JPH09321564A - Surface acoustic wave element - Google Patents
Surface acoustic wave elementInfo
- Publication number
- JPH09321564A JPH09321564A JP8159198A JP15919896A JPH09321564A JP H09321564 A JPH09321564 A JP H09321564A JP 8159198 A JP8159198 A JP 8159198A JP 15919896 A JP15919896 A JP 15919896A JP H09321564 A JPH09321564 A JP H09321564A
- Authority
- JP
- Japan
- Prior art keywords
- glass substrate
- surface acoustic
- acoustic wave
- glass
- alkaline earth
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000010897 surface acoustic wave method Methods 0.000 title claims abstract description 42
- 239000011521 glass Substances 0.000 claims abstract description 72
- 239000000758 substrate Substances 0.000 claims abstract description 66
- 229910052784 alkaline earth metal Inorganic materials 0.000 claims abstract description 21
- 150000001342 alkaline earth metals Chemical class 0.000 claims abstract description 13
- 229910052751 metal Inorganic materials 0.000 claims abstract description 4
- 239000002184 metal Substances 0.000 claims abstract description 4
- 229910052783 alkali metal Inorganic materials 0.000 claims description 21
- -1 alkali metal salt Chemical class 0.000 claims description 17
- 150000001340 alkali metals Chemical group 0.000 claims description 12
- 239000002253 acid Substances 0.000 claims description 10
- 239000000126 substance Substances 0.000 claims description 10
- 230000002378 acidificating effect Effects 0.000 claims description 7
- 239000007864 aqueous solution Substances 0.000 claims description 5
- 239000005361 soda-lime glass Substances 0.000 claims description 4
- 239000005407 aluminoborosilicate glass Substances 0.000 claims description 3
- 239000005388 borosilicate glass Substances 0.000 claims description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 6
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 abstract description 3
- 229910052700 potassium Inorganic materials 0.000 abstract description 3
- 239000011591 potassium Substances 0.000 abstract description 3
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 abstract description 2
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 abstract description 2
- 229910052790 beryllium Inorganic materials 0.000 abstract description 2
- ATBAMAFKBVZNFJ-UHFFFAOYSA-N beryllium atom Chemical compound [Be] ATBAMAFKBVZNFJ-UHFFFAOYSA-N 0.000 abstract description 2
- 229910052744 lithium Inorganic materials 0.000 abstract description 2
- 229910052749 magnesium Inorganic materials 0.000 abstract description 2
- 239000011777 magnesium Substances 0.000 abstract description 2
- 150000002739 metals Chemical class 0.000 abstract 1
- 230000003647 oxidation Effects 0.000 abstract 1
- 238000007254 oxidation reaction Methods 0.000 abstract 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 13
- 229910052708 sodium Inorganic materials 0.000 description 13
- 239000011734 sodium Substances 0.000 description 13
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 11
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 10
- 229910052791 calcium Inorganic materials 0.000 description 9
- 239000011575 calcium Substances 0.000 description 9
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 8
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- 239000005357 flat glass Substances 0.000 description 5
- 239000011787 zinc oxide Substances 0.000 description 5
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- 208000005156 Dehydration Diseases 0.000 description 3
- 244000126211 Hericium coralloides Species 0.000 description 3
- WMFOQBRAJBCJND-UHFFFAOYSA-M Lithium hydroxide Chemical compound [Li+].[OH-] WMFOQBRAJBCJND-UHFFFAOYSA-M 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 230000018044 dehydration Effects 0.000 description 3
- 238000006297 dehydration reaction Methods 0.000 description 3
- 239000010432 diamond Substances 0.000 description 3
- 229910003460 diamond Inorganic materials 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 239000000377 silicon dioxide Substances 0.000 description 3
- 235000012239 silicon dioxide Nutrition 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- TWRXJAOTZQYOKJ-UHFFFAOYSA-L Magnesium chloride Chemical compound [Mg+2].[Cl-].[Cl-] TWRXJAOTZQYOKJ-UHFFFAOYSA-L 0.000 description 2
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 2
- WCUXLLCKKVVCTQ-UHFFFAOYSA-M Potassium chloride Chemical compound [Cl-].[K+] WCUXLLCKKVVCTQ-UHFFFAOYSA-M 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- KWGKDLIKAYFUFQ-UHFFFAOYSA-M lithium chloride Chemical compound [Li+].[Cl-] KWGKDLIKAYFUFQ-UHFFFAOYSA-M 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 229910017604 nitric acid Inorganic materials 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 239000011780 sodium chloride Substances 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 239000011593 sulfur Substances 0.000 description 2
