[go: up one dir, main page]
More Web Proxy on the site http://driver.im/

JPH02191640A - Method for treating surface of polyester film with plasma - Google Patents

Method for treating surface of polyester film with plasma

Info

Publication number
JPH02191640A
JPH02191640A JP1119089A JP1119089A JPH02191640A JP H02191640 A JPH02191640 A JP H02191640A JP 1119089 A JP1119089 A JP 1119089A JP 1119089 A JP1119089 A JP 1119089A JP H02191640 A JPH02191640 A JP H02191640A
Authority
JP
Japan
Prior art keywords
plasma
film
polyester film
surface treatment
polyester
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1119089A
Other languages
Japanese (ja)
Inventor
Hiroyuki Yamada
博之 山田
Masataka Sekiguchi
関口 昌孝
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
OJI KAKO KK
Original Assignee
OJI KAKO KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by OJI KAKO KK filed Critical OJI KAKO KK
Priority to JP1119089A priority Critical patent/JPH02191640A/en
Publication of JPH02191640A publication Critical patent/JPH02191640A/en
Pending legal-status Critical Current

Links

Landscapes

  • Treatments Of Macromolecular Shaped Articles (AREA)

Abstract

PURPOSE:To obtain a film excellent in adhesion of transparent electrically conductive films in a simple process without depositing low-molecular compounds by homogeneously subjecting the surface of a polyester film to plasma treatment with high-frequency discharge. CONSTITUTION:One or both surfaces of a saturated polyester film are subjected to plasma surface treatment with high-frequency discharge in an atmosphere under 0.01-5Pa pressure. In carrying out the surface treatment with the plasma, an inorganic gas is introduced into a vacuum vessel in an atmosphere under reduced pressure to apply a high-frequency voltage to the inner electrodes, carry out discharge and generate a plasma, which is then made to collide with the surfaces of the film, etc.

Description

【発明の詳細な説明】 [産業−にの利用分野] 本発明は、ポリエステルフィルムの表面をプラズマ処理
する方法に関する。より詳しくは、本発明は、加熱・発
熱状態でのポリエステルからの低分子化合物のフィルム
表面への析出を防止し、透明性の高いポリエステルフィ
ルムを得るための方法に関する。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a method for plasma treating the surface of a polyester film. More specifically, the present invention relates to a method for obtaining a highly transparent polyester film by preventing precipitation of low-molecular compounds from polyester onto the surface of the film during heating and exothermic conditions.

〔従来の技術] ポリエステルフィルムは、機械的性質、寸法安定性、耐
熱性、化学的安定性が優れ、電気的性質も良好であるの
で、電気絶縁材料、金銀糸、磁気記録テープ、製図用フ
ィルム、写真フィルム等に応用され、最近では、電気・
電子部品として、透明導電フィルムが開発されている。
[Prior Art] Polyester film has excellent mechanical properties, dimensional stability, heat resistance, chemical stability, and good electrical properties, so it is used as electrical insulating materials, gold and silver threads, magnetic recording tapes, and drafting films. , has been applied to photographic film, etc., and recently it has been applied to electrical and
Transparent conductive films have been developed as electronic components.

その透明導電フィルムを用いた例として、表示素子の電
極、タッチパネル、光電変換素子、面状発熱体、電磁波
シールド等が挙げられる。
Examples of the use of the transparent conductive film include electrodes of display elements, touch panels, photoelectric conversion elements, planar heating elements, electromagnetic shields, and the like.

この透明導電フィルムの製造には、真空蒸着法、スパッ
タリング法、イオンブレーティング法等の真空を利用す
る方法が用いられ、ポリエステルフィルムの少くとも片
面に、透明な導電性薄膜を設ける。
To manufacture this transparent conductive film, a method utilizing vacuum such as a vacuum evaporation method, a sputtering method, an ion blating method, etc. is used, and a transparent conductive thin film is provided on at least one side of the polyester film.

これらの方法で製造した透明導電フィルムは、透明性、
導電性、薄形化、軽量化、耐衝撃性、可撓性、大面積化
、加工性等の特性をもち、種々の用途に利用されるが、
加熱したり、発熱したりする用途では、ポリエステルフ
ィルムから析出する低分子化合物が発生し、透明性を損
うという問題があった。
Transparent conductive films manufactured by these methods have transparency,
It has properties such as conductivity, thinness, weight reduction, impact resistance, flexibility, large area, and workability, and is used for various purposes.
In applications that involve heating or generating heat, there is a problem in that low-molecular compounds precipitate from the polyester film, impairing transparency.

