CN112951103B - Micro-LED manufacturing method for improving sub-pixel light emitting balance - Google Patents

Abstract

The invention relates to a Micro-LED manufacturing method for improving the luminous balance of sub-pixels. The method includes: coating photoresist on the light-receiving surface of an array substrate; adjusting a mask so that the light-transmitting area of the mask corresponds to each Display pixels; keep the relative position of the mask and the array substrate unchanged, and use three groups of light sources with different incident directions to simultaneously pass through the light-transmitting area of the mask to expose different groups of sub-pixels; wherein, each group of light sources corresponds to a A group of sub-pixels of the same color, the illumination intensity and illumination time of each group of light sources are determined according to the volume of quantum dot colloid to be filled in the sub-pixels of the corresponding color of the group of light sources; the photoresist on the array substrate is subjected to the first time using the developer solution. dissolve; dry the array substrate, and etch the sub-pixels to form three liquid storage tanks with different depths. The method is beneficial to improve the luminous brightness balance of the sub-pixels and improve the display effect.

Description

A Micro-LED manufacturing method for improving sub-pixel luminous balance

technical field

The invention belongs to the field of displays, and in particular relates to a Micro-LED manufacturing method for improving sub-pixel light emission balance.

Background technique

Micro-LED (Micro Light Emitting Diode) is a new generation of display technology that is brighter and more efficient, but consumes less power than existing OLED (Organic Light Emitting Diode) technology. Micro-LED technology, the LED structure design is thinned, miniaturized, and arrayed, and its size is only about 1 to 10 μm. The biggest advantage of Micro-LED comes from the micron-level pitch, each pixel can be addressed and controlled and driven to emit light at a single point, long life, and wide range of applications.

Quantum dot QDs are semiconductor nanoparticles composed of II-VI or III-V elements, and their size is generally between several nanometers to tens of nanometers. Due to the existence of the quantum confinement effect, the quantum dot material turns the originally continuous energy band into a discrete energy level structure, which can emit visible light after being excited by the outside world. Since quantum dot materials have a small luminescence peak with a small half-height width and the luminescence color can be adjusted by the size, structure or composition of the quantum dot material, the application in the field of Micro-LED display will improve the color saturation and color gamut. Due to their characteristics, quantum dot materials are often used in Micro-LEDs as light-emitting crystals.

In Micro-LED, the same size storage tank (groove) is generally used to encapsulate the quantum dots corresponding to the three colors of red, green and blue. When the grooves are encapsulated, the encapsulation thicknesses are also different, which further leads to unbalanced luminous brightness of sub-pixels of different colors, and poor display effect.

SUMMARY OF THE INVENTION

The purpose of the present invention is to provide a Micro-LED manufacturing method for improving the luminous balance of the sub-pixels, which is beneficial to improve the luminous brightness balance of the sub-pixels and improve the display effect.

In order to achieve the above object, the technical solution adopted in the present invention is: a method for manufacturing a Micro-LED that improves the luminous balance of sub-pixels, the Micro-LED includes red sub-pixels, green sub-pixels and blue sub-pixels, and each sub-pixel includes a liquid storage tank, each liquid storage tank is filled with quantum dot colloid, and a UV-LED is arranged under each liquid storage tank; the method includes:

A photoresist is coated on the light-receiving surface of the array substrate; wherein, the array substrate includes display pixels arranged in an array, and each display pixel includes the red sub-pixel, the green sub-pixel and the blue sub-pixel;

adjusting the mask so that the light-transmitting area of the mask corresponds to each of the display pixels;

Keeping the relative position of the mask and the array substrate unchanged, three groups of light sources with different incident directions are used to simultaneously pass through the light-transmitting area of the mask to expose different groups of sub-pixels; The light source corresponds to a group of sub-pixels of the same color, and the illumination intensity and illumination time of each group of light sources are determined according to the volume of quantum dot colloid that needs to be filled in the sub-pixels of the color corresponding to the group of light sources;

using a developer to dissolve the photoresist on the array substrate for the first time;

The array substrate is dried, and the sub-pixels are etched to form three liquid storage tanks with different depths.

