JP2000210559A - Gas storable organic metal complex, manufacture thereof and gas storage device - Google Patents
Gas storable organic metal complex, manufacture thereof and gas storage deviceInfo
- Publication number
- JP2000210559A JP2000210559A JP11013696A JP1369699A JP2000210559A JP 2000210559 A JP2000210559 A JP 2000210559A JP 11013696 A JP11013696 A JP 11013696A JP 1369699 A JP1369699 A JP 1369699A JP 2000210559 A JP2000210559 A JP 2000210559A
- Authority
- JP
- Japan
- Prior art keywords
- complex
- group
- metal
- gas
- adsorbent
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000003860 storage Methods 0.000 title claims abstract description 34
- 150000004696 coordination complex Chemical class 0.000 title claims abstract description 28
- 238000004519 manufacturing process Methods 0.000 title description 16
- 239000007789 gas Substances 0.000 claims abstract description 87
- 229910052751 metal Inorganic materials 0.000 claims abstract description 61
- 239000002184 metal Substances 0.000 claims abstract description 61
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 claims abstract description 39
- 239000003463 adsorbent Substances 0.000 claims abstract description 32
- 239000013110 organic ligand Substances 0.000 claims abstract description 24
- 238000000034 method Methods 0.000 claims abstract description 19
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims abstract description 12
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical compound P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 claims abstract description 12
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 claims abstract description 11
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 claims abstract description 10
- 229910052757 nitrogen Inorganic materials 0.000 claims abstract description 8
- 239000007788 liquid Substances 0.000 claims abstract description 7
- RBFQJDQYXXHULB-UHFFFAOYSA-N arsane Chemical compound [AsH3] RBFQJDQYXXHULB-UHFFFAOYSA-N 0.000 claims abstract description 6
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims abstract description 6
- 239000001257 hydrogen Substances 0.000 claims abstract description 6
- 229910052739 hydrogen Inorganic materials 0.000 claims abstract description 6
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims abstract description 6
- 150000002894 organic compounds Chemical class 0.000 claims abstract description 6
- 229910052760 oxygen Inorganic materials 0.000 claims abstract description 6
- 239000001301 oxygen Substances 0.000 claims abstract description 6
- 229910000073 phosphorus hydride Inorganic materials 0.000 claims abstract description 6
- -1 halogen ion Chemical group 0.000 claims description 46
- 125000002524 organometallic group Chemical group 0.000 claims description 40
- 229910021645 metal ion Inorganic materials 0.000 claims description 27
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims description 19
- 239000010949 copper Substances 0.000 claims description 15
- 239000003446 ligand Substances 0.000 claims description 12
- 239000010948 rhodium Substances 0.000 claims description 11
- 239000000126 substance Substances 0.000 claims description 11
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 10
- 229910052802 copper Inorganic materials 0.000 claims description 10
- 125000005677 ethinylene group Chemical group [*:2]C#C[*:1] 0.000 claims description 10
- 125000004450 alkenylene group Chemical group 0.000 claims description 9
- 125000002947 alkylene group Chemical group 0.000 claims description 9
- 125000004419 alkynylene group Chemical group 0.000 claims description 9
- 150000001875 compounds Chemical class 0.000 claims description 9
- 229910052763 palladium Inorganic materials 0.000 claims description 9
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims description 7
- 239000011651 chromium Substances 0.000 claims description 7
- 125000001424 substituent group Chemical group 0.000 claims description 7
- 229910052725 zinc Inorganic materials 0.000 claims description 7
- 239000011701 zinc Substances 0.000 claims description 7
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 6
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims description 6
- 125000000732 arylene group Chemical group 0.000 claims description 6
- 125000004429 atom Chemical group 0.000 claims description 6
- 229910052804 chromium Inorganic materials 0.000 claims description 6
- 229910052750 molybdenum Inorganic materials 0.000 claims description 6
- 239000011733 molybdenum Substances 0.000 claims description 6
- 229910052703 rhodium Inorganic materials 0.000 claims description 6
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 claims description 6
- 102000015782 Electron Transport Complex III Human genes 0.000 claims description 5
- 108010024882 Electron Transport Complex III Proteins 0.000 claims description 5
- 125000004432 carbon atom Chemical group C* 0.000 claims description 5
- 150000007942 carboxylates Chemical class 0.000 claims description 4
- 229910001507 metal halide Inorganic materials 0.000 claims description 4
- 108010007425 oligomycin sensitivity conferring protein Proteins 0.000 claims description 4
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 4
- 229910052721 tungsten Inorganic materials 0.000 claims description 4
- 239000010937 tungsten Substances 0.000 claims description 4
- ZUCRGHABDDWQPY-UHFFFAOYSA-N pyrazine-2,3-dicarboxylic acid Chemical compound OC(=O)C1=NC=CN=C1C(O)=O ZUCRGHABDDWQPY-UHFFFAOYSA-N 0.000 claims description 3
- 125000005649 substituted arylene group Chemical group 0.000 claims description 3
- 101100533772 Caenorhabditis elegans snf-6 gene Proteins 0.000 claims description 2
- 101100396546 Neurospora crassa (strain ATCC 24698 / 74-OR23-1A / CBS 708.71 / DSM 1257 / FGSC 987) tif-6 gene Proteins 0.000 claims description 2
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 2
- 229910052736 halogen Inorganic materials 0.000 claims description 2
- 238000001179 sorption measurement Methods 0.000 abstract description 9
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 abstract 1
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 84
- 150000003839 salts Chemical class 0.000 description 42
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 31
- 239000013078 crystal Substances 0.000 description 30
- 239000000243 solution Substances 0.000 description 29
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 27
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 24
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 21
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- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 21
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 21
- 238000006243 chemical reaction Methods 0.000 description 16
- 239000003960 organic solvent Substances 0.000 description 15
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 14
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 14
- KYQCOXFCLRTKLS-UHFFFAOYSA-N Pyrazine Chemical compound C1=CN=CC=N1 KYQCOXFCLRTKLS-UHFFFAOYSA-N 0.000 description 12
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 12
- 239000000203 mixture Substances 0.000 description 12
- 239000002244 precipitate Substances 0.000 description 12
- 239000000463 material Substances 0.000 description 10
- 230000015572 biosynthetic process Effects 0.000 description 9
- 239000011148 porous material Substances 0.000 description 9
- 238000003786 synthesis reaction Methods 0.000 description 9
- 238000002156 mixing Methods 0.000 description 8
- 239000002904 solvent Substances 0.000 description 8
- 239000002253 acid Substances 0.000 description 7
- 150000001298 alcohols Chemical class 0.000 description 7
- 239000001530 fumaric acid Substances 0.000 description 7
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 7
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 7
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 6
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 6
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 6
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 6
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 6
- PCNDJXKNXGMECE-UHFFFAOYSA-N Phenazine Natural products C1=CC=CC2=NC3=CC=CC=C3N=C21 PCNDJXKNXGMECE-UHFFFAOYSA-N 0.000 description 6
- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 6
- XNMQEEKYCVKGBD-UHFFFAOYSA-N dimethylacetylene Natural products CC#CC XNMQEEKYCVKGBD-UHFFFAOYSA-N 0.000 description 6
- 235000019253 formic acid Nutrition 0.000 description 6
- 238000004438 BET method Methods 0.000 description 5
- HFDWIMBEIXDNQS-UHFFFAOYSA-L copper;diformate Chemical compound [Cu+2].[O-]C=O.[O-]C=O HFDWIMBEIXDNQS-UHFFFAOYSA-L 0.000 description 5
- 238000001914 filtration Methods 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 5
- 239000012046 mixed solvent Substances 0.000 description 5
- 150000007524 organic acids Chemical class 0.000 description 5
- VXNZUUAINFGPBY-UHFFFAOYSA-N 1-Butene Chemical compound CCC=C VXNZUUAINFGPBY-UHFFFAOYSA-N 0.000 description 4
- MWVTWFVJZLCBMC-UHFFFAOYSA-N 4,4'-bipyridine Chemical group C1=NC=CC(C=2C=CN=CC=2)=C1 MWVTWFVJZLCBMC-UHFFFAOYSA-N 0.000 description 4
- MGFJDEHFNMWYBD-OWOJBTEDSA-N 4-[(e)-2-pyridin-4-ylethenyl]pyridine Chemical group C=1C=NC=CC=1/C=C/C1=CC=NC=C1 MGFJDEHFNMWYBD-OWOJBTEDSA-N 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 4
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 4
- BDAGIHXWWSANSR-UHFFFAOYSA-M Formate Chemical compound [O-]C=O BDAGIHXWWSANSR-UHFFFAOYSA-M 0.000 description 4
- 229910002651 NO3 Inorganic materials 0.000 description 4
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 description 4
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 4
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 4
- 235000002597 Solanum melongena Nutrition 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 4
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 description 4
- KDKYADYSIPSCCQ-UHFFFAOYSA-N but-1-yne Chemical compound CCC#C KDKYADYSIPSCCQ-UHFFFAOYSA-N 0.000 description 4
- IAQRGUVFOMOMEM-UHFFFAOYSA-N but-2-ene Chemical compound CC=CC IAQRGUVFOMOMEM-UHFFFAOYSA-N 0.000 description 4
- 238000005119 centrifugation Methods 0.000 description 4
- 150000001879 copper Chemical class 0.000 description 4
- XUPMSLUFFIXCDA-UHFFFAOYSA-N dipyridin-4-yldiazene Chemical compound C1=NC=CC(N=NC=2C=CN=CC=2)=C1 XUPMSLUFFIXCDA-UHFFFAOYSA-N 0.000 description 4
- KWGKDLIKAYFUFQ-UHFFFAOYSA-M lithium chloride Chemical compound [Li+].[Cl-] KWGKDLIKAYFUFQ-UHFFFAOYSA-M 0.000 description 4
- VEZNVMFOOMYSBF-UHFFFAOYSA-N n-pyridin-4-ylpyridine-4-carboxamide Chemical compound C=1C=NC=CC=1C(=O)NC1=CC=NC=C1 VEZNVMFOOMYSBF-UHFFFAOYSA-N 0.000 description 4
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 4
- KDYFGRWQOYBRFD-UHFFFAOYSA-N succinic acid Chemical compound OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- OONPLQJHBJXVBP-UHFFFAOYSA-N 3-(2-phenylethenyl)phthalic acid Chemical compound OC(=O)C1=CC=CC(C=CC=2C=CC=CC=2)=C1C(O)=O OONPLQJHBJXVBP-UHFFFAOYSA-N 0.000 description 3
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 3
- RGSFGYAAUTVSQA-UHFFFAOYSA-N Cyclopentane Chemical compound C1CCCC1 RGSFGYAAUTVSQA-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 3
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 description 3
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 3
- 239000000654 additive Substances 0.000 description 3
- 229910001420 alkaline earth metal ion Inorganic materials 0.000 description 3
- 125000000217 alkyl group Chemical group 0.000 description 3
- 125000003118 aryl group Chemical group 0.000 description 3
- 229910052788 barium Inorganic materials 0.000 description 3
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 description 3
- 229910052790 beryllium Inorganic materials 0.000 description 3
- ATBAMAFKBVZNFJ-UHFFFAOYSA-N beryllium atom Chemical compound [Be] ATBAMAFKBVZNFJ-UHFFFAOYSA-N 0.000 description 3
- 125000006367 bivalent amino carbonyl group Chemical group [H]N([*:1])C([*:2])=O 0.000 description 3
- 229910052793 cadmium Inorganic materials 0.000 description 3
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 3
- 229910052791 calcium Inorganic materials 0.000 description 3
- 239000011575 calcium Substances 0.000 description 3
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 3
- 229910017052 cobalt Inorganic materials 0.000 description 3
- 239000010941 cobalt Substances 0.000 description 3
