JP5862616B2 - 光配向用偏光光照射装置及び光配向用偏光光照射方法 - Google Patents
光配向用偏光光照射装置及び光配向用偏光光照射方法 Download PDFInfo
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- JP5862616B2 JP5862616B2 JP2013148597A JP2013148597A JP5862616B2 JP 5862616 B2 JP5862616 B2 JP 5862616B2 JP 2013148597 A JP2013148597 A JP 2013148597A JP 2013148597 A JP2013148597 A JP 2013148597A JP 5862616 B2 JP5862616 B2 JP 5862616B2
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Classifications
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Optics & Photonics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Mathematical Physics (AREA)
- Liquid Crystal (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Polarising Elements (AREA)
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2013148597A JP5862616B2 (ja) | 2013-07-17 | 2013-07-17 | 光配向用偏光光照射装置及び光配向用偏光光照射方法 |
| TW103119730A TWI537547B (zh) | 2013-07-17 | 2014-06-06 | Polarized light irradiation device for light orientation and polarized light irradiation method for light orientation |
| KR1020140089816A KR101646834B1 (ko) | 2013-07-17 | 2014-07-16 | 광배향용 편광광 조사 장치 및 광배향용 편광광 조사 방법 |
| CN201410341209.4A CN104296874B (zh) | 2013-07-17 | 2014-07-17 | 光取向用偏振光照射装置以及光取向用偏振光照射方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2013148597A JP5862616B2 (ja) | 2013-07-17 | 2013-07-17 | 光配向用偏光光照射装置及び光配向用偏光光照射方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2015022068A JP2015022068A (ja) | 2015-02-02 |
| JP5862616B2 true JP5862616B2 (ja) | 2016-02-16 |
Family
ID=52316704
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2013148597A Active JP5862616B2 (ja) | 2013-07-17 | 2013-07-17 | 光配向用偏光光照射装置及び光配向用偏光光照射方法 |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP5862616B2 (ko) |
| KR (1) | KR101646834B1 (ko) |
| CN (1) | CN104296874B (ko) |
| TW (1) | TWI537547B (ko) |
Families Citing this family (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20160231176A1 (en) * | 2015-02-05 | 2016-08-11 | Polarization Solutions, Llc | Light irradiation device having polarization measuring mechanism |
| JP6240654B2 (ja) * | 2015-05-06 | 2017-11-29 | ウィア・コーポレーション | 光配向装置 |
| JP6492994B2 (ja) * | 2015-06-12 | 2019-04-03 | 東芝ライテック株式会社 | 光配向用偏光光照射装置 |
| JP6597149B2 (ja) * | 2015-10-08 | 2019-10-30 | ウシオ電機株式会社 | 光照射装置 |
| JP6607003B2 (ja) * | 2015-11-30 | 2019-11-20 | ウシオ電機株式会社 | 光照射装置および光照射方法 |
| JP6613949B2 (ja) * | 2016-02-16 | 2019-12-04 | ウシオ電機株式会社 | 偏光素子ユニットおよび偏光光照射装置 |
| JP2017215353A (ja) * | 2016-05-30 | 2017-12-07 | ウシオ電機株式会社 | 偏光光照射装置及び光配向装置 |
| CN107561785B (zh) * | 2016-06-30 | 2020-10-27 | 上海微电子装备（集团）股份有限公司 | 一种光学配向装置及其配向方法 |
| CN107561784B (zh) * | 2016-06-30 | 2021-08-20 | 上海微电子装备（集团）股份有限公司 | 一种光配向控制方法及光配向设备 |
| CN106019721A (zh) * | 2016-07-27 | 2016-10-12 | 京东方科技集团股份有限公司 | 光配向膜制作过程中偏光板的调节方法及装置 |
| CN109100890B (zh) * | 2017-06-20 | 2021-04-16 | 上海微电子装备（集团）股份有限公司 | 一种光配向设备及其运动和旋转方法 |
| DE102018205984A1 (de) * | 2018-04-19 | 2019-10-24 | Robert Bosch Gmbh | Vorrichtung und Verfahren zum Bestimmen einer Position von mindestens einem Objekt |
| JP7137449B2 (ja) * | 2018-11-30 | 2022-09-14 | ミネベアミツミ株式会社 | アブソリュートエンコーダ |
| US11156755B2 (en) * | 2019-03-28 | 2021-10-26 | Facebook Technologies, Llc | Aligning a polarization device using a spatially variant polarization element |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5089700A (en) | 1990-01-30 | 1992-02-18 | Amdata, Inc. | Apparatus for infrared imaging inspections |
| CN1226811A (zh) * | 1997-03-28 | 1999-08-25 | 精工爱普生株式会社 | 触觉检测器,触觉报告器,信息输入器,触觉复现器,触觉传输系统,脉博诊断器,脉博诊断训练器以及脉博诊断信息传输器 |
| US7239389B2 (en) * | 2004-07-29 | 2007-07-03 | Applied Materials, Israel, Ltd. | Determination of irradiation parameters for inspection of a surface |
| JP4603387B2 (ja) | 2005-02-22 | 2010-12-22 | 大日本印刷株式会社 | 液晶表示装置用光学素子の製造装置 |
| JP4610368B2 (ja) | 2005-02-22 | 2011-01-12 | 大日本印刷株式会社 | 液晶表示装置用光学素子の製造装置 |
| JP2007127567A (ja) | 2005-11-07 | 2007-05-24 | Ushio Inc | 偏光方向測定装置 |
| JP5051874B2 (ja) * | 2006-01-11 | 2012-10-17 | 日東電工株式会社 | 積層フィルムの製造方法、積層フィルムの欠陥検出方法、積層フィルムの欠陥検出装置 |
| JP4968165B2 (ja) | 2008-04-24 | 2012-07-04 | ウシオ電機株式会社 | 光配向用偏光光照射装置 |
| CN103765303B (zh) * | 2012-04-19 | 2016-06-29 | 信越工程株式会社 | 光定向照射装置 |
| JP6201310B2 (ja) * | 2012-12-14 | 2017-09-27 | 東芝ライテック株式会社 | 偏光光照射装置 |
-
2013
- 2013-07-17 JP JP2013148597A patent/JP5862616B2/ja active Active
-
2014
- 2014-06-06 TW TW103119730A patent/TWI537547B/zh active
- 2014-07-16 KR KR1020140089816A patent/KR101646834B1/ko active IP Right Grant
- 2014-07-17 CN CN201410341209.4A patent/CN104296874B/zh active Active
Also Published As
| Publication number | Publication date |
|---|---|
| TW201510494A (zh) | 2015-03-16 |
| JP2015022068A (ja) | 2015-02-02 |
| CN104296874A (zh) | 2015-01-21 |
| TWI537547B (zh) | 2016-06-11 |
| KR101646834B1 (ko) | 2016-08-08 |
| KR20150009935A (ko) | 2015-01-27 |
| CN104296874B (zh) | 2016-10-26 |
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