- 229910052717 sulfur Inorganic materials 0.000 description 2
- 230000007704 transition Effects 0.000 description 2
- UXVMQQNJUSDDNG-UHFFFAOYSA-L Calcium chloride Chemical compound [Cl-].[Cl-].[Ca+2] UXVMQQNJUSDDNG-UHFFFAOYSA-L 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-N Sulfurous acid Chemical compound OS(O)=O LSNNMFCWUKXFEE-UHFFFAOYSA-N 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- BFNBIHQBYMNNAN-UHFFFAOYSA-N ammonium sulfate Chemical compound N.N.OS(O)(=O)=O BFNBIHQBYMNNAN-UHFFFAOYSA-N 0.000 description 1
- 229910052921 ammonium sulfate Inorganic materials 0.000 description 1
- 235000011130 ammonium sulphate Nutrition 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 229910052788 barium Inorganic materials 0.000 description 1
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 description 1
- 229910052792 caesium Inorganic materials 0.000 description 1
- TVFDJXOCXUVLDH-UHFFFAOYSA-N caesium atom Chemical compound [Cs] TVFDJXOCXUVLDH-UHFFFAOYSA-N 0.000 description 1
- 150000001669 calcium Chemical class 0.000 description 1
- 239000001110 calcium chloride Substances 0.000 description 1
- 229910001628 calcium chloride Inorganic materials 0.000 description 1
- AXCZMVOFGPJBDE-UHFFFAOYSA-L calcium dihydroxide Chemical compound [OH-].[OH-].[Ca+2] AXCZMVOFGPJBDE-UHFFFAOYSA-L 0.000 description 1
- 239000000920 calcium hydroxide Substances 0.000 description 1
- 229910001861 calcium hydroxide Inorganic materials 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000004453 electron probe microanalysis Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- HFGPZNIAWCZYJU-UHFFFAOYSA-N lead zirconate titanate Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ti+4].[Zr+4].[Pb+2] HFGPZNIAWCZYJU-UHFFFAOYSA-N 0.000 description 1
- 229910052451 lead zirconate titanate Inorganic materials 0.000 description 1
- 229910001629 magnesium chloride Inorganic materials 0.000 description 1
- VTHJTEIRLNZDEV-UHFFFAOYSA-L magnesium dihydroxide Chemical compound [OH-].[OH-].[Mg+2] VTHJTEIRLNZDEV-UHFFFAOYSA-L 0.000 description 1
- 239000000347 magnesium hydroxide Substances 0.000 description 1
- 229910001862 magnesium hydroxide Inorganic materials 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 239000001103 potassium chloride Substances 0.000 description 1
- 235000011164 potassium chloride Nutrition 0.000 description 1
- KAQHZJVQFBJKCK-UHFFFAOYSA-L potassium pyrosulfate Chemical compound [K+].[K+].[O-]S(=O)(=O)OS([O-])(=O)=O KAQHZJVQFBJKCK-UHFFFAOYSA-L 0.000 description 1
- 229910052701 rubidium Inorganic materials 0.000 description 1
- IGLNJRXAVVLDKE-UHFFFAOYSA-N rubidium atom Chemical compound [Rb] IGLNJRXAVVLDKE-UHFFFAOYSA-N 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 229910052712 strontium Inorganic materials 0.000 description 1
- CIOAGBVUUVVLOB-UHFFFAOYSA-N strontium atom Chemical compound [Sr] CIOAGBVUUVVLOB-UHFFFAOYSA-N 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Landscapes
- Surface Acoustic Wave Elements And Circuit Networks Thereof (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、脱アルカリ処理し
たガラス基板を用いる表面弾性波素子に関する。TECHNICAL FIELD The present invention relates to a surface acoustic wave device using a dealkalized glass substrate.
【0002】[0002]
【従来の技術】表面弾性波の伝搬経路上において信号の
出入れが容易である表面弾性波素子は、テレビジョンの
中間周波数フィルタ、発振器、共振器等に利用され、特
開平5−90860号公報にみられる如く、表面弾性波
の励振を作る圧電体、電気信号を印加する圧電体上のク
シ型電極に加えて、表面弾性波の伝搬速度を速める基板
上の絶縁層、例えば、ダイヤモンド層とから構成される
ものや、特公昭61−35716号公報に開示される如
く、シリコン(Si)基板上に圧電性膜としての酸化亜鉛
(ZnO)を形成し、酸化亜鉛層の上に伝搬損失の小さい誘
電体膜としての二酸化シリコン(SiO2)とクシ型電極を
配するものが知られている。2. Description of the Related Art A surface acoustic wave device that allows signals to be easily input and output on a surface acoustic wave propagation path is used for an intermediate frequency filter, an oscillator, a resonator, and the like of a television, and is disclosed in JP-A-5-90860. In addition to the piezoelectric body that excites surface acoustic waves and the comb-shaped electrode on the piezoelectric body that applies an electric signal, an insulating layer on the substrate that accelerates the propagation velocity of surface acoustic waves, for example, a diamond layer. As disclosed in JP-B-61-35716, zinc oxide (ZnO) as a piezoelectric film is formed on a silicon (Si) substrate, and a propagation loss of zinc oxide is formed on the zinc oxide layer. It is known to dispose silicon dioxide (SiO 2 ) as a small dielectric film and a comb-shaped electrode.
