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JP2000086744A - Epoxy resin composition, inductance component and semiconductor sealing device - Google Patents

Epoxy resin composition, inductance component and semiconductor sealing device

Info

Publication number
JP2000086744A
JP2000086744A JP10270522A JP27052298A JP2000086744A JP 2000086744 A JP2000086744 A JP 2000086744A JP 10270522 A JP10270522 A JP 10270522A JP 27052298 A JP27052298 A JP 27052298A JP 2000086744 A JP2000086744 A JP 2000086744A
Authority
JP
Japan
Prior art keywords
epoxy resin
resin composition
curing agent
sealing device
component
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10270522A
Other languages
Japanese (ja)
Other versions
JP3705704B2 (en
Inventor
Shinji Tsuchiya
愼二 土屋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyocera Chemical Corp
Original Assignee
Toshiba Chemical Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Chemical Corp filed Critical Toshiba Chemical Corp
Priority to JP27052298A priority Critical patent/JP3705704B2/en
Publication of JP2000086744A publication Critical patent/JP2000086744A/en
Application granted granted Critical
Publication of JP3705704B2 publication Critical patent/JP3705704B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Compositions Of Macromolecular Compounds (AREA)
  • Epoxy Resins (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
  • Organic Insulating Materials (AREA)

Abstract

(57)【要約】 【課題】 薄肉部の充填性に優れ、ボイド等の欠陥の発
生がなく、強靭化により耐クラック性に優れ、耐湿性等
の信頼性に優れたエポキシ樹脂組成物、またそれにより
絶縁・封止したインダクタンス部品および半導体封止装
置を提供する。 【解決手段】 (A)必要に応じ反応性希釈剤を配合し
た液状エポキシ樹脂と(B)無機質充填剤とを含む樹脂
成分に、(C)硬化剤として水素化メチルナジック酸も
しくはその無水物と(D)液状硬化促進剤としてイミダ
ゾール系化合物とを含む硬化剤成分を混合した、二液性
電気絶縁材料であることを特徴とするエポキシ樹脂組成
物、また、そのエポキシ樹脂組成物の注型物、硬化物に
よって、コイル、半導体チップが絶縁、封止されること
を特徴とするインダクタンス部品、半導体封止装置であ
る。
(57) [Problem] An epoxy resin composition which is excellent in filling property of a thin portion, has no defects such as voids, has excellent crack resistance due to toughness, and has excellent reliability such as moisture resistance. Thus, an insulated and sealed inductance component and a semiconductor sealing device are provided. SOLUTION: A resin component containing (A) a liquid epoxy resin mixed with a reactive diluent as required and (B) an inorganic filler, and (C) hydrogenated methylnadic acid or an anhydride thereof as a curing agent. (D) An epoxy resin composition, which is a two-part electrical insulating material, obtained by mixing a curing agent component containing an imidazole compound as a liquid curing accelerator, and a cast of the epoxy resin composition. And a coil and a semiconductor chip are insulated and sealed by a cured product, and an inductance component and a semiconductor sealing device.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、耐クラック性、耐
湿性、成形性に優れ、高温での電気特性に優れた耐熱性
の高いエポキシ樹脂組成物並びに該エポキシ樹脂組成物
によって絶縁・封止されたインダクタンス部品および半
導体封止装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an epoxy resin composition having excellent crack resistance, moisture resistance, moldability, and excellent electrical properties at high temperatures and high heat resistance, and insulating and sealing with the epoxy resin composition. To a manufactured inductance component and a semiconductor sealing device.

