CN204178344U - Embedded touch display panel structure with induction electrodes connected by conducting wires - Google Patents

Abstract

An in-cell touch display panel structure in which sensing electrodes are connected with conductive lines includes an upper substrate, a lower substrate, a display material layer, and a wiring layer of sensing electrodes. The upper substrate and the lower substrate are arranged in parallel pairs with the display material layer sandwiched therebetween. The wiring layer of the sensing electrode is composed of a plurality of wiring conductor lines, and a plurality of sensing electrodes are planted on a light-shielding sensing electrode layer or a sensing electrode layer, wherein each sensing electrode has at least one wiring conductor line and The positions of the plurality of routing conductor lines are set corresponding to the positions of the light-shielding lines of the light-shielding layer.

Description

In-cell touch display panel structure with conductive wires connecting sensing electrodes

technical field

The utility model relates to a structure of a display screen with a touch panel, in particular to an embedded touch display panel structure in which conductive wires are used to connect sensing electrodes.

Background technique

The known touch-type flat-panel display is to directly stack the touch panel and the flat-panel display up and down, because the stacked touch panel is a transparent panel, so the image can pass through the superimposed touch panel to display the image. Then the touch panel is used as an input medium or interface. However, this known technology must increase the entire weight of a touch panel when stacking, so that the weight of the flat-panel display is greatly increased, which does not meet the current market requirements for light, thin, and short displays. When directly stacking the touch panel and the flat panel display, in terms of thickness, the thickness of the touch panel itself is increased, the light penetration rate is reduced, the reflectivity and haze are increased, and the quality of the screen display is greatly reduced.

To address the foregoing shortcomings, the touch-sensitive flat-panel display adopts embedded touch technology. The main development direction of embedded touch technology can be divided into two technologies: On-Cell and In-Cell. On-Cell technology is to make the sensing electrode (Sensor) of the projected capacitive touch technology on the back of the color filter (Color Filter, CF) of the panel (that is, attach the polarizer surface), and integrate it into a color filter structure . In-Cell technology is to put the sensing electrode (Sensor) into the structure of the LCD Cell. Currently, the main sensing methods used can be divided into three types: resistive (contact) sensing, capacitive sensing, and optical sensing. Among them, resistive sensing uses LCD The conduction of the upper and lower substrate electrodes of the Cell calculates the change of the partial pressure to determine the contact position coordinates. The On Cell Touch technology is to make the Sensor of the touch panel on the film, and then paste it on the glass of the uppermost upper substrate. .

Out Cell Touch technology refers to the touch panel that is installed outside the display panel. It is also the most common at present. There are resistive and capacitive technologies. They are usually manufactured by other touch panel manufacturers, and then combined with the display panel. Carry out lamination and assembly.

In Cell Touch technology is to integrate the touch components into the display panel, so that the display panel itself has touch function, so it does not need to be bonded or assembled with the touch panel. This technology is usually made by TFT LCD panel factory development.

However, regardless of In Cell Touch technology, On Cell Touch technology or Out Cell Touch technology, they all set the sensing electrode layer on the upper glass substrate or lower glass substrate of the LCD display panel, which not only increases the cost, but also increases the process procedure, which may easily lead to poor process The reduction of the efficiency and the soaring process cost, and the decrease of the aperture ratio requires a stronger backlight, which will also increase the power consumption, which is not conducive to the demand for thin and light mobile devices. Therefore, there is still room for improvement in the known capacitive touch panel technology.

Utility model content

The purpose of this utility model is to provide a built-in touch display panel structure with conductive wires connected to the sensing electrodes, which can greatly reduce the weight and thickness of the touch liquid crystal display panel, and at the same time greatly save material costs and improve the touch feeling Measured accuracy.

In order to achieve the above purpose, the utility model provides an embedded touch display panel structure with conductive wires connecting the sensing electrodes, including an upper substrate, a lower substrate, a light-shielding sensing electrode layer, a wiring layer of the sensing electrodes, and a Insulation. The upper substrate and the lower substrate are configured in parallel pairs to sandwich a display material layer between the two substrates. The light-shielding sensing electrode layer is located on the surface of the upper substrate and faces the display material layer. The light-shielding sensing electrode layer is composed of a plurality of light-shielding sensing lines, wherein part of the plurality of light-shielding sensing lines are patterned to form a plurality of sensing electrodes. . The routing layer of the sensing electrode is located on the surface of the light-shielding sensing electrode layer and faces the display material layer, and the routing layer of the sensing electrode is composed of a plurality of routing conductor lines. The insulating layer is located between the wiring layer of the sensing electrode and the light-shielding sensing electrode layer; wherein, each sensing electrode is connected with at least one wiring conductor line, and the positions of the plurality of wiring conductor lines are based on the light-shielding sensing electrode layer. The positions of the plurality of light-shielding lines on the light-shielding sensing electrode layer are arranged correspondingly.