Further, the method also includes:

According to the incident directions of the three groups of light sources, the exposure width of the sub-pixels, and the gap between two adjacent sub-pixels in the same display pixel, the distance between the mask and the array substrate is obtained. The distance d between the plate and the array substrate satisfies the relationship of d=(p+q)×|cotθ ₁ |;

where p is the exposure width of the sub-pixel, q is the gap between two adjacent sub-pixels in the same display pixel, θ ₁ is the first incident angle, θ ₂ is the second incident angle, and θ ₃ is the third incident angle The first incident angle θ ₁ , the second incident angle θ ₂ and the third incident angle θ ₃ are the angles between the incident directions of the three groups of light sources and the normal to the array substrate, and There are θ ₂ =-θ ₁ and θ ₃ =0.

Further, the method also includes:

controlling the reticle to keep the distance d between the reticle and the array substrate unchanged;

Adjusting the first incident angle θ ₁ and the second incident angle θ ₂ enables three groups of the light sources to expose different groups of sub-pixels.

Further, the method also includes:

controlling the light source so that the first incident angle θ ₁ and the second incident angle θ ₂ remain unchanged;

The reticle is adjusted, and the distance d between the reticle and the array substrate is changed, so that the three groups of the light sources expose different groups of sub-pixels.

Further, the three sub-pixels included in the display pixel are rectangles of equal size, and the sizes of the sub-pixels and the light-transmitting area are the same.

Further, a plurality of the display pixels form a column of pixel groups, and the column of pixel groups is divided into a red sub-pixel group, a green sub-pixel group and a blue sub-pixel group, and the red sub-pixel group, green sub-pixel group, The blue sub-pixel group and the light-transmitting area are rectangles of equal width.

Further, the method further includes: adding a volume of quantum dot colloid corresponding to the depth of the liquid storage tank into the liquid storage tank.

Further, the method further includes: after adding the quantum dot colloid, sealing the liquid storage tank to form a sealing layer with a uniform thickness.

Further, the photoresist is a positive photoresist.

Compared with the prior art, the present invention has the following beneficial effects: 1. The present invention adjusts the mask so that the light-transmitting area of the mask corresponds to each display pixel. This ensures that the three sub-pixels in the display pixel are exposed at the same time. 2. The present invention maintains the relative position of the mask and the array substrate unchanged, and uses three groups of light sources with different incident directions to simultaneously pass through the light-transmitting area of the mask to expose different groups of sub-pixels. In the present invention, the relative positions of the mask and the array substrate remain unchanged, and the exposure of all sub-pixels can be completed without alignment, thereby avoiding incomplete exposure caused by alignment errors, and the present invention only performs one exposure, reducing the number of exposures. ,Increase productivity. 3. In the present invention, each group of light sources corresponds to a group of sub-pixels of the same color, and the illumination intensity and illumination time of each group of light sources are determined according to the volume of quantum dot colloid to be filled in sub-pixels of the corresponding color of the group of light sources. Due to the difference in light intensity and light time, the solubility of photoresist in the developer is also different. This feature can ensure that the depths of the reservoirs corresponding to different groups of light sources are also different during etching. To sum up, the present invention exposes three sub-pixels by using three sets of light sources with different illumination intensity and illumination time at the same time, and then develops and etches to form three kinds of liquid storage tanks with different depths, so that the liquid storage tanks of different color sub-pixels can be formed. The tank encapsulates a corresponding volume of quantum dot colloid, thereby ensuring that the thickness of the encapsulant of each liquid storage tank is consistent, improving the balance of luminous brightness of the sub-pixels, and improving the display effect.

Description of drawings

FIG. 1 is a schematic diagram of a method implementation flowchart according to an embodiment of the present invention.