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 3
- 150000001991 dicarboxylic acids Chemical class 0.000 description 3
- 150000004820 halides Chemical class 0.000 description 3
- 125000001188 haloalkyl group Chemical group 0.000 description 3
- 150000004761 hexafluorosilicates Chemical class 0.000 description 3
- 229910052742 iron Inorganic materials 0.000 description 3
- 229910052749 magnesium Inorganic materials 0.000 description 3
- 239000011777 magnesium Substances 0.000 description 3
- 229910052748 manganese Inorganic materials 0.000 description 3
- 239000011572 manganese Substances 0.000 description 3
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 3
- 229910052753 mercury Inorganic materials 0.000 description 3
- 239000011259 mixed solution Substances 0.000 description 3
- 238000000465 moulding Methods 0.000 description 3
- 229910052759 nickel Inorganic materials 0.000 description 3
- 125000004433 nitrogen atom Chemical group N* 0.000 description 3
- LXPCOISGJFXEJE-UHFFFAOYSA-N oxifentorex Chemical class C=1C=CC=CC=1C[N+](C)([O-])C(C)CC1=CC=CC=C1 LXPCOISGJFXEJE-UHFFFAOYSA-N 0.000 description 3
- VLTRZXGMWDSKGL-UHFFFAOYSA-N perchloric acid Chemical compound OCl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-N 0.000 description 3
- 239000002994 raw material Substances 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- 229910052712 strontium Inorganic materials 0.000 description 3
- CIOAGBVUUVVLOB-UHFFFAOYSA-N strontium atom Chemical compound [Sr] CIOAGBVUUVVLOB-UHFFFAOYSA-N 0.000 description 3
- PXGZQGDTEZPERC-UHFFFAOYSA-N 1,4-cyclohexanedicarboxylic acid Chemical compound OC(=O)C1CCC(C(O)=O)CC1 PXGZQGDTEZPERC-UHFFFAOYSA-N 0.000 description 2
- GTKIGDZXPDCIKR-UHFFFAOYSA-N 2-phenylbenzamide Chemical compound NC(=O)C1=CC=CC=C1C1=CC=CC=C1 GTKIGDZXPDCIKR-UHFFFAOYSA-N 0.000 description 2
- HSSYVKMJJLDTKZ-UHFFFAOYSA-N 3-phenylphthalic acid Chemical compound OC(=O)C1=CC=CC(C=2C=CC=CC=2)=C1C(O)=O HSSYVKMJJLDTKZ-UHFFFAOYSA-N 0.000 description 2
- LCGLNKUTAGEVQW-UHFFFAOYSA-N Dimethyl ether Chemical compound COC LCGLNKUTAGEVQW-UHFFFAOYSA-N 0.000 description 2
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- DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 description 2
- 230000000996 additive effect Effects 0.000 description 2
- 239000001361 adipic acid Substances 0.000 description 2
- 235000011037 adipic acid Nutrition 0.000 description 2
- 125000003545 alkoxy group Chemical group 0.000 description 2
- 125000003710 aryl alkyl group Chemical group 0.000 description 2
- YTIVTFGABIZHHX-UHFFFAOYSA-N butynedioic acid Chemical compound OC(=O)C#CC(O)=O YTIVTFGABIZHHX-UHFFFAOYSA-N 0.000 description 2
- 150000001844 chromium Chemical class 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 229940116318 copper carbonate Drugs 0.000 description 2
- 229910000365 copper sulfate Inorganic materials 0.000 description 2
- XTVVROIMIGLXTD-UHFFFAOYSA-N copper(II) nitrate Chemical compound [Cu+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O XTVVROIMIGLXTD-UHFFFAOYSA-N 0.000 description 2
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 description 2
- OPQARKPSCNTWTJ-UHFFFAOYSA-L copper(ii) acetate Chemical compound [Cu+2].CC([O-])=O.CC([O-])=O OPQARKPSCNTWTJ-UHFFFAOYSA-L 0.000 description 2
- GEZOTWYUIKXWOA-UHFFFAOYSA-L copper;carbonate Chemical compound [Cu+2].[O-]C([O-])=O GEZOTWYUIKXWOA-UHFFFAOYSA-L 0.000 description 2
- QYQADNCHXSEGJT-UHFFFAOYSA-N cyclohexane-1,1-dicarboxylate;hydron Chemical compound OC(=O)C1(C(O)=O)CCCCC1 QYQADNCHXSEGJT-UHFFFAOYSA-N 0.000 description 2
- LPIQUOYDBNQMRZ-UHFFFAOYSA-N cyclopentene Chemical compound C1CC=CC1 LPIQUOYDBNQMRZ-UHFFFAOYSA-N 0.000 description 2
- SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical compound COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 description 2
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- AMXOYNBUYSYVKV-UHFFFAOYSA-M lithium bromide Chemical compound [Li+].[Br-] AMXOYNBUYSYVKV-UHFFFAOYSA-M 0.000 description 2
- 150000005309 metal halides Chemical class 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- 150000002751 molybdenum Chemical class 0.000 description 2
- 150000002940 palladium Chemical class 0.000 description 2
- VLTRZXGMWDSKGL-UHFFFAOYSA-M perchlorate Inorganic materials [O-]Cl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-M 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 239000001294 propane Substances 0.000 description 2
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 2
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 2
- MWWATHDPGQKSAR-UHFFFAOYSA-N propyne Chemical compound CC#C MWWATHDPGQKSAR-UHFFFAOYSA-N 0.000 description 2
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 2
- 230000001105 regulatory effect Effects 0.000 description 2
- 150000003283 rhodium Chemical class 0.000 description 2
- 150000004671 saturated fatty acids Chemical class 0.000 description 2
- 239000001384 succinic acid Substances 0.000 description 2
- 150000003657 tungsten Chemical class 0.000 description 2
- 150000004670 unsaturated fatty acids Chemical class 0.000 description 2
- 235000021122 unsaturated fatty acids Nutrition 0.000 description 2
- 238000001291 vacuum drying Methods 0.000 description 2
- KOQMBAGMXLUQDS-UHFFFAOYSA-N 2-benzhydrylidenepropanedinitrile Chemical group C=1C=CC=CC=1C(=C(C#N)C#N)C1=CC=CC=C1 KOQMBAGMXLUQDS-UHFFFAOYSA-N 0.000 description 1
- 125000000094 2-phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 1
- FAMBKWFZKVDIHN-UHFFFAOYSA-N 2-tert-butylbenzamide Chemical compound CC(C)(C)C1=CC=CC=C1C(N)=O FAMBKWFZKVDIHN-UHFFFAOYSA-N 0.000 description 1
- NEQFBGHQPUXOFH-UHFFFAOYSA-N 4-(4-carboxyphenyl)benzoic acid Chemical compound C1=CC(C(=O)O)=CC=C1C1=CC=C(C(O)=O)C=C1 NEQFBGHQPUXOFH-UHFFFAOYSA-N 0.000 description 1
- KAXYYLCSSXFXKR-UHFFFAOYSA-N 4-(4-cyanophenyl)benzonitrile Chemical group C1=CC(C#N)=CC=C1C1=CC=C(C#N)C=C1 KAXYYLCSSXFXKR-UHFFFAOYSA-N 0.000 description 1
- MAWKLXRVKVOYLR-UHFFFAOYSA-N 4-(4-pyridin-4-ylphenyl)pyridine Chemical compound C1=NC=CC(C=2C=CC(=CC=2)C=2C=CN=CC=2)=C1 MAWKLXRVKVOYLR-UHFFFAOYSA-N 0.000 description 1
- KXDAEFPNCMNJSK-UHFFFAOYSA-N Benzamide Chemical class NC(=O)C1=CC=CC=C1 KXDAEFPNCMNJSK-UHFFFAOYSA-N 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- 229910020366 ClO 4 Inorganic materials 0.000 description 1
- JPVYNHNXODAKFH-UHFFFAOYSA-N Cu2+ Chemical compound [Cu+2] JPVYNHNXODAKFH-UHFFFAOYSA-N 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical class [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 1
- SLGBZMMZGDRARJ-UHFFFAOYSA-N Triphenylene Natural products C1=CC=C2C3=CC=CC=C3C3=CC=CC=C3C2=C1 SLGBZMMZGDRARJ-UHFFFAOYSA-N 0.000 description 1
- 229910021536 Zeolite Inorganic materials 0.000 description 1
- 150000001242 acetic acid derivatives Chemical class 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 150000001450 anions Chemical class 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 150000001491 aromatic compounds Chemical class 0.000 description 1
- BHXFKXOIODIUJO-UHFFFAOYSA-N benzene-1,4-dicarbonitrile Chemical compound N#CC1=CC=C(C#N)C=C1 BHXFKXOIODIUJO-UHFFFAOYSA-N 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- 125000002529 biphenylenyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3C12)* 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- 125000004106 butoxy group Chemical group [*]OC([H])([H])C([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 1
- QOYRNHQSZSCVOW-UHFFFAOYSA-N cadmium nitrate tetrahydrate Chemical compound O.O.O.O.[Cd+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O QOYRNHQSZSCVOW-UHFFFAOYSA-N 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 150000001721 carbon Chemical group 0.000 description 1
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000000748 compression moulding Methods 0.000 description 1
- 150000004699 copper complex Chemical class 0.000 description 1
- 229910001431 copper ion Inorganic materials 0.000 description 1
- NHELIHXBJRANPL-UHFFFAOYSA-L copper;diperchlorate;hexahydrate Chemical compound O.O.O.O.O.O.[Cu+2].[O-]Cl(=O)(=O)=O.[O-]Cl(=O)(=O)=O NHELIHXBJRANPL-UHFFFAOYSA-L 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 description 1
- 238000000921 elemental analysis Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 150000004675 formic acid derivatives Chemical class 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- 125000006343 heptafluoro propyl group Chemical group 0.000 description 1
- DMEGYFMYUHOHGS-UHFFFAOYSA-N heptamethylene Natural products C1CCCCCC1 DMEGYFMYUHOHGS-UHFFFAOYSA-N 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- AUHZEENZYGFFBQ-UHFFFAOYSA-N mesitylene Substances CC1=CC(C)=CC(C)=C1 AUHZEENZYGFFBQ-UHFFFAOYSA-N 0.000 description 1
- 125000001827 mesitylenyl group Chemical group [H]C1=C(C(*)=C(C([H])=C1C([H])([H])[H])C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 125000000896 monocarboxylic acid group Chemical group 0.000 description 1
- AQVNQXCOBGHOPL-UHFFFAOYSA-N n-(pyridin-4-ylmethyl)pyridine-4-carboxamide Chemical compound C=1C=NC=CC=1C(=O)NCC1=CC=NC=C1 AQVNQXCOBGHOPL-UHFFFAOYSA-N 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- RXOHFPCZGPKIRD-UHFFFAOYSA-N naphthalene-2,6-dicarboxylic acid Chemical compound C1=C(C(O)=O)C=CC2=CC(C(=O)O)=CC=C21 RXOHFPCZGPKIRD-UHFFFAOYSA-N 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 125000004957 naphthylene group Chemical group 0.000 description 1
- 150000002823 nitrates Chemical class 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 125000006340 pentafluoro ethyl group Chemical group FC(F)(F)C(F)(F)* 0.000 description 1
- YWAKXRMUMFPDSH-UHFFFAOYSA-N pentene Chemical compound CCCC=C YWAKXRMUMFPDSH-UHFFFAOYSA-N 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 235000019260 propionic acid Nutrition 0.000 description 1
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 1
- 239000012266 salt solution Substances 0.000 description 1
- 235000003441 saturated fatty acids Nutrition 0.000 description 1
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 238000007086 side reaction Methods 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 239000011232 storage material Substances 0.000 description 1
- 235000011044 succinic acid Nutrition 0.000 description 1
- 238000000967 suction filtration Methods 0.000 description 1
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 125000003866 trichloromethyl group Chemical group ClC(Cl)(Cl)* 0.000 description 1
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 description 1
- 125000005580 triphenylene group Chemical group 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 239000010457 zeolite Substances 0.000 description 1
- 150000003751 zinc Chemical class 0.000 description 1
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
- Y02E60/30—Hydrogen technology
- Y02E60/32—Hydrogen storage
Landscapes
- Filling Or Discharging Of Gas Storage Vessels (AREA)
- Solid-Sorbent Or Filter-Aiding Compositions (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、有機金属錯体を用
いたガス吸着材及びそれを用いた吸着式ガス貯蔵方法に
関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a gas adsorbent using an organometallic complex and an adsorption gas storage method using the same.
【0002】[0002]
【従来の技術】ガスを高密度で貯蔵する方法として、一
般に、ガスの臨界温度以下に冷却、圧縮して液化して貯
蔵する方法、及び、常温、高圧下で圧縮ガスとして貯蔵
する方法が知られている。2. Description of the Related Art As a method of storing a gas at a high density, there are generally known a method of cooling, compressing and liquefying a gas to a temperature lower than a critical temperature of the gas, and a method of storing as a compressed gas at normal temperature and high pressure. Have been.
【0003】しかし、液化して貯蔵する方法は、大規模
な冷却、圧縮の設備が必要なため、設備費が高価なもの
となる。また、自動車のような移動の必要な分野では使
用が困難である。一方、圧縮ガスとして貯蔵する方法
は、液化ガスに比べるとエネルギー密度が低く、200
kgf/cm2程度の圧力詰めの圧縮ガスであっても、
そのエネルギーは同体積のガソリンの約1/3にしか相
当しない。しかも、高圧ボンベを用いるので、大型で重
量の大きな耐圧容器や調圧弁が必要となる。However, the method of liquefied storage requires large-scale cooling and compression equipment, and thus the equipment cost is high. In addition, it is difficult to use it in a field requiring movement such as an automobile. On the other hand, the method of storing as a compressed gas has a lower energy density than a liquefied gas,
Even a compressed gas with a pressure of about kgf / cm 2 ,
Its energy is only about one-third of the same volume of gasoline. In addition, since a high-pressure cylinder is used, a large-sized and heavy pressure vessel and pressure regulating valve are required.
