CN201097111Y - Reticle pod and reticle pod transfer box - Google Patents

Abstract

The utility model discloses a photomask box for particle causes the pollution to the photomask in avoiding the environment, and prevents the electrostatic discharge destruction that the charge accumulation produced. The mask box is composed of two cover bodies; at least one of the cover bodies is made of a polymer material doped with metal, and the metal can be stainless steel wires, conductive metal wires or metal particles.

Description

Reticle Pod and Reticle Transfer Box

technical field

The utility model relates to a photomask box, in particular to a photomask box capable of preventing electrostatic discharge damage.

Background technique

The rapid development of modern semiconductor technology, in which optical lithography (Optical Lithography) plays an important role, as long as it is about the definition of graphics (pattern), it needs to rely on optical lithography.

In the application of optical lithography technology to semiconductors, the designed circuit is manufactured into a light-transmitting photo mask with a specific shape. Using the principle of exposure, the light source is projected onto the silicon wafer through the mask to expose and display specific patterns. Because any dust particles (such as particles, dust or organic matter) attached to the mask will cause the quality of projection imaging to deteriorate, the mask used to generate graphics must be kept absolutely clean, so in the general wafer manufacturing process, it provides no Clean room environment to avoid airborne particle contamination. However, the current clean room cannot achieve an absolutely dust-free state. Modern semiconductor manufacturing processes use anti-pollution reticle pods for storage and transportation of reticle to keep the reticle clean.

The known photomask boxes are mostly made of polymer materials, which have the advantages of easy molding, low cost and the ability to form transparent bodies. This kind of polymer material with high insulation resistance is easy to generate static electricity due to friction or separation, especially the working environment in a clean room needs to maintain low humidity, so the photomask pod made of polymer material is very easy to generate and accumulate charges. The static electricity on the surface of the photomask is easy to attract the pollution particles in the air, what's more, it will cause electrostatic discharge (ESD) effect on the metal lines on the photomask. The instantaneous current generated by electrostatic discharge will cause spark or arc. When the spark and arc occur, the strong current is accompanied by high temperature, which leads to the oxidation and dissolution of the metal wire, thus changing the photomask. pattern.

At present, there are many solutions to electrostatic discharge. The first is to improve the working environment, maintain proper humidity in the air, wear clothes with a grounding effect, or use ion fans to eliminate static electricity in the environment. However, there are many unpredictable variables that change the working environment, and there is no way to completely solve the damage of static electricity to the photomask.

Another method is to change the material of the components of the pod. US Patent No. 6,513,654 proposes to set up a photomask support with a grounding function. When the photomask is in contact with the matching machine, the photomask support can Charge derivation on the mask. In addition, US Pat. No. 6,247,599 proposes to add a conductive plate to the chassis, cover or handle of the pod to reduce the accumulation of charges. However, the above methods all rely on the discharge of electric charges when the conductive element is grounded, and such methods still cannot solve the charge accumulation effect of the reticle pod.

If the material of the photomask pod is changed to a conductive material, a way to dissipate static electricity can be provided. However, changing the material of the photomask box to a metal-like conductive material must also modify the matching machine interface, resulting in a problem of a large increase in cost.

In view of the above deficiencies, the photomask pod provided by the present invention is an improvement on the prior art.

Utility model content

Based on solving the deficiency of the above-mentioned prior art, the photomask box provided by the utility model is to use metal doped with polymer material as the material of the photomask box, even if the polymer material will generate charges due to friction, the nearby The metal material will immediately export the charge to avoid charge accumulation and electrostatic discharge effect.

The main purpose of the present utility model is to provide a photomask box, which can reduce the accumulation of charges and prevent damage to the photomask caused by static electricity.

Another object of the present utility model is to provide a photomask box whose composition material has metal doped with polymer material. This material has the advantages of both polymer and metal, and has low cost, easy molding, and The effect of forming a light-transmitting material.

Another object of the present invention is to provide a photomask pod, which is composed of metal-doped polymer material, which can continuously lead out electric charge and avoid high-temperature damage to the photomask caused by instantaneous discharge.

Description of drawings

Fig. 1 is a sectional view of a photomask box according to a preferred embodiment of the present invention;

Fig. 2 is a sectional view of a photomask box in another preferred embodiment of the present invention;

FIG. 3 is a cross-sectional view of a pod in another preferred embodiment of the present invention.