【0003】前述した表面弾性波素子の新しい応用分野
として、特開平4−15146号公報、特開平7−22
3512号公報および特開平7−223513号公報
は、表面弾性波を利用して自動車の窓ガラスやミラーの
水滴を除去する装置が開示されている。As a new application field of the above-mentioned surface acoustic wave device, Japanese Patent Application Laid-Open Nos. 4-15146 and 7-22.
Japanese Patent No. 3512 and Japanese Patent Application Laid-Open No. 7-223513 disclose a device that uses surface acoustic waves to remove water droplets on a window glass of an automobile or a mirror.
【0004】[0004]
【発明が解決しようとする課題】従来、表面弾性波の伝
搬損失を低減するために、基板上にダイヤモンドや二酸
化シリコン膜を設けているが、ダイヤモンドや二酸化シ
リコンを基板上に膜形成するのには大掛かりな製造装置
が必要となり、コストアップにつながってしまう。一
方、こうした膜を形成していない表面弾性波素子を自動
車の窓ガラスやミラーに装着し、その振動を用いて汚れ
や水滴を除去するものにあっては、その表面弾性波の伝
搬損失が大きく、窓ガラスやミラーの全域の汚れや水滴
を均一に除去するには大きな消費電力を必要とする。こ
のため、基板としての窓ガラスに伝搬損失の小さい材質
の層を生成させ、伝搬損失の低減が試みられる。しか
し、その材質のガラスとの密着性や製造工程の複雑化の
点から、伝搬損失の小さい材質のガラス基板への組合せ
は実用的でない。それ故に、本発明は前述した従来技術
の不具合を解消させることを解決すべき課題とする。Conventionally, in order to reduce the propagation loss of surface acoustic waves, a diamond or silicon dioxide film is provided on the substrate. However, when forming a film of diamond or silicon dioxide on the substrate, Requires large-scale manufacturing equipment, which leads to cost increase. On the other hand, when a surface acoustic wave device without such a film is attached to a window glass or a mirror of an automobile and the dirt and water droplets are removed by using the vibration, the propagation loss of the surface acoustic wave is large. However, a large amount of power consumption is required to uniformly remove dirt and water droplets on the entire window glass and mirrors. Therefore, an attempt is made to reduce the propagation loss by forming a layer of a material having a small propagation loss on the window glass as the substrate. However, it is not practical to combine a material having a small propagation loss with a glass substrate in terms of the adhesion to the glass of that material and the complexity of the manufacturing process. Therefore, an object of the present invention is to solve the above-mentioned disadvantages of the related art.
【0005】[0005]
【課題を解決するための手段】本発明は、前述した課題
を解決するために、表面弾性波素子のガラス基板に、脱
アルカリ処理を施したものである。In order to solve the above-mentioned problems, the present invention is one in which a glass substrate of a surface acoustic wave device is subjected to dealkalization treatment.
【0006】本発明では、ガラス基板に脱アルカリ処理
を施すことにより、ガラス基板上での表面弾性波の伝搬
損失を低減する。好ましくは、本発明における脱アルカ
リ処理は酸、または酸とアルカリ金属塩またはアルカリ
土類金属塩とを含む水溶液にガラス基板を浸漬、または
ガラス基板に酸性物質、または酸性物質とアルカリ金属
塩またはアルカリ土類金属塩とを接触させるのがよい。
その中でも酸と、アルカリ金属塩またはアルカリ土類金
属塩とを含む水溶液にガラス基板を浸漬、またはガラス
基板に酸性物質と、アルカリ金属塩またはアルカリ土類
金属塩とを接触させた場合には、酸単体または酸性物質
単体で脱アルカリ処理を行った場合と比べ、ガラス基板
での表面弾性波の伝搬損失がより低減される。脱アルカ
リ処理によりガラス基板から除去される成分は、アルカ
リ金属またはアルカリ土類金属であり、この場合、ガラ
ス基板から除去される量は、ガラス表面でのアルカリ金
属またはアルカリ土類金属の含有量の1重量%以上、ま
たはガラス表面からの深さ(板厚方向の深さ)200μ
mまでに含まれるアルカリ金属またはアルカリ土類金属
の含有量の0.1重量%以上であるとより効果的である。
尚、この脱アルカリ処理では、高価な装置を使用しなく
てもよい。更に、ガラス基板は、脱アルカリ処理後に脱
水処理が施されるとよく、ガラス基板には、アルカリ金
属またはアルカリ土類金属を含むソーダライムガラス、
ホウケイ酸ガラス、アルミノホウケイ酸ガラスのいずれ
かを用いることができる。According to the present invention, the propagation loss of surface acoustic waves on the glass substrate is reduced by subjecting the glass substrate to dealkalization treatment. Preferably, the dealkalization treatment in the present invention involves immersing the glass substrate in an acid or an aqueous solution containing an acid and an alkali metal salt or an alkaline earth metal salt, or an acidic substance on the glass substrate, or an acidic substance and an alkali metal salt or alkali. Contact with an earth metal salt is preferred.