【0004】上記のような大型設備を必要とせず、しか
も比較的低圧でガスを貯蔵する方法としてボンベ等の耐
圧容器にガスを加圧下で吸着材に吸着させることにより
貯蔵する方法が提案されている。この方法によれば、吸
着材のポア内では気相バルクに比べて分子間距離が小さ
くなるために、比較的低圧でも高圧圧縮ガスと同量のガ
スを貯蔵することが可能となる。その結果、耐圧容器や
調圧弁を軽量化することができる。As a method of storing gas at a relatively low pressure without requiring the above-mentioned large-scale equipment, a method of storing gas by adsorbing the gas under pressure into an adsorbent in a pressure vessel such as a cylinder has been proposed. I have. According to this method, the intermolecular distance is smaller in the pores of the adsorbent than in the gas phase bulk, so that the same amount of gas as the high pressure compressed gas can be stored even at a relatively low pressure. As a result, the pressure vessel and the pressure regulating valve can be reduced in weight.
【0005】例えば、メタンガスを貯蔵する場合、ボン
ベ等に充填する吸着材については、活性アルミナ、シリ
カ、ゼオライト及び活性炭については評価がなされ、活
性炭が最も優れた吸蔵能力を有することが報告されてい
る(A. Golovoy, Compress.Nat.Gas, 36 (1983))。[0005] For example, when storing methane gas, activated alumina, silica, zeolite and activated carbon have been evaluated as adsorbents to be filled into cylinders and the like, and it has been reported that activated carbon has the best storage capacity. (A. Golovoy, Compress. Nat. Gas, 36 (1983)).
【0006】しかし、上記に示された吸着量であって
も、そのエネルギー密度は、液化ガスやガソリンのエネ
ルギー密度と比較すると大きく下回っている。[0006] However, even with the adsorption amount indicated above, the energy density is much lower than the energy density of liquefied gas or gasoline.
【0007】[0007]
【発明が解決しようとする課題】本発明の目的は、各種
のガスの貯蔵方法として、安価であるとともに体積当た
りのガス貯蔵量の高いガス貯蔵技術を提供することにあ
る。An object of the present invention is to provide a gas storage technique which is inexpensive and has a high gas storage amount per volume as a method for storing various gases.
【0008】[0008]
【課題を解決するための手段】本発明者は、上記のよう
な課題を解決するために鋭意研究を遂行し、特定の有機
金属錯体がガス吸着材として好適であることを見出し、
本錯体を吸着材として用いることにより各種のガス貯蔵
方法として、安価であるとともに体積あたりのガス貯蔵
量の高いガス貯蔵技術を完成させた。Means for Solving the Problems The present inventor has conducted intensive studies in order to solve the above problems, and found that a specific organometallic complex is suitable as a gas adsorbent.
By using this complex as an adsorbent, a gas storage technology that is inexpensive and has a high gas storage amount per volume has been completed as various gas storage methods.
【0009】本発明は、下記の項1〜項8に関する。 項1. 有機金属錯体を用いたメタンを除く常温常圧で
ガス状又は液状の有機化合物の吸着材。 項2. 有機金属錯体を用いた水素、酸素及び窒素から
なる群から選ばれる少なくとも1種の吸着材。 項3. 有機金属錯体を用いたアセチレン吸着材。 項4. 有機金属錯体を用いたアルシン及びホスフィン
からなる群から選ばれる少なくとも1種の吸着材。 項5. 有機金属錯体が、下記錯体I〜錯体VIIからな
る群から選ばれる少なくとも1種である項1〜4のいず
れかに記載の吸着材。錯体I. ジカルボン酸と銅、ク
ロム、モリブデン、ロジウム、パラジウム及び亜鉛から
なる群から選ばれる少なくとも1種の金属からなるジカ
ルボン酸金属錯体; 錯体II. 二価の金属イオン、前記金属イオンに配位可
能な原子を有する二座配位可能な有機配位子、及びSiF6
2-、GeF6 2-、ZrF6 2-、TiF6 2-、SnF6 2-、NbOF6 2-、MoO2F
4 2-からなる群から選ばれる少なくとも1種より構成さ
れる三次元構造を有する有機金属錯体; 錯体III. 化学式(1) Ru2(OOC−R1−COO)2・X (1) 〔式中、R1はアルキレン基、アルケニレン基、アルキ
ニレン基、置換基を有していてもよいアリーレン基を示
す。Xはハロゲンイオン又はBF4 -を示す。〕で表され
るジカルボン酸ハロゲン化金属錯体。 錯体IV. 化学式(2)The present invention relates to the following items 1 to 8. Item 1. Adsorbent for gaseous or liquid organic compounds at normal temperature and normal pressure except for methane using an organometallic complex. Item 2. At least one adsorbent selected from the group consisting of hydrogen, oxygen and nitrogen using an organometallic complex. Item 3. Acetylene adsorbent using organometallic complex. Item 4. At least one adsorbent selected from the group consisting of arsine and phosphine using an organometallic complex. Item 5. Item 5. The adsorbent according to any one of Items 1 to 4, wherein the organometallic complex is at least one selected from the group consisting of the following complexes I to VII. Complex I. Metal complex of dicarboxylic acid consisting of dicarboxylic acid and at least one metal selected from the group consisting of copper, chromium, molybdenum, rhodium, palladium and zinc; Complex II. A divalent metal ion, a bidentate organic ligand having an atom capable of coordinating to the metal ion, and SiF 6
2-, GeF 6 2-, ZrF 6 2-, TiF 6 2-, SnF 6 2-, NbOF 6 2-, MoO 2 F
Organometallic complex having a three-dimensional structure composed of at least one selected from the group consisting of 4 2-;. Complex III Formula (1) Ru 2 (OOC- R 1 -COO) 2 · X (1) [Formula In the formula, R 1 represents an alkylene group, alkenylene group, alkynylene group, or an optionally substituted arylene group. X is a halogen ion or BF 4 - shows a. ] The dicarboxylic acid metal halide complex represented by these. Complex IV. Chemical formula (2)
【0010】[0010]
【化3】 Embedded image
【0011】〔式中、R2はアルキレン基、アルケニレ
ン基、アルキニレン基、置換基を有していてもよいアリ
ーレン基を示す。〕で表されるカルボン酸から選択され
る少なくとも1種と銅、クロム、モリブデン、ロジウ
ム、パラジウム及びタングステンからなる群から選ばれ
る少なくとも1種の金属と前記金属に2座配位可能な有
機配位子からなるカルボン酸金属錯体; 錯体V. 化学式(3) HOOC−R3−COOH (3) 〔式中、R3はアルキレン基、アルケニレン基、アルキ
ニレン基、置換基を有していてもよいアリーレン基を示
す。〕で表されるジカルボン酸から選択される少なくと
も1種と銅、クロム、モリブデン、ロジウム、パラジウ
ム、亜鉛及びタングステンからなる群から選ばれる少な
くとも1種の金属と前記金属に2座配位可能な有機配位
子からなるジカルボン酸金属錯体。 錯体VI. 2価の金属イオン、前記金属イオンに配位可
能な原子を有する2座配位可能な有機配位子(Ligand)及
び2,3−ピラジンジカルボン酸(pyzdc)からなる化学
式(4) Cu2(Ligand)(pyzdc)2 (4) で表される三次元構造を有する有機金属錯体; 錯体VII. 2価の金属イオン及び化学式(5)[In the formula, R 2 represents an alkylene group, alkenylene group, alkynylene group, or an arylene group which may have a substituent. And at least one metal selected from the group consisting of copper, chromium, molybdenum, rhodium, palladium, and tungsten, and an organic coordination capable of bidentate coordination with the metal. Metal carboxylate complex; complex V. Chemical formula (3) HOOC—R 3 —COOH (3) wherein R 3 represents an alkylene group, alkenylene group, alkynylene group, or an arylene group which may have a substituent. And at least one metal selected from the group consisting of copper, chromium, molybdenum, rhodium, palladium, zinc and tungsten, and an organic compound capable of bidentate coordination with the metal. A dicarboxylic acid metal complex comprising a ligand. Complex VI. Chemical formula (4) Cu 2 (constituting a divalent metal ion, an organic ligand capable of coordinating bidentate having an atom capable of coordinating with the metal ion (Ligand) and 2,3-pyrazinedicarboxylic acid (pyzdc) Ligand) (pyzdc) 2 An organometallic complex having a three-dimensional structure represented by (4): Complex VII. Divalent metal ion and chemical formula (5)
【0012】[0012]
【化4】 Embedded image
【0013】〔式中、R4及びR5は同一又は異なって、
アルキレン基、アルケニレン基、アルキニレン基、置換
基を有していてもよいアリーレン基または単結合を示
す。但し、R4及びR5が同時に単結合になることはな
い。〕で表される有機配位子からなる有機金属錯体 項6. ガスの出入口を備えた耐圧容器の内部に形成さ
れた空間に、項1〜5のいずれかに記載の吸着材を収納
したガス貯蔵装置。 項7. 項6に記載のガス貯蔵装置に必要に応じて加圧
条件下で炭素数が2以上のガス、蒸気又は液体化合物、
水素、酸素、窒素、アルシン及びポスフィンからなる群
から選ばれる少なくとも1種を吸着させることを特徴と
する貯蔵方法。 項8. 項5に記載の有機金属錯体からなるガス吸着材
にアセチレンを吸着して貯蔵するガス貯蔵方法およびガ
ス貯蔵装置に関する。Wherein R 4 and R 5 are the same or different,
It represents an alkylene group, an alkenylene group, an alkynylene group, an optionally substituted arylene group or a single bond. However, R 4 and R 5 do not simultaneously form a single bond. 5. An organometallic complex comprising an organic ligand represented by the formula: Item 7. A gas storage device in which the adsorbent according to any one of Items 1 to 5 is stored in a space formed inside a pressure-resistant container provided with a gas inlet / outlet. Item 7. A gas, a vapor or a liquid compound having 2 or more carbon atoms under pressurized conditions as necessary for the gas storage device according to item 6,
A storage method characterized by adsorbing at least one selected from the group consisting of hydrogen, oxygen, nitrogen, arsine and phosphine. Item 8. Item 5 relates to a gas storage method and a gas storage device for adsorbing and storing acetylene on a gas adsorbent comprising an organometallic complex according to item 5.
【0014】[0014]
【発明の実施の形態】本明細書において、アルキル基と
しては、メチル、エチル、n−プロピル、イソプロピ
ル、n−ブチル、イソブチル、sec−ブチル、t−ブ
チルなどの炭素数1〜4のアルキル基が挙げられる。BEST MODE FOR CARRYING OUT THE INVENTION In the present specification, an alkyl group having 1 to 4 carbon atoms such as methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, sec-butyl, t-butyl and the like. Is mentioned.
【0015】ハロアルキル基としては、トリフルオロメ
チル、ペンタフルオロエチル、モノクロロメチル、トリ
クロロメチル、ヘプタフルオロプロピルなどの炭素数1
〜4のハロアルキル基が挙げられる。Examples of the haloalkyl group include those having 1 carbon atom such as trifluoromethyl, pentafluoroethyl, monochloromethyl, trichloromethyl and heptafluoropropyl.
To 4 haloalkyl groups.
【0016】アルキレン基としては、−(CH2)n−
(n=1〜6)で表される基が挙げられる。As the alkylene group,-(CH 2 ) n-
And groups represented by (n = 1 to 6).
【0017】アルケニレン基としては、−(CH2)n1
−CH=CH−(CH2)n2−(n1+n2=0、1、2又
は3;n1≧0;n2≧0)が例示される。As the alkenylene group,-(CH 2 ) n1
—CH = CH— (CH 2 ) n2 — (n1 + n2 = 0, 1, 2, or 3; n1 ≧ 0; n2 ≧ 0).
【0018】アルキニレン基としては、−(CH2)n3
−CH≡CH−(CH2)n4−(n1+n2=0、1、2又
は3;n1≧0;n2≧0)が例示される。The alkynylene group includes-(CH 2 ) n3
—CH≡CH— (CH 2 ) n4 — (n1 + n2 = 0, 1, 2, or 3; n1 ≧ 0; n2 ≧ 0).
【0019】アリーレン基としては、1,2−フェニレ
ン、1,3−フェニレン、1,4−フェニレン、ナフチ
レン、ビフェニレン(-C6H4-C6H4-)、トリフェニレン
(-C6H4-C6H4-C6H4-)、-C6H4-CH=CH-C6H4-、-C6H4-CON
H-C6H4-、-C6H4-O-C6H4-などが挙げられる。[0019] As the arylene group, 1,2-phenylene, 1,3-phenylene, 1,4-phenylene, naphthylene, biphenylene (-C 6 H 4 -C 6 H 4 -), triphenylene (-C 6 H 4 -C 6 H 4 -C 6 H 4 -), - C 6 H 4 -CH = CH-C 6 H 4 -, - C 6 H 4 -CON
HC 6 H 4 -, - C 6 H 4 -OC 6 H 4 - , and the like.