【0002】[0002]

【従来の技術】従来、コイル、半導体素子などの電気・
電子部品は、それを外部雰囲気や機械的衝撃から保護す
るため、樹脂絶縁・封止することが行われてきた。近
年、コイル装置における小形化、内部電圧の高電圧化、
一方、半導体装置における軽薄短小化の進行に伴い、注
型・成形樹脂には、コイル巻線間への充填性や薄肉成形
性に適するよう、より一層の低粘度化と注型・成形後の
耐湿性、耐クラック性等の信頼性が求められるようにな
ってきた。
2. Description of the Related Art Conventionally, electric power of coils, semiconductor elements, etc.
Electronic components have been resin-insulated and sealed to protect them from the external atmosphere and mechanical shock. In recent years, the coil device has been downsized, the internal voltage has been increased,
On the other hand, as semiconductor devices become lighter, thinner and shorter, casting and molding resins are further reduced in viscosity and cast and molded after molding so as to be suitable for filling between coil windings and thin moldability. Reliability such as moisture resistance and crack resistance has been required.

【0003】[0003]

【発明が解決しようとする課題】本発明は、上記の欠点
を解消するためなされたもので、薄肉部の充填性に優
れ、ボイド等の欠陥の発生がなく、強靭化により耐クラ
ック性に優れ、耐湿性等の信頼性にも優れたエポキシ樹
脂組成物、またそれにより絶縁・封止したインダクタン
ス部品および半導体封止装置を提供しようとするもので
ある。
DISCLOSURE OF THE INVENTION The present invention has been made to solve the above-mentioned drawbacks, and is excellent in the filling property of a thin portion, has no defects such as voids, and has excellent crack resistance due to toughness. Another object of the present invention is to provide an epoxy resin composition excellent in reliability such as moisture resistance and the like, and an insulated and sealed inductance component and a semiconductor sealing device.

【0004】[0004]

【課題を解決するための手段】本発明者は、上記の目的
を達成しようと鋭意研究を重ねた結果、液状エポキシ樹
脂に無機質充填剤を配合し、必要に応じて反応性希釈
剤、消泡剤、沈降防止剤、着色剤などを配合した樹脂成
分を、水素化メチルナジック酸硬化剤とイミダゾール系
硬化促進剤からなる液状硬化剤成分を用いて硬化させる
ことによって、上記の目的が達成されることを見いだ
し、本発明を完成したものである。
Means for Solving the Problems The present inventors have conducted intensive studies to achieve the above object, and as a result, mixed an inorganic filler with a liquid epoxy resin, and if necessary, a reactive diluent and a defoamer. The above object is achieved by curing a resin component containing an agent, an antisettling agent, a colorant, and the like, using a liquid curing agent component comprising a hydrogenated methyl nadic acid curing agent and an imidazole-based curing accelerator. Thus, the present invention has been completed.

【0005】即ち、本発明は、(A)必要に応じ反応性
希釈剤を配合した液状エポキシ樹脂と(B)無機質充填
剤とを含む樹脂成分に、(C)硬化剤として水素化メチ
ルナジック酸もしくはその無水物と(D)液状硬化促進
剤としてイミダゾール系化合物とを含む硬化剤成分を混
合した、二液性電気絶縁材料であることを特徴とするエ
ポキシ樹脂組成物である。また、別の本発明は、そのエ
ポキシ樹脂組成物の注型物、硬化物によって、コイル、
半導体チップが絶縁、封止されることを特徴とするイン
ダクタンス部品、半導体封止装置である。
That is, the present invention relates to a resin component containing (A) a liquid epoxy resin containing a reactive diluent as required and (B) an inorganic filler, and (C) hydrogenated methyl nadic acid as a curing agent. Alternatively, the epoxy resin composition is a two-part electrically insulating material obtained by mixing a curing agent component containing an anhydride thereof and (D) an imidazole-based compound as a liquid curing accelerator. Further, another invention is a cast product of the epoxy resin composition, a cured product, a coil,
An inductance component and a semiconductor sealing device, wherein a semiconductor chip is insulated and sealed.

【0006】以下、本発明を詳細に説明する。Hereinafter, the present invention will be described in detail.

【0007】本発明に用いる(A)エポキシ樹脂として
は、その分子中にエポキシ基を少なくとも2 個以上有す
る化合物である限り、分子構造、分子量等に制限される
ことなく一般に使用されているものを広く使用すること
ができる。
[0007] As the epoxy resin (A) used in the present invention, those generally used without being limited by the molecular structure, molecular weight, etc., as long as the compound has at least two epoxy groups in the molecule. Can be widely used.