The utility model also provides an embedded touch display panel structure with conductive wires connected to the sensing electrodes, including an upper substrate, a lower substrate, a light-shielding layer, a sensing electrode layer, an insulating layer, and a routing of the sensing electrodes. line layer. The upper substrate and the lower substrate are configured in parallel pairs to sandwich a display material layer between the two substrates. The light-shielding layer is located on the surface of the upper substrate and faces the display material layer, and the light-shielding layer is composed of a plurality of light-shielding lines. The sensing electrode layer is located on the surface of the light-shielding layer on the same side as the display material layer. The sensing electrode layer is composed of a plurality of conductor lines, and the plurality of conductor lines are patterned to form a plurality of sensing electrodes. The insulating layer is located on the surface of the sensing electrode layer facing the same side of the display material layer, the wiring layer of the sensing electrode is located on the surface of the insulating layer facing the same side of the display material layer, the wiring of the sensing electrode The layer is composed of a plurality of routing conductor lines; wherein, each sensing electrode is connected with at least one routing conductor line, and the positions of the plurality of routing conductor lines are based on the plurality of shading lines of the shading layer The corresponding position is set.

Description of drawings

FIG. 1 is a schematic diagram of stacking layers of an in-cell touch display panel structure in which conductive wires are used to connect sensing electrodes of the present invention.

FIG. 2 is a schematic diagram of a known light-shielding layer.

Fig. 3 is a schematic diagram of the light-shielding sensing electrode layer of the present invention.

FIG. 4 is another schematic diagram of the light-shielding sensing electrode layer of the present invention.

Fig. 5 is a schematic diagram of the sensing electrodes of the light-shielding sensing electrode layer of the present invention.

6A to 6F are process schematic diagrams of the present invention.

FIG. 7 is a schematic diagram of layer stacking according to another embodiment of the present invention.

FIG. 8 is a schematic view of another embodiment of the in-cell touch display panel structure of the present invention in which the conductive wires are used to connect the sensing electrodes.

FIG. 9 is a schematic diagram of another embodiment of the in-cell touch display panel structure of the present invention in which the sensing electrodes are connected by conductive wires.

Explanation of symbols in the attached drawings:

In-cell touch display panel structure 100 with conductive wires connecting sensing electrodes; upper substrate 110; lower substrate 120; display material layer 130; light-shielding sensing electrode layer 140; wiring layer 150 of sensing electrodes; insulating layer 160; color filter optical layer 170; thin film transistor layer 180; protective layer 190;

Shared electrode layer 200; first polarizing layer 210; second polarizing layer 220; thin film transistor 182; transparent electrode 181;

shading layer 500; shading lines 510; space 520;

The first group of light-shielding conductor lines 310; the second group of light-shielding conductor lines 320; polygonal areas 320-1-320-N; sensing electrodes 320-1-320-N; routing conductor lines 330, 330-1, 330-2, 330-3;

Through hole 52;

An in-cell touch display panel structure 700 in which the sensing electrodes are connected by conductive wires;

display material layer 230;

Cathode layer 270;

Anode layer 280;

Thin film transistor layer 290; pixel driving circuit 291; gate 2911; drain/source 2913; drain/source 2915;

Anode pixel electrode 281;

The hole transport sublayer 231; the light emitting layer 233; the electron transport sublayer 235;

An in-cell touch display panel structure 800 with conductive wires connecting the sensing electrodes; a light-shielding layer 840; a sensing electrode layer 810;

An in-cell touch display panel structure 900 in which the sensing electrodes are connected by conductive wires.

