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JPH0853796A - Production of copper foil for printed circuit - Google Patents

Production of copper foil for printed circuit

Info

Publication number
JPH0853796A
JPH0853796A JP20932894A JP20932894A JPH0853796A JP H0853796 A JPH0853796 A JP H0853796A JP 20932894 A JP20932894 A JP 20932894A JP 20932894 A JP20932894 A JP 20932894A JP H0853796 A JPH0853796 A JP H0853796A
Authority
JP
Japan
Prior art keywords
pulsation rate
copper
copper foil
current
cathode cylinder
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP20932894A
Other languages
Japanese (ja)
Inventor
Masaomi Murakami
昌臣 村上
Takeshi Ebina
毅 蝦名
Kenji Inukai
賢二 犬飼
Shoji Sugihara
省司 杉原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Mining Holdings Inc
Original Assignee
Nikko Materials Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikko Materials Co Ltd filed Critical Nikko Materials Co Ltd
Priority to JP20932894A priority Critical patent/JPH0853796A/en
Publication of JPH0853796A publication Critical patent/JPH0853796A/en
Withdrawn legal-status Critical Current

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  • Electroplating Methods And Accessories (AREA)
  • Manufacturing Of Printed Wiring (AREA)

Abstract

PURPOSE:To establish a technique for producing copper coil for printed circuits capable of easily and cost effectively controlling the surface roughness of a copper foil matte surface. CONSTITUTION:A DC current having ripples of a pulsation rate of >=5%, more preferably >=20% is used as an electrolytic current in production of the electrolytic copper foil by filling an electrolyte contg. copper ions between a horizontally rotating cathode cylinder and an anode arranged to face this cathode cylinder and effecting electrolysis to electrodeposit copper on the cathode cylinder, then peeling the electrodeposited copper to a foil form. The waveform of the ripple currents is regulated by the pulsation rate, i.e., the ratio (i1/i2) of the ripple current value to the average current value and period (T). Control of the pulsation rate is executed by changing the secondary voltage of a transformer of a DC power source by a thyristor phase control system or changing to make the ratio of the current rectification output small in the pulsation rate and the current rectification output large in the pulsation rate and mixing both outputs. The nucleus generation in the initial period of copper electrodeposition is accelerated and uniform crystal growth is effected if the pulsation rate is made larger. The surface roughness of the matte surface is thus controlled small.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、印刷回路用銅箔の製造
方法に係わり、特に容易に粗面の表面粗さを制御可能
な、特には表面粗さを小さくすることのできる電解銅箔
の製造方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for producing a copper foil for a printed circuit, and in particular, it is possible to easily control the surface roughness of a rough surface, and particularly to reduce the surface roughness. Manufacturing method.

【0002】[0002]

【従来の技術】銅及び銅合金箔(以下、銅箔と称する)
は、電器・電子関連産業の発展に大きく寄与しており、
特に印刷回路材として不可欠の存在となっている。銅箔
には電解銅箔と圧延銅箔とがあるが、プリント配線板用
として使用される銅箔は、その接着強度等の観点から、
大部分が電解銅箔である。電解銅箔は、電気銅乃至それ
と同等の純度を有する電線スクラップを原料として銅イ
オンを含む電解液を調製し、電解液中に浸漬されるカソ
ードとしての水平に回転する陰極円筒と、該陰極円筒の
円筒面に相対して配置された陽極との間に、銅イオンを
含む電解液を満たして電解を行い、該陰極円筒の円筒面
上に銅を連続的に電着させた後、所定の厚さとなった電
着物を回転ドラムから箔状に剥離させて生箔を製造する
ことを基本とする。その後、印刷回路板用銅箔に対する
品質要求に応じて、樹脂基材と接着されるマット面(接
着面)と光沢面(非接着面)とでそれぞれに多くの表面
処理がなされる。通常の電解銅箔では、例えば マット
面では、銅のふしこぶ状の電着を行う粗化処理、電着粒
子の脱落を防止するためのかぶせ層を形成する薄い銅め
っき処理及び必要に応じ金属乃至合金層を形成するトリ
ート処理、更に防錆処理が行われる。
2. Description of the Related Art Copper and copper alloy foils (hereinafter referred to as copper foils)
Contributes greatly to the development of the electrical and electronic related industries,
In particular, it is indispensable as a printed circuit material. There are electrolytic copper foil and rolled copper foil in the copper foil, the copper foil used for the printed wiring board, from the viewpoint of its adhesive strength,
Most are electrolytic copper foil. The electrolytic copper foil is prepared by preparing an electrolytic solution containing copper ions from electric wire scrap having the same purity as electrolytic copper or a raw material, and a horizontally rotating cathode cylinder as a cathode that is immersed in the electrolytic solution, and the cathode cylinder. Between the anode disposed opposite to the cylindrical surface of, the electrolytic solution containing copper ions is filled to perform electrolysis, and copper is continuously electrodeposited on the cylindrical surface of the cathode cylinder. Basically, a raw foil is manufactured by peeling a thick electrodeposit from a rotary drum in a foil shape. Then, depending on the quality requirements for the printed circuit board copper foil, many surface treatments are performed on the matte surface (adhesive surface) and the glossy surface (non-adhesive surface) that are adhered to the resin base material. In the case of ordinary electrolytic copper foil, for example, on the matte surface, roughening treatment is performed to perform galvanic deposition of copper, thin copper plating treatment is performed to form a covering layer to prevent electrodeposited particles from falling off, and if necessary, metal is used. Further, a treat treatment for forming an alloy layer and a rust preventive treatment are performed.