Among them, acid, when the glass substrate is immersed in an aqueous solution containing an alkali metal salt or an alkaline earth metal salt, or when the glass substrate is brought into contact with an acidic substance, an alkali metal salt or an alkaline earth metal salt, The propagation loss of the surface acoustic wave on the glass substrate is further reduced as compared with the case where the dealkalization treatment is performed by using the acid alone or the acid substance alone. The component removed from the glass substrate by the dealkalization treatment is an alkali metal or an alkaline earth metal, and in this case, the amount removed from the glass substrate is the content of the alkali metal or the alkaline earth metal on the glass surface. 1% by weight or more, or the depth from the glass surface (depth in the plate thickness direction) 200μ
It is more effective if the content of alkali metal or alkaline earth metal contained up to m is 0.1% by weight or more.
In this dealkalization treatment, it is not necessary to use an expensive device. Further, the glass substrate may be subjected to dehydration treatment after dealkalization treatment, the glass substrate, soda lime glass containing an alkali metal or alkaline earth metal,
Either borosilicate glass or aluminoborosilicate glass can be used.
【0007】本発明によれば、表面弾性波素子のガラス
基板の表面を脱アルカリ処理したことによりガラス基板
表面弾性波の伝搬損失係数を抑えられ、自動車の窓ガラ
スやミラーに付着した汚れや水滴を均一により小さい消
費電力で除去可能となり、本発明の実用上の価値は高
い。According to the present invention, since the surface of the glass substrate of the surface acoustic wave device is dealkalized, the propagation loss coefficient of the surface acoustic wave of the glass substrate can be suppressed, and dirt or water droplets attached to the window glass or mirror of the automobile can be suppressed. Can be uniformly removed with less power consumption, and the practical value of the present invention is high.
【0008】[0008]
【発明の実施の形態】表面弾性波素子6は、図1に示す
如く、その表面を脱アルカリ処理したガラス基板1と、
該ガラス基板1の表面上に生成した圧電性膜2と、該圧
電性膜2と接するクシ歯電極3a、3bからなる基本構
成を有す。クシ歯電極3a、3bと対向させ(圧電性膜
2を介在させ)て、圧電性膜2に対向電極4a、4bを
設ける。図1の例はクシ歯電極3a、3bをガラス基板
1と圧電性膜2との間に介在させ、図2の例は対向電極
4a、4bをガラス基板1と圧電性膜2との間に介在さ
せたものである。図3と図4は、クシ歯電極3a、3b
のみを用い、該クシ歯電極3a、3bをガラス基材1と
圧電性膜2との間、又は圧電性膜2の表面に設けたもの
である。BEST MODE FOR CARRYING OUT THE INVENTION A surface acoustic wave element 6 comprises a glass substrate 1 whose surface is dealkalized, as shown in FIG.
It has a basic structure including a piezoelectric film 2 formed on the surface of the glass substrate 1 and comb-shaped electrodes 3 a and 3 b in contact with the piezoelectric film 2. Opposed electrodes 4a and 4b are provided on the piezoelectric film 2 so as to face the comb-teeth electrodes 3a and 3b (the piezoelectric film 2 is interposed). In the example of FIG. 1, the comb-teeth electrodes 3a and 3b are interposed between the glass substrate 1 and the piezoelectric film 2, and in the example of FIG. 2, the counter electrodes 4a and 4b are between the glass substrate 1 and the piezoelectric film 2. Intervening. 3 and 4 show the comb-teeth electrodes 3a, 3b.
The comb tooth electrodes 3a and 3b are provided only between the glass substrate 1 and the piezoelectric film 2 or on the surface of the piezoelectric film 2 by using only the above.
【0009】脱アルカリ処理は、この場合、ガラス基板
1からアルカリ金属またはアルカリ土類金属を除去する
ものであり、ガラス基板1から除去される成分は、例え
ば、リチウム、ナトリウム、カリウム、ルビジウム、セ
シウム等のアルカリ金属、または、ベリリウム、マグネ
シウム、カルシウム、ストロンチウム、バリウム等のア
ルカリ土類金属のいずれかである。このことからガラス
基板1には、アルカリ金属またはアルカリ土類金属のい
ずれかを含むガラスが用いられ、例えば、安価なソーダ
ライムガラス、ホウケイ酸ガラス、アルミノホウケイ酸
ガラス等を用いることが可能である。In this case, the dealkalization treatment removes alkali metal or alkaline earth metal from the glass substrate 1. The components removed from the glass substrate 1 are, for example, lithium, sodium, potassium, rubidium and cesium. Or an alkaline earth metal such as beryllium, magnesium, calcium, strontium, or barium. From this, glass containing either an alkali metal or an alkaline earth metal is used for the glass substrate 1, and for example, inexpensive soda lime glass, borosilicate glass, aluminoborosilicate glass, or the like can be used. .