Detailed ways

For the structure of the in-cell touch display panel with conductive wires connected to the sensing electrodes of the present invention, please refer to the stacked layers of the in-cell touch display panel structure 100 of the present invention with conductive wires connected to the sensing electrodes shown in FIG. Schematic diagram, as shown in the figure, the in-cell touch display panel structure 100 with conductive wires connecting the sensing electrodes includes an upper substrate 110, a lower substrate 120, a display material layer 130, a light-shielding sensing electrode layer 140, and a sensing electrode The wiring layer 150, an insulating layer 160, a color filter layer 170, a thin film transistor layer 180, a protective layer 190, a common electrode (Vcom) layer 200, a first polarizer (upper polarizer) 210, a The second polarizer (lower polarizer) 220 .

The upper substrate 110 and the lower substrate 120 are preferably glass substrates, and the upper substrate 110 and the lower substrate 120 are arranged in parallel and sandwiched the display material layer 130 between the two substrates 110 , 120 .

The light-shielding sensing electrode layer 140 is located on the surface of the upper substrate 110 and faces the display material layer 130. The light-shielding sensing electrode layer 140 is composed of a plurality of light-shielding sensing lines, wherein part of the plurality of light-shielding sensing lines are formed after patterning. a plurality of sensing electrodes.

FIG. 2 is a schematic diagram of a generally known light-shielding layer. As shown in FIG. 2 , the known light-shielding layer 500 is composed of a plurality of light-shielding lines 510 formed of lines of opaque black insulating material, and the plurality of light-shielding lines 510 of the black insulating material are mutually perpendicularly distributed on the known light-shielding layer 500, Therefore, the known light-shielding layer 500 is also called a black matrix (BM). A color filter layer (color filter) 170 is distributed between the lines 520 of the black insulating material. What is shown in FIG. 2 is not the actual size and proportion of the shading lines 510 and the spaces 520 , and what is shown in FIG. 2 is only used to illustrate the technology of the present invention.

The utility model changes the known light-shielding layer 500 from an opaque black insulating material to a light-shielding conductive material, and forms a plurality of light-shielding induction lines after patterning the plurality of light-shielding induction lines in the known light-shielding layer 500. electrodes to form the light-shielding sensing electrode layer 140 of the present invention, and the wiring layer 150 of the sensing electrode is arranged on the surface of the light-shielding sensing electrode layer 140 facing the display material layer 130, and the plurality of light-shielding sensing electrode layers 140 The electrical signal induced by each sensing electrode is transmitted to a controller (not shown) through the wiring layer 150 of the sensing electrode to determine the touch position. A new sensing electrode layer is added to reduce costs, reduce process procedures, improve process yield and reduce process costs.

FIG. 3 is a schematic diagram of the light-shielding sensing electrode layer 140 of the present invention. As shown in FIG. 3 , the light-shielding sensing electrode layer 140 is composed of a plurality of light-shielding conductor lines. The plurality of light-shielding conductor lines of the light-shielding sensing electrode layer 140 are arranged in a first direction (X) and a second direction (Y). Wherein, the first direction is perpendicular to the second direction.

The plurality of light-shielding conductor lines of the light-shielding sensing electrode layer 140 are made of light-shielding conductive material. Wherein, the plurality of light-shielding conductor lines of the light-shielding sensing electrode layer 140 are made of black light-shielding conductive material.

The plurality of light-shielding conductor lines can be divided into a first group of light-shielding conductor lines 310 and a second group of light-shielding conductor lines 320 .

The second group of light-shielding conductor lines 320 forms N polygonal regions 320 - 1 - 320 -N, wherein N is a natural number. The light-shielding conductor lines in each polygonal area are electrically connected together, and any two polygonal areas are not connected, so that a single-layer sensing touch pattern is formed on the light-shielding sensing electrode layer (black matrix) 140 type structure. Wherein, the polygonal area (320-1～320-N) is one of the following shapes: rectangle, triangle, square, rhombus, hexagon, octagon, circle, radial shape, wedge shape and other polygons required for implementation . In this embodiment, the N polygonal areas are quadrilateral areas as an example.

FIG. 4 is another schematic diagram of the light-shielding sensing electrode layer 140 of the present invention. As shown in FIG. 4 , the first group of light-shielding conductor lines 310 and the second group of light-shielding conductor lines 320 are not connected. That is, the place where the first group of light-shielding conductor wires 310 and the second group of light-shielding conductor wires 320 should be connected is cut off. Therefore, the second group of light-shielding conductor lines 320 can form a single-layer sensing touch pattern structure on the light-shielding sensing electrode layer (black matrix). The place where the first group of light-shielding conductor lines 310 and the second group of light-shielding conductor lines 320 should be connected is not cut off firstly by producing the known light-shielding layer 500 as shown in FIG. During mask layout of the electrode layer 140, layout tools, such as Laker and Virtuso, are used to make the first group of light-shielding conductor lines 310 and the second group of light-shielding conductor lines 320 unconnected on the photomask. There is no new process in the display panel process.