FIG. 2 is a schematic structural diagram of a Micro-LED in an embodiment of the present invention.

FIG. 3 is a schematic diagram of an exposure light path in a first specific situation in an embodiment of the present invention.

FIG. 4 is a schematic diagram of an exposure light path of a second specific situation in the embodiment of the present invention.

FIG. 5 is a schematic diagram of the relationship between sub-pixels and light-transmitting regions in an embodiment of the present invention.

FIG. 6 is a schematic diagram showing the relationship between a display pixel group and a light-transmitting area in an embodiment of the present invention.

FIG. 7 is a schematic structural diagram of a Micro-LED in the prior art.

Detailed ways

The present invention discloses a Micro-LED manufacturing method for improving the luminous balance of sub-pixels, and those skilled in the art can learn from the content of this article and appropriately improve the technical details for implementation. It should be particularly pointed out that all similar substitutions and modifications are obvious to those skilled in the art, and they are deemed to be included in the present invention. The method and application of the present invention have been described through the preferred embodiments, and it is obvious that relevant persons can make changes or appropriate changes and combinations of the methods and applications described herein without departing from the content, spirit and scope of the present invention to achieve and Apply the technology of the present invention.

The quantum dots corresponding to the sub-pixels of different colors absorb different energy of light with the same brightness, which leads to the use of quantum dot colloids of different shapes in order to make the sub-pixels of different colors emit light evenly. However, in general, the size of each liquid storage tank of the Micro-LED array substrate is the same, which makes the thickness of the liquid storage tanks of different color sub-pixels also inconsistent when sealing, as shown in FIG. 7 . In FIG. 7, 701 is a sealing layer, 702 is a liquid storage tank, and 703 is a UV-LED. Different thicknesses of the sealant lead to different brightness of the quantum dots after emitting light through the sealant layer, so that the light-emitting brightness of the sub-pixels of different colors is not balanced, and the display effect is deteriorated.

In view of this, as shown in FIGS. 1-6 , an embodiment of the present invention provides a method for manufacturing a Micro-LED that improves the light emission balance of sub-pixels. The Micro-LED includes a red sub-pixel, a green sub-pixel and a blue sub-pixel, each of which is Each sub-pixel includes a liquid storage tank, a UV-LED is arranged under each liquid storage tank, and each liquid storage tank is filled with quantum dot colloid. As shown in Figure 1, the method includes:

Step S101: Coating photoresist on the light-receiving surface of the array substrate.

Wherein, the array substrate includes display pixels arranged in an array, and each display pixel includes a red sub-pixel, a green sub-pixel and a blue sub-pixel.

It should be noted that the color presented by each sub-pixel is determined by the filled quantum dots. Whenever a quantum dot is stimulated by light or electricity, the quantum dot will emit colored light. The color of the light is determined by the material, size and shape of the quantum dot. Generally, the larger the particle is, the longer the wavelength will be absorbed, and the smaller the particle will be, the shorter the wavelength will be absorbed. . Quantum dots with a size of 8 nanometers can absorb long-wave red and show blue, and quantum dots with a size of 2 nanometers can absorb short-wave blue and show red. This property enables quantum dots to change the color of light emitted by a light source. Therefore, the quantum dot sizes corresponding to sub-pixels of different colors are also different.

Optionally, the photoresist is a positive photoresist.

It should be noted that the photoresist is an organic compound, and its solubility in the developing solution will change after it is exposed to ultraviolet light. Positive photoresist is a kind of photoresist. After exposure, the exposed part can be dissolved in the developing solution, and the unexposed part cannot be dissolved. The solubility of the positive photoresist used in the embodiments of the present invention in the developing solution increases with the increase of the illumination intensity and the illumination time.

Step S102: Adjust the mask so that the light-transmitting area of the mask corresponds to each display pixel.