【0008】例えば、エポキシノボラック型、ビフェニ
ル型の芳香族系、シクロヘキサン誘導体等の脂環族系、
さらに、次の一般式で示されるビスフェノールA型エポ
キシ樹脂が挙げられる。
For example, epoxy novolak type, biphenyl type aromatic systems, alicyclic systems such as cyclohexane derivatives, etc.
Further, a bisphenol A type epoxy resin represented by the following general formula may be mentioned.

【0009】[0009]

【化1】 (但、式中、nは0 以上の整数を表す) こられのエポキシ樹脂は、単独又は2 種以上混合して使
用することができる。これらのエポキシ樹脂は、反応性
希釈剤を加えずにあるいは加え、液状エポキシ樹脂とし
て用いる。
Embedded image (In the formula, n represents an integer of 0 or more.) These epoxy resins can be used alone or in combination of two or more. These epoxy resins are used as liquid epoxy resins without or with the addition of reactive diluents.

【0010】本発明に用いる(B)無機充填剤として
は、一般に使用されているものが広く使用される。具体
的には、例えば、シリカ粉末、アルミナ、三酸化アンチ
モン、タルク、炭酸カルシウム、チタンホワイト、クレ
ー、ベンガル、ガラス繊維、炭素繊維等が挙げられ、特
にシリカ粉末およびアルミナが好ましく使用される。無
機充填剤の配合割合は、全体の樹脂組成物に対して25〜
95重量%含有するように配合することが好ましい。その
割合が25重量%未満では、樹脂組成物の吸湿性が高く、
耐湿性に劣り、また95重量%を超えると極端に流動性が
悪くなり、成形性に劣り好ましくない。
As the inorganic filler (B) used in the present invention, those generally used are widely used. Specifically, for example, silica powder, alumina, antimony trioxide, talc, calcium carbonate, titanium white, clay, bengal, glass fiber, carbon fiber and the like can be mentioned, and silica powder and alumina are particularly preferably used. The mixing ratio of the inorganic filler is 25 to the entire resin composition.
It is preferable to mix so as to contain 95% by weight. If the proportion is less than 25% by weight, the hygroscopicity of the resin composition is high,
Moisture resistance is inferior, and if it exceeds 95% by weight, fluidity extremely deteriorates and moldability is inferior, which is not preferable.

【0011】(A)の液状エポキシ樹脂と(B)無機質
充填剤を含む樹脂成分は、(A)成分と(B)成分とを
加熱混合されるが、本発明の目的に反しない限度におい
て、また必要に応じて、例えば脂環式エポキシ等の反応
性希釈剤、シリコーン類等の消泡剤およびシランカップ
リング剤、又は種々の沈降防止剤、カーボンブラック等
の着色剤等を適宜、追加配合することができる。
The resin component (A) containing the liquid epoxy resin and the resin component (B) containing the inorganic filler is prepared by heating and mixing the components (A) and (B). Also, if necessary, a reactive diluent such as an alicyclic epoxy, an antifoaming agent such as silicones and a silane coupling agent, or various anti-settling agents, a coloring agent such as carbon black, etc. may be appropriately added. can do.

【0012】本発明に用いる(C)水素化メチルナジッ
ク酸硬化剤としては、メチルナジック酸の水素化物およ
び/もしくはメチルナジック酸無水物の水素化物であっ
て、その分子量、酸無水物当量については特に限定され
るものではなく、次の一般式に示されるものが最適であ
る。
The (C) hydrogenated methyl nadic acid curing agent used in the present invention is a hydride of methyl nadic acid and / or a hydride of methyl nadic anhydride, and its molecular weight and acid anhydride equivalent are as follows. There is no particular limitation, and the one represented by the following general formula is optimal.