【0020】アリール基としては、フェニル基、ナフチ
ル基などが挙げられ、アリール基の置換基としては、ア
ルキル基、アルコキシ基(メトキシ、エトキシ、プロポ
キシ、ブトキシ等の炭素数1〜4のアルコキシ基)、ハ
ロゲン原子(F、Cl、Br、I)などが挙げられる。Examples of the aryl group include a phenyl group and a naphthyl group. Examples of the substituent of the aryl group include an alkyl group and an alkoxy group (alkoxy group having 1 to 4 carbon atoms such as methoxy, ethoxy, propoxy and butoxy). , A halogen atom (F, Cl, Br, I) and the like.
【0021】アラルキル基としては、ベンジル、フェネ
チルなどが挙げられる。Examples of the aralkyl group include benzyl, phenethyl and the like.
【0022】二座配位可能な前記有機配位子としては、
ピラジン、4,4’−ビピリジル、トランス−1,2−
ビス(4−ピリジル)エチレン、4,4’−アゾピリジ
ン、4,4’−ビピリジルエタン、4,4’−ビスビピ
リジルフェニレン、N−(4−ピリジル)イソニコチン
アミド等が使用できる。 <金属錯体の製造>有機金属錯体Iの製造法 有機溶媒に溶解されたジカルボン酸と、金属塩を含有す
る溶液を混合することにより、ジカルボン酸金属錯体I
を製造することができる。得られる混合液を、例えば、
数時間〜数日静置し、沈殿してきた固体を吸引濾過し、
120℃で5時間乾燥することにより、ジカルボン酸金
属錯体の結晶(特に、一次元のチャネル構造を有する結
晶)を製造することができる。The organic ligand capable of bidentate coordination includes:
Pyrazine, 4,4'-bipyridyl, trans-1,2-
Bis (4-pyridyl) ethylene, 4,4'-azopyridine, 4,4'-bipyridylethane, 4,4'-bisbipyridylphenylene, N- (4-pyridyl) isonicotinamide and the like can be used. <Production of metal complex> Method for producing organometallic complex I By mixing a solution containing a metal salt with a dicarboxylic acid dissolved in an organic solvent, a dicarboxylic acid metal complex I is prepared.
Can be manufactured. The resulting mixture, for example,
After leaving for several hours to several days, the precipitated solid is filtered off with suction,
By drying at 120 ° C. for 5 hours, a crystal of a metal dicarboxylate (particularly, a crystal having a one-dimensional channel structure) can be produced.
【0023】原料として使用するジカルボン酸の種類を
選択することにより、得られるジカルボン酸金属錯体の
結晶の細孔径を制御すること、即ち、一次元チャネル構
造を有するジカルボン酸金属錯体の結晶のチャネルの大
きさを調節することができる。一般式(1)〜(9)の
ジカルボン酸、フマル酸、トランス−シクロヘキサンジ
カルボン酸、テレフタル酸、2,6−ナフタレンジカル
ボン酸、4,4’−ビフェニルジカルボン酸、スチルベ
ンジカルボン酸、トランジカルボン酸、トリフェニルジ
カルボン酸から選択される少なくとも1種を使用するこ
とにより、比表面積が大きく、吸着量が多いジカルボン
酸金属錯体の結晶を製造することができる。The type of dicarboxylic acid used as a raw material is selected to control the pore size of the resulting dicarboxylic acid metal complex crystal, that is, to control the channel of the dicarboxylic acid metal complex crystal having a one-dimensional channel structure. The size can be adjusted. Dicarboxylic acids of general formulas (1) to (9), fumaric acid, trans-cyclohexanedicarboxylic acid, terephthalic acid, 2,6-naphthalenedicarboxylic acid, 4,4′-biphenyldicarboxylic acid, stilbenedicarboxylic acid, transdicarboxylic acid, By using at least one selected from triphenyldicarboxylic acid, it is possible to produce a crystal of a metal dicarboxylate having a large specific surface area and a large amount of adsorption.
【0024】[0024]
【化5】 Embedded image
【0025】ジカルボン酸及び金属塩を溶解しやすく、
ジカルボン酸金属錯体を溶解しにくい有機溶媒を使用す
ることにより、ジカルボン酸と金属塩(金属イオン)と
を効率よく反応させ、ジカルボン酸金属錯体の結晶を効
率よく回収することができる。有機溶媒としては、メタ
ノール、エタノール、プロパノール等のアルコール類、
ベンゼン、トルエン、アセトニトリル、テトラハイドロ
フラン、ジメチルスルホキシド、ジメチルホルムアミド
(DMF)、ヘキサン、アセトン又はこれらの混合溶媒
を使用することできる。ジカルボン酸金属錯体に配位し
ない有機溶媒(例えば、メタノール、エタノール、DM
F、アルコール又はこれらの混合溶媒)を使用すること
により、不純物(有機溶媒の金属錯体)の生成を防止す
ることができる。Easy to dissolve dicarboxylic acid and metal salt,
By using an organic solvent that hardly dissolves the dicarboxylic acid metal complex, the dicarboxylic acid and the metal salt (metal ion) can be efficiently reacted, and the crystals of the dicarboxylic acid metal complex can be efficiently collected. Examples of the organic solvent include alcohols such as methanol, ethanol, and propanol,
Benzene, toluene, acetonitrile, tetrahydrofuran, dimethylsulfoxide, dimethylformamide (DMF), hexane, acetone or a mixed solvent thereof can be used. Organic solvents that do not coordinate with the dicarboxylic acid metal complex (eg, methanol, ethanol, DM
By using F, alcohol or a mixed solvent thereof, generation of impurities (metal complex of organic solvent) can be prevented.
【0026】有機溶媒に0.005〜0.1mol/
l、好ましくは0.02〜0.08mol/lの濃度で
溶解させたジカルボン酸を使用することにより、金属塩
(金属イオン:Cu2+、Mo2+、Cr2+、Rh2+、Pd
2+、W2+の塩)に効率よく反応させることができる。0.005 to 0.1 mol /
1, preferably a metal salt (metal ions: Cu 2+ , Mo 2+ , Cr 2+ , Rh 2+ , Pd) by using a dicarboxylic acid dissolved in a concentration of 0.02 to 0.08 mol / l.
2+ and W 2+ salts).
【0027】銅塩、モリブデン塩、クロム塩、ロジウム
塩、パラジウム塩及びタングステン塩から選択される一
種以上の金属塩を使用することにより、対応するジカル
ボン酸金属錯体を製造することができる。金属塩として
は、ギ酸塩、酢酸塩等の有機酸塩、硫酸塩、硝酸塩、炭
酸塩等の無機酸塩を使用することができる。一般に銅塩
は安価であり且つ取扱が容易であるため、金属塩とし
て、ギ酸銅、酢酸銅、硫酸銅、硝酸銅及び炭酸銅から選
択される少なくとも一種以上の銅塩を使用することによ
り、ジカルボン酸銅錯体を簡便に且つ安価に大量生産す
ることができる。By using one or more metal salts selected from copper salts, molybdenum salts, chromium salts, rhodium salts, palladium salts and tungsten salts, the corresponding metal complexes of dicarboxylic acids can be produced. As the metal salt, organic acid salts such as formate and acetate, and inorganic acid salts such as sulfate, nitrate and carbonate can be used. In general, copper salts are inexpensive and easy to handle. Therefore, by using at least one copper salt selected from copper formate, copper acetate, copper sulfate, copper nitrate and copper carbonate as a metal salt, The acid copper complex can be easily and inexpensively mass-produced.
【0028】ジカルボン酸に対して、0.5〜2mol
等量の金属塩を含有する溶液を使用することにより、ジ
カルボン酸と金属イオンとを効率よく反応させることが
できる。ジカルボン酸に対して0.5mol等量以上の
金属塩を使用することにより、ジカルボン酸金属錯体を
高い収率で製造することができる。金属塩の使用量をジ
カルボン酸に対して2mol等量以下とすることによ
り、金属の配位数(例えば、銅は2個配位する)との関
係から副反応を抑制することができる。0.5 to 2 mol based on dicarboxylic acid
By using a solution containing an equal amount of a metal salt, a dicarboxylic acid and a metal ion can be efficiently reacted. By using a metal salt in an amount of 0.5 mol equivalent or more with respect to dicarboxylic acid, a metal complex of dicarboxylic acid can be produced in a high yield. By setting the use amount of the metal salt to 2 mol equivalent or less with respect to the dicarboxylic acid, a side reaction can be suppressed in relation to the coordination number of the metal (for example, copper coordinates two).
【0029】ジカルボン酸溶液に特定の添加剤を添加す
ることにより、得られるジカルボン酸金属錯体の結晶構
造の安定化を図ることができ、ガス吸蔵材として使用す
る場合のガス吸着能を実質的に制御することができる。
添加剤としては、有機酸を使用することができる。有機
酸としては、ギ酸、酢酸、トリフルオロ酢酸、プロピオ
ン酸(好ましくはギ酸、酢酸)を使用することができ
る。By adding a specific additive to the dicarboxylic acid solution, the crystal structure of the resulting dicarboxylic acid metal complex can be stabilized, and the gas adsorbing ability when used as a gas storage material can be substantially reduced. Can be controlled.
Organic acids can be used as additives. As the organic acid, formic acid, acetic acid, trifluoroacetic acid, and propionic acid (preferably formic acid and acetic acid) can be used.
【0030】ジカルボン酸を有機溶媒に溶解し、有機酸
を添加してpHを調整した溶液に、金属塩の溶液を滴下
することにより、ジカルボン酸金属錯体(結晶)を効率
よく製造することができる。ジカルボン酸に対して有機
酸を0.1〜20重量%、好ましくは0.5〜10重量
%添加することにより、得られるジカルボン酸金属錯体
のガス吸蔵能を向上させることができる。有機酸の使用
量が少なすぎると、得られるジカルボン酸金属錯体のガ
ス吸蔵能が上がらず、多すぎると、ジカルボン酸金属錯
体が生成し難くなる。The dicarboxylic acid metal complex (crystal) can be efficiently produced by dissolving the dicarboxylic acid in the organic solvent and adding the metal salt solution dropwise to the solution whose pH has been adjusted by adding the organic acid. . By adding 0.1 to 20% by weight, preferably 0.5 to 10% by weight of the organic acid to the dicarboxylic acid, the gas storage capacity of the obtained metal complex of dicarboxylic acid can be improved. If the amount of the organic acid is too small, the gas storage capacity of the obtained dicarboxylic acid metal complex does not increase, and if it is too large, the dicarboxylic acid metal complex is hardly generated.
【0031】添加剤としては、結晶構造のテンプレート
として作用する化合物、即ち、ジカルボン酸金属錯体結
晶が生成し、析出する際に、ジカルボン酸と反応せず且
つ結晶内に取り込まれることができる化合物を使用する
ことができる。本発明のジカルボン酸金属錯体結晶の空
隙(細孔)の大きさは約7〜12Åであるため、分子の
大きさが約12Å以下、特に8〜12Å程度の化合物は
ジカルボン酸金属錯体結晶が析出する際に結晶内に取り
込まれることができる。As the additive, a compound that acts as a template for the crystal structure, that is, a compound that does not react with the dicarboxylic acid and can be taken into the crystal when the dicarboxylic acid metal complex crystal is formed and precipitated. Can be used. Since the size of the voids (pores) of the dicarboxylic acid metal complex crystal of the present invention is about 7 to 12 °, the compound having a molecular size of about 12 ° or less, particularly about 8 to 12 °, has a dicarboxylic acid metal complex crystal precipitated. In doing so, it can be incorporated into the crystal.
【0032】テンプレートとして作用する化合物として
は、例えば、6員環、特にベンゼン環を有する化合物、
具体的にはトルエン、キシレン、メシチレン等のメチル
基を有する芳香族化合物を使用することができる。結晶
構造のテンプレートとして作用する化合物をジカルボン
酸1gに対して1〜100cc、好ましくは10〜50
cc使用することにより、得られるジカルボン酸金属錯
体の結晶構造を安定化させることができる。As the compound acting as a template, for example, a compound having a 6-membered ring, especially a benzene ring,
Specifically, aromatic compounds having a methyl group such as toluene, xylene, and mesitylene can be used. 1-100 cc, preferably 10-50 cc, of the compound acting as a template for the crystal structure is added to 1 g of dicarboxylic acid.
By using cc, the crystal structure of the resulting metal dicarboxylate complex can be stabilized.