As shown in FIG. 4 , the plurality of polygonal regions ( 320 - 1 - 320 -N) form a plurality of sensing electrodes ( 320 - 1 - 320 -N) of the light-shielding sensing electrode layer 140 . The plurality of sensing electrodes (320-1˜320-N) are arranged in a first direction and a second direction, and the first direction is substantially perpendicular to the second direction.

FIG. 5 is a schematic diagram of the sensing electrodes of the light-shielding sensing electrode layer 140 of the present invention. FIG. 5 is viewed from the lower substrate 120 toward the upper substrate 110 , that is, viewed from the known lower glass (lower substrate 120 ) toward the upper glass (upper substrate 110 ). As shown in FIG. 5 , the wiring layer 150 of the sensing electrode is located on the surface of the light-shielding sensing electrode layer 140 facing the same side of the display material layer 130 . There is an insulating layer 160 between the wiring layer 150 of the sensing electrode and the light-shielding sensing electrode layer 140 . The wiring layer 150 of the sensing electrode is composed of a plurality of wiring conductor lines 330 . Wherein, the positions of the plurality of routing conductor lines 330 are set corresponding to the positions of the plurality of light-shielding conductor lines of the light-shielding sensing electrode layer 140 .

The insulating layer 160 is located between the wiring layer 150 of the sensing electrode and the light-shielding sensing electrode layer 140 . As shown by ellipse A in FIG. 1 , the insulating layer 160 is filled with insulating material at the position where there is no trace conductor line 330 . As shown in ellipse B in Fig. 1, the insulation layer 160 is at the position where there is a conductor wire 330. Since the conductor wire 330 needs to be insulated from the sensing electrodes (320-1-320-N), the insulating layer 160 is filled with insulation. substance. As shown by ellipse C in FIG. 1 , the insulating layer 160 is left blank at the position where the wiring conductor line 330 is located, so that the wiring conductor line 330 and the sensing electrode can be connected to each other during the manufacturing process of the wiring layer 150 of the sensing electrode. 310 electrical connection. As shown by the ellipse D in FIG. 1 , since the light needs to pass through, this place is a red color filter layer (color filter) 170 .

The plurality of sensing electrodes (320-1-320-N) are N polygonal areas, and the polygonal areas of any two sensing electrodes (320-1-320-N) are not connected to each other, so that the light-shielding The sensing electrode layer 140 is formed with a single-layer sensing touch pattern structure, and N is an integer greater than 1. Each sensing electrode 310 is connected via at least one trace conductor line 330 , and the trace conductor lines 330 connected to different sensing electrodes 310 are not connected. Wherein, the plurality of routing conductor lines 330 of the routing layer 150 of the sensing electrode are made of conductive metal material or alloy material. Wherein, the metal conductive material is one of the following: chromium (Cr), barium (Ba), aluminum (Al), silver (Ag), copper (Cu), titanium (Ti), nickel (Ni), tantalum (Ta ), cobalt (Co), tungsten (W), magnesium (Mg), calcium (Ca), potassium (K), lithium (Li), indium (In), alloys with the above materials, lithium fluoride ( LiF), magnesium fluoride (MgF2), lithium oxide (LiO).

As shown in FIG. 5 , the routing conductor lines 330 , 330 - 1 and the sensing electrodes 320 , 320 - 1 are electrically connected through the gap of the insulating layer 160 , as shown by ellipse C in FIG. 1 . When the routing conductor lines 330, 330-1 go down through the sensing electrodes 320, 320-2, since the routing conductor lines 330, 330-1 and the sensing electrodes 320, 320-2 can conduct electricity, the routing conductors An insulating substance is provided between the wires 330, 330-1 and the sensing electrodes 320, 320-2, as shown by ellipse B in FIG. 1 . The rest can be understood in the same way. In FIG. 5 , the insulating layer 160 is not shown for the convenience of showing the routing conductor lines 330 , 330 - 1 and the sensing electrodes 320 , 320 - 2 .