【0013】[0013]

【化2】 なお、この水素化メチルナジック酸硬化剤には、メチル
テトラヒドロフタル酸無水物等の他の酸無水物硬化剤を
併用することができる。
Embedded image The hydrogenated methyl nadic acid curing agent may be used in combination with another acid anhydride curing agent such as methyl tetrahydrophthalic anhydride.

【0014】本発明に用いる(D)イミダゾール系化合
物からなる液状硬化促進剤としては、エポキシ樹脂同
士、またはエポキシ樹脂と(C)水素化メチルナジック
酸無水物硬化剤との反応を促進するために用いられるも
のであれば、いかなるものであってもよい。硬化促進剤
の具体例を例示すると、例えば、2-メチルイミダゾー
ル、2-ウンデシルイミダゾール、2-ヘプタデシルイミダ
ゾール、1,2-ジメチルイミダゾール、2-エチル-4- メチ
ルイミダゾール、2-フェニルイミダゾール、2-フェニル
-4- メチルイミダゾール等が挙げられる。これらの硬化
剤のうちでも、樹脂組成物の成形性(注型性)、硬化物
の耐熱性を考慮して下記の式に示される1-ベンジル-2-
メチルイミダゾール等が好ましく用いられる。
The liquid curing accelerator (D) comprising an imidazole compound used in the present invention may be used for accelerating the reaction between epoxy resins or between the epoxy resin and (C) hydrogenated methylnadic anhydride curing agent. Any material may be used as long as it is used. Illustrative examples of the curing accelerator include, for example, 2-methylimidazole, 2-undecylimidazole, 2-heptadecylimidazole, 1,2-dimethylimidazole, 2-ethyl-4-methylimidazole, 2-phenylimidazole, 2-phenyl
-4-methylimidazole and the like. Among these curing agents, 1-benzyl-2- represented by the following formula in consideration of the moldability (castability) of the resin composition and the heat resistance of the cured product.
Methyl imidazole and the like are preferably used.

【0015】[0015]

【化3】 Embedded image

【0016】本発明のエポキシ樹脂組成物を注型、成形
材料として調製する場合の一般的方法は、前述した特定
のエポキシ樹脂、無機質充填剤、その他の成分を配合
し、ミキサー等によって十分均一に加熱混合した樹脂成
分と、水素化メチルナジック酸硬化剤とイミダゾール系
化合物からなる液状硬化促進剤をミキサー等によって十
分均一に加熱混合した硬化剤成分とを2 液性成分とし、
これらを使用前に混合して注型、成形材料とすることが
できる。こうして得られた注型、成形材料は、コイル注
型、半導体素子の成形をはじめとする電気部品あるいは
電子部品の封止、被覆、絶縁等に適用すれば優れた特性
と信頼性を付与させることができる。
A general method for preparing the epoxy resin composition of the present invention as a casting or molding material is to mix the above-mentioned specific epoxy resin, inorganic filler and other components, and to make the mixture sufficiently uniform with a mixer or the like. The resin component mixed by heating and the hardener component obtained by heating and mixing the liquid hardening accelerator composed of the hydrogenated methyl nadic acid hardener and the imidazole compound sufficiently uniformly with a mixer or the like as a two-component component,
These can be mixed before use to form a casting or molding material. The casting and molding materials obtained in this way can provide excellent properties and reliability when applied to sealing, coating, insulation, etc. of electric or electronic components such as coil casting and molding of semiconductor elements. Can be.