【0033】ジカルボン酸と金属塩(金属イオン)とを
−20℃〜80℃程度で反応させることにより、ジカル
ボン酸金属錯体(結晶)を製造することができる。有機金属錯体IIの製造法 アンモニウムヘキサフルオロシリケートと金属塩の反応
により得られるヘキサフルオロシリケート金属塩の溶液
と二座配位可能な有機配位子の溶液を混合することによ
り有機金属錯体IIを製造することができる。具体的に
は、得られた混合液を、例えば数時間〜数日間静置し、
沈殿した固体を吸引濾過し、100℃で5時間真空乾燥
することにより有機金属錯体IIを結晶として製造するこ
とができる。By reacting a dicarboxylic acid with a metal salt (metal ion) at about -20 ° C. to 80 ° C., a dicarboxylic acid metal complex (crystal) can be produced. Preparation of organometallic complex II Preparation of organometallic complex II by mixing a solution of hexafluorosilicate metal salt obtained by reaction of ammonium hexafluorosilicate and metal salt with a solution of organic ligand capable of bidentate coordination can do. Specifically, the obtained mixed solution is allowed to stand, for example, for several hours to several days,
The precipitated solid is subjected to suction filtration and vacuum-dried at 100 ° C. for 5 hours to produce organometallic complex II as crystals.
【0034】金属塩としては、ベリリウム、マグネシウ
ム、カルシウム、ストロンチウム、バリウム等のアルカ
リ土類金属イオン、鉄、コバルト、ニッケル、パラジウ
ム等のVIII族の金属イオン、銅、亜鉛、カドミウム、水
銀、鉛、マンガン等の金属イオンの硫酸塩、硝酸塩、過
塩素酸塩、テトラフルオロホウ酸塩、ヘキサフルオロリ
ン酸塩、ハロゲン化塩、炭酸塩、ギ酸塩、酢酸塩を使用
することができる。これらの金属塩にアンモニウムヘキ
サフルオロシリケートを反応させることにより、ヘキサ
フルオロシリケート金属塩を得ることができる。Examples of the metal salt include alkaline earth metal ions such as beryllium, magnesium, calcium, strontium, and barium; group VIII metal ions such as iron, cobalt, nickel, and palladium; copper, zinc, cadmium, mercury, and lead. Sulfate, nitrate, perchlorate, tetrafluoroborate, hexafluorophosphate, halide, carbonate, formate and acetate of metal ions such as manganese can be used. By reacting ammonium hexafluorosilicate with these metal salts, a hexafluorosilicate metal salt can be obtained.
【0035】前記有機配位子としては、ピラジン、4,
4’−ビピリジル、トランス−1,2−ビス(4−ピリ
ジル)エチレン、4,4’−アゾピリジン、4,4’−
ビピリジルエタン、4,4’−ビスビピリジルフェニレ
ン、N−(4−ピリジル)イソニコチンアミド等が使用
できる。As the organic ligand, pyrazine, 4,
4'-bipyridyl, trans-1,2-bis (4-pyridyl) ethylene, 4,4'-azopyridine, 4,4'-
Bipyridylethane, 4,4'-bisbipyridylphenylene, N- (4-pyridyl) isonicotinamide and the like can be used.
【0036】濃度としては、ヘキサフルオロシリケート
の2等量であり、0.01〜0.5mol/Lである。The concentration is 2 equivalents of hexafluorosilicate, and is 0.01 to 0.5 mol / L.
【0037】前記合成の反応温度は−20〜100℃程
度であり、常温で反応する。The reaction temperature of the above synthesis is about -20 to 100 ° C., and the reaction is carried out at ordinary temperature.
【0038】本反応の溶媒としては、水、アセトン、メ
タノール、エタノール等のアルコール類、アセトニトリ
ル、テトラヒドロフラン、ジオキサン、ジメチルホルム
アミド、ジメチルアセトアミド、ベンゼン、トルエン、
ヘキサン等の有機溶媒を単独又は混合して使用できる。有機金属錯体IIIの製造法 ジカルボン酸とRu2(CH3COO)4・X(X=C
l,BF4,Br)から選択される1種以上である金属
塩とハロゲン化物を含有する溶液を混合することによ
り、目的のガス吸着材であるカルボン酸錯体IIIを製造
することができる。具体的には、得られた混合液を、例
えば数時間〜数日間静置し、遠心分離により沈殿物を集
め、メタノールにより洗浄後100℃で5時間真空乾燥
することにより三次元有機金属錯体IIIの結晶を製造す
ることができる。As the solvent for this reaction, water, alcohols such as acetone, methanol and ethanol, acetonitrile, tetrahydrofuran, dioxane, dimethylformamide, dimethylacetamide, benzene, toluene,
Organic solvents such as hexane can be used alone or in combination. Method for producing organometallic complex III Dicarboxylic acid and Ru 2 (CH 3 COO) 4 .X (X = C
1, BF 4 , Br), a carboxylate complex III as a target gas adsorbent can be produced by mixing a solution containing one or more metal salts and a halide. Specifically, the obtained liquid mixture is allowed to stand, for example, for several hours to several days, the precipitate is collected by centrifugation, washed with methanol, and then dried in vacuum at 100 ° C. for 5 hours to obtain a three-dimensional organometallic complex III. Can be produced.
【0039】ジカルボン酸としては、好ましくはスクシ
ン酸、アジピン酸等の飽和脂肪酸、フマル酸、アセチレ
ンジカルボン酸等の不飽和脂肪酸、シクロヘキサンジカ
ルボン酸、テレフタル酸、ビフェニルアミドジカルボン
酸、スチルベンジカルボン酸、トランジカルボン酸、ビ
フェニルエチレンジカルボン酸等のアリールジカルボン
酸を使用することができる。ジカルボン酸の濃度は、
0.003〜0.1mol/L、好ましくは0.005
〜0.05mol/Lである。The dicarboxylic acid is preferably a saturated fatty acid such as succinic acid or adipic acid, an unsaturated fatty acid such as fumaric acid or acetylenedicarboxylic acid, cyclohexanedicarboxylic acid, terephthalic acid, biphenylamidedicarboxylic acid, stilbenedicarboxylic acid or trandicarboxylic acid. Acids and aryl dicarboxylic acids such as biphenylethylene dicarboxylic acid can be used. The concentration of dicarboxylic acid is
0.003 to 0.1 mol / L, preferably 0.005
0.050.05 mol / L.
【0040】金属塩としては、Ru2(CH3COO)4
・X(X=Cl,BF4,Br)から選択されるルテニ
ウム金属塩を使用することができる。金属塩の濃度は、
前記ジカルボン酸の1等量であり、0.003〜0.1
mol/L、好ましくは0.005〜0.05mol/
Lである。As the metal salt, Ru 2 (CH 3 COO) 4
· X ruthenium metal salt selected from (X = Cl, BF 4, Br) can be used. The concentration of the metal salt is
1 equivalent of the dicarboxylic acid, 0.003 to 0.1
mol / L, preferably 0.005-0.05 mol /
L.
【0041】ハロゲン化金属としては、リチウムクロラ
イド、リチウムブロマイド、ナトリウムクロライド等が
使用できる。As the metal halide, lithium chloride, lithium bromide, sodium chloride and the like can be used.
【0042】濃度としては、前記ジカルボン酸と金属塩
より生成する金属錯体に対して、0.5〜0.6等量、
好ましくは0.5等量である。The concentration is 0.5 to 0.6 equivalent to the metal complex formed from the dicarboxylic acid and the metal salt.
Preferably it is 0.5 equivalent.
【0043】溶媒としては、ジカルボン酸、金属塩及び
金属ハロゲン化物を溶解しやすく、目的物であるカルボ
ン酸金属錯体を溶解しにくい有機溶媒を使用することが
できる。具体的には、メタノール、エタノール、プロパ
ノール等のアルコール類、ベンゼン、トルエン、アセト
ニトリル、テトラヒドロフラン、ジメチルホルムアミ
ド、ヘキサン、アセトン等の有機溶媒を単独又は混合し
て使用できる。As the solvent, an organic solvent which can easily dissolve the dicarboxylic acid, the metal salt and the metal halide and hardly dissolve the target carboxylic acid metal complex can be used. Specifically, alcohols such as methanol, ethanol, and propanol, and organic solvents such as benzene, toluene, acetonitrile, tetrahydrofuran, dimethylformamide, hexane, and acetone can be used alone or in combination.
【0044】前記合成の反応温度は−20〜100℃程
度であり、常温で反応する。有機金属錯体IVの製造法 安息香酸アミド化合物と金属塩より生成する金属錯体の
有機溶液と二座配位可能な有機配位子を含有する溶液を
混合することにより、目的のガス吸着材であるカルボン
酸錯体を製造することができる。具体的には、得られた
混合液を、例えば数時間〜数日間攪拌し、遠心分離によ
り沈殿物を集め、メタノールにより洗浄後100℃で5
時間真空乾燥することにより有機金属錯体IVの結晶を製
造することができる。The reaction temperature of the synthesis is about -20 to 100 ° C., and the reaction is carried out at ordinary temperature. Production method of organometallic complex IV By mixing an organic solution of a metal complex formed from a benzoic acid amide compound and a metal salt with a solution containing an organic ligand capable of bidentate coordination, it is an intended gas adsorbent Carboxylic acid complexes can be produced. Specifically, the obtained mixture is stirred, for example, for several hours to several days, the precipitate is collected by centrifugation, washed with methanol, and then washed at 100 ° C for 5 hours.
The crystals of organometallic complex IV can be produced by vacuum drying for a time.
【0045】安息香酸アミド化合物としては、化学式
(2)The benzoic acid amide compound is represented by the following chemical formula (2)
【0046】[0046]
【化6】 Embedded image
【0047】〔式中、R2はアルキル基、ハロアルキル
基、置換基を有していてもよいアリール基、アラルキル
基を示す。〕好ましい安息香酸アミド化合物は、t−ブ
チル安息香酸アミド、フェニル安息香酸アミドが挙げら
れる。[In the formula, R 2 represents an alkyl group, a haloalkyl group, an aryl group which may have a substituent, or an aralkyl group. Preferred benzoic acid amide compounds include t-butylbenzoic acid amide and phenylbenzoic acid amide.
【0048】安息香酸アミド化合物の濃度は、0.00
3〜0.1mol/L、好ましくは0.005〜0.0
5mol/Lである。The concentration of the benzoic acid amide compound is 0.00
3 to 0.1 mol / L, preferably 0.005 to 0.0
5 mol / L.
【0049】前記有機配位子としては、ピラジン、4,
4’−ビピリジル、トランス−1,2−ビス(4−ピリ
ジル)エチレン、4,4’−アゾピリジン、4,4’−
ビピリジルエタン、4,4’−ビスビピリジルフェニレ
ン、N−(4−ピリジル)イソニコチンアミド等が使用
できる。As the organic ligand, pyrazine, 4,4
4'-bipyridyl, trans-1,2-bis (4-pyridyl) ethylene, 4,4'-azopyridine, 4,4'-
Bipyridylethane, 4,4'-bisbipyridylphenylene, N- (4-pyridyl) isonicotinamide and the like can be used.
【0050】二座配位可能な前記有機配位子の濃度とし
ては、前記安息香酸アミド化合物と金属塩より生成する
金属錯体に対して1〜2等量、好ましくは1.3〜1.
7等量である。The concentration of the organic ligand capable of bidentate coordination is 1 to 2 equivalents, preferably 1.3 to 1.1 equivalent to the metal complex formed from the benzoic acid amide compound and the metal salt.
7 equivalents.
【0051】溶媒としては、安息香酸アミド化合物と金
属塩より生成する金属錯体及び二座配位可能な有機配位
子を溶解しやすく、目的物であるカルボン酸金属錯体を
溶解しにくい有機溶媒を使用することができる。具体的
には、メタノール、エタノール、プロパノール等のアル
コール類、ベンゼン、トルエン、アセトニトリル、テト
ラヒドロフラン、ジメチルホルムアミド、ヘキサン、ア
セトン等の有機溶媒を単独又は混合して使用できる。As the solvent, an organic solvent which easily dissolves a metal complex formed from a benzoic acid amide compound and a metal salt and an organic ligand capable of bidentate coordination and hardly dissolves a target metal carboxylate complex is used. Can be used. Specifically, alcohols such as methanol, ethanol, and propanol, and organic solvents such as benzene, toluene, acetonitrile, tetrahydrofuran, dimethylformamide, hexane, and acetone can be used alone or in combination.