6A to 6F are process schematic diagrams of the present invention. As shown in FIG. 6A , the light-shielding sensing electrode layer 140 is formed before the upper substrate 110 . At this time, due to the mask of the light-shielding sensing electrode layer 140, when forming the light-shielding sensing electrode layer 140, the first group of light-shielding conductor lines 310 and the second group of light-shielding conductor lines 320 are also formed at the same time, that is, a plurality of sensing conductor lines are simultaneously formed. Electrodes (320-1~320-N).

As shown in FIG. 6B , the insulating layer 160 is formed on the light-shielding sensing electrode layer 140 . Etching is then performed on the insulating layer 160 relative to the routing conductor lines 330 , as shown by ellipse C, to form vias 52 corresponding to the routing conductor lines 330 of the routing layer 150 in the insulating layer 160 . The through hole (via) 52 is the opening through the insulating layer 160 mentioned above.

As shown in FIG. 6C , on the insulating layer 160 , corresponding to the light-shielding lines of the light-shielding sensing electrode layer 140 , the wiring conductor lines 330 of the wiring layer 150 of the sensing electrodes are formed. As shown in FIG. 6C, when manufacturing the wiring conductor line 330, due to the presence of a through hole (via) 52 (vacancy of the insulating layer 160) at the ellipse C, the wiring conductor line 330 will be downward at the ellipse C. , and is electrically connected to the sensing electrode.

As shown in FIG. 6D , the color filter layer 180 is formed on the insulating layer 160 and the trace conductor lines 330 . As shown in FIG. 6E , the protective layer 190 is formed on the color filter layer 180 . As shown in FIG. 6F , the common electrode (Vcom) layer 200 is formed on the passivation layer 190 . If it is an IPS or FFS type liquid crystal display or OLED display, the common electrode (Vcom) layer 200 does not need to be formed on the upper glass.

As shown in Figure 5, the size of the sensing electrodes (320-1-320-N) is about 5mm, and the interval of the light-shielding lines 510 is about 50-200 μm. Therefore, one side of one sensing electrode 310 may correspond to 50-100 light-shielding lines. Line 510. That is, one side of one sensing electrode ( 320 - 1 ˜ 320 -N) may correspond to hundreds of light-shielding lines 510 . In the present invention, the width of the routing conductor line 330 is slightly smaller than the width of the light-shielding line 510 . The utility model is to overlap the position of a plurality of routing conductor lines 330 with the shading line 510, so as to route the induced electrical signals of the sensing electrodes (320-1 to 320-N) through the routing layer 150 of the sensing electrodes. The wire conductor wire 330 is transmitted to a controller (not shown in the figure) to determine the touch position, that is, the utility model forms a plurality of sensing electrodes (320-1-320-N) on a known light-shielding layer 500 , and constitute the so-called light-shielding sensing electrode layer 140, so that there is no need to set a new sensing electrode layer on the upper glass substrate or the lower glass substrate of the display panel, thereby reducing costs, reducing process procedures, improving process yield and reducing process Cost, increase light transmittance, reduce power consumption.

Since the routing conductor line 330 is made of conductive metal material or alloy material, its impedance is much smaller than that of transparent conductive indium tin oxide (ITO), so the line width of the routing conductor line 330 can be thinner, and It can be disposed under the light-shielding line 510 without affecting the aperture ratio.

The width of the routing conductor lines 330 is slightly smaller than the width of the light-shielding lines 510. When viewed from the upper substrate 110 to the direction of the lower substrate 120, the routing conductor lines 330 can be covered by the plurality of light-shielding lines. You will see the plurality of light-shielding lines, but you will not see the wiring conductor lines.

The color filter layer (color filter) 170 is located on the surface of the light shielding layer 140 and faces the display material layer 130 .

The thin film transistor layer 180 is located on the surface of the lower substrate 120 and faces the display material layer 130 . The thin film transistor layer (TFT) 180 is composed of a thin film transistor 182 and a transparent electrode 181 .

The passivation layer 190 is located on the surface of the upper substrate 110 and faces the display material layer 130 .

The common electrode (Vcom) layer 200 is between the passivation layer 190 and the display material layer 130 .

The first polarizer (upper polarizer) 210 is located on the surface of the upper substrate 110 facing the other side of the display material layer 130 .

The second polarizer 220 is located on the surface of the lower substrate 120 facing away from the display material layer 130 .