【0017】注型、成形の一般的な方法としては、真空
注型があるが、特定のエポキシ樹脂、無機充填剤その他
の成分を配合し、ミキサー等によって十分均一に加熱混
合した樹脂成分と水素化メチルナジック酸硬化剤とイミ
ダゾール系化合物からなる液状硬化促進剤をミキサー等
によって十分均一に加熱混合した硬化剤成分との2 つの
樹脂成分を予め混合しておくことにより、射出成形、圧
縮成形等、その他の方法による注型、成形も可能であ
る。これら注型、成形法により封止後、加熱して硬化さ
せ、最終的にはこの硬化物によって封止されたコイル注
型物、半導体封止装置が得られる。
As a general method of casting and molding, there is a vacuum casting. A resin component mixed with a specific epoxy resin, an inorganic filler and other components, and heated and mixed sufficiently uniformly with a mixer or the like is mixed with hydrogen. Injection molding, compression molding, etc. by mixing in advance two resin components, a hardening agent component obtained by heating and mixing a liquid curing accelerator consisting of a methylated nadic acid curing agent and an imidazole-based compound sufficiently uniformly with a mixer or the like. Casting and molding by other methods are also possible. After sealing by these casting and molding methods, the mixture is heated and cured, and finally, a coil casting and a semiconductor sealing device sealed with the cured product are obtained.

【0018】[0018]

【作用】本発明のエポキシ樹脂組成物は、特定の水素化
メチルナジック酸硬化剤を用いることにより、樹脂組成
物の薄肉部の充填性に優れ、ボイド等の欠陥の発生がな
く、強靭化により耐クラック性に優れ、耐湿性等の信頼
性に優れたコイル注型、半導体封止等に好適な耐クラッ
ク性に優れたエポキシ樹脂組成物を提供できる。
The epoxy resin composition of the present invention, by using a specific hydrogenated methyl nadic acid curing agent, has excellent filling properties in the thin portion of the resin composition, does not generate defects such as voids, and has a high toughness. An epoxy resin composition having excellent crack resistance and excellent crack resistance suitable for coil casting, semiconductor encapsulation, etc., having excellent reliability such as moisture resistance can be provided.

【0019】[0019]

【発明の実施の形態】次に、実施例を示して本発明の効
果を具体的に説明するが、本発明はこれらの実施例によ
って限定されるものではない。
Next, the effects of the present invention will be described specifically with reference to examples, but the present invention is not limited to these examples.

【0020】実施例1 エポキシ樹脂(エポキシ当量190 ) 100重量部、溶融シ
リカ粉末 220重量部、シリコーン系消泡剤 0.1重量部お
よびシランカップリング剤 0.3重量部をミキサーに投入
し、70℃で加熱混合してエポキシ樹脂成分とした。別に
水素化メチルナジック酸硬化剤(無水物当量 183)90重
量部と1-ベンジル−2-メチルイミダゾール0.7 重量部を
ミキサーに投入し、70℃で加熱混合して硬化剤成分とし
た。
Example 1 100 parts by weight of an epoxy resin (epoxy equivalent: 190), 220 parts by weight of fused silica powder, 0.1 part by weight of a silicone-based defoamer and 0.3 part by weight of a silane coupling agent were put into a mixer and heated at 70 ° C. The mixture was mixed to form an epoxy resin component. Separately, 90 parts by weight of a hydrogenated methyl nadic acid curing agent (anhydride equivalent: 183) and 0.7 part by weight of 1-benzyl-2-methylimidazole were charged into a mixer, and heated and mixed at 70 ° C. to obtain a curing agent component.

【0021】上記のエポキシ樹脂成分と硬化剤成分を混
合し、実施例1のエポキシ樹脂組成物を得た。
The epoxy resin component and the curing agent component were mixed to obtain an epoxy resin composition of Example 1.

【0022】実施例2〜4 表1に示した組成を70℃で加熱混合し、エポキシ樹脂成
分と硬化剤成分を得た。実施例1と同様にして表1に示
したエポキシ樹脂成分と硬化剤成分を混合し、実施例2
〜4のエポキシ樹脂組成物を得た。
Examples 2 to 4 The compositions shown in Table 1 were heated and mixed at 70 ° C. to obtain an epoxy resin component and a curing agent component. The epoxy resin component and the curing agent component shown in Table 1 were mixed in the same manner as in Example 1, and
~ 4 epoxy resin compositions were obtained.

【0023】比較例1〜3 表1に示した組成を実施例と同様に70℃で加熱混合し、
エポキシ樹脂成分と硬化剤成分を混合し、比較例1〜3
のエポキシ樹脂組成物を得た。
Comparative Examples 1 to 3 The compositions shown in Table 1 were mixed by heating at 70 ° C. in the same manner as in the Examples.
Mixing the epoxy resin component and the curing agent component, Comparative Examples 1-3
Was obtained.

