JPS5191669A - Doopudo okisaidonoseiseihoho - Google Patents
Doopudo okisaidonoseiseihohoInfo
- Publication number
- JPS5191669A JPS5191669A JP50012578A JP1257875A JPS5191669A JP S5191669 A JPS5191669 A JP S5191669A JP 50012578 A JP50012578 A JP 50012578A JP 1257875 A JP1257875 A JP 1257875A JP S5191669 A JPS5191669 A JP S5191669A
- Authority
- JP
- Japan
- Prior art keywords
- okisaidonoseiseihoho
- doopudo
- doopudo okisaidonoseiseihoho
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Chemical Vapour Deposition (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Formation Of Insulating Films (AREA)
- Glass Melting And Manufacturing (AREA)
- Oxygen, Ozone, And Oxides In General (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP50012578A JPS5191669A (en) | 1975-01-31 | 1975-01-31 | Doopudo okisaidonoseiseihoho |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP50012578A JPS5191669A (en) | 1975-01-31 | 1975-01-31 | Doopudo okisaidonoseiseihoho |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5191669A true JPS5191669A (en) | 1976-08-11 |
Family
ID=11809230
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP50012578A Pending JPS5191669A (en) | 1975-01-31 | 1975-01-31 | Doopudo okisaidonoseiseihoho |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5191669A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62238628A (en) * | 1986-04-04 | 1987-10-19 | インタ−ナショナル ビジネス マシ−ンズ コ−ポレ−ション | Method of forming layer containing silicon and oxygen |
JPH03278435A (en) * | 1990-02-05 | 1991-12-10 | Mitsubishi Electric Corp | Semiconductor device and manufacture thereof |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4831027A (en) * | 1971-08-25 | 1973-04-24 | ||
JPS4921991A (en) * | 1972-04-25 | 1974-02-26 |
-
1975
- 1975-01-31 JP JP50012578A patent/JPS5191669A/en active Pending
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4831027A (en) * | 1971-08-25 | 1973-04-24 | ||
JPS4921991A (en) * | 1972-04-25 | 1974-02-26 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62238628A (en) * | 1986-04-04 | 1987-10-19 | インタ−ナショナル ビジネス マシ−ンズ コ−ポレ−ション | Method of forming layer containing silicon and oxygen |
JPH03278435A (en) * | 1990-02-05 | 1991-12-10 | Mitsubishi Electric Corp | Semiconductor device and manufacture thereof |
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