【0010】脱アルカリ処理は、周知のように、ガラス
を希薄な酸性水溶液、例えば塩酸、硝酸、硫酸等の水溶
液に室温から100℃くらいで浸漬させることにより、
または、ガラスをその転移温度付近で硫黄を含む酸性物
質、例えば硫黄粉末、硫酸アンモニウム、亜硫酸ガス、
ピロ硫酸カリウム等と接触させることによりガラス表面
のアルカリ金属、アルカリ土類金属の成分を除去するも
のである。As is well known, the dealkalizing treatment is carried out by immersing glass in a dilute acidic aqueous solution such as hydrochloric acid, nitric acid or sulfuric acid at room temperature to about 100 ° C.
Alternatively, the glass is an acidic substance containing sulfur near its transition temperature, for example, sulfur powder, ammonium sulfate, sulfurous acid gas,
By contacting with potassium pyrosulfate or the like, the components of alkali metal and alkaline earth metal on the glass surface are removed.
【0011】更に好ましい脱アルカリ処理は酸と、アル
カリ金属塩またはアルカリ土類金属塩とを含む水溶液に
ガラス基板を室温から100℃くらいで浸漬、またはガ
ラス基板にその転移温度付近で硫黄を含む酸性物質と、
アルカリ金属塩またはアルカリ土類金属塩とを接触させ
ればよい。ここに用いられる酸としては、塩酸、硫酸、
硝酸等が用いられ、また、アルカリ金属塩またはアルカ
リ土類金属塩としては、塩化ナトリウム、塩化リチウ
ム、水酸化ナトリウム、水酸化リチウム、塩化カリウ
ム、水酸化カリウム、塩化マグネシウム、水酸化マグネ
シウム、塩化カルシウム、水酸化カルシウム等を用いる
ことができる。脱アルカリ処理によってガラス基板1か
ら除去されるアルカリ金属またはアルカリ土類金属の量
は、例えば、ガラス表面での上記の物質の含有量の少な
くとも1重量%以上、またはガラス表面からの深さが2
00μmまでの間に上記の物質の含有量の0.1%以上で
あることがよく、更に、脱アルカリ処理後に施される脱
水処理は、ガラス基板1に対して大気中では300〜6
00℃、または真空中では50〜200℃で3時間ほど
熱処理することであり、この脱水処理により、表面弾性
波の伝搬損失が更に低減できる。A more preferable dealkalization treatment is to immerse the glass substrate in an aqueous solution containing an acid and an alkali metal salt or an alkaline earth metal salt at room temperature to about 100 ° C., or to add acid to the glass substrate containing sulfur near its transition temperature. Substance,
It may be brought into contact with an alkali metal salt or an alkaline earth metal salt. Acids used here include hydrochloric acid, sulfuric acid,
Nitric acid or the like is used, and examples of the alkali metal salt or alkaline earth metal salt include sodium chloride, lithium chloride, sodium hydroxide, lithium hydroxide, potassium chloride, potassium hydroxide, magnesium chloride, magnesium hydroxide, calcium chloride. , Calcium hydroxide and the like can be used. The amount of the alkali metal or alkaline earth metal removed from the glass substrate 1 by the dealkalization treatment is, for example, at least 1% by weight or more of the content of the above substance on the glass surface, or the depth from the glass surface is 2% or more.
It is preferable that the content of the above substances is 0.1% or more in the range of up to 00 μm, and further, the dehydration treatment performed after the dealkalizing treatment is performed in the air at 300 to 6%.
The heat treatment is performed at 00 ° C. or 50 to 200 ° C. in vacuum for about 3 hours, and this dehydration treatment can further reduce the propagation loss of surface acoustic waves.
【0012】圧電性膜2は周知のように酸化亜鉛、窒化
アルミ、チタン酸ジルコン酸鉛等で、そのガラス基板1
への生成法は周知のスパッタ法、蒸着法、イオンプレー
ティング法、CVD法等であり、特に制限はない。ま
た、クシ歯電極3a、3bと対向電極4a、4bはアル
ミニウム等の金属またはその合金からなり、集積回路等
の形成で一般的に用いられている方法によって形成する
ことができる。As is well known, the piezoelectric film 2 is made of zinc oxide, aluminum nitride, lead zirconate titanate or the like, and its glass substrate 1 is used.