それらの例として、液晶やエレクトロルミネッセンス等
の表示素子の電極、タッチパネル、太陽電池等の充電変
換素子は、加工工程中で高温加熱される工程があり、ま
た、航空機・車輌等の窓ガラス、ショーケース等の面状
発熱体では、発熱が繰り返し行われるため、ポリエステ
ルフィルムから低分子化合物が析出し、透明性を損う事
があった。
Examples of these include electrodes for display devices such as liquid crystals and electroluminescence, touch panels, and charge conversion elements such as solar cells, which are heated to high temperatures during the processing process; In planar heating elements such as cases, because heat is generated repeatedly, low-molecular compounds may precipitate from the polyester film, impairing its transparency.

従来、この対策として、ポリエステルフィルムの両面も
しくは片面に塗工による硬化性高分子層や蒸着による金
属酸化物等のバリヤー層を形成して低分子化合物の析出
を防止し、そのバリヤー層の少くとも片面に透明導電膜
を形成する方法が行われている。しかし、この方法では
、塗工や蒸着等の加工工程が増え、製造コストが高く、
ポリエステルフィルムとバリヤー層との密着性にも問題
がある。
Conventionally, as a countermeasure against this problem, a curable polymer layer by coating or a barrier layer such as a metal oxide by vapor deposition is formed on both or one side of the polyester film to prevent the precipitation of low-molecular compounds. A method of forming a transparent conductive film on one side has been used. However, this method requires additional processing steps such as coating and vapor deposition, resulting in high manufacturing costs.
There is also a problem with the adhesion between the polyester film and the barrier layer.

また、特殊な条件下で、固相重合して、低分子化合物を
除去したポリエステル樹脂を溶融押出し、延伸してフィ
ルム化する方法がある。しかし、この方法では、重合工
程の繁雑さと重合時間が長い事により、製造コストが高
いという欠点がある。
Furthermore, there is a method in which polyester resin is subjected to solid phase polymerization under special conditions to remove low molecular weight compounds, and then melt-extruded and stretched to form a film. However, this method has the drawback of high production costs due to the complexity of the polymerization process and long polymerization time.

[発明が解決しようとする課題] 以上のように、従来のポリエステルフィルムからの低分
子化合物の析出防止方法では、加工工程の増加の問題、
ポリエステルフィルムとバリヤー層の密着性の問題、製
造コスト高の問題等があった。
[Problems to be Solved by the Invention] As described above, the conventional method for preventing the precipitation of low molecular weight compounds from polyester films has the problems of increasing processing steps;
There were problems with the adhesion between the polyester film and the barrier layer, high manufacturing costs, etc.

本発明では、以上の問題点を解決した連続的に、容易に
、ポリエステルフィルム表面を均一に処理し、低分子化
合物の析出を防止する処理方法を提″供するものである
The present invention provides a treatment method that solves the above-mentioned problems and can continuously and easily treat the surface of a polyester film uniformly and prevent precipitation of low-molecular compounds.

[課題を解決するための手段] 本発明者らは、処理工程が単純で、透明導電膜等の密着
性も良く、製造コストの低いポリエステルフィルムの低
分子化合物析出防止のだめの表面処理方法を種々検討し
た結果、ポリエステルフィルム表面を、高周波放電によ
り、プラズマ表面処理する方法により、従来の問題点を
解決できる事を見出した。
[Means for Solving the Problems] The present inventors have developed various surface treatment methods for preventing the precipitation of low-molecular-weight compounds on polyester films, which have simple processing steps, good adhesion to transparent conductive films, etc., and low production costs. As a result of our investigation, we found that the conventional problems could be solved by a method in which the surface of a polyester film was treated with plasma using high-frequency discharge.

本発明者らは、従来から報告されている表面処理方法を
種々検討する中で、真空容器に、減圧雰囲気下で、活性
または不活性ガスを導入し、高周波放電によってプラズ
マ状態とし、ポリエステルフィルムをプラズマで表面処
理したところ、プラズマにより、ポリエステルフィルム
表面が、架橋されたり、スパッタエツチングされたりす
る事のために150℃で3時間加熱しても低分子化合物
の析出がなく、光線透過率の低下も少ない事がわかり、
本発明に到達した。
The present inventors investigated various surface treatment methods that have been reported in the past, and found that by introducing an active or inert gas into a vacuum container under a reduced pressure atmosphere and creating a plasma state by high-frequency discharge, the polyester film was When the surface was treated with plasma, the surface of the polyester film was cross-linked and sputter-etched by the plasma, so even when heated at 150℃ for 3 hours, there was no precipitation of low-molecular compounds, and the light transmittance decreased. It turns out that there are few
We have arrived at the present invention.