In the embodiment of FIG. 1 , the display material layer 130 is made of liquid crystal. FIG. 7 is a schematic diagram of layer stacking according to another embodiment of the present invention, wherein the display material layer uses organic light emitting diodes instead of liquid crystals. As shown in FIG. 7 , the in-cell touch display panel structure 700 with conductive wires connecting the sensing electrodes includes an upper substrate 110 , a lower substrate 120 , a display material layer 230 , a light-shielding sensing electrode layer 140 , and a sensing electrode layer. The wiring layer 150 , an insulating layer 160 , a color filter layer 170 , an overcoat 190 , a cathode layer 270 , an anode layer 280 , and a thin film transistor layer 290 .

The main difference between FIG. 7 and FIG. 1 lies in the display material layer 230 , the cathode layer 270 , the anode layer 280 , and the thin film transistor layer 290 .

The TFT layer 290 is located on the surface of the lower substrate 120 facing the display material layer 230 . The thin film transistor layer has K gate driving lines and L source driving lines, and drives the pixel driving transistors and pixel capacitors of the corresponding pixel driving circuit according to a display driving signal and a display pixel signal, and then performs a display operation, Wherein, K and L are positive integers. The positions of the K gate driving lines and the L source driving lines are set corresponding to the positions of the plurality of light-shielding conductor lines of the light-shielding sensing electrode layer (blackmatrix) 140 .

The thin film transistor layer 290 includes a plurality of pixel driving circuits 291 in addition to a plurality of gate driving lines and a plurality of source driving lines. The thin film transistor layer 290 is used to drive the corresponding pixel driving circuit 291 according to a display pixel signal and a display driving signal, and then perform a display operation.

Depending on the design of the pixel driving circuit 291, for example, 2T1C is a pixel driving circuit designed with 2 TFTs and 1 storage capacitor, and 6T2C is a pixel driving circuit designed with 6 TFTs and 2 storage capacitors. The gate 2911 of at least one thin film transistor in the pixel driving circuit 291 is connected to a gate driving line (not shown in the figure), and depending on the design of the driving circuit, the drain/source 2913 of at least one thin film transistor in the control circuit is connected to a The source driving line (not shown in the figure), the drain/source 2915 of at least one thin film transistor in the pixel driving circuit 291 is connected to a corresponding anode pixel electrode 281 in the anode layer 280 .

The cathode layer 270 is located on a side of the protection layer 260 facing the display material layer 230 . Meanwhile, the cathode layer 270 is located between the upper substrate 110 and the display material layer 230 . The cathode layer 270 is formed of metal conductive material. Preferably, the cathode layer 270 is formed of a metal material with a thickness less than 50 nanometers (nm), and the metal material is selected from one of the following groups: aluminum (Al), silver (Ag), magnesium (Mg) , calcium (Ca), potassium (K), lithium (Li), indium (In), and their alloys or a combination of lithium fluoride (LiF), magnesium fluoride (MgF2), lithium oxide (LiO) and Al . Since the thickness of the cathode layer 270 is less than 50 nm, the light generated by the display material layer 230 can still pass through the cathode layer 270 to display images on the upper substrate 110 . The cathode layer 270 is electrically connected to the entire piece, so it can be used as shielding. At the same time, the cathode layer 270 also receives the current from the anode pixel electrode 281 .

The anode layer 280 is located on a side of the TFT layer 290 facing the display material layer 230 . The anode layer 280 has a plurality of anode pixel electrodes 281 . Each anode pixel electrode 281 corresponds to a pixel drive transistor of the pixel drive circuit 291 of the thin film transistor layer 290, that is, each anode pixel electrode of the plurality of anode pixel electrodes corresponds to the corresponding pixel drive circuit 291. The source/drain 2913 of the pixel driving transistor is connected to form a pixel electrode of a specific color, such as a red pixel electrode, a green pixel electrode, or a blue pixel electrode or a white pixel electrode used in this embodiment.

The display material layer 230 includes a hole transporting layer (HTL) 231 , an emitting layer (emitting layer) 233 , and an electron transporting layer (HTL) 235 . The display material layer 230 preferably produces white light, which is filtered by the color filter layer (color filter) 170 to produce three primary colors of red, blue and green.