It should be noted that the mask includes a light-transmitting area and a non-light-transmitting area. The light-transmitting area is used to expose each sub-pixel in the display pixel through the light source, and the non-light-transmitting area is used to block the light source to prevent the photoresist at other positions on the array substrate from being exposed and subsequently dissolved in the developer. The purpose of making the light-transmitting area of the mask correspond to each display pixel is to enable the light source to expose three sub-pixels of different colors at the same time, thereby increasing the production efficiency.

Step S103 : maintaining the relative positions of the mask and the array substrate unchanged, and using three groups of light sources with different incident directions to simultaneously pass through the light-transmitting regions of the mask to expose different groups of sub-pixels.

It should be noted that maintaining the relative position of the reticle and the array substrate unchanged can solve the alignment error of exposing sub-pixels of different colors by moving the reticle, resulting in repeated exposure or unexposed parts of sub-pixels. Three groups of light sources with different incident directions are used to expose different groups of sub-pixels through the light-transmitting area of the mask at the same time. In this way, exposure of all sub-pixels can be completed by only one irradiation, thereby improving exposure efficiency and increasing productivity.

Wherein, each group of light sources corresponds to a group of sub-pixels of the same color, and the illumination intensity and illumination time of each group of light sources are determined according to the volume of quantum dot colloid that needs to be filled in sub-pixels of the color corresponding to the group of light sources.

It should be noted that, because quantum dots of different color sub-pixels need to produce the same brightness under the same power of UV-LED irradiation, different quantum dots are required, that is, the volume of quantum dot colloids is different. Therefore, in the case of different volumes of quantum dot colloids, to make the sealing layers of different color sub-pixels the same, the depths of the liquid storage tanks for loading quantum dot colloids should be different. The solubility of the photoresist used in the embodiment of the present invention in the developer increases with the increase of the light intensity and light time. tank. To sum up, the present invention determines the depth of the liquid storage tank to be used according to the quantum dot colloid volume corresponding to the sub-pixels of different colors, and then determines the irradiation intensity and irradiation time of the light source according to the depth of the liquid storage tank.

Optionally, in a specific embodiment, the three groups of light sources with different incident directions respectively include: a first light source, a second light source and a third light source. The first light source exposes the red sub-pixels, and the second light source exposes the green sub-pixels. Exposure is performed, and the third light source exposes the blue sub-pixels.

Wherein, under the same illumination time of the first light source, the second light source, and the third light source, the illumination intensity is: first light source<second light source<third light source.

Under the same illumination intensity of the first light source, the second light source, and the third light source, the illumination time: the first light source<the second light source<the third light source.

In the case where the illumination time and intensity are different, after being irradiated by three sets of light sources, it is necessary to ensure the solubility of the photoresist on each color sub-pixel: red sub-pixel < green sub-pixel < blue sub-pixel.

It should be noted that, in general, the quantum dot colloids corresponding to the three sub-pixels of red, green and blue produce light of the same brightness, and the required volume of the quantum dot colloid is: red sub-pixel < green sub-pixel < blue sub-pixel.

Step S104 : using a developer to dissolve the photoresist on the array substrate for the first time.

It should be noted that, because the present invention adopts positive photoresist, only the exposed photoresist can be dissolved in the developing solution, and the solubility of the photoresist increases with the increase of illumination time and illumination intensity. After the same time of dissolution, the depths of grooves formed on sub-pixels of different colors are also different, and the depths of the liquid storage grooves formed by etching are also different during subsequent etching.

Step S105 : drying the array substrate, and etching the sub-pixels to form three liquid storage tanks with different depths.

It should be noted that, after developing, the array substrate must be dried before etching. Because etching is divided into dry etching and wet etching, liquid materials may be used for etching, and if not dried, the etching materials are easily contaminated.

Optionally, the method further includes: arranging UV-LEDs at the bottom of the liquid storage tank.

Optionally, the method further includes: adding a volume of quantum dot colloid corresponding to the depth of the liquid storage tank into the liquid storage tank.