【0003】得られた印刷回路用銅箔は一般に樹脂基材
に高温高圧下で積層、接着され、その後エッチング処理
等を経て目的とする回路が形成される。その後種々の電
気素子が組み付けられて、最終的にプリント基板が形成
される。
The obtained copper foil for printed circuits is generally laminated and adhered to a resin substrate under high temperature and high pressure, and then subjected to etching treatment or the like to form a desired circuit. After that, various electric elements are assembled to finally form a printed circuit board.

【0004】最近における電気機器の小型化及び高性能
化の傾向に伴いプリント基板の高密度化が進み、形成さ
れる回路幅をより細くすることが要求されている。その
ためにはエッチング処理を均一に行う必要があり、これ
には銅箔マット面の表面粗さが大きく関係してくる。マ
ット面とは銅箔の、樹脂基板上に接着される側の面であ
り、マット面の表面粗さを制御し、それを小さく抑える
ことにより均一なエッチング処理が可能になる。
With the recent trend toward miniaturization and high performance of electric devices, the density of printed circuit boards has increased, and it has been required to reduce the width of circuits to be formed. For that purpose, it is necessary to uniformly perform the etching treatment, and the surface roughness of the copper foil matte surface is greatly related to this. The matte surface is the surface of the copper foil that is adhered to the resin substrate. By controlling the surface roughness of the matte surface and suppressing it to a small value, uniform etching can be performed.

【0005】従来、電解法によって製造される印刷回路
用銅箔は、マット面の表面粗さの制御を、主に電解液中
に加える添加剤によって行なっていた。
Conventionally, in the copper foil for printed circuits produced by the electrolytic method, the surface roughness of the matte surface is controlled mainly by an additive added to the electrolytic solution.

【0006】一方、電気めっきの分野では電解電流にパ
ルス電流を用いることにより、めっき面の表面粗さが低
下することが知られている。パルス電流の使用と関連し
て、印刷回路用銅箔の分野でパルス電流を用いた技術に
は、銅箔のピンホール及びマイクロポロシティ等の発生
防止を目的とした例があるが(特公昭63−28228
8号参照)、銅箔の表面粗さの制御を目的とした適用例
は見られない。また、生箔製造後の粗化処理の一環とし
て、パルス電流を使用することにより接着強度を改善す
る試みが特開昭61−6297号や特公平2−6024
0号に記載されているが、生箔の製造と直接かかわるも
のではない。
On the other hand, in the field of electroplating, it is known that the surface roughness of the plated surface is reduced by using a pulse current as the electrolytic current. In connection with the use of pulse current, there is an example of a technique using pulse current in the field of copper foil for printed circuits for the purpose of preventing the generation of pinholes, microporosity, etc. of the copper foil (Japanese Patent Publication Sho 63). -28228
No. 8), there is no application example for controlling the surface roughness of the copper foil. Also, as part of the roughening treatment after the production of green foil, an attempt to improve the adhesive strength by using a pulsed current has been made in JP-A-61-6297 and JP-B-2-6024.
Although described in No. 0, it is not directly related to the production of green foil.