【0052】前記合成の反応温度は−20〜100℃程
度であり、常温で反応する。有機金属錯体Vの製造法 ジカルボン酸と金属塩より生成する金属錯体の有機溶液
と二座配位可能な有機配位子を含有する溶液を混合する
ことにより、目的のガス吸着材であるカルボン酸錯体を
製造することができる。または、二座配位可能な有機配
位子と金属塩より生成する金属錯体の有機溶液と化学式
(3)のジカルボン酸を含有する溶液を混合することに
より、目的のガス吸着材であるカルボン酸錯体を製造す
ることができる。具体的には、得られた混合液を、例え
ば数時間〜数日間攪拌し、遠心分離により沈殿物を集
め、メタノールにより洗浄後100℃で5時間真空乾燥
することにより有機金属錯体Vの結晶を製造することが
できる。The reaction temperature of the above synthesis is about -20 to 100 ° C., and the reaction is carried out at ordinary temperature. Method for producing organometallic complex V By mixing an organic solution of a metal complex formed from a dicarboxylic acid and a metal salt with a solution containing an organic ligand capable of bidentate coordination, a carboxylic acid as a target gas adsorbent is mixed. Complexes can be produced. Alternatively, by mixing an organic solution of a metal complex formed from an organic ligand capable of bidentate coordination and a metal salt with a solution containing a dicarboxylic acid of the chemical formula (3), a carboxylic acid as a target gas adsorbent is mixed. Complexes can be produced. Specifically, the obtained mixed solution is stirred, for example, for several hours to several days, a precipitate is collected by centrifugation, washed with methanol, and then dried in vacuum at 100 ° C. for 5 hours to form crystals of the organometallic complex V. Can be manufactured.
【0053】ジカルボン酸としては、スクシン酸、アジ
ピン酸等の飽和脂肪酸、フマル酸、アセチレンジカルボ
ン酸等の不飽和脂肪酸、シクロヘキサンジカルボン酸、
テレフタル酸、ビフェニルアミドジカルボン酸、スチル
ベンジカルボン酸、トランジカルボン酸、ビフェニルエ
チレンジカルボン酸等のアリールジカルボン酸を使用す
ることができる。ジカルボン酸の濃度は、0.003〜
0.1mol/L、好ましくは0.005〜0.05m
ol/Lである。The dicarboxylic acids include saturated fatty acids such as succinic acid and adipic acid, unsaturated fatty acids such as fumaric acid and acetylenedicarboxylic acid, cyclohexanedicarboxylic acid,
Aryl dicarboxylic acids such as terephthalic acid, biphenylamide dicarboxylic acid, stilbene dicarboxylic acid, transdicarboxylic acid, and biphenylethylene dicarboxylic acid can be used. The concentration of dicarboxylic acid is from 0.003 to
0.1 mol / L, preferably 0.005 to 0.05 m
ol / L.
【0054】金属塩としては、ロジウム塩、銅塩、モリ
ブデン塩、クロム塩、パラジウム塩、亜鉛塩及びタング
ステン塩から選択される金属塩を使用することができ
る。またこれらの金属塩としては、ギ酸塩、酢酸塩等の
有機酸塩、硫酸塩、硝酸塩、炭酸塩等の無機酸塩を使用
することができる。金属塩の濃度は、前記ジカルボン酸
の1/2等量であり、0.001〜0.05mol/
L、好ましくは0.003〜0.03mol/Lであ
る。As the metal salt, a metal salt selected from rhodium salts, copper salts, molybdenum salts, chromium salts, palladium salts, zinc salts and tungsten salts can be used. In addition, as these metal salts, organic acid salts such as formate and acetate, and inorganic acid salts such as sulfate, nitrate and carbonate can be used. The concentration of the metal salt is 1/2 equivalent of the dicarboxylic acid, and is 0.001 to 0.05 mol /.
L, preferably 0.003 to 0.03 mol / L.
【0055】二座配位可能な前記有機配位子の濃度とし
ては、前記ジカルボン酸と金属塩より生成する金属錯体
に対して、0.5〜0.6等量、好ましくは0.5等量
である。The concentration of the organic ligand capable of bidentate coordination is 0.5 to 0.6 equivalent, preferably 0.5 equivalent, to the metal complex formed from the dicarboxylic acid and the metal salt. Quantity.
【0056】溶媒としては、ジカルボン酸と金属塩より
生成する金属錯体および二座配位可能な前記有機配位子
を溶解しやすく、目的物であるジカルボン酸金属錯体を
溶解しにくい有機溶媒を使用することができる。具体的
には、メタノール、エタノール、プロパノール等のアル
コール類、ベンゼン、トルエン、アセトニトリル、テト
ラヒドロフラン、ジメチルホルムアミド、ヘキサン、ア
セトン等の有機溶媒を単独又は混合して使用できる。As the solvent, an organic solvent which easily dissolves the metal complex formed from the dicarboxylic acid and the metal salt and the organic ligand capable of bidentate coordination and hardly dissolves the target dicarboxylic acid metal complex is used. can do. Specifically, alcohols such as methanol, ethanol, and propanol, and organic solvents such as benzene, toluene, acetonitrile, tetrahydrofuran, dimethylformamide, hexane, and acetone can be used alone or in combination.
【0057】前記合成の反応温度は−20〜100℃程
度であり、常温で反応する。有機金属錯体VIの製造法 本発明の金属錯体を構成する二座配位可能な前記有機配
位子は、ピラジン、4,4’−ビピリジル、トランス−
1,2−ビス(4−ピリジル)エチレン、1,4−ジシ
アノベンゼン、4,4’−ジシアノビフェニル、1,2
−ジシアノエチレン、1,4−ビス(4−ピリジル)ベ
ンゼン、4,4’−アゾピリジン、4,4’−ビピリジ
ルエタン、4,4’−ビスビピリジルフェニレン、N−
(4−ピリジル)イソニコチンアミド等が使用できる。The reaction temperature of the above synthesis is about -20 to 100 ° C., and the reaction is carried out at ordinary temperature. Method for Producing Organometallic Complex VI The bidentate organic ligand constituting the metal complex of the present invention may be pyrazine, 4,4′-bipyridyl, trans-
1,2-bis (4-pyridyl) ethylene, 1,4-dicyanobenzene, 4,4′-dicyanobiphenyl, 1,2
-Dicyanoethylene, 1,4-bis (4-pyridyl) benzene, 4,4'-azopyridine, 4,4'-bipyridylethane, 4,4'-bisbipyridylphenylene, N-
(4-pyridyl) isonicotinamide and the like can be used.
【0058】かかる配位子は、分子の両末端に金属イオ
ンに配位可能な原子、好ましくは窒素原子を有し、かつ
分子に剛直性があるため、その両末端、好ましくは分子
内の点対称の位置に存在する窒素原子が、それぞれ別の
金属イオンに配位し、その(金属イオン−配位子)の繰
り返し構造が錯体の結晶格子中で形成され、このような
格子が場合によっては積層された構造を形成することに
より、ガス貯蔵可能な層状構造が形成されるものと考え
られる。配位子中の金属に配位した原子、ここでは窒素
原子間の距離はこの配位子により決定されるため、当該
配位子の選択により、吸着される分子の大きさが変更で
き、従って、貯蔵しうるガス成分の選択も可能になる。
また、原料化合物である金属塩の陰イオンによっても変
動しうる。Such a ligand has an atom capable of coordinating with a metal ion, preferably a nitrogen atom, at both ends of the molecule and has rigidity in the molecule. The nitrogen atoms present at symmetrical positions coordinate to different metal ions, and a repeating structure of the (metal ion-ligand) is formed in the crystal lattice of the complex. It is considered that a layered structure capable of storing gas is formed by forming the stacked structure. Since the distance between the atoms coordinated to the metal in the ligand, here the nitrogen atom, is determined by this ligand, the choice of the ligand can change the size of the molecule to be adsorbed, In addition, it is possible to select a gas component that can be stored.
In addition, it may vary depending on the anion of the metal salt as the raw material compound.
【0059】前記錯体に適する金属イオンとしては、ベ
リリウム、マグネシウム、カルシウム、ストロンチウ
ム、バリウム等のアルカリ土類金属イオン、鉄、コバル
ト、ニッケル、パラジウム等のVIII族の金属イオン、
銅、亜鉛、カドミウム、水銀、鉛、マンガン等の金属イ
オンが使用でき、これらの金属イオンの硫酸塩、硝酸
塩、過塩素酸塩、テトラフルオロホウ酸塩、ヘキサフル
オロリン酸塩、ハロゲン化塩、炭酸塩、ギ酸塩、酢酸塩
を前記金属イオンの原料として使用することができる。
金属イオンとしては、銅イオンが好ましく、金属塩とし
ては硫酸銅、硝酸銅、炭酸銅等の無機塩、ギ酸銅、酢酸
銅等の有機塩を好ましく使用できる。Suitable metal ions for the complex include alkaline earth metal ions such as beryllium, magnesium, calcium, strontium and barium; group VIII metal ions such as iron, cobalt, nickel and palladium;
Metal ions such as copper, zinc, cadmium, mercury, lead and manganese can be used, and sulfates, nitrates, perchlorates, tetrafluoroborates, hexafluorophosphates, halide salts of these metal ions, Carbonates, formates, and acetates can be used as raw materials for the metal ions.
As the metal ions, copper ions are preferable, and as the metal salts, inorganic salts such as copper sulfate, copper nitrate, and copper carbonate, and organic salts such as copper formate and copper acetate can be preferably used.
【0060】金属錯体は、金属塩の溶液、有機配位子の
溶液、及び2,3−ピラジンジカルボン酸の溶液を混合
して反応させ、錯体化することにより得られるものであ
り、各原料の比率が所定の比となるように混合し、均一
に攪拌した後、所定の条件で反応させ、錯体の結晶を生
成させる。反応条件は、金属イオンと配位子の組み合わ
せによって異なるが、例えば得られた混合液を、例えば
数時間〜数日間攪拌し、遠心分離により沈殿物を集め、
メタノールにより洗浄後100℃で5時間真空乾燥する
ことにより有機金属錯体VIの結晶を製造することができ
る。反応温度は−20〜100℃程度、好ましくは10
〜60℃程度で反応する。The metal complex is obtained by mixing and reacting a solution of a metal salt, a solution of an organic ligand, and a solution of 2,3-pyrazinedicarboxylic acid to form a complex. The mixture is mixed so that the ratio becomes a predetermined ratio, uniformly stirred, and then reacted under predetermined conditions to generate a complex crystal. The reaction conditions vary depending on the combination of the metal ion and the ligand.For example, the obtained mixture is stirred for several hours to several days, for example, and the precipitate is collected by centrifugation.
After washing with methanol and vacuum drying at 100 ° C. for 5 hours, crystals of organometallic complex VI can be produced. The reaction temperature is about −20 to 100 ° C., preferably 10
Reacts at about 60 ° C.
【0061】本反応の溶媒としては、水、アセトン、メ
チルエチルケトン、メチルイソブチルケトン等のケトン
類、メタノール、エタノール等のアルコール類、アセト
ニトリル、テトラヒドロフラン、ジオキサン、ジメチル
ホルムアミド、ジメチルアセトアミド、ベンゼン、トル
エン、ヘキサン、酢酸エチル、酢酸ブチル等のエステル
類等の有機溶媒を単独又は混合して使用できる。有機金属錯体VIIの製造法 化学式(5)Examples of the solvent for this reaction include water, ketones such as acetone, methyl ethyl ketone and methyl isobutyl ketone, alcohols such as methanol and ethanol, acetonitrile, tetrahydrofuran, dioxane, dimethylformamide, dimethylacetamide, benzene, toluene, hexane, and the like. Organic solvents such as esters such as ethyl acetate and butyl acetate can be used alone or in combination. Production method of organometallic complex VII Chemical formula (5)
【0062】[0062]
【化7】 Embedded image
【0063】〔式中、R4及びR5は前記に定義されたと
おりである。〕で表される二座配位可能なアミド結合を
分子内に有する有機配位子の溶液と金属塩の溶液を混合
することにより、有機金属錯体VIIを製造することがで
きる。具体的には、得られた混合液を、例えば数時間〜
数日間静置し、沈殿した固体を吸引濾過し、100℃で
5時間真空乾燥することにより有機金属錯体VIIを結晶
として製造することができる。Wherein R 4 and R 5 are as defined above. By mixing a solution of an organic ligand having an amide bond capable of bidentate coordination in a molecule thereof and a solution of a metal salt, an organometallic complex VII can be produced. Specifically, the obtained mixed solution is, for example, several hours to
The mixture is allowed to stand for several days, and the precipitated solid is suction-filtered and vacuum-dried at 100 ° C. for 5 hours, whereby the organometallic complex VII can be produced as crystals.