Optionally, the method further includes: sealing the liquid storage tank to form a sealing layer with a uniform thickness.

In a specific embodiment, the Micro-LED manufactured in the embodiment of the present invention is shown in FIG. 2 , 201 is the sealing layer, 202 is the liquid storage tank of the red sub-pixel, 203 is the liquid storage tank of the green sub-pixel, and 204 is the liquid storage tank of the green sub-pixel. The liquid storage tank of the blue sub-pixel, 205 is the UV-LED, and 206 is the array substrate. The thickness of each sealing layer in the sealing layer 201 is the same.

Optionally, the method further includes:

According to the three groups of incident directions of the light source, the exposure width of the sub-pixels, and the gap between two adjacent sub-pixels in the same display pixel, the distance between the reticle and the array substrate, and the distance between the reticle and the array substrate are obtained. d satisfies the relationship of d=(p+q)×|cotθ ₁ |;

Among them, p is the exposure width of the sub-pixel, q is the gap between two adjacent sub-pixels in the same display pixel, θ ₁ is the first incident angle, θ ₂ is the second incident angle, θ ₃ is the third incident angle, The first incident angle θ ₁ , the second incident angle θ ₂ and the third incident angle θ ₃ are respectively the angles between the incident directions of the three groups of light sources and the normal to the array substrate, and θ ₂ =−θ ₁ , θ ₃ =0 .

It should be noted that the exposure width of each sub-pixel is equal, and the exposure width is the projection length of the sub-pixel on the front surface of the array substrate. The front surface of the array substrate is a surface perpendicular to the center line of the sub-pixels in the middle of the display pixels. FIG. 3 and FIG. 4 are optical path diagrams of the front view of the array substrate. The gap between two adjacent sub-pixels in the same display pixel can be an electrode. A certain distance between the mask and the array substrate can ensure that three groups of light sources in different directions can simultaneously expose three sub-pixels of different colors.

Optionally, in a specific embodiment, when the gap between two adjacent sub-pixels in the same display pixel is 0, that is, when q=0, the light path during exposure is shown in FIG. 3 , and 301 is a mask. Stencil, 302 is three sub-pixels of the same display pixel. Then the distance d between the mask and the array substrate, the exposure width p of the sub-pixels, the gap q between two adjacent sub-pixels in the same display pixel, the first incident angle θ ₁ , the second incident angle θ ₂ and the third The three incident angles θ ₃ have a relationship of d=p×|cotθ ₁ |.

Optionally, in a specific embodiment, when the gap between two adjacent sub-pixels in the same display pixel is greater than 0, that is, when q>0, the light path during exposure is shown in FIG. 4 , and 401 is a mask. Stencil, 402 is three sub-pixels of the same display pixel. Then the distance d between the mask and the array substrate, the exposure width p of the sub-pixels, the gap q between two adjacent sub-pixels in the same display pixel, the first incident angle θ ₁ , the second incident angle θ ₂ and the third The three incident angles θ ₃ have a relationship of d=(p+q)×|cotθ ₁ |.

Optionally, the method further includes:

Control the mask to keep the distance d between the mask and the array substrate unchanged;

Adjusting the first incident angle θ ₁ and the second incident angle θ ₂ enables the three groups of light sources to expose different groups of sub-pixels.

It should be noted that, by adjusting the first incident angle θ ₁ and the second incident angle θ ₂ , the three groups of light sources are exposed to different groups of sub-pixels, so as to avoid moving the reticle module and causing the light-transmitting area to be unable to communicate with each display pixel. Corresponding, resulting in poor exposure.

Optionally, the method further includes:

Controlling the light source so that the first incident angle θ ₁ and the second incident angle θ ₂ remain unchanged;

Adjust the reticle, and change the distance d between the reticle and the array substrate, so that the three groups of light sources expose different groups of sub-pixels.