【0007】[0007]

【発明が解決しようとする課題】しかし、仮に銅箔マッ
ト面の表面粗さの制御を目的として電解電流にパルス電
流を用いるとしても、パルス電源は直流電源より高価で
消費電力も大きく、経済的に不利である。しかも電解銅
箔の製造に用いられるような大電流を供給するパルス電
源は入手困難であるため、実用的ではない。そのため一
般には上記の通り添加剤の使用により銅箔マット面の表
面粗さを制御する方法が採用されてきたわけである。こ
の場合、製造時に常に電解液中の添加剤の濃度、添加量
の制御・管理が必要である。しかし、従来の粗化された
箔と粗さを抑えた箔を作り分ける場合、電解セルによっ
て添加剤の添加方法が異なることになり、制御が煩わし
かった。まして1つの電解セルでこれらの箔を作ろうと
すると、制御方法を切り替える必要があり、定常状態に
達するまでに無駄に箔を作ることになる。
However, even if a pulse current is used as the electrolytic current for the purpose of controlling the surface roughness of the copper foil mat surface, the pulse power source is more expensive and consumes more power than the DC power source, which is economical. Is disadvantageous to Moreover, a pulsed power supply for supplying a large current, which is used for manufacturing an electrolytic copper foil, is difficult to obtain and is not practical. Therefore, in general, the method of controlling the surface roughness of the copper foil matt surface by using the additive has been adopted as described above. In this case, it is always necessary to control and manage the concentration and amount of the additive in the electrolytic solution at the time of manufacturing. However, when a conventional roughened foil and a foil with a reduced roughness are separately produced, the method of adding the additive differs depending on the electrolytic cell, which makes control difficult. If one tries to make these foils with one electrolysis cell, it is necessary to switch the control method, and the foils are wastefully made before the steady state is reached.

【0008】本発明の課題は、従来技術における上記の
欠点を解消し、銅箔マット面の表面粗さの制御、特にそ
の低減化を容易かつ経済的に行うことのできる印刷回路
用銅箔の製造技術を確立することである。
An object of the present invention is to provide a printed circuit copper foil which can solve the above-mentioned drawbacks of the prior art and can easily and economically control the surface roughness of the copper foil matte surface, particularly, reduce the surface roughness. Establishing manufacturing technology.

【0009】[0009]

【課題を解決するための手段】本発明者は、電解電流と
して脈動率が5%以上である、リップルを有する直流電
流を用いると、マット面の表面粗さを制御し得ることを
見いだした。例えば、脈動率を5%から100%まで変
化させることにより平均表面粗さを0.95μmから
0.80μm水準まで変化させることができることが判
明した。リップルとは、交流電源から整流して得られた
直流電源の出力に含まれる電圧又は電流の電源交流に同
期した脈流成分を云う。脈動率とは、リップル電流の波
形において平均電流値(i2 )に対するリップル電流値
(i1 )の比(=i1 /i2 )で定義される。この知見
に基づいて、本発明は、水平に回転する陰極円筒と該陰
極円筒の円筒面に相対して配置された陽極との間に銅イ
オンを含む電解液を満たして電解を行い、該陰極円筒の
円筒面上に銅を電着させた後、電着物を該陰極円筒の円
筒面から箔状に剥離させる電解銅箔の製造方法におい
て、電解電流として、脈動率が5%以上、好ましくは2
0%以上であるリップルを有する直流電流を用いること
を特徴とする印刷回路用銅箔の製造方法を提供する。脈
動率の制御は、(A)サイリスタ位相制御方式による直
流電源においてトランスの2次電圧を変化させることに
よって或いは(B)脈動率の制御を脈動率を小さくした
整流出力と脈動率を大きくした整流出力との比を変化さ
せて混合することによって行うことができる。
The inventors of the present invention have found that the surface roughness of the matte surface can be controlled by using a rippled direct current having a pulsation rate of 5% or more as the electrolytic current. For example, it has been found that the average surface roughness can be changed from 0.95 μm to 0.80 μm level by changing the pulsation rate from 5% to 100%. The ripple means a pulsating current component of a voltage or current included in the output of the DC power supply obtained by rectifying the AC power supply, which is synchronized with the power supply AC. The pulsation rate is defined as the ratio (= i 1 / i 2 ) of the ripple current value (i 1 ) to the average current value (i 2 ) in the ripple current waveform. Based on this finding, the present invention performs electrolysis by filling an electrolytic solution containing copper ions between a horizontally rotating cathode cylinder and an anode arranged opposite to the cylindrical surface of the cathode cylinder, In the method for producing an electrolytic copper foil in which copper is electrodeposited on the cylindrical surface of the cylinder, and then the electrodeposit is peeled off from the cylindrical surface of the cathode cylinder in a foil shape, the electrolytic current has a pulsation rate of 5% or more, preferably Two
Provided is a method for manufacturing a copper foil for a printed circuit, which uses a direct current having a ripple of 0% or more. The pulsation rate is controlled by (A) changing the secondary voltage of the transformer in the DC power supply by the thyristor phase control method, or (B) rectifying the pulsation rate by reducing the pulsation rate and increasing the pulsation rate. This can be done by changing the ratio with the output and mixing.

