material to be processed under high vacuum pressure, a guide pipe for guiding the wire sent out by the pair of drive rollers to the evaporation source, and a rotation center. At least a pair of wire rods are arranged at regular intervals in the wire transport direction, and are arranged relative to the wire transport direction, so that deformation stress is generated perpendicular to the wire rod transport direction. By providing a leveler with a conveying roller,
It is possible to stably supply the wire to the evaporation source continuously for a long time at a nearly constant conveyance speed, regardless of the material or plastic history of the wire that is the evaporation material, and its practical effects are great. There is.

なお、本実施例では、レベラー16の搬送ローラによっ
て、一方向だけに変形応力が発生するようにしたが、二
方向、さらに三方向と規制方向を多くして変形応力が発
生するようにしても良い。
In this embodiment, deformation stress is generated in only one direction by the conveyance roller of the leveler 16, but deformation stress may also be generated in two or even three directions. good.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は従来の真空蒸着装置の概略図、第2図は本発明
の一実施例の真空蒸着装置の概略図である。 11・・・・・・パイプ、12・・・・・・線材、13
・・・・・・蒸発源、14・・・・・・駆動ローラ、1
6・・・・・・レベラー。 第1図 第 2 図
FIG. 1 is a schematic diagram of a conventional vacuum evaporation apparatus, and FIG. 2 is a schematic diagram of a vacuum evaporation apparatus according to an embodiment of the present invention. 11...Pipe, 12...Wire rod, 13
... Evaporation source, 14 ... Drive roller, 1
6...Leveler. Figure 1 Figure 2

Claims (1)

【特許請求の範囲】[Claims] 金属あるいは、化合物よ構成るワイヤ状蒸着材料の線材
と、前記線材を挾んで送シ出す一対の駆動ローラと、こ
の駆動ローラにより送シ出される線材を高真空度の圧力
状態で被加工物である基材に加熱蒸発させて蒸着するた
めの蒸発源と、前記一対の駆動ローラによって送シ出さ
れる線材を蒸発源に案内するガイド用のパイプと、回転
中心の位置が、線材の搬送方向に一定の間隔をおき、か
つ、線材の搬送方向に対して相対に配置し、線材に、搬
送方向に対し垂直に、変形力が発生するように配設した
少なくとも一対の搬送ローラを有するレベラーとからな
る真空蒸着装置。
A wire of a wire-shaped vapor-deposited material made of metal or a compound, a pair of drive rollers that sandwich and feed the wire, and a wire fed by the drive rollers to a workpiece under high vacuum pressure. An evaporation source for heating and evaporating vapor deposition onto a certain base material, a guide pipe for guiding the wire sent out by the pair of drive rollers to the evaporation source, and a center of rotation located in the direction of conveyance of the wire. A leveler having at least a pair of conveying rollers arranged at a constant interval and relative to the conveying direction of the wire rod so as to generate a deforming force perpendicular to the conveying direction on the wire rod. vacuum evaporation equipment.
JP6693184A 1984-04-04 1984-04-04 Vacuum depositing apparatus Pending JPS60211071A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6693184A JPS60211071A (en) 1984-04-04 1984-04-04 Vacuum depositing apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6693184A JPS60211071A (en) 1984-04-04 1984-04-04 Vacuum depositing apparatus

Publications (1)

Publication Number Publication Date
JPS60211071A true JPS60211071A (en) 1985-10-23

Family

ID=13330227

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6693184A Pending JPS60211071A (en) 1984-04-04 1984-04-04 Vacuum depositing apparatus

Country Status (1)

Country Link
JP (1) JPS60211071A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2270253A1 (en) * 2009-07-03 2011-01-05 Applied Materials, Inc. Bending fixture for homogenous and smooth operation of an evaporation source
EP2471733A3 (en) * 2010-12-30 2013-01-16 United Technologies Corporation Wire feed pressure lock system

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2270253A1 (en) * 2009-07-03 2011-01-05 Applied Materials, Inc. Bending fixture for homogenous and smooth operation of an evaporation source
EP2471733A3 (en) * 2010-12-30 2013-01-16 United Technologies Corporation Wire feed pressure lock system
US8920566B2 (en) 2010-12-30 2014-12-30 United Technologies Corporation Wire feed pressure lock system

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