【0024】前記で得た組成物を真空下、70℃の条件下
でコイル注入し、次いで110 ℃で3時間、さらに150 ℃
で5 時間、後硬化させた。これらのエポキシ樹脂組成物
について諸試験を行ったので、その結果を表2に示し
た。また、同様に半導体素子を同樹脂で同硬化条件で封
止して、125 ℃,2.3 atm,500 時間後において半導
体素子のアルミニウム配線の腐食による断線を発生した
ICの不良個数をカウントして記述した。その結果も併
せて表2に示した。本発明のエポキシ樹脂組成物は、耐
クラック性等に優れており、本発明の顕著な効果を確認
することができた。
The composition obtained above was coil-injected under vacuum at 70 ° C., then at 110 ° C. for 3 hours, and further at 150 ° C.
For 5 hours. Various tests were performed on these epoxy resin compositions, and the results are shown in Table 2. Similarly, the semiconductor element is sealed with the same resin under the same curing conditions, and the number of defective ICs that have broken due to the corrosion of the aluminum wiring of the semiconductor element after 125 hours at 2.3 atm and 500 hours is counted and described. did. The results are also shown in Table 2. The epoxy resin composition of the present invention was excellent in crack resistance and the like, and the remarkable effect of the present invention could be confirmed.

【0025】[0025]

【表1】 *1 :エポキシ当量190 *2 :酸無水物当量183 *3 :Me−THPA *4 :HHPA *5 :Me−HHPA[Table 1] * 1: Epoxy equivalent 190 * 2: Acid anhydride equivalent 183 * 3: Me-THPA * 4: HHPA * 5: Me-HHPA

【0026】[0026]

【表2】 *1 :コイル含浸性については、フライバックトランスに注入し、硬化条件110 ℃で3 時間、さらに150 ℃で5 時間で、後硬化させ、コイルの切断面を顕微鏡で 観察した。含浸率95%以上を含浸性良好、95%未満を含浸性不良と判定した。ボ イド欠陥数については、含浸性を判定したときのボイド欠陥数をカウントして個 数を記述した。 *2 :ブリキ製シヤーレ(直径5 cm×高さ1.5 cm)にボルトナットワッシャ ーをインサートして注形し、高温(130 ℃)、低温(−60℃)各30分の冷熱サイ クルを200 回与え、各試験物に発生したクラックの長さを測定した。 *3 :PCT(125 ℃/2.3atm/24H )に直径50mm、厚さ3 mmの硬化物を入 れ、24時間後の重量変化から吸水率を算出した。 *4 :アルミニウム配線を施した半導体集積回路素子を銅フレームに接着し、11 0 ℃で3 時間、さらに150 ℃で5 時間、後硬化させて、125 ℃,2.3 atmの飽 和水蒸気中でPCT(プレッシャークッカーテスト)を500 時間行い、アルミニ ウム配線の腐食によるICの不良個数をカウントして記述した。[Table 2] * 1: Regarding coil impregnation, the resin was injected into a flyback transformer, post-cured at 110 ° C for 3 hours and further at 150 ° C for 5 hours, and the cut surface of the coil was observed with a microscope. An impregnation rate of 95% or more was judged as good impregnation, and an impregnation rate of less than 95% was judged as poor impregnation. Regarding the number of void defects, the number was described by counting the number of void defects when the impregnation was determined. * 2: Insert a bolt and nut washer into a tin plate shear (5 cm in diameter x 1.5 cm in height) and cast it. 200 cycles of 30 minutes each of high temperature (130 ° C) and low temperature (-60 ° C) for 200 minutes. The test pieces were applied once, and the length of cracks generated in each specimen was measured. * 3: A cured product having a diameter of 50 mm and a thickness of 3 mm was put into PCT (125 ° C / 2.3atm / 24H), and the water absorption was calculated from the weight change after 24 hours. * 4: A semiconductor integrated circuit device with aluminum wiring is bonded to a copper frame and post-cured at 110 ° C for 3 hours and then at 150 ° C for 5 hours. PCT in saturated steam at 125 ° C and 2.3 atm. (Pressure cooker test) was performed for 500 hours, and the number of defective ICs due to corrosion of aluminum wiring was counted and described.