【0010】[0010]

【作用】リップルを有する直流電流がマット面の表面粗
さに影響を及ぼす機構は明確ではないが、脈動率を大き
くすると銅電着初期における核発生が促進され、均一な
結晶成長が行われ、銅薄膜の形成が起こることにより、
マット面の表面粗さが小さく制御されると推測される。
本発明において用いられる、リップルを有する直流電流
の波形としては、例えば図1に示されるようなものが挙
げられる。図1においてTはリップルの周期を表し、i
1 、i2 はそれぞれリップル電流値、平均電流値を表し
ており、通常、リップル電流の波形は、脈動率、即ち平
均電流値に対するリップル電流値の比(i1 /i2 )お
よび周期(T)で規定される。所定の設備において、脈
動率と生箔表面粗さとの関係を得ておくことにより、銅
箔に求められる表面粗さに応じて使用する直流電流の脈
動率を調節することにより、銅箔マット面の表面粗さの
制御を容易かつ経済的に行うことのできる。脈動率の制
御は、(A)サイリスタ位相制御方式による直流電源に
おいてトランスの2次電圧を変化させることによって或
いは(B)脈動率の制御を脈動率を小さくした整流出力
と脈動率を大きくした整流出力との比を変化させて混合
することによって行う。
[Function] Although the mechanism by which a rippled direct current influences the surface roughness of the matte surface is not clear, increasing the pulsation rate promotes nucleation in the early stage of copper electrodeposition, resulting in uniform crystal growth. Due to the formation of the copper thin film,
It is presumed that the surface roughness of the matte surface is controlled to be small.
As a waveform of a direct current having a ripple used in the present invention, for example, a waveform shown in FIG. 1 can be mentioned. In FIG. 1, T represents the ripple period, i
1 and i 2 represent a ripple current value and an average current value, respectively. Usually, the ripple current waveform has a pulsation rate, that is, a ratio of the ripple current value to the average current value (i 1 / i 2 ) and a period (T ). The copper foil matte surface can be adjusted by adjusting the pulsation rate of the direct current used according to the surface roughness required for the copper foil by obtaining the relationship between the pulsation rate and the surface roughness of the raw foil in the specified equipment. The surface roughness can be controlled easily and economically. The pulsation rate is controlled by (A) changing the secondary voltage of the transformer in the DC power supply by the thyristor phase control method, or (B) rectifying the pulsation rate by reducing the pulsation rate and increasing the pulsation rate. This is done by changing the ratio with the output and mixing.