FIG. 8 is a schematic view of another embodiment of the in-cell touch display panel structure of the present invention in which the conductive wires are used to connect the sensing electrodes. As shown in FIG. 8 , the in-cell touch display panel structure 800 with conductive wires connected to the sensing electrodes includes an upper substrate 110 , a lower substrate 120 , a display material layer 130 , a light-shielding layer 840 , and a wiring for sensing electrodes. Layer 150, an insulating layer 160, a color filter layer 170, a thin film transistor layer 180, a protective layer 190, a shared electrode (Vcom) layer 200, a first polarizer layer (upper polarizer) 210, a second polarizer layer (lower polarizer) 220 , and a sensing electrode layer 810 .

The main difference between FIG. 8 and FIG. 1 lies in the light shielding layer 840 and the sensing electrode layer 810 . The light-shielding layer 840 is the well-known light-shielding layer 140 , which is composed of a plurality of light-shielding lines, and is not planted as a sensing electrode itself. The newly added sensing electrode layer 810 is located on the surface of the light-shielding layer 840 and faces the display material layer 130 . The sensing electrode layer 810 is composed of a plurality of conductor lines, and the plurality of conductor lines are patterned to form a plurality of sensing electrodes. That is to say, the plurality of sensing electrodes formed by the plurality of light-shielding sensing lines in FIG. 1 are replaced here by the plurality of sensing electrodes implanted on the sensing electrode layer 810 .

As shown in FIG. 8 , the insulating layer 160 is located between the wiring layer 150 of the sensing electrode and the sensing electrode layer 810 . As shown by the ellipse X in FIG. 8 , the insulating layer 160 is filled with insulating material at the position where there is no trace conductor line 330 . As shown in the ellipse Y in Fig. 8, the insulating layer 160 is at the position where the conductor wire 330 is located. Since the conductor wire 330 needs to be insulated from the sensing electrodes (320-1-320-N), the insulating layer 160 is filled with insulation substance. As shown by the ellipse Z in Fig. 8, the insulating layer 160 is at the position where the conductor wire 330 is located. Since the conductor wire 330 needs to be electrically connected to the sensing electrodes (320-1-320-N), the insulation layer 160 must be insulated. The layer 160 is left empty, so that the routing conductor lines 330 are electrically connected to the sensing electrodes ( 320 - 1 - 320 -N). As shown by the ellipse W in FIG. 8 , since the light needs to pass through, this place is a red color filter layer (color filter) 170 .

9 is a schematic view of another embodiment of the structure of the in-cell touch display panel with conductive wires connecting the sensing electrodes of the present invention, wherein the display material layer uses organic light emitting diodes instead of liquid crystals. As shown in FIG. 9 , the in-cell touch display panel structure 900 with conductive wires connecting the sensing electrodes includes an upper substrate 110 , a lower substrate 120 , a display material layer 230 , a light-shielding layer 840 , a sensing electrode layer 810 , A wiring layer 150 of a sensing electrode, an insulating layer 160 , a color filter layer 170 , an overcoat 190 , a cathode layer 270 , an anode layer 280 , and a thin film transistor layer 290 . For other technical contents, reference may be made to FIG. 1 , FIG. 7 , and FIG. 8 , which will not be repeated here.

It can be seen from the foregoing description that the present invention can form a single-layer sensing touch pattern structure on the light-shielding sensing electrode layer 140 or the sensing electrode layer 810. Electrode layer, thereby reducing cost and increasing touch accuracy.

It should be noted that the above-mentioned embodiments are only examples for convenience of description, and the scope of rights claimed by the utility model should be based on the scope of claims in the application, rather than being limited to the above-mentioned embodiments.

Claims (16)