It should be noted that the reticle needs to be moved when loading the array substrate, and the reticle is adjusted at the same time, and the distance d between the reticle and the array substrate is changed so that the three groups of light sources can expose different groups of sub-pixels. This can effectively save the overall manufacturing time.

Optionally, the three sub-pixels included in the display pixel are rectangles of equal size, and the sub-pixels and the light-transmitting area have the same size.

As shown in FIG. 5 , the display pixel 501 includes three sub-pixels, and the light-transmitting area is a rectangle as large as the sub-pixels. The gaps between the sub-pixels are not shown in FIG. 5 , which does not limit the present invention.

Optionally, a plurality of display pixels form a column of pixel groups, and a column of pixel groups is divided into a red sub-pixel group, a green sub-pixel group, and a blue sub-pixel group, and the red sub-pixel group, the green sub-pixel group, and the blue sub-pixel group. And the light-transmitting area is a rectangle of equal width.

As shown in FIG. 6 , a plurality of display pixels form a column of pixel groups 601 , and 601 includes a red sub-pixel group, a green sub-pixel group, and a blue sub-pixel group. And the red sub-pixel group, the green sub-pixel group, the blue sub-pixel group and the light-transmitting area 602 are rectangles of equal width. In FIG. 6 , the gaps between the display pixels and the display pixels are not shown, nor are the gaps between adjacent sub-pixels in the same display pixel, which do not limit the present invention.

The invention adjusts the mask so that the light-transmitting area of the mask corresponds to each display pixel. This ensures that the three sub-pixels in the display pixel are exposed at the same time. In the embodiment of the present invention, the relative positions of the mask and the array substrate are kept unchanged, and three groups of light sources with different incident directions are used to simultaneously pass through the light-transmitting regions of the mask to perform different sets of sub-pixels on the mask. exposure. In the embodiment of the present invention, the relative positions of the mask and the array substrate are kept unchanged, and the exposure of all sub-pixels can be completed without alignment, which avoids incomplete exposure caused by alignment errors, and the embodiment of the present invention only performs one exposure, The number of exposures is reduced and the production efficiency is improved. In the embodiment of the present invention, each group of the light sources corresponds to a group of the sub-pixels of the same color, and the illumination intensity and illumination time of each group of light sources are based on the volume of quantum dot colloid to be filled in the sub-pixels of the color corresponding to the group of light sources Decide. Due to the difference in light intensity and light time, the solubility of photoresist in the developer is also different. This feature can ensure that the depths of the reservoirs corresponding to different groups of light sources are also different during etching. To sum up, in the embodiment of the present invention, three sets of light sources with different illumination intensity and illumination time are used to expose three sub-pixels at the same time, and then develop and etch to form three liquid storage tanks with different depths, which can make the sub-pixels of different colors. The liquid storage tank encapsulates a corresponding volume of quantum dot colloid, which can ensure that the thickness of the encapsulation glue in each liquid storage tank is consistent, improve the brightness balance of the sub-pixels, and improve the display effect.

It should be noted that, in this document, relational terms such as first and second are only used to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply any relationship between these entities or operations. any such actual relationship or sequence exists. Moreover, the terms "comprising", "comprising" or any other variation thereof are intended to encompass a non-exclusive inclusion such that a process, method, article or device that includes a list of elements includes not only those elements, but also includes not explicitly listed or other elements inherent to such a process, method, article or apparatus. Without further limitation, an element qualified by the phrase "comprising a..." does not preclude the presence of additional identical elements in a process, method, article or apparatus that includes the element.

Each embodiment in this specification is described in a related manner, and the same and similar parts between the various embodiments may be referred to each other, and each embodiment focuses on the differences from other embodiments. In particular, as for the system embodiments, since they are basically similar to the method embodiments, the description is relatively simple, and for related parts, please refer to the partial descriptions of the method embodiments.

The above descriptions are only preferred embodiments of the present invention, and are not intended to limit the protection scope of the present invention. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the present invention are included in the protection scope of the present invention.