【0011】[0011]

【発明の具体的説明】電解銅箔生箔は、電気銅乃至それ
と同等の純度を有する電線スクラップを原料として銅イ
オンを含む電解液を調製し、電解液中に浸漬されるカソ
ードとしての水平に回転する陰極円筒と、該陰極円筒の
円筒面に相対して配置された陽極との間に、銅イオンを
含む電解液を満たして電解を行い、該陰極円筒上に銅を
連続的に電着させた後、所定の厚さとなった電着物を陰
極円筒から箔状に剥離させることにより製造する。図2
は、従来からの陰極円筒11と円筒面に相対して配置さ
れた陽極12とを示す。陰極円筒11は電解液を収蔵す
る電解槽(図示なし)に部分的に浸漬された常態で水平
に回転しうるように設置される。陰極円筒11のおおよ
そ下半分を覆って陰極円筒11から一定の間隔を置いて
例えば2枚の陽極12が配置される。電解液は、2枚の
陽極の間から供給され、陰極円筒と陽極との間隙を通し
て流れ陽極上縁から溢出して電解槽内を循環される。整
流器13が陰極円筒と陽極との間に所定の直流電流を維
持している。
DETAILED DESCRIPTION OF THE INVENTION An electrolytic copper foil raw foil is prepared by preparing an electrolytic solution containing copper ions from electrolytic copper or electric wire scrap having a purity equivalent to that of electrolytic copper, and horizontally laying it as a cathode to be immersed in the electrolytic solution. Between the rotating cathode cylinder and the anode arranged opposite to the cylindrical surface of the cathode cylinder, an electrolytic solution containing copper ions is filled for electrolysis, and copper is continuously electrodeposited on the cathode cylinder. After that, the electrodeposit having a predetermined thickness is peeled from the cathode cylinder in a foil shape to manufacture. Figure 2
Shows a conventional cathode cylinder 11 and an anode 12 arranged to face the cylindrical surface. The cathode cylinder 11 is installed so as to be horizontally rotatable in a normal state of being partially immersed in an electrolytic cell (not shown) that stores an electrolytic solution. For example, two anodes 12 are arranged so as to cover approximately the lower half of the cathode cylinder 11 and to be spaced apart from the cathode cylinder 11 by a predetermined distance. The electrolytic solution is supplied from between the two anodes, flows through the gap between the cathode cylinder and the anode, overflows from the upper edge of the anode, and is circulated in the electrolytic cell. The rectifier 13 maintains a predetermined direct current between the cathode cylinder and the anode.

【0012】一般に、次の電解条件を使用して生箔が製
造されている: CuSO4 ・5H2 O:130〜500g/l H2 SO4 :80〜150g/l 液温:50〜70℃ 平均電流密度:100〜150A/dm2
Raw foils are generally produced using the following electrolysis conditions: CuSO 4 .5H 2 O: 130-500 g / l H 2 SO 4 : 80-150 g / l Liquid temperature: 50-70 ° C. Average current density: 100 to 150 A / dm 2

【0013】本発明に従えば、電解電流として脈動率が
5%以上、好ましくは20%以上である、リップルを有
する直流電流が用いられる。リップルを有する直流電流
の波形例としては、先に図1に示したようなものが挙げ
られる。通常、リップル電流の波形は、脈動率、即ち平
均電流値に対するリップル電流値の比(i1 /i2 )お
よび周期(T)で規定される。リップルを大きく又密に
することにより脈動率は増加する。脈動率を制御する方
法としては、第1に、従来の図3及び図4に示すサイリ
スタ位相制御方式による直流電源において、トランスの
2次電圧を変化させることによって、脈動率を制御する
方法を挙げることができる。図3に示すように、単相或
いは3相交流電源2からの電流はサイリスタ等の電流制
御器3、トランス4、ダイオード等の整流器5、電流計
6から電解槽8に流される。位相制御コントローラー7
が電流計6から電流制御器3へと接続されて位相制御を
行っている。別様には、図4に示すように、単相或いは
3相交流電源2からの電流をトランス4に通し、その2
次電圧を変化させ、サイリスタ9から電流計6を通して
電解槽8に流すようにすることもできる。位相制御コン
トローラー7が電流計6からサイリスタ9へと接続され
て、位相制御を行う。トランス4の2次電圧を切り替え
ることで脈動率の制御を行い、トランス4の2次電圧を
高くすることにより脈動率が大きくなる。しかし、この
方式では、負荷変動が電源変動の影響を受けやすい。
According to the present invention, a DC current having a ripple with a pulsation rate of 5% or more, preferably 20% or more is used as the electrolytic current. An example of the waveform of the DC current having a ripple is the one shown in FIG. Usually, the ripple current waveform is defined by the pulsation rate, that is, the ratio (i 1 / i 2 ) of the ripple current value to the average current value and the period (T). By making the ripples large and dense, the pulsation rate increases. As a method of controlling the pulsation rate, a method of controlling the pulsation rate by changing the secondary voltage of the transformer in the DC power supply according to the conventional thyristor phase control method shown in FIGS. 3 and 4 is mentioned. be able to. As shown in FIG. 3, the current from the single-phase or three-phase AC power supply 2 is supplied to the electrolytic cell 8 from a current controller 3 such as a thyristor, a transformer 4, a rectifier 5 such as a diode, and an ammeter 6. Phase controller 7
Is connected from the ammeter 6 to the current controller 3 for phase control. Alternatively, as shown in FIG. 4, the current from the single-phase or three-phase AC power supply 2 is passed through the transformer 4,
It is also possible to change the next voltage so that it flows from the thyristor 9 to the electrolytic cell 8 through the ammeter 6. The phase control controller 7 is connected from the ammeter 6 to the thyristor 9 to control the phase. The pulsation rate is controlled by switching the secondary voltage of the transformer 4, and the pulsation rate is increased by increasing the secondary voltage of the transformer 4. However, in this method, load fluctuations are easily affected by power supply fluctuations.