There are no particular restrictions on the method of forming the above-mentioned material, which is a known sputtering method, vapor deposition method, ion plating method, CVD method, or the like. The comb-teeth electrodes 3a, 3b and the counter electrodes 4a, 4b are made of a metal such as aluminum or an alloy thereof, and can be formed by a method generally used for forming an integrated circuit or the like.
【0013】[0013]
〔実施例1〕厚さ1.9mmのソーダライムガラスからなる
ガラス基板を、96℃、0.1規定の塩酸溶液中に48時
間浸漬し、その表面を脱アルカリ処理した。ガラス基板
の表面のナトリウム含有量は、EPMA分析法により測
定した結果、9.8重量%であった(脱アルカリ処理以前
は、10.4重量%であった。この場合、伝搬損失を低減
させるためには、アルカリ金属またはアルカリ土類金属
の量が小さい方がよく、ナトリウム以外の成分ではカル
シウム等があり、このカルシウム含有量は5.3重量%で
変化はなかったが、ナトリウムはガラス基板1の深さ5
00μmまで除去されていた)。図1に示す如く、ガラ
ス基板の片面に、ギャップと線幅とが20μm 、対数が
83対、交叉幅1mm、膜厚0.1μm のアルミ製のクシ歯
電極を形成した。クシ歯電極上にスパッタ法により膜厚
2μm の酸化亜鉛膜を形成し、その上に膜厚0.1μm の
アルミ製の対向電極を形成し、表面弾性波素子とした。
この素子における表面弾性波の伝搬損失係数は、2.86
dB/cmであった。[Example 1] A glass substrate made of soda lime glass having a thickness of 1.9 mm was immersed in a 0.1 N hydrochloric acid solution at 96 ° C for 48 hours, and its surface was dealkalized. The sodium content on the surface of the glass substrate was 9.8 wt% as measured by EPMA analysis (before the dealkalization treatment, it was 10.4 wt%. In this case, the propagation loss was reduced. For this purpose, it is better that the amount of alkali metal or alkaline earth metal is smaller, and calcium is the only component other than sodium, and this calcium content did not change at 5.3% by weight, but sodium is a glass substrate. 1 depth 5
It was removed up to 00 μm). As shown in FIG. 1, a comb-shaped electrode made of aluminum having a gap and a line width of 20 μm, a logarithm of 83 pairs, a cross width of 1 mm and a film thickness of 0.1 μm was formed on one surface of a glass substrate. A zinc oxide film having a film thickness of 2 μm was formed on the comb-teeth electrode by a sputtering method, and a counter electrode made of aluminum having a film thickness of 0.1 μm was formed on the zinc oxide film to obtain a surface acoustic wave device.
The propagation loss coefficient of surface acoustic wave in this device is 2.86.
It was dB / cm.
【0014】〔実施例2〕実施例1は、ガラス基板を9
8℃、2規定塩酸溶液中に79時間浸漬させ脱アルカリ
処理した以外、同じ工程を経て表面弾性波素子を製造し
た。ガラス基板表面のカルシウム含有量は5.3重量%で
変化はなかったが、基板表面のナトリウム含有量は、9.
7重量%であり、ガラス基板1の表面からの深さ700
μmよりも深いところまで、ほぼ均一にナトリウムは除
去されていた。この素子の表面弾性波の伝搬損失係数
は、2.99dB/cmであった。[Embodiment 2] In Embodiment 1, a glass substrate is used.
A surface acoustic wave device was manufactured through the same steps, except that it was immersed in a 2N hydrochloric acid solution at 8 ° C. for 79 hours and dealkalized. The calcium content on the glass substrate surface was 5.3% by weight, which was unchanged, but the sodium content on the substrate surface was 9.
7% by weight, depth 700 from the surface of the glass substrate 1
Sodium was almost uniformly removed to a depth deeper than μm. The surface acoustic wave propagation loss coefficient of this device was 2.99 dB / cm.
【0015】〔実施例3〕実施例1で、ガラス基板を9
6℃、0.1規定塩酸と1規定塩化ナトリウム水溶液に4
8時間浸漬させ脱アルカリ処理し、上記と同じ工程を経
て表面弾性波素子を形成した。ガラス基板1表面のナト
リウム含有量は9.5重量%、カルシウム含有量は5.1重
量%であった(脱アルカリ処理以前、カルシウムは5.3
重量%であった)。ガラス基板1の深さ方向にナトリウ
ムは600μm、カルシウムは100μmまで除去され
た。この場合でのこの素子の表面弾性波の伝搬損失係数
は、2.37dB/cmであった。これとは別に、実施例1
において脱アルカリ処理で得られたガラス基板1を、真
空中100℃で3時間熱処理し、ガラス基板1の表面を
脱水処理して同じ工程を経て表面弾性波素子を形成した
場合には、表面弾性波の伝搬損失係数は2.78dB/cm
であった。[Embodiment 3] In Embodiment 1, the glass substrate is replaced by 9
4 at 0.1C hydrochloric acid and 1N sodium chloride solution at 6 ℃
The surface acoustic wave device was formed by immersing for 8 hours for dealkalization, and through the same steps as above. The sodium content on the surface of the glass substrate 1 was 9.5% by weight and the calcium content was 5.1% by weight (before the dealkalization treatment, the calcium content was 5.3%).