【0064】金属塩としては、ベリリウム、マグネシウ
ム、カルシウム、ストロンチウム、バリウム等のアルカ
リ土類金属イオン、鉄、コバルト、ニッケル、パラジウ
ム等のVIII族の金属イオン、銅、亜鉛、カドミウム、水
銀、鉛、マンガン等の金属イオンの硫酸塩、硝酸塩、過
塩素酸塩、テトラフルオロホウ酸塩、ヘキサフルオロリ
ン酸塩、ハロゲン化塩、炭酸塩、ギ酸塩、酢酸塩を使用
することができる。この金属塩と二座配位可能な有機配
位子を反応させることにより、有機金属錯体VIIを得る
ことができる。Examples of the metal salt include alkaline earth metal ions such as beryllium, magnesium, calcium, strontium, and barium; group VIII metal ions such as iron, cobalt, nickel, and palladium; copper, zinc, cadmium, mercury, and lead. Sulfate, nitrate, perchlorate, tetrafluoroborate, hexafluorophosphate, halide, carbonate, formate and acetate of metal ions such as manganese can be used. By reacting this metal salt with an organic ligand capable of bidentate coordination, organometallic complex VII can be obtained.
【0065】有機配位子の濃度としては、金属塩の2モ
ル当量であり、0.01〜0.5mol/Lである。The concentration of the organic ligand is 2 molar equivalents of the metal salt, and is 0.01 to 0.5 mol / L.
【0066】前記合成の反応温度は−20〜100℃程
度であり、常温で反応する。The reaction temperature of the above synthesis is about -20 to 100 ° C., and the reaction is carried out at ordinary temperature.
【0067】本反応の溶媒としては、水、アセトン、メ
タノール、エタノール等のアルコール類、アセトニトリ
ル、テトラヒドロフラン、ジオキサン、ジメチルホルム
アミド、ジメチルアセトアミド、ベンゼン、トルエン、
ヘキサン等の有機溶媒を単独又は混合して使用できる。ガス吸着材 有機金属錯体はガスを吸着することができるので、ガス
吸蔵材として使用することができる。有機金属錯体の結
晶における細孔径は、構造上一定しているため、特定の
ガス以外のガス成分を吸着したまま脱着しにくくなり、
繰り返し性能が劣化するといった問題も発生しにくい。Examples of the solvent for this reaction include water, alcohols such as acetone, methanol, and ethanol, acetonitrile, tetrahydrofuran, dioxane, dimethylformamide, dimethylacetamide, benzene, toluene, and the like.
Organic solvents such as hexane can be used alone or in combination. Gas adsorbent Since the organometallic complex can adsorb gas, it can be used as a gas occluding material. Since the pore diameter of the crystal of the organometallic complex is constant in structure, it becomes difficult to desorb while adsorbing gas components other than the specific gas,
Problems such as repeated performance degradation are unlikely to occur.
【0068】有機金属錯体の結晶を成型(特に、圧縮成
型)することにより、比較的嵩密度の高いガス吸蔵材と
することができる。ガス吸蔵材の嵩密度を高くすること
により、体積当たりのガスの吸着量を大きく増大するこ
とができ、ガス貯蔵性能の点からも好ましい。有機金属
錯体の結晶を成型することにより、その成型密度を高く
するとともに、その吸着能を高くすることができ、単位
体積当たりのガス吸蔵能を、例えば、活性炭より格段に
高いものとすることができる。By molding (particularly, compression molding) the crystal of the organometallic complex, a gas occlusion material having a relatively high bulk density can be obtained. By increasing the bulk density of the gas occluding material, the amount of gas adsorbed per volume can be greatly increased, which is preferable from the viewpoint of gas storage performance. By molding the crystal of the organometallic complex, it is possible to increase its molding density and its adsorption ability, and to make the gas storage capacity per unit volume much higher than, for example, activated carbon. it can.
【0069】貯蔵可能なガス成分としては、メタンを除
く常温常圧でガス状又は液状の有機化合物、例えばアセ
チレン、エチレン、エタン、プロピレン、プロピン、プ
ロパン、1−ブテン、2−ブテン、1−ブチン、2−ブ
チン、ペンテン、ペンタン、シクロペンタン、シクロペ
ンテン、メタノール、エタノール、ブタノール、ジメチ
ルエーテル;水素、酸素、窒素、アルシン、ホスフィン
などが挙げられ、好ましくは炭素数2〜4のガス(アセ
チレン、エチレン、エタン、プロピレン、プロピン、プ
ロパン、1−ブテン、2−ブテン、1−ブチン、2−ブ
チン)が挙げられ、特にアセチレンが挙げられる。ガス貯蔵方法 本発明のガス吸蔵材を、加圧条件下で、貯蔵の対象とな
るガスを接触させることにより、吸着し、貯蔵すること
ができる。この貯蔵は、常温以上(例えば、5℃以上)
でも可能である。ガスを吸着したガス吸蔵材のガス圧
(貯蔵容器内の圧力)を減圧することにより又は吸蔵材
を加熱することにより、吸着したガスを脱着(放出)さ
せることができる。ガス貯蔵装置 本発明のガス貯蔵装置においては、圧力容器内に本発明
のガス吸蔵材を備えるので、吸蔵材が収納されている圧
力容器内に、その出入口からガスを圧入することによ
り、ガス吸着材に吸着させた状態で貯蔵することができ
る。本発明のガス貯蔵装置においては、例えば、出口側
に備えられる弁を開放し、圧力容器内の内圧を低下させ
ることにより、ガスをガス吸蔵材から脱着させ、貯蔵装
置から放出させることができる。The storable gas components include organic compounds which are gaseous or liquid at normal temperature and pressure except for methane, such as acetylene, ethylene, ethane, propylene, propyne, propane, 1-butene, 2-butene and 1-butyne. , 2-butyne, pentene, pentane, cyclopentane, cyclopentene, methanol, ethanol, butanol, dimethyl ether; hydrogen, oxygen, nitrogen, arsine, phosphine and the like, and preferably a gas having 2 to 4 carbon atoms (acetylene, ethylene, Ethane, propylene, propyne, propane, 1-butene, 2-butene, 1-butyne, 2-butyne), and especially acetylene. Gas Storage Method The gas occluding material of the present invention can be adsorbed and stored by contacting a gas to be stored under a pressurized condition. This storage is at normal temperature or higher (for example, 5 ° C or higher)
But it is possible. The adsorbed gas can be desorbed (released) by reducing the gas pressure (pressure in the storage container) of the gas occluding material that has adsorbed the gas or by heating the occluding material. Gas storage device In the gas storage device of the present invention, since the gas occlusion material of the present invention is provided in the pressure vessel, the gas is adsorbed by pressurizing the gas from the inlet / outlet into the pressure vessel in which the occlusion material is stored. It can be stored in a state of being adsorbed on the material. In the gas storage device of the present invention, for example, by opening the valve provided on the outlet side and reducing the internal pressure in the pressure vessel, the gas can be desorbed from the gas occluding material and released from the storage device.
【0070】[0070]
【発明の効果】本発明のガス吸着材は、各種のガス貯蔵
法として、安価であるため、経済的なメリットが大き
く、かつ体積あたりのガス貯蔵性能が向上する。As described above, the gas adsorbent of the present invention is inexpensive as a gas storage method, and therefore has a great economical advantage and an improved gas storage performance per volume.
【0071】[0071]
【実施例】(1)有機金属錯体の合成製造例1 メタノール100cc、ギ酸14ccの混合溶媒に、
1,4−トランス−シクロヘキサンジカルボン酸2.5
3gを溶解する。得られた1,4−トランス−シクロヘ
キサンジカルボン酸溶液に、攪拌下、ギ酸銅3.3gを
メタノール100ccに溶解した溶液を滴下し、得られ
た溶液を室温にて数日静置した。得られた青緑色沈殿を
濾過して集め、減圧乾燥したところ、目的物である錯体
が2.68g得られた。EXAMPLES (1) Synthesis of organometallic complex Production example 1 In a mixed solvent of 100 cc of methanol and 14 cc of formic acid,
1,4-trans-cyclohexanedicarboxylic acid 2.5
Dissolve 3 g. A solution prepared by dissolving 3.3 g of copper formate in 100 cc of methanol was added dropwise to the obtained 1,4-trans-cyclohexanedicarboxylic acid solution with stirring, and the resulting solution was allowed to stand at room temperature for several days. The obtained blue-green precipitate was collected by filtration, and dried under reduced pressure to obtain 2.68 g of the target complex.
【0072】得られた錯体の比表面積をBET法により
調べたところ、480m2/gであり、細孔径は約4.
7Åであった。製造例2 メタノール100cc、ギ酸12ccの混合溶媒に、フ
マル酸1.20gを溶解する。得られたフマル酸溶液
に、攪拌下、ギ酸銅3.38gをメタノール100cc
に溶解した溶液を滴下し、得られた溶液を室温にて数日
静置した。得られた青色沈殿を濾過して集め、減圧乾燥
したところ、目的物である錯体が1.37g得られた。When the specific surface area of the obtained complex was measured by the BET method, it was 480 m 2 / g, and the pore diameter was about 4.
It was 7Å. Production Example 2 1.20 g of fumaric acid is dissolved in a mixed solvent of 100 cc of methanol and 12 cc of formic acid. To the obtained fumaric acid solution, 3.38 g of copper formate was added with stirring to 100 cc of methanol.
Was added dropwise, and the resulting solution was allowed to stand at room temperature for several days. The resulting blue precipitate was collected by filtration and dried under reduced pressure to give 1.37 g of the desired complex.
【0073】得られた錯体の比表面積をBET法により
調べたところ、450m2/gであり、細孔径は約5.
4Åであった。製造例3 DMF90cc、ギ酸0.5ccの混合溶媒に、ビフェ
ニルジカルボン酸0.25gを溶解する。得られたビフ
ェニルジカルボン酸溶液に、攪拌下、ギ酸銅0.5gを
メタノール25ccに溶解した溶液を滴下し、得られた
溶液を室温にて数日静置した。得られた青緑色沈殿を濾
過して集め、減圧乾燥したところ、目的物である錯体が
0.17g得られた。When the specific surface area of the obtained complex was measured by the BET method, it was 450 m 2 / g, and the pore size was about 5.
It was 4Å. Production Example 3 In a mixed solvent of 90 cc of DMF and 0.5 cc of formic acid, 0.25 g of biphenyldicarboxylic acid was dissolved. A solution prepared by dissolving 0.5 g of copper formate in 25 cc of methanol was added dropwise to the obtained biphenyldicarboxylic acid solution with stirring, and the resulting solution was allowed to stand at room temperature for several days. The obtained blue-green precipitate was collected by filtration and dried under reduced pressure to obtain 0.17 g of the target complex.
【0074】得られた錯体の比表面積をBET法により
調べたところ、1200m2/gであり、細孔径は約
7.8Åであった。製造例4 過塩素酸銅6水和物(Cu(ClO4)2・6H20、378mg、1.02mm
ol)とアンモニウムヘキサフルオロシリケート((NH4)2Si
F6、200mg、1.12mmol)を水20mlに溶かした。これに
4,4’−ビピリジル(349mg、2.24mmol)の水溶液(20m
l)をゆっくりと加えた。得られた青色沈殿を濾過して集
め、減圧乾燥したところ、目的物である錯体が0.53g得
られた。得られた錯体の比表面積をBET法により調べ
たところ、1193m2/gであり、細孔径は約7.8
Åであった。製造例5 <Cu(OOCC=CCOO)2・ピリジンの合成>C
u(CH3COO)2・H2O(199mg)、フマル酸
116mg、ピリジン80mg及びギ酸1ccを100
mlナスフラスコに入れ、約20mlのメタノールに溶
解し、室温で攪拌し、4日間静置した。その後、沈殿物
を吸引濾過し、メタノールで3回洗浄し、真空下100
℃で約2時間加熱乾燥し、目的物を118mg得た。製造例6 <Ru2(OOCC=CCOO)2・Clの合成>Ru2
(CH3COO)4・Cl(477mg)、フマル酸23
2mg、リチウムクロライド42mgを200mlナス
フラスコに入れ、約100mlのメタノールに溶解し、
室温で攪拌し、4日間静置した。その後、沈殿物を吸引
濾過し、メタノールで3回洗浄し、真空下100℃で約
2時間加熱乾燥し、目的物を532mg得た。製造例7 <Rh2(p−OOCC6H4NHCOtBu)4・ピラジ
ンの合成>Rh2(CH3COO)4(100mg)とp
−tBuCONHC6H4COOH(400mg)を10
0mlナスフラスコに入れ、約10mlのジグライムに
溶解し、200℃で2時間攪拌した後溶媒を留去し、再
び約5mlのジグライムを加え、200℃で30分間攪
拌した後溶媒を留去した。得られた緑色の粗結晶にメタ
ノールを加え、遠心分離器により結晶を集めた。さらに
メタノールで3回洗浄し、真空下100℃で約2時間加
熱乾燥し、Rh2(p−OOCC6H4NHCOtBu)4
を168mg得た。When the specific surface area of the obtained complex was measured by the BET method, it was 1200 m 2 / g, and the pore diameter was about 7.8 °. Production Example 4 copper perchlorate hexahydrate (Cu (ClO 4) 2 · 6H 2 0,378mg, 1.02mm
ol) and ammonium hexafluorosilicate ((NH 4 ) 2 Si
F 6, 200mg, 1.12mmol) was dissolved in water 20ml. To this, an aqueous solution of 4,4′-bipyridyl (349 mg, 2.24 mmol) (20 m
l) was added slowly. The resulting blue precipitate was collected by filtration and dried under reduced pressure to give 0.53 g of the desired complex. When the specific surface area of the obtained complex was examined by the BET method, it was 1193 m 2 / g, and the pore diameter was about 7.8.