【0014】そのため安定に動作させるのであれば、例
えば図5及び図6に示す直流電源において、脈動率を小
さくした3相の整流出力と、脈動率を大きくした例えば
単相の整流出力比を変化させて混合することにより、脈
動率を制御する方法が利用できる。3相交流電源1及び
単相或いは3相交流電源2を用いて、電流制御器3、ト
ランス4、整流器5、電流計6、位相制御コントローラ
ー7により制御された電流を混合することによりリプル
のコントロールを行う。図6に示すように、サイリスタ
9を使用することにより回路を簡略化することができ
る。
For stable operation, therefore, in the DC power supply shown in FIGS. 5 and 6, for example, the three-phase rectified output with a small pulsation rate and the single-phase rectified output with a large pulsation rate are changed. A method of controlling the pulsation rate can be used by mixing them. Ripple control by mixing currents controlled by a current controller 3, a transformer 4, a rectifier 5, an ammeter 6, and a phase controller 7 using a three-phase AC power supply 1 and a single-phase or three-phase AC power supply 2. I do. As shown in FIG. 6, the circuit can be simplified by using the thyristor 9.

【0015】脈動の周期(T)は、交流電源の周波数お
よび位相(単相、3相等)等により定まる。
The pulsation cycle (T) is determined by the frequency and phase (single phase, three phase, etc.) of the AC power supply.

【0016】このように、本発明においては、電解銅箔
のマット面の表面粗さを制御する手段として脈動率を制
御する方法を用いる。前述のように、リップル電流値が
大きくなると、即ち脈動率が大きくなると電解銅箔の粗
面の表面粗さが小さくなる作用がある。しかし、通常の
直流電流のように脈動率が5%より小さい値をとる場合
には、ほとんど効果が認められず、一層大きな効果を所
望する場合には20%以上が好ましい。
As described above, in the present invention, the method of controlling the pulsation rate is used as the means for controlling the surface roughness of the matte surface of the electrolytic copper foil. As described above, when the ripple current value increases, that is, when the pulsation rate increases, the surface roughness of the rough surface of the electrolytic copper foil decreases. However, when the pulsation rate takes a value smaller than 5% like ordinary direct current, almost no effect is recognized, and when a larger effect is desired, 20% or more is preferable.

【0017】[0017]

【実施例】以下に、実施例及び比較例を示す。表面粗さ
の測定は、実施例及び比較例ともにJIS BO 60
1に基づいて行なった。
EXAMPLES Examples and comparative examples will be shown below. The surface roughness was measured according to JIS BO 60 in both the examples and the comparative examples.
1 based on 1.