Description of main component marking

100 photomask box 110 first cover

120 second cover body 200 mask box

210 first cover body 220 second cover body

300 mask box 310 top cover

320 base 330 mask

340 conductive plate

Detailed ways

Since the present invention discloses a photomask pod, some of the basic elements used therein and their connection with each other have been disclosed in detail in the background art, so the description below will not be fully described. Meanwhile, those skilled in the art can easily understand the main structural principles of the photomask pod, and will not repeat them here. However, the accompanying drawings hereinafter are for the purpose of expressing the structural representations related to the features of the present utility model, and do not need to be completely drawn according to the actual size, so they will be described first.

Referring to FIG. 1 , according to a preferred embodiment of the present invention, a pod 100 is provided. The pod 100 can be a photomask storage box or a photomask transfer box. The pod 100 includes a first cover 110 and a The second cover 120 ; wherein the material forming the first cover 110 is a polymer material doped with metal, and the metal can be stainless steel wire, conductive metal wire or metal particles.

Referring to FIG. 2 , according to another preferred embodiment of the present invention, in order to provide a pod 200, the pod 200 can be a pod storage box or a pod transfer box, and the pod 200 includes a first cover 210 and the second cover 220; wherein the material forming the second cover 220 is a polymer material doped with metal, and the metal can be stainless steel wire, conductive metal wire or metal particles.

Referring to FIG. 3 , according to another preferred embodiment of the present invention, in order to provide a pod 300 , the pod 300 can be a photomask storage box or a photomask transfer box, and the pod 300 includes a base 320 and a The top cover 310, the base 320 is made of metal, stainless steel or polymer material, the base 320 and the top cover 310 are combined into an inner space, which can accommodate at least one photomask 330; at least one of the top cover 310 or the base 320 The forming material is a polymer material doped with metal, and the metal can be stainless steel wire, conductive metal wire or metal particles; in addition, a conductive plate 340 is provided, and the conductive plate 340 is made of metal, and is located on the side of the base 320 facing the top cover 310 The upper surface is in electrical communication with the top cover 310 .

The material formed by doping the polymer material with metal in the foregoing embodiments preferably has a surface impedance range of about 10 ³ -10 ⁹ ohms/sq per square centimeter.

To sum up, the photomask pod of the present invention is composed of metal doped with polymer material. This material has the advantages of both polymer and metal, and can continuously lead out the charge, avoiding the generation of instantaneous discharge on the photomask. Heat damage. The utility model can also achieve the effects of low cost, easy molding, and the ability to form light-transmitting materials.

Above, the utility model has been clearly stated through the embodiments and related drawings. However, those skilled in the art should understand that the various embodiments of the present utility model are only illustrative rather than restrictive, that is, the above-mentioned and The variations and amendments of each component are covered by the present invention. Accordingly, the invention is defined by the claims.

Claims (9)

1. box for photomask comprises:

First lid; And

Second lid is combined to form the inner space with first lid, can ccontaining at least one light shield, and the material that it is characterized in that wherein forming this first or second lid is the macromolecule material doping metals.

2. box for photomask according to claim 1 is characterized in that this metal is to mix this macromolecule material with the tinsel form.

3. box for photomask according to claim 1 is characterized in that this metal is to mix this macromolecule material with the metal particle form.

4. box for photomask according to claim 1 is characterized in that this metal is a stainless steel.

5. box for photomask according to claim 1 is characterized in that the surface impedance of this macromolecule material doping metals is about 10 ³-10 ⁹Ohm/sq.

6. a light shield transmits box; Comprise:

Pedestal; And

Top cover forms the inner space with this base combination, and this inner space can ccontaining at least one light shield, it is characterized in that the material of this top cover wherein or pedestal is the macromolecule material doping metals.

7. light shield according to claim 6 transmits box, it is characterized in that also comprising current-carrying plate, is located at this pedestal in opposite directions in the presumptive area of this top cover upper surface.

8. light shield according to claim 7 transmits box, it is characterized in that this top cover and this current-carrying plate electrically connect.

9. light shield according to claim 6 transmits box, it is characterized in that metal is to mix this macromolecule material with the tinsel form.

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