以下、本発明につき、詳細に説明する。Hereinafter, the present invention will be explained in detail.

ポリエステルとは、分子構造にエステル結合をもつ重合
体であり、飽和ポリエステルと不飽和ポリエステルに大
別される。飽和ポリエステルは、線状ポリエステルで熱
可塑性であり、不飽和ポリエステルは、熱硬化性であり
、架橋反応を起こし、硬化する。本発明では、前者の飽
和ポリエステルのフィルム、具体的には、ポリエチレン
テレフタレート、ポリエチレンイソフタレート、ポリエ
チレンナフタレート、ポリブチレンテレフタレート等の
フィルムを対象とする。
Polyester is a polymer having ester bonds in its molecular structure, and is broadly classified into saturated polyester and unsaturated polyester. Saturated polyester is a linear polyester and is thermoplastic, while unsaturated polyester is thermosetting and undergoes a crosslinking reaction to cure. The present invention targets films of the former saturated polyester, specifically films of polyethylene terephthalate, polyethylene isophthalate, polyethylene naphthalate, polybutylene terephthalate, and the like.

本発明の表面処理方法は、ポリエステルフィルムの中、
無延伸フィルム、−軸延伸フィルl2、二軸延伸フィル
ムのいずれであっても適用する事ができる。
In the surface treatment method of the present invention, in a polyester film,
Any of non-stretched film, -axially stretched film l2, and biaxially stretched film can be applied.

これらのポリエステルフィルトは、溶融押出法、カレン
ダ・−法、キャスティング法等によって、作られるが、
ポリエステルの他に、必要に応じて、所望の添加剤、例
えば、顔料、充填剤、滑剤、紫外線吸収剤、安定剤を適
量含有するものでも良い。
These polyester filters are made by melt extrusion, calendering, casting, etc.
In addition to the polyester, it may contain appropriate amounts of desired additives, such as pigments, fillers, lubricants, ultraviolet absorbers, and stabilizers, if necessary.

さらには、延伸加工の異なるものを積層した複合フィル
ムでもさしつかえない。
Furthermore, a composite film obtained by laminating films with different stretching processes may also be used.

本発明においては、上記したようなポリエステルフィル
ムの表面が、プラズマ表面処理される。
In the present invention, the surface of the polyester film as described above is subjected to plasma surface treatment.

プラズマ表面処理にあたっては、真空容器内で、減圧雰
囲気下において、無機系のガスを導入し、内部電極に高
周波電圧を印加し、放電させる事によって生じたプラズ
マ(イオン、電子、励起分子、ラジカル、紫外光等)を
フィルム等の表面に衝突させる$によって行う。
For plasma surface treatment, an inorganic gas is introduced in a vacuum container under a reduced pressure atmosphere, and a high-frequency voltage is applied to the internal electrodes to generate a discharge, resulting in plasma (ions, electrons, excited molecules, radicals, This is done by colliding ultraviolet light, etc.) onto the surface of a film, etc.

表面処理を行う装置としては、真空容器内に誘導結合型
電極または容量結合型電極を設け、マツチングボックス
を介して、高周波電源に接続されているものが好適であ
る。この処理は、バッチ式、連続式いずれによっても良
い。
A suitable surface treatment device is one in which an inductively coupled electrode or a capacitively coupled electrode is provided in a vacuum container and connected to a high frequency power source via a matching box. This treatment may be carried out either batchwise or continuously.

本発明において、ポリエステルフィルムの表面に対する
プラズマ処理は、0.01〜5Paの減圧雰囲気下で斤
う。雰囲気圧が0.01Paより低い時は、ポリエステ
ルフィルムからの脱ガスの影響で圧力が変動しやすく、
また、5Paを超える時は、放電が不安定となるので好
ましくない。
In the present invention, the surface of the polyester film is subjected to plasma treatment under a reduced pressure atmosphere of 0.01 to 5 Pa. When the atmospheric pressure is lower than 0.01 Pa, the pressure tends to fluctuate due to the influence of degassing from the polyester film.
Moreover, when it exceeds 5 Pa, the discharge becomes unstable, which is not preferable.

放電電力は、0.1〜10W/eJの範囲内とするのが
一般的である。処理時間は、1〜600秒の程度とする
。高周波電源としては、通常数百kHz〜数トMIlz
の周波数のものを用いる。たとえば、実用」二、13.
56MHzの電源を用いるのが、好適である。
The discharge power is generally within the range of 0.1 to 10 W/eJ. The processing time is approximately 1 to 600 seconds. As a high frequency power supply, it is usually several hundred kHz to several tons MIlz.
Use a frequency of . For example, "Practical" 2, 13.
Preferably, a 56 MHz power supply is used.