【0018】(実施例)以下に示す条件で製造した電解
銅箔の粗面の表面粗さについて表1に示す。 (電解条件): CuSO4 ・5H2 O:300g/l H2 SO4 :120g/l 液 温:55℃ 平均電流密度:100A/dm2 銅箔厚み:30μm 脈動率:5%、10%、20%、30%、50%、10
0%
(Example) Table 1 shows the surface roughness of the rough surface of the electrolytic copper foil produced under the following conditions. (Electrolysis conditions): CuSO 4 .5H 2 O: 300 g / l H 2 SO 4 : 120 g / l Liquid temperature: 55 ° C. Average current density: 100 A / dm 2 Copper foil thickness: 30 μm Pulsation rate: 5%, 10%, 20%, 30%, 50%, 10
0%

【0019】[0019]

【表1】 [Table 1]

【0020】得られた銅箔を樹脂基材に高温高圧下で積
層、接着し、その後エッチング処理により回路を形成し
た。エッチング精度は、脈動率5〜50%で良好であ
り、特に100%では特に良好であった。
The obtained copper foil was laminated and adhered to a resin substrate under high temperature and high pressure, and then a circuit was formed by etching treatment. The etching accuracy was good at a pulsation rate of 5 to 50%, and particularly good at 100%.

【0021】(比較例)電解電流に脈動率0の直流電流
を用いた以外は、実施例と同様の条件で製造した電解銅
箔の粗面の表面粗さを表2に示す。
(Comparative Example) Table 2 shows the surface roughness of the rough surface of the electrolytic copper foil produced under the same conditions as in Example except that a direct current having a pulsation rate of 0 was used as the electrolytic current.

【0022】[0022]

【表2】 [Table 2]

【0023】[0023]

【発明の効果】本発明を用いれば、添加剤の添加方法を
変更することなく銅箔マット面の表面粗さを容易に制御
可能である。特に1つの電解セルで表面粗さの異なる箔
を作る場合、従来のように添加方法を変更後、定常状態
に至るまで無駄な箔を作ることはない。更に、本発明方
法を適用するに当たって、従来の電解装置の大幅な改造
は必要なく、直流電源装置の変更のみで実施可能であ
り、経済的負担効果が大きい。
According to the present invention, the surface roughness of the copper foil matte surface can be easily controlled without changing the method of adding the additive. In particular, when foils having different surface roughness are produced by one electrolysis cell, there is no need to produce wasteful foils until the steady state is achieved after changing the addition method as in the conventional case. Further, in applying the method of the present invention, it is not necessary to remodel the conventional electrolysis device, and it can be carried out only by changing the DC power supply device, which has a large economical burden.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明に用いるリップルを有する直流電流の波
形の例を示す。
FIG. 1 shows an example of a waveform of a DC current having a ripple used in the present invention.

【図2】生箔製造設備の簡略図である。FIG. 2 is a simplified diagram of a raw foil manufacturing facility.

【図3】サイリスタ位相制御方式によるリップルを有す
る直流電流を発生する整流器の1例を示す模式図であ
る。
FIG. 3 is a schematic diagram showing an example of a rectifier that generates a direct current having a ripple by a thyristor phase control method.

【図4】サイリスタ位相制御方式によるリップルを有す
る直流電流を発生する整流器の別の例を示す模式図であ
る。
FIG. 4 is a schematic view showing another example of a rectifier that generates a direct current having a ripple by a thyristor phase control method.

【図5】2種の整流出力比を変化させて混合するリップ
ルを有する直流電流を発生する整流器の1例を示す模式
図である。
FIG. 5 is a schematic diagram showing an example of a rectifier that generates a direct current having a ripple that mixes by changing two types of rectification output ratios.

【図6】2種の整流出力比を変化させて混合するリップ
ルを有する直流電流を発生する整流器の別の例を示す模
式図である。
FIG. 6 is a schematic diagram showing another example of a rectifier that generates a direct current having a ripple that mixes by changing two types of rectification output ratios.