Claims (9)

1. A Micro-LED manufacturing method for improving the luminous balance of sub-pixels, wherein the Micro-LED includes red sub-pixels, green sub-pixels and blue sub-pixels, each sub-pixel includes a liquid storage tank, and each sub-pixel includes a liquid storage tank. The liquid storage tanks are filled with quantum dot colloid, and a UV-LED is arranged under each liquid storage tank; the method includes: A photoresist is coated on the light-receiving surface of the array substrate; wherein, the array substrate includes display pixels arranged in an array, and each display pixel includes the red sub-pixel, the green sub-pixel and the blue sub-pixel; adjusting the mask so that the light-transmitting area of the mask corresponds to each of the display pixels; Keeping the relative position of the mask and the array substrate unchanged, three groups of light sources with different incident directions are used to simultaneously pass through the light-transmitting area of the mask to expose different groups of sub-pixels; The light source corresponds to a group of sub-pixels of the same color, and the illumination intensity and illumination time of each group of light sources are determined according to the volume of quantum dot colloid that needs to be filled in the sub-pixels of the color corresponding to the group of light sources; using a developer to dissolve the photoresist on the array substrate for the first time; The array substrate is dried, and the sub-pixels are etched to form three liquid storage tanks with different depths. 2 . The method for manufacturing a Micro-LED for improving sub-pixel luminous balance according to claim 1 , wherein the method further comprises: 3 . According to the incident directions of the three groups of light sources, the exposure width of the sub-pixels, and the gap between two adjacent sub-pixels in the same display pixel, the distance between the mask and the array substrate is obtained. The distance d between the plate and the array substrate satisfies the relationship of d=(p+q)×|cotθ ₁ |; where p is the exposure width of the sub-pixel, q is the gap between two adjacent sub-pixels in the same display pixel, θ ₁ is the first incident angle, θ ₂ is the second incident angle, and θ ₃ is the third incident angle The first incident angle θ ₁ , the second incident angle θ ₂ and the third incident angle θ ₃ are the angles between the incident directions of the three groups of light sources and the normal to the array substrate, and There are θ ₂ =-θ ₁ and θ ₃ =0. 3. The method for manufacturing a Micro-LED for improving sub-pixel luminous balance according to claim 2, wherein the method further comprises: controlling the reticle to keep the distance d between the reticle and the array substrate unchanged; Adjusting the first incident angle θ ₁ and the second incident angle θ ₂ enables three groups of the light sources to expose different groups of sub-pixels. 4. The method for manufacturing a Micro-LED for improving sub-pixel luminous balance according to claim 2, wherein the method further comprises: controlling the light source so that the first incident angle θ ₁ and the second incident angle θ ₂ remain unchanged; The reticle is adjusted, and the distance d between the reticle and the array substrate is changed, so that the three groups of the light sources expose different groups of sub-pixels. 5 . The method of manufacturing a Micro-LED for improving the light-emission balance of sub-pixels according to claim 1 , wherein the three sub-pixels included in the display pixel are rectangles of equal size, and the sub-pixels and the transparent Regions are the same size. 6 . The method of claim 1 , wherein a plurality of the display pixels form a pixel group, and the pixel group in a row is a red sub-pixel group, The green sub-pixel group and the blue sub-pixel group, and the red sub-pixel group, the green sub-pixel group, the blue sub-pixel group and the light-transmitting area are rectangles of equal width. 7 . The method of claim 1 , wherein the method further comprises: adding a depth corresponding to the depth of the liquid storage tank into the liquid storage tank. 8 . Volume of quantum dot colloids. 8 . The method for manufacturing a Micro-LED for improving sub-pixel luminescence balance according to claim 7 , wherein the method further comprises: after adding the quantum dot colloid, sealing the liquid storage tank, 9 . A sealant layer of uniform thickness is formed. 9 . The method of claim 1 , wherein the photoresist is a positive photoresist. 10 .

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