Wt%). Sodium of 600 μm and calcium of 100 μm were removed in the depth direction of the glass substrate 1. The propagation loss coefficient of the surface acoustic wave of this device in this case was 2.37 dB / cm. Apart from this, Example 1
In the case where the glass substrate 1 obtained by the dealkalization treatment is heat-treated in vacuum at 100 ° C. for 3 hours to dehydrate the surface of the glass substrate 1 and form a surface acoustic wave device through the same steps, Wave propagation loss coefficient is 2.78 dB / cm
Met.
【0016】〔比較例〕脱アルカリ処理をしないガラス
基板(ナトリウム含有量は10.4重量%)を用い、実施
例1と同じ表面弾性波素子を得た。この素子の表面弾性
波の伝搬損失係数は、3.54dB/cmであった。尚、実
施例におけるナトリウム含有量とはナトリウム、カリウ
ム、カルシウム、ケイ素、酸素の5元素中に占めるナト
リウムの重量%を表している。[Comparative Example] The same surface acoustic wave device as that of Example 1 was obtained by using a glass substrate (sodium content: 10.4% by weight) not subjected to dealkalization treatment. The surface acoustic wave propagation loss coefficient of this device was 3.54 dB / cm. The sodium content in the examples means the weight% of sodium in the five elements of sodium, potassium, calcium, silicon and oxygen.
【0017】[0017]
【効果】脱アルカリ処理したガラス基板を用いた表面弾
性波素子は、伝搬損失を低減させる膜を形成するための
装置が必要ないので、コストアップを抑えることができ
る。更に、表面弾性波の伝搬損失を低減させ、低消費電
力で表面弾性波を発生させるので、自動車の窓ガラス、
ミラーのほこりや水滴を除去させるという新しい応用分
野に使用可能となる。また、このような分野だけでな
く、表面弾性波を伝える伝搬材料としてガラスを用いる
ものに対し、本発明を適用できる。[Effect] The surface acoustic wave device using the glass substrate subjected to dealkalization does not require a device for forming a film for reducing the propagation loss, so that cost increase can be suppressed. Furthermore, since the propagation loss of surface acoustic waves is reduced and surface acoustic waves are generated with low power consumption,
It can be used in new applications such as removing dust and water droplets from mirrors. Further, the present invention can be applied not only to such a field but also to a material using glass as a propagation material for transmitting a surface acoustic wave.
【図1】本発明の一例の素子の断面図である。FIG. 1 is a sectional view of an element of an example of the present invention.
【図2】クシ歯電極を圧電性膜の表面に用いた例の断面
図である。FIG. 2 is a cross-sectional view of an example in which a comb tooth electrode is used on the surface of a piezoelectric film.
【図3】対向電極を使用しない例の断面図である。FIG. 3 is a sectional view of an example in which a counter electrode is not used.
【図4】図3の例でクシ歯電極を圧電性膜の表面に配し
た例の断面図である。FIG. 4 is a cross-sectional view of an example in which the comb-teeth electrode is arranged on the surface of the piezoelectric film in the example of FIG.
【図5】図5は脱アルカリ処理でのガラス基板の深さ方
向におけるナトリウムまたはカルシウム含有量の変化を
示したグラフ図である。FIG. 5 is a graph showing changes in sodium or calcium content in the depth direction of a glass substrate in dealkalization treatment.
1 ガラス基板 2 圧電性膜 3a、3b クシ歯電極 4a、4b 対向電極 1 Glass Substrate 2 Piezoelectric Films 3a, 3b Comb Tooth Electrodes 4a, 4b Counter Electrodes
フロントページの続き (72)発明者 谷 俊彦 愛知県愛知郡長久手町大字長湫字横道41番 地の1 株式会社豊田中央研究所内 (72)発明者 斎藤 康善 愛知県愛知郡長久手町大字長湫字横道41番 地の1 株式会社豊田中央研究所内Front Page Continuation (72) Inventor Toshihiko Tani, Nagakute-cho, Aichi-gun, Aichi Prefecture 41, Nagachoji, Yokochi Central Research Institute, Ltd. (72) Inventor Yasushi Saito, 41, Nagakute-cho, Aichi-gun, Nagakute-machi Address 1 Toyota Central Research Institute Co., Ltd.