プラズマ表面処理の際の雰囲気ガスとしては、種々の気
体を用いる事ができるが、アルゴン、ヘリウム、酸素、
窒素、炭酸ガス等が好ましい。
Various gases can be used as the atmospheric gas during plasma surface treatment, including argon, helium, oxygen,
Nitrogen, carbon dioxide gas, etc. are preferred.

「実 施 例」 以下、実施例に基づいて具体的に説明する。"Example" Hereinafter, a detailed description will be given based on examples.

実施例 1 厚さ 100μの二軸延伸ポリエチレンテレフタレート
(ダイアホイル■製#100)を所定寸法(10emφ
)に切断し、第1図に示した装置を使用して、プラズマ
表面処理を行った。まず、同ポリエチレンテレフタレー
トフィルム8を第1図の装置の真空容器1内の基板支持
台7の−Lにセ・ソトする。そして、排気管2に連結さ
れた真空ポンプ(図示仕ず)により、装置内を0.00
1.Pa以下に減圧した後、ガス導入バルブ3を開いて
、アルゴンガスを導入し、真空容器1内の雰囲気圧を1
1)aに調整し、真空容器1内をこの圧力に維持する。
Example 1 Biaxially oriented polyethylene terephthalate (#100 manufactured by Diafoil ■) with a thickness of 100 μm was made into a predetermined size (10 emφ
) and subjected to plasma surface treatment using the apparatus shown in FIG. First, the same polyethylene terephthalate film 8 is placed on -L of the substrate support stand 7 in the vacuum container 1 of the apparatus shown in FIG. Then, a vacuum pump (not shown) connected to the exhaust pipe 2 pumps the inside of the device to 0.00.
1. After reducing the pressure to below Pa, open the gas introduction valve 3, introduce argon gas, and reduce the atmospheric pressure in the vacuum container 1 to 1.
1) Adjust to a and maintain the pressure inside the vacuum container 1 at this pressure.

次に、高周波電源6から、マツチングボックス5を介し
、コイル電極4に、周波数1356MHzの高周波電圧
を印加し、放電電力IW/Cシにて、10秒間、ポリエ
チレンテレフタレートの片側表面をプラズマ表面処理す
る。
Next, a high frequency voltage with a frequency of 1356 MHz is applied from the high frequency power supply 6 to the coil electrode 4 via the matching box 5, and one side surface of the polyethylene terephthalate is subjected to plasma surface treatment for 10 seconds using the discharge power IW/C. do.

その後、基板支持台7の上のポリエチレンテレフタレー
トフィルムを反転し、プラズマ表面処理していない面に
、高周波イオンブレーティング法により、ガス導入バル
ブ9を開いて、酸素ガスを導入し、雰囲気圧0.07P
aで放電させ、電子銃10によりハースJ1中の酸化イ
ンジウムと酸化スズの混合物12を蒸発させ、膜厚約3
00人の実施例1の透明導電フィルムを得た。
Thereafter, the polyethylene terephthalate film on the substrate support 7 is turned over, and the gas introduction valve 9 is opened to introduce oxygen gas to the surface that has not been subjected to plasma surface treatment using the high-frequency ion blating method, and the atmospheric pressure is reduced to 0. 07P
a, the mixture 12 of indium oxide and tin oxide in the hearth J1 is evaporated by the electron gun 10, and the film thickness is about 3.
00 people obtained the transparent conductive film of Example 1.

実施例 2〜8.比較例 1 プラズマ表面処理の条件を第1表に示すように設定した
以外は、すべて、実施例1と同様に処理して、酸化イン
ジウムと酸化スズの混合物12を約300人蒸着し、そ
れぞれの透明導電フィルムを得た。
Examples 2-8. Comparative Example 1 Approximately 300 people deposited a mixture of indium oxide and tin oxide 12 in the same manner as in Example 1 except that the plasma surface treatment conditions were set as shown in Table 1. A transparent conductive film was obtained.

比較例 2 ポリエチレンテレフタレートフィルムの両面ともプラズ
マ表面していないフィルムに、高周波イオンブレーティ
ング法により、酸化インジウムと酸化スズの混合物を実
施例1と同様にして約300人蒸着し、透明導電フィル
ムを得た。
Comparative Example 2 About 300 people deposited a mixture of indium oxide and tin oxide on a polyethylene terephthalate film, neither of which had plasma surfaces, using the high-frequency ion blating method in the same manner as in Example 1 to obtain a transparent conductive film. Ta.

