CN111571368A - A central liquid supply planetary polishing device and method - Google Patents

Abstract

The invention discloses a central liquid supply planetary polishing device which comprises a base plate, a revolution unit, an autorotation unit, a liquid supply and gas supply unit, a loading unit and a polishing shaft assembly, wherein the base plate is provided with a base plate; a revolution motor in the revolution unit transmits power to a hollow revolution shaft through a primary belt transmission pair, one end of the hollow revolution shaft is provided with a connecting flange, and the connecting flange is provided with an eccentric adjusting mechanism; the rotation unit comprises a rotation motor, a transmission flexible shaft and a polishing disc; the hollow rotating shaft of the liquid and gas supply unit is connected with the other end of the hollow revolution shaft, and the hollow polishing shaft in the polishing shaft assembly is connected with the liquid supply pipe and the rotation unit in the liquid and gas supply unitThe polishing disc is connected; the revolution motor drives the eccentric adjusting mechanism to rotate around the axis O₁Revolution; the self-rotating motor drives the polishing disc to wind the axis O thereof₂The polishing liquid is supplied from the center of the tool by autorotation, so that the liquid supply is more sufficient; the revolution and rotation speed and the eccentricity can be adjusted in a stepless change manner, and the adjustment is convenient; the rotation motor does not participate in revolution, and the rotational inertia is reduced.

Description

A central liquid supply planetary polishing device and method

technical field

The invention relates to a planetary polishing device in the field of optical manufacturing, in particular to a planetary polishing device and method for central liquid supply.

Background technique

With the rapid development of modern optical systems, large-aperture aspheric optical elements are widely used in laser nuclear fusion devices, large astronomical telescopes due to their high precision, light weight, good reliability and low cost compared with ordinary spherical lenses. , infrared thermal imaging, medical imaging equipment and other national defense and civil advanced technology fields, the processing technology is also developing in the direction of high precision, high efficiency and high quality.

At this stage, the polishing technology of aspheric optical components is mainly Computer Controlled Optics Surfacing (CCOS). A large number of foreign studies have shown that the shape of the removal function is an important factor affecting the polishing quality and efficiency, and directly determines whether the final surface error can converge and the degree of convergence. In traditional self-rotating grinding head polishing, the center linear velocity of the grinding head is zero. According to the Preston assumption, the center of the removal function is zero, and a ring-shaped removal function with zero center is obtained, resulting in limited or no convergence of the surface error. However, planetary polishing can overcome the above defects and obtain a better Gauss-like removal function, which can make the surface error of the workpiece converge rapidly and improve the machining accuracy and machining efficiency, so it is widely used in CCOS technology. However, the existing planetary polishing device has disadvantages such as overly complex structure, inability to centrally supply liquid, large moment of inertia and poor dynamic performance. For example, the patent document with the application number 201710546844.X discloses "A Planetary Polishing Device Containing Double Parallelogram Mechanisms". The rotation and revolution of the device are driven by two servo motors respectively, and the revolution transmission is realized by double parallelogram mechanisms. , the rotation motor is fixed on the base, and the motion is transmitted to the polishing disc by a secondary belt drive. Although this technical solution can realize central liquid supply, the mechanism is too complicated and the movement is not stable. For another example, the patent document with the application number of 201910266143.X discloses "A Planetary Polishing Device", the planetary motion of the device is realized by a planetary gear train, and its structure is compact, and only one motor can realize the revolution of the polishing disc and Self-rotation, small inertia force; but no central supply of liquid, adjustment of eccentric distance and male-to-self speed ratio requires replacing gears and pulleys with different numbers of teeth, which is troublesome to operate and has a small adjustment range.

SUMMARY OF THE INVENTION

Aiming at the problems of high difficulty, high processing cost and low processing efficiency in ultra-precision machining of modern large-diameter aspherical optical elements, the present invention proposes a planetary polishing device with central liquid supply, which realizes the supply of polishing liquid from the center of the tool and the liquid supply. It is more sufficient; the revolution speed and eccentricity can be adjusted infinitely (within the allowable range), and the adjustment is convenient; the autorotation motor does not participate in the revolution, which reduces the moment of inertia.