【0027】[0027]

【発明の効果】以上の説明および表2から明らかなよう
に、本発明のエポキシ樹脂組成物は、薄肉部の充填性に
優れ、ボイド等の欠陥の発生がなく、強靭化により耐ク
ラック性に優れ、耐湿性等の信頼性に優れたコイル注
型、半導体封止等に好適な耐クラック性に優れたエポキ
シ樹脂組成物である。
As apparent from the above description and Table 2, the epoxy resin composition of the present invention is excellent in the filling property of a thin portion, has no defects such as voids, and has a crack resistance due to toughness. It is an epoxy resin composition having excellent crack resistance suitable for coil casting, semiconductor encapsulation, etc., which is excellent in reliability such as moisture resistance.

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 FI テーマコート゛(参考) H01L 23/29 H01L 23/30 R 23/31 Fターム(参考) 4J002 CD021 CD051 CD061 DA016 DE116 DE126 DE136 DE146 DE236 DJ016 DJ036 DJ046 DL006 EL137 EU118 FA046 FD016 GQ01 GQ05 4J036 AD07 AD08 AF06 AJ08 DB15 DB18 DB21 DC41 FA01 FA03 FA05 JA07 4M109 AA01 CA01 EA02 EB02 EB12 EC01 EC03 EC05 EC07 GA10 5G305 AA07 AA13 AA20 AB15 AB24 AB26 AB36 BA07 BA15 CA15 CB13 CB15 CC02 CC11 CD01 CD08 ──────────────────────────────────────────────────続 き Continued on the front page (51) Int.Cl. 7 Identification symbol FI Theme coat ゛ (Reference) H01L 23/29 H01L 23/30 R 23/31 F term (Reference) 4J002 CD021 CD051 CD061 DA016 DE116 DE126 DE136 DE146 DE236 DJ016 DJ036 DJ046 DL006 EL137 EU118 FA046 FD016 GQ01 GQ05 4J036 AD07 AD08 AF06 AJ08 DB15 DB18 DB21 DC41 FA01 FA03 FA05 JA07 4M109 AA01 CA01 EA02 EB02 EB12 EC01 EC03 EC05 EC07 GA10 5G305 AA07 AA13 ABA20 AB15 AB15 AB24 AB15 AB24 CD08

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 (A)必要に応じ反応性希釈剤を配合し
た液状エポキシ樹脂と(B)無機質充填剤とを含む樹脂
成分に、(C)硬化剤として水素化メチルナジック酸も
しくはその無水物と(D)液状硬化促進剤としてイミダ
ゾール系化合物とを含む硬化剤成分を混合した、二液性
電気絶縁材料であることを特徴とするエポキシ樹脂組成
物。
1. A resin component containing (A) a liquid epoxy resin containing a reactive diluent as required and (B) an inorganic filler, and (C) hydrogenated methylnadic acid or an anhydride thereof as a curing agent. And (D) a curing agent component containing an imidazole compound as a liquid curing accelerator, wherein the epoxy resin composition is a two-part electrically insulating material.
【請求項2】 請求項1記載のエポキシ樹脂組成物の注
型物よって、コイルが絶縁されたことを特徴とするイン
ダクタンス部品。
2. An inductance component, wherein the coil is insulated by the casting of the epoxy resin composition according to claim 1.
【請求項3】 請求項1記載のエポキシ樹脂組成物の硬
化物によって、半導体チップが封止されたことを特徴と
する半導体封止装置。
3. A semiconductor sealing device, wherein a semiconductor chip is sealed with a cured product of the epoxy resin composition according to claim 1.
JP27052298A 1998-09-08 1998-09-08 Epoxy resin composition, inductance component Expired - Fee Related JP3705704B2 (en)