これら実施例1〜8、比較例1〜2の透明導電フィルム
におけるプラズマ表面処理後のポリエチレンテレフタレ
ートフィルム表面からの低分子化合物の析出防止効果を
調べるために、それぞれを150℃で3時間、熱風循環
式恒温槽中で加熱した後、ヘーズメータ(スガ試験機■
)により、ヘーズ値を求めた。(JIS K−8714
)また、分光光度計(日立製作所■)により、波長20
0〜900nm領域で、連続的に光線透過率を測定し、
記録チャートより波長5500■における光線透過率を
求めた。得られた結果をあわせて、第1表に示す。
In order to investigate the effect of preventing precipitation of low molecular weight compounds from the polyethylene terephthalate film surface after plasma surface treatment in the transparent conductive films of Examples 1 to 8 and Comparative Examples 1 to 2, each was heated at 150°C for 3 hours with hot air circulation. After heating in a thermostatic oven, use a haze meter (Suga Test Machine)
), the haze value was determined. (JIS K-8714
) Also, using a spectrophotometer (Hitachi ■), wavelength 20
Continuously measure light transmittance in the 0-900 nm region,
The light transmittance at a wavelength of 5500 cm was determined from the recording chart. The obtained results are also shown in Table 1.

7 : 8 ; 9 : 11: 12: 13: 基板支持台 ポリエステルフィルム ガス導入バルブ    10:電子銃 ハース 酸化インジウムと酸化スズ混合物 電子銃電源7: 8; 9: 11: 12: 13: board support stand polyester film Gas introduction valve 10: Electron gun hearth Indium oxide and tin oxide mixture electron gun power supply

Claims (1)

【特許請求の範囲】[Claims] 飽和ポリエステルフィルムの片面または両面を0.01
〜5Paの雰囲気圧下で、高周波放電による表面処理を
行う事を特徴とするポリエステルフィルムのプラズマ表
面処理方法。
0.01 on one or both sides of the saturated polyester film
A plasma surface treatment method for a polyester film, characterized in that the surface treatment is performed by high frequency discharge under an atmospheric pressure of ~5 Pa.
JP1119089A 1989-01-20 1989-01-20 Method for treating surface of polyester film with plasma Pending JPH02191640A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1119089A JPH02191640A (en) 1989-01-20 1989-01-20 Method for treating surface of polyester film with plasma

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1119089A JPH02191640A (en) 1989-01-20 1989-01-20 Method for treating surface of polyester film with plasma

Publications (1)

Publication Number Publication Date
JPH02191640A true JPH02191640A (en) 1990-07-27

Family

ID=11771145

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1119089A Pending JPH02191640A (en) 1989-01-20 1989-01-20 Method for treating surface of polyester film with plasma

Country Status (1)

Country Link
JP (1) JPH02191640A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011005793A (en) * 2009-06-29 2011-01-13 Dainippon Printing Co Ltd Moisture-resistant heat-resistant transparent electroconductive laminate for touch panels, and moisture-resistant heat-resistant transparent laminated plastic touch panel

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011005793A (en) * 2009-06-29 2011-01-13 Dainippon Printing Co Ltd Moisture-resistant heat-resistant transparent electroconductive laminate for touch panels, and moisture-resistant heat-resistant transparent laminated plastic touch panel

Similar Documents

Publication Publication Date Title
KR100922661B1 (en) Metal oxide thin film and its manufacturing method
CN104919542B (en) Transparent conducting film and its manufacture method
CN104937676B (en) Transparent conducting film and its manufacture method
US9624573B2 (en) Production method for transparent conductive film
US4345000A (en) Transparent electrically conductive film
US20160024640A1 (en) Transparent conductive film and production method therefor
WO1987005742A1 (en) Process for producing transparent conductive film
JP4260907B2 (en) Film laminate
JPH02191640A (en) Method for treating surface of polyester film with plasma
JPH05295528A (en) Method for producing gas barrier film
JPH04198469A (en) Manufacture of laminated body
KR0141509B1 (en) Method for zinc adhesive strength film
JPH01171856A (en) Metallized film
WO1987005637A1 (en) Continuous ion plating device for rapidly moving film
JPS61219028A (en) Formation of liquid crystal orienting film
JPS6226869A (en) Manufacture of photovoltaic device
JPH01313810A (en) High speed manufacture of ito transparent conductive film
Bae et al. Indium Tin Oxide (ITO) Thin Film Deposition on Polyethylene Terephthalate (PET) Using Ion Beam Assisted Deposition (IBAD)
JPH02239518A (en) Manufacture of transparent conductive laminated body
JPH02238026A (en) Production of organic electroconductive material