In order to solve the above technical problems, a central liquid supply planetary polishing device proposed by the present invention includes a base plate, a revolution unit, a rotation unit, a liquid supply and air supply unit, a loading unit and a polishing shaft assembly; the revolution unit includes a revolution motor and a hollow revolving shaft, the revolving motor is fixed on the base plate, the output end of the revolving motor transmits power to the hollow revolving shaft through a first-stage belt transmission pair, and the two ends of the hollow revolving shaft are respectively fixed by The base plate is supported by two bearings with seats; one end of the hollow revolving shaft is provided with a connection flange, and the connection flange is provided with an eccentric adjustment mechanism; the autorotation unit includes an autorotation motor, a transmission flexible shaft and a polishing disc; the autorotation motor is fixed on the base plate, and one end of the flexible transmission shaft is connected with the output end of the autorotation motor; the liquid supply and air supply unit includes a hollow air circuit rotary joint, a hollow water circuit rotation joint A joint, a hollow rotating shaft, an air supply pipe and a liquid supply pipe; the hollow rotating shaft is connected with the other end of the hollow revolving shaft, and the rotor part of the hollow air path rotary joint and the rotor part of the hollow water path rotary joint are connected in series On the hollow rotating shaft, the stator part of the hollow air path rotary joint and the stator part of the hollow water path rotary joint are fixed to the base plate; one end of the air supply pipe is connected to the hollow air path rotary joint; the One end of the liquid supply pipe is connected with the hollow waterway rotary joint; the loading unit includes a support seat fixed with the eccentric adjustment mechanism, the support seat is provided with a thin-walled cylinder and an L-shaped connecting piece, the L-shaped The connecting piece and the supporting seat are slidably connected through a pair of linear guide rails; the thin-walled cylinder is communicated with the other end of the gas supply pipe of the liquid and gas supply unit; the polishing shaft assembly includes a transmission shaft, a split cavity body and a hollow polishing shaft, the input end of the transmission shaft is connected with the other end of the flexible transmission shaft, the half opening and closing cavity is arranged on the L-shaped connecting piece, and the hollow polishing shaft is formed by the pair of The opening and closing cavity is supported, and one end of the hollow polishing shaft is communicated with the other end of the liquid supply pipe in the liquid and gas supply unit; the other end of the hollow polishing shaft is connected with the polishing disc in the rotation unit; the revolution motor The eccentric adjustment mechanism is driven to revolve around the axis O ₁ by the first-stage belt drive pair; the autorotation motor sequentially drives the polishing disc to revolve around its The axis O ₂ rotates; the speed ratio between the rotation and revolution of the polishing disc is in the range of (0-500].

Further, in the central liquid supply planetary polishing device of the present invention, the eccentric adjustment mechanism includes a sliding seat, a sliding block, an adjusting screw and a locking screw, the sliding seat is fixed with the connecting flange, and the A dovetail groove-dovetail block sliding fit is used between the sliding block and the sliding seat _; the radius of the eccentric adjusting mechanism revolving around the axis O1 is e, and e is 0-32mm. When the eccentric adjustment mechanism reaches the set eccentric distance, the locking screw is used for locking.

When the loading unit is loading, the compressed air is pressed in from the stator part of the rotary joint of the hollow air path, and is sequentially transmitted to the thin-walled cylinder through the air supply pipe to realize loading; the movement stroke of the piston rod of the thin-walled cylinder is: The maximum stroke of the cylinder. The thin-walled cylinder drives the polishing shaft assembly fixed on the L-shaped connector to move up and down through the linear guide pair, so as to realize the lateral pressure loading of the polishing disc on the workpiece during the polishing process, and the loading range is 0- 100N.

The connection between the hollow polishing shaft and the polishing disc is connected by a single-diaphragm flexible coupling. The connection between the hollow polishing shaft and the liquid supply pipe is connected by a quick-plug rotary joint.

The processing method using the central liquid supply planetary polishing device of the present invention is that the polishing disc is provided with a central through hole, and during processing, the polishing liquid is injected from the stator part of the hollow air path rotary joint, and passes through all the The liquid supply pipe, the quick-plug rotary joint and the hollow polishing shaft finally flow from the central through hole of the polishing disc to the processing area to realize central liquid supply.

The polishing liquid is any one of deionized water, cerium oxide polishing liquid, alumina polishing liquid, silicon oxide polishing liquid, silicon carbide polishing liquid and diamond polishing liquid. The diamond polishing liquid is any one of polycrystalline diamond polishing liquid, single crystal diamond polishing liquid and nano-diamond polishing liquid.

Compared with the prior art, the beneficial effects of the present invention are:

1) The polishing liquid is supplied from the center of the polishing disc to prevent the polishing disc from being thrown out due to excessive rotation speed, and the abrasive particle distribution is more uniform and the processing process is more stable.

2) The rotation motor does not participate in the revolving motion, which reduces the moment of inertia and has better dynamic characteristics.