1. An in-cell touch display panel structure connected with conductive wires to sensing electrodes, characterized in that it includes: One upper substrate; A lower substrate, the upper substrate and the lower substrate are arranged in parallel to sandwich a display material layer between the two substrates; A light-shielding sensing electrode layer, located on the surface of the upper substrate and facing the display material layer, the light-shielding sensing electrode layer is composed of a plurality of light-shielding sensing lines, wherein part of the plurality of light-shielding sensing lines are patterned to form a plurality of sensing electrode; A routing layer of the sensing electrode, located on the surface of the light-shielding sensing electrode layer and facing the display material layer, the routing layer of the sensing electrode is composed of a plurality of routing conductor lines; and an insulating layer, located between the wiring layer of the sensing electrode and the light-shielding sensing electrode layer; Wherein, each sensing electrode is connected with at least one routing conductor line, and the positions of the plurality of routing conductor lines are set corresponding to the positions of the plurality of light-shielding sensing lines of the light-shielding sensing electrode layer. 2. The structure of an in-cell touch display panel with conductive wires connecting sensing electrodes according to claim 1, wherein the plurality of sensing electrodes are N polygonal areas, and any two polygonal areas are separated by The light-shielding sensing electrode layer is not connected, so that a single-layer sensing touch pattern structure is formed on the light-shielding sensing electrode layer, and N is an integer greater than 1. 3 . The in-cell touch display panel structure in which the sensing electrodes are connected by conductive wires according to claim 2 , wherein each conductor wire is not connected to each other. 4 . 4. The in-cell touch display panel structure with conductive wires connecting sensing electrodes according to claim 3, wherein the plurality of sensing electrodes of the light-shielding sensing electrode layer are arranged in a first direction and a second direction Set, the first direction is perpendicular to the second direction. 5. According to claim 4, the in-cell touch display panel structure with conductive wires connecting the sensing electrodes is characterized in that, the plurality of routing conductor lines in the routing layer of the sensing electrodes are conductive metal materials or alloys Material. 6. According to claim 5, the structure of the in-cell touch display panel connecting the sensing electrodes with conductive wires is characterized in that it comprises: A color filter layer, located on the surface of the light-shielding sensing electrode layer and facing the display material layer; and A thin film transistor layer is located on the surface of the lower substrate and faces the display material layer. 7 . The in-cell touch display panel structure with conductive wires connecting the sensing electrodes according to claim 6 , wherein the display material layer is made of liquid crystal. 8 . The in-cell touch display panel structure with conductive wires connecting the sensing electrodes according to claim 6 , wherein the display material layer is composed of organic light emitting diodes. 9. An in-cell touch display panel structure with conductive wires connecting sensing electrodes, characterized in that it includes: One upper substrate; A lower substrate, the upper substrate and the lower substrate are arranged in parallel to sandwich a display material layer between the two substrates; A light-shielding layer, located on the surface of the upper substrate and facing the display material layer, the light-shielding layer is composed of multiple light-shielding lines; A sensing electrode layer, located on the surface of the light-shielding layer and facing the display material layer, the sensing electrode layer is composed of a plurality of conductor lines, and the plurality of conductor lines are patterned to form a plurality of sensing electrodes; an insulating layer, located on the surface of the sensing electrode layer and facing the display material layer; and A routing layer of the sensing electrode is located on the surface of the insulating layer and faces the display material layer, and the routing layer of the sensing electrode is composed of a plurality of routing conductor lines; Wherein, each sensing electrode is connected with at least one routing conductor line, and the positions of the plurality of routing conductor lines are set corresponding to the positions of the plurality of light-shielding lines of the light-shielding layer. 10. The in-cell touch display panel structure with conductive wires connecting the sensing electrodes according to claim 9, wherein the plurality of sensing electrodes are N polygonal regions, and any two polygonal regions are separated by The sensing electrode layer is not connected so that a single-layer sensing touch pattern structure is formed on the sensing electrode layer, and N is an integer greater than 1. 11 . The structure of the in-cell touch display panel in which the sensing electrodes are connected by conductive wires according to claim 10 , wherein each conductor wire is not connected to each other. 11 . 12. The in-cell touch display panel structure with conductive wires connecting sensing electrodes according to claim 11, wherein the plurality of sensing electrodes of the sensing electrode layer are arranged in a first direction and a second direction, the The first direction is perpendicular to the second direction. 13. According to claim 12, the in-cell touch display panel structure with conductive wires connecting the sensing electrodes is characterized in that, the plurality of routing conductor lines of the routing layer of the sensing electrodes are conductive metal materials or alloys Material. 14. According to claim 13, the in-cell touch display panel structure connecting the sensing electrodes with conductive wires is characterized in that it comprises: a color filter layer located on the surface of the light-shielding layer on the same side as the display material layer; and A thin film transistor layer is located on the surface of the lower substrate and faces the display material layer. 15 . The in-cell touch display panel structure with conductive wires connecting the sensing electrodes according to claim 14 , wherein the display material layer is made of liquid crystal. 16 . The in-cell touch display panel structure with conductive wires connecting the sensing electrodes according to claim 14 , wherein the display material layer is composed of organic light emitting diodes.