Was Å. Production Example 5 <Synthesis of Cu (OOCC = CCOO) 2 .pyridine> C
u (CH 3 COO) 2 .H 2 O (199 mg), 116 mg of fumaric acid, 80 mg of pyridine and 1 cc of formic acid
The mixture was placed in a ml eggplant flask, dissolved in about 20 ml of methanol, stirred at room temperature, and allowed to stand for 4 days. Thereafter, the precipitate is filtered off with suction, washed three times with methanol and reduced in vacuo to 100
The mixture was dried by heating at ℃ for about 2 hours to obtain 118 mg of the desired product. Production Example 6 <Synthesis of Ru 2 (OOCC = CCOO) 2 .Cl> Ru 2
(CH 3 COO) 4 .Cl (477 mg), fumaric acid 23
2 mg and lithium chloride 42 mg were put in a 200 ml eggplant flask and dissolved in about 100 ml of methanol.
The mixture was stirred at room temperature and allowed to stand for 4 days. Thereafter, the precipitate was filtered by suction, washed with methanol three times, and dried by heating at 100 ° C. under vacuum for about 2 hours to obtain 532 mg of the desired product. Production Example 7 <Synthesis of Rh 2 (p-OOCC 6 H 4 NHCO t Bu) 4 .pyrazine> Rh 2 (CH 3 COO) 4 (100 mg) and p
- t BuCONHC 6 H 4 COOH and (400 mg) 10
The mixture was placed in a 0 ml eggplant flask, dissolved in about 10 ml of diglyme, stirred at 200 ° C. for 2 hours, and then the solvent was distilled off. About 5 ml of diglyme was added again, and the mixture was stirred at 200 ° C. for 30 minutes, and then the solvent was distilled off. Methanol was added to the obtained green crude crystals, and the crystals were collected by a centrifuge. Further, it is washed with methanol three times, dried by heating at 100 ° C. under vacuum for about 2 hours, and Rh 2 (p-OOCC 6 H 4 NHCO t Bu) 4
168 mg was obtained.
【0075】Rh2(p−OOCC6H4NHCOtBu)
4(100mg)を50mlナスフラスコに入れ、約20mlの
メタノールに溶解した。この溶液にピラジン11mgを
加え、1日攪拌した。その後、遠心分離器により沈殿を
集め、メタノールで3回洗浄し、真空下100℃で約2
時間加熱乾燥し、目的物であるガス吸着材を黄土色粉末
結晶として93mgを得た。製造例8 N−(4−ピコリル)−イソニコチンアミド(pci
a,R=CH2)(42mg,2mmol)のエタノール溶液40
mlをCd(NO3)2・4H2O(308mg, 1mmol)のメタ
ノール溶液40mlに滴下し、50℃に加熱しながら1
時間攪拌した。得られた白色沈殿を濾過して集め、減圧
乾燥したところ、目的物である錯体が0.58g得られ
た。Rh 2 (p-OOCC 6 H 4 NHCO t Bu)
4 (100 mg) was placed in a 50 ml eggplant flask and dissolved in about 20 ml of methanol. To this solution, 11 mg of pyrazine was added and stirred for one day. Thereafter, the precipitate was collected by a centrifugal separator, washed three times with methanol, and vacuumed at 100 ° C. for about 2 hours.
After heating and drying for an hour, 93 mg of the target gas adsorbent was obtained as ocher powder crystals. Production Example 8 N- (4-picolyl) -isonicotinamide (pci
a, R = CH 2 ) (42 mg, 2 mmol) in ethanol solution 40
of methanol was added dropwise to 40 ml of a methanol solution of Cd (NO 3 ) 2 .4H 2 O (308 mg, 1 mmol).
Stirred for hours. The obtained white precipitate was collected by filtration and dried under reduced pressure to obtain 0.58 g of the target complex.
【0076】得られた錯体の比表面積をBET法により
調べたところ160m2/gであり、細孔径は約4Åで
あった。When the specific surface area of the obtained complex was measured by the BET method, it was 160 m 2 / g and the pore diameter was about 4 °.
【0077】この錯体を元素分析することにより、組成
式が{Cd(pcia)2(NO3)2}nで表されるものであること
が判明した。 (2)ガス貯蔵能力の測定 実施例1〜8で得られた錯体についてアセチレンの吸着
能力を測定した。Elemental analysis of this complex revealed that the composition formula was represented by {Cd (pcia) 2 (NO 3 ) 2 } n. (2) Measurement of gas storage capacity The acetylene adsorption capacity of the complexes obtained in Examples 1 to 8 was measured.
【0078】実験条件は、 使用ガス:アセチレン(純度99.99%) 温度:25℃ 時間:平行に達するまで(数秒) にて行った。結果を図1に示す。図1に示されるよう
に、本発明の錯体はアセチレン吸着能を有することが明
らかになった。The experimental conditions were as follows: gas used: acetylene (purity: 99.99%) temperature: 25 ° C. time: until reaching parallel (several seconds). The results are shown in FIG. As shown in FIG. 1, the complex of the present invention was found to have acetylene adsorption ability.
【図1】実施例1の錯体のガス吸着能(吸着等温線)を
示すグラフである。FIG. 1 is a graph showing the gas adsorption capacity (adsorption isotherm) of the complex of Example 1.
フロントページの続き Fターム(参考) 3E072 EA10 GA30 4G066 AA32B AB07B AB24B BA23 BA26 CA21 CA27 CA37 CA38 CA51 FA05 Continuation of the front page F term (reference) 3E072 EA10 GA30 4G066 AA32B AB07B AB24B BA23 BA26 CA21 CA27 CA37 CA38 CA51 FA05
Claims (8)
圧でガス状又は液状の有機化合物の吸着材。1. An adsorbent for a gaseous or liquid organic compound at normal temperature and normal pressure except for methane using an organometallic complex.
からなる群から選ばれる少なくとも1種の吸着材。2. At least one adsorbent selected from the group consisting of hydrogen, oxygen and nitrogen using an organometallic complex.
ィンからなる群から選ばれる少なくとも1種の吸着材。4. At least one adsorbent selected from the group consisting of arsine and phosphine using an organometallic complex.
らなる群から選ばれる少なくとも1種である請求項1〜
4のいずれかに記載の吸着材。 錯体I. ジカルボン酸と銅、クロム、モリブデン、ロ
ジウム、パラジウム及び亜鉛からなる群から選ばれる少
なくとも1種の金属からなるジカルボン酸金属錯体; 錯体II. 二価の金属イオン、前記金属イオンに配位可
能な原子を有する二座配位可能な有機配位子、及びSiF6
2-、GeF6 2-、ZrF6 2-、TiF6 2-、SnF6 2-、NbOF6 2-、MoO2F
4 2-からなる群から選ばれる少なくとも1種より構成さ
れる三次元構造を有する有機金属錯体; 錯体III. 化学式(1) Ru2(OOC−R1−COO)2・X (1) 〔式中、R1はアルキレン基、アルケニレン基、アルキ
ニレン基、置換基を有していてもよいアリーレン基を示
す。Xはハロゲンイオン又はBF4 -を示す。〕で表され
るジカルボン酸ハロゲン化金属錯体。 錯体IV. 化学式(2) 【化1】 〔式中、R2はアルキレン基、アルケニレン基、アルキ
ニレン基、置換基を有していてもよいアリーレン基を示
す。〕で表されるカルボン酸から選択される少なくとも
1種と銅、クロム、モリブデン、ロジウム、パラジウム
及びタングステンからなる群から選ばれる少なくとも1
種の金属と前記金属に2座配位可能な有機配位子からな
るカルボン酸金属錯体; 錯体V. 化学式(3) HOOC−R3−COOH (3) 〔式中、R3はアルキレン基、アルケニレン基、アルキ
ニレン基、置換基を有していてもよいアリーレン基を示
す。〕で表されるジカルボン酸から選択される少なくと
も1種と銅、クロム、モリブデン、ロジウム、パラジウ
ム、亜鉛及びタングステンからなる群から選ばれる少な
くとも1種の金属と前記金属に2座配位可能な有機配位
子からなるジカルボン酸金属錯体。 錯体VI. 2価の金属イオン、前記金属イオンに配位可
能な原子を有する2座配位可能な有機配位子(Ligand)及
び2,3−ピラジンジカルボン酸(pyzdc)からなる化学
式(4) Cu2(Ligand)(pyzdc)2 (4) で表される三次元構造を有する有機金属錯体; 錯体VII. 2価の金属イオン及び化学式(5) 【化2】 〔式中、R4及びR5は同一又は異なって、アルキレン
基、アルケニレン基、アルキニレン基、置換基を有して
いてもよいアリーレン基または単結合を示す。但し、R
4及びR5が同時に単結合になることはない。〕で表され
る有機配位子からなる有機金属錯体5. The organic metal complex is at least one selected from the group consisting of the following complexes I to VII.
4. The adsorbent according to any one of 4. Complex I. Metal complex of dicarboxylic acid consisting of dicarboxylic acid and at least one metal selected from the group consisting of copper, chromium, molybdenum, rhodium, palladium and zinc; Complex II. A divalent metal ion, a bidentate organic ligand having an atom capable of coordinating to the metal ion, and SiF 6
2-, GeF 6 2-, ZrF 6 2-, TiF 6 2-, SnF 6 2-, NbOF 6 2-, MoO 2 F
Organometallic complex having a three-dimensional structure composed of at least one selected from the group consisting of 4 2-;. Complex III Formula (1) Ru 2 (OOC- R 1 -COO) 2 · X (1) [Formula In the formula, R 1 represents an alkylene group, alkenylene group, alkynylene group, or an optionally substituted arylene group. X is a halogen ion or BF 4 - shows a. ] The dicarboxylic acid metal halide complex represented by these. Complex IV. Chemical formula (2) [In the formula, R 2 represents an alkylene group, alkenylene group, alkynylene group, or an arylene group which may have a substituent. And at least one selected from the group consisting of copper, chromium, molybdenum, rhodium, palladium and tungsten
Metal carboxylate complex comprising a metal of a kind and an organic ligand capable of bidentate coordination with the metal; complex V. Chemical formula (3) HOOC—R 3 —COOH (3) wherein R 3 represents an alkylene group, alkenylene group, alkynylene group, or an arylene group which may have a substituent. And at least one metal selected from the group consisting of copper, chromium, molybdenum, rhodium, palladium, zinc and tungsten, and an organic compound capable of bidentate coordination with the metal. A dicarboxylic acid metal complex comprising a ligand. Complex VI. Divalent metal ions, consisting of 2 Zahaii acceptable organic ligands with coordinating an atom to the metal ion (Ligand) and 2,3-pyrazine dicarboxylic acid (pyzdc) Chemical formula (4) Cu 2 ( Ligand) (pyzdc) 2 An organometallic complex having a three-dimensional structure represented by (4): Complex VII. Divalent metal ion and chemical formula (5) [In the formula, R 4 and R 5 are the same or different and each represents an alkylene group, an alkenylene group, an alkynylene group, an arylene group which may have a substituent, or a single bond. Where R
4 and R 5 do not simultaneously form a single bond. Organometallic complex comprising an organic ligand represented by the formula:
成された空間に、請求項1〜5のいずれかに記載の吸着
材を収納したガス貯蔵装置。6. A gas storage device in which the adsorbent according to claim 1 is stored in a space formed inside a pressure vessel having a gas inlet / outlet.
じて加圧条件下で炭素数が2以上のガス、蒸気又は液体
化合物、水素、酸素、窒素、アルシン及びポスフィンか
らなる群から選ばれる少なくとも1種を吸着させること
を特徴とする貯蔵方法。7. The gas storage device according to claim 6, wherein the gas storage device according to claim 6 is a gas, vapor or liquid compound having 2 or more carbon atoms, hydrogen, oxygen, nitrogen, arsine and phosphine under a pressurized condition. A storage method comprising adsorbing at least one selected member.
ス吸着材にアセチレンを吸着して貯蔵するガス貯蔵方法
およびガス貯蔵装置に関する。8. A gas storage method and apparatus for adsorbing and storing acetylene on a gas adsorbent comprising the organometallic complex according to claim 5.
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Cited By (18)
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