【符号の説明】[Explanation of symbols]

1 3相交流電源 2 単相或いは3相交流電源 3 電流制御器(サイリスタ等) 4 トランス 5 整流器(ダイオード等) 6 電流計 7 位相制御コントローラ 8 電解セル 9 サイリスタ 11 陰極円筒 12 陽極 13 整流器 1 3 Phase AC Power Supply 2 1 Phase or 3 Phase AC Power Supply 3 Current Controller (Thyristor etc.) 4 Transformer 5 Rectifier (Diode etc.) 6 Ammeter 7 Phase Control Controller 8 Electrolysis Cell 9 Thyristor 11 Cathode Cylinder 12 Anode 13 Rectifier

───────────────────────────────────────────────────── フロントページの続き (72)発明者 杉原 省司 茨城県日立市白銀町3丁目3番1号日鉱グ ールド・フォイル株式会社日立工場内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Shoji Sugihara 3-3-1, Shiragincho, Hitachi-shi, Ibaraki Nikko Gold Foil Co., Ltd. Hitachi factory

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 水平に回転する陰極円筒と該陰極円筒の
円筒面に相対して配置された陽極との間に銅イオンを含
む電解液を満たして電解を行い、該陰極円筒の円筒面上
に銅を電着させた後、電着物を該陰極円筒の円筒面から
箔状に剥離させる電解銅箔の製造方法において、電解電
流として、脈動率が5%以上であるリップルを有する直
流電流を用いることを特徴とする印刷回路用銅箔の製造
方法。
1. On the cylindrical surface of the cathode cylinder, an electrolytic solution containing copper ions is filled between a horizontally rotating cathode cylinder and an anode arranged opposite to the cylindrical surface of the cathode cylinder to perform electrolysis. In the method for producing an electro-deposited copper foil in which copper is electrodeposited on, and then the electro-deposit is peeled from the cylindrical surface of the cathode cylinder in a foil shape, a direct current having a ripple with a pulsation rate of 5% or more is used as the electrolysis current. A method for producing a copper foil for a printed circuit, which is used.
【請求項2】 脈動率が20%以上である請求項1の印
刷回路用銅箔の製造方法。
2. The method for producing a copper foil for a printed circuit according to claim 1, wherein the pulsation rate is 20% or more.
【請求項3】 脈動率の制御をサイリスタ位相制御方式
による直流電源においてトランスの2次電圧を変化させ
ることによって行う請求項1乃至2の印刷回路用銅箔の
製造方法。
3. The method for manufacturing a copper foil for a printed circuit according to claim 1, wherein the pulsation rate is controlled by changing the secondary voltage of the transformer in a DC power supply of the thyristor phase control system.
【請求項4】 脈動率の制御を脈動率を小さくした整流
出力と脈動率を大きくした整流出力との比を変化させて
混合することによって行う請求項1乃至2の印刷回路用
銅箔の製造方法。
4. The production of a copper foil for a printed circuit according to claim 1, wherein the pulsation rate is controlled by changing the ratio of the rectified output with a small pulsation rate and the rectified output with a large pulsation rate and mixing them. Method.
JP20932894A 1994-08-11 1994-08-11 Production of copper foil for printed circuit Withdrawn JPH0853796A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP20932894A JPH0853796A (en) 1994-08-11 1994-08-11 Production of copper foil for printed circuit

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP20932894A JPH0853796A (en) 1994-08-11 1994-08-11 Production of copper foil for printed circuit

Publications (1)

Publication Number Publication Date
JPH0853796A true JPH0853796A (en) 1996-02-27

Family

ID=16571130

Family Applications (1)

Application Number Title Priority Date Filing Date
JP20932894A Withdrawn JPH0853796A (en) 1994-08-11 1994-08-11 Production of copper foil for printed circuit

Country Status (1)

Country Link
JP (1) JPH0853796A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2002033150A3 (en) * 2000-10-18 2006-03-09 Tecnu Inc Electrochemical processing power device
CN102404938A (en) * 2010-09-13 2012-04-04 鸿富锦精密工业(深圳)有限公司 Control method of processing factors influencing electrical characteristics of printed board
WO2024124374A1 (en) * 2022-12-12 2024-06-20 广东腐蚀科学与技术创新研究院 Copper foil, preparation method therefor and use thereof

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2002033150A3 (en) * 2000-10-18 2006-03-09 Tecnu Inc Electrochemical processing power device
CN102404938A (en) * 2010-09-13 2012-04-04 鸿富锦精密工业(深圳)有限公司 Control method of processing factors influencing electrical characteristics of printed board
WO2024124374A1 (en) * 2022-12-12 2024-06-20 广东腐蚀科学与技术创新研究院 Copper foil, preparation method therefor and use thereof

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