Claims (5)
し、前記ガラス基板上または前記圧電性膜上に電極を設
けて表面弾性波を発生させる表面弾性波素子において、
前記ガラス基板に脱アルカリ処理を施したことを特徴と
する表面弾性波素子。1. A surface acoustic wave element having a piezoelectric film formed on a glass substrate, wherein an electrode is provided on the glass substrate or on the piezoelectric film to generate a surface acoustic wave.
A surface acoustic wave device, characterized in that the glass substrate is subjected to dealkalization treatment.
アルカリ金属塩またはアルカリ土類金属塩とを含む水溶
液に前記ガラス基板を浸漬、または前記ガラス基板に酸
性物質、または酸性物質と、アルカリ金属塩またはアル
カリ土類金属塩とを接触させる請求項1記載の表面弾性
波素子。2. The dealkalizing treatment is an acid or an acid,
2. The glass substrate is immersed in an aqueous solution containing an alkali metal salt or an alkaline earth metal salt, or the glass substrate is contacted with an acidic substance or an acidic substance and an alkali metal salt or an alkaline earth metal salt. Surface acoustic wave device.
板から除去される成分はアルカリ金属またはアルカリ土
類金属であり、前記ガラス基板から除去される量は、前
記ガラス表面での前記アルカリ金属またはアルカリ土類
金属の含有量の1重量%以上、または前記ガラス表面か
らの深さ200μmまでに含まれる前記アルカリ金属ま
たはアルカリ土類金属の含有量の0.1重量%以上である
請求項1または2記載の表面弾性波素子。3. The component removed from the glass substrate by the dealkalizing treatment is an alkali metal or an alkaline earth metal, and the amount removed from the glass substrate is the alkali metal or alkaline earth on the glass surface. 3. 1% by weight or more of the content of the group metal, or 0.1% by weight or more of the content of the alkali metal or alkaline earth metal contained up to a depth of 200 μm from the glass surface. Surface acoustic wave device.
脱水処理が施された請求項3記載の表面弾性波素子。4. The surface acoustic wave device according to claim 3, wherein the glass substrate is dehydrated after dealkalization.
ス、ホウケイ酸ガラス、アルミノホウケイ酸ガラスのい
ずれかを用いる請求項4記載の表面弾性波素子。5. The surface acoustic wave device according to claim 4, wherein the glass substrate is made of soda lime glass, borosilicate glass, or aluminoborosilicate glass.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8159198A JPH09321564A (en) | 1996-05-31 | 1996-05-31 | Surface acoustic wave element |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8159198A JPH09321564A (en) | 1996-05-31 | 1996-05-31 | Surface acoustic wave element |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH09321564A true JPH09321564A (en) | 1997-12-12 |
Family
ID=15688474
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8159198A Pending JPH09321564A (en) | 1996-05-31 | 1996-05-31 | Surface acoustic wave element |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH09321564A (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2003065769A1 (en) * | 2002-01-28 | 2003-08-07 | Nippon Sheet Glass Co., Ltd. | Back sealing member for organic electroluminescence device, glass substrate for organic electroluminescence device, organic electroluminescence device, and methods for manufacturing sealing member and glass substrate |
JP2003233983A (en) * | 2001-12-05 | 2003-08-22 | Korea Advanced Inst Of Science & Technol | Method of controlling magnetization easy axis in ferromagnetic films using voltage and magnetic memory using this method and its information recording method |
US6803698B2 (en) | 2000-10-12 | 2004-10-12 | Murata Manufacturing Co., Ltd | Acceleration sensor |
JP2008026273A (en) * | 2006-07-25 | 2008-02-07 | Denso Corp | Surface-acoustic-wave angular velocity sensor |
US8256289B2 (en) | 2006-07-25 | 2012-09-04 | Denso Corporation | Angular rate sensor |
-
1996
- 1996-05-31 JP JP8159198A patent/JPH09321564A/en active Pending
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6803698B2 (en) | 2000-10-12 | 2004-10-12 | Murata Manufacturing Co., Ltd | Acceleration sensor |
JP2003233983A (en) * | 2001-12-05 | 2003-08-22 | Korea Advanced Inst Of Science & Technol | Method of controlling magnetization easy axis in ferromagnetic films using voltage and magnetic memory using this method and its information recording method |
WO2003065769A1 (en) * | 2002-01-28 | 2003-08-07 | Nippon Sheet Glass Co., Ltd. | Back sealing member for organic electroluminescence device, glass substrate for organic electroluminescence device, organic electroluminescence device, and methods for manufacturing sealing member and glass substrate |
JP2008026273A (en) * | 2006-07-25 | 2008-02-07 | Denso Corp | Surface-acoustic-wave angular velocity sensor |
US8256289B2 (en) | 2006-07-25 | 2012-09-04 | Denso Corporation | Angular rate sensor |
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