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Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003026771A (en) * 2001-07-23 2003-01-29 Fujitsu Ltd Epoxy sealing resin composition
JP2003026763A (en) * 2001-07-13 2003-01-29 New Japan Chem Co Ltd Epoxy resin composition
JP2003026766A (en) * 2001-07-13 2003-01-29 New Japan Chem Co Ltd Epoxy-based reactive diluent and liquid epoxy resin composition containing the same
CN100355851C (en) * 2004-05-27 2007-12-19 哈尔滨工程大学 Epoxy resin pouring sealant
WO2011090038A1 (en) * 2010-01-21 2011-07-28 積水化学工業株式会社 Thermosetting resin composition, flip-chip mounting adhesive, semiconductor device fabrication method, and semiconductor device
JP2015131915A (en) * 2014-01-14 2015-07-23 ソマール株式会社 Two-pack type epoxy resin composition and method for producing case mold type capacitor
CN111944270A (en) * 2019-05-16 2020-11-17 衡所华威电子有限公司 Epoxy resin composition, process for producing the same and use thereof

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JPH0476020A (en) * 1990-07-17 1992-03-10 New Japan Chem Co Ltd Epoxy resin composition
JPH07316263A (en) * 1994-05-23 1995-12-05 New Japan Chem Co Ltd Epoxy resin composition
JPH10218975A (en) * 1997-02-12 1998-08-18 Asahi Chem Ind Co Ltd Curable resin composition

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0395215A (en) * 1989-01-10 1991-04-19 New Japan Chem Co Ltd Curing agent composition for epoxy rein and epoxy resin composition containing same
JPH0476020A (en) * 1990-07-17 1992-03-10 New Japan Chem Co Ltd Epoxy resin composition
JPH07316263A (en) * 1994-05-23 1995-12-05 New Japan Chem Co Ltd Epoxy resin composition
JPH10218975A (en) * 1997-02-12 1998-08-18 Asahi Chem Ind Co Ltd Curable resin composition

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003026763A (en) * 2001-07-13 2003-01-29 New Japan Chem Co Ltd Epoxy resin composition
JP2003026766A (en) * 2001-07-13 2003-01-29 New Japan Chem Co Ltd Epoxy-based reactive diluent and liquid epoxy resin composition containing the same
JP2003026771A (en) * 2001-07-23 2003-01-29 Fujitsu Ltd Epoxy sealing resin composition
CN100355851C (en) * 2004-05-27 2007-12-19 哈尔滨工程大学 Epoxy resin pouring sealant
WO2011090038A1 (en) * 2010-01-21 2011-07-28 積水化学工業株式会社 Thermosetting resin composition, flip-chip mounting adhesive, semiconductor device fabrication method, and semiconductor device
US20120326301A1 (en) * 2010-01-21 2012-12-27 Sekisui Chemical Co., Ltd. Thermosetting resin composition, flip-chip mounting adhesive, semiconductor device fabrication method, and semiconductor device
JP5130397B2 (en) * 2010-01-21 2013-01-30 積水化学工業株式会社 Thermosetting resin composition, pre-applied flip chip mounting adhesive, method for manufacturing semiconductor device, and semiconductor device
TWI499610B (en) * 2010-01-21 2015-09-11 Sekisui Chemical Co Ltd Heat-curable resin composition with adhesive flip chip package, a method of manufacturing a semiconductor device, and semiconductor device
JP2015131915A (en) * 2014-01-14 2015-07-23 ソマール株式会社 Two-pack type epoxy resin composition and method for producing case mold type capacitor
CN111944270A (en) * 2019-05-16 2020-11-17 衡所华威电子有限公司 Epoxy resin composition, process for producing the same and use thereof
CN111944270B (en) * 2019-05-16 2024-02-02 衡所华威电子有限公司 Epoxy resin composition, method for producing the same and use thereof

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