3) Different revolution radii can be obtained by adjusting the eccentric mechanism, which is suitable for different process needs, and it is easier to obtain an ideal Gauss-like removal function, so that the surface surface error can be quickly converged, and the surface processing quality and processing efficiency can be improved.

4) Strong adaptability. It can be freely installed on the end of common CNC machine tools or robots or on self-built test benches without special equipment.

Description of drawings

Fig. 1 is the front view of the center liquid supply planetary polishing device of the present invention;

Fig. 2 is a side view of the central liquid-supply planetary polishing device shown in Fig. 1;

FIG. 3 is a schematic structural diagram of the polishing shaft assembly shown in FIG. 1 .

In the picture:

101-revolution motor 102-hollow revolving shaft 103-eccentric adjustment mechanism

104-One-stage belt drive pair 105-Pillow bearing 106-Connecting flange

201-Rotation motor 202-Transmission flexible shaft 203-Polishing disc

301-Hollow air path rotary joint 302-Hollow water path rotary joint 303-Hollow shaft

304-Air supply pipe 305-Liquid supply pipe 401-Thin-wall cylinder

402-L-type connector 403-Linear guide pair 404-Support seat

501-Hollow polished shaft 502-Gear pair 503-Split cavity

504-Quick plug rotary joint 505-Transmission shaft 1031-Adjusting screw

1032-Lock screw 600-Base plate

Detailed ways

The present invention will be further described below with reference to the accompanying drawings and specific embodiments, but the following embodiments do not limit the present invention by any means.

A central liquid supply planetary polishing device proposed by the present invention includes a base plate 600, a revolution unit, an autorotation unit, a liquid supply and air supply unit, a loading unit and a polishing shaft assembly.

As shown in FIG. 1 and FIG. 2 , the revolving unit includes a revolving motor 101 and a hollow revolving shaft 102 , the revolving motor 101 is fixed on the base plate 600 , and the output end of the revolving motor 101 passes through a primary belt transmission pair 104 transmits power to the hollow revolving shaft 102, the two ends of the hollow revolving shaft 102 are respectively supported by two seated bearings 05 fixed on the base plate 600; one end of the hollow revolving shaft 102 is provided with There is a connecting flange 106, and the connecting flange 106 is provided with an eccentric adjusting mechanism 103; the eccentric adjusting mechanism 103 includes a sliding seat, a sliding block, an adjusting screw 1031 and a locking screw 1032, and the sliding seat and the connecting method The blue 106 is fixed, and the sliding block and the sliding seat adopt a dovetail groove-dovetail block sliding fit; the radius of the eccentric adjustment mechanism 103 revolving around the axis O ₁ is e, and e is 0-32mm, which can be adjusted according to different According to the process requirements, choose different revolution radii or seek the optimal Gauss-like removal function to improve the surface processing quality and processing efficiency of the workpiece. When the eccentric adjustment mechanism 103 reaches the set eccentric distance, the locking screw 1032 is used for locking.

As shown in FIG. 1 and FIG. 2 , the rotation unit includes a rotation motor 201 , a flexible transmission shaft 202 and a polishing disc 203 ; the rotation motor 201 is fixed on the base plate 600 , and one end of the flexible transmission shaft 202 is It is connected to the output end of the rotation motor 201 .

As shown in FIG. 1 and FIG. 2 , the liquid and air supply unit includes a hollow gas path rotary joint 301, a hollow water path rotary joint 302, a hollow rotary shaft 303, an air supply pipe 304 and a liquid supply pipe 305; the hollow rotary shaft 303 is connected to the The other end of the hollow revolving shaft 102 is connected, the rotor part of the hollow air path rotary joint 301 and the rotor part of the hollow water path rotary joint 302 are connected in series on the hollow shaft 303, and the hollow air path rotary joint 301 The stator part of the hollow water circuit rotary joint 302 is fixed to the base plate 600; one end of the air supply pipe 304 is connected to the hollow air circuit rotary joint 301; one end of the liquid supply pipe 305 is The hollow waterway rotary joint 302 is connected.

As shown in FIG. 1 and FIG. 2 , the loading unit includes a support seat 404 fixed with the eccentric adjustment mechanism 103 , the support seat 404 is provided with a thin-walled cylinder 401 and an L-shaped connecting piece 402 . The connecting piece 402 and the support base 404 are slidably connected through a pair of linear guide rails 403 ; the thin-walled cylinder 401 is communicated with the other end of the air supply pipe 304 of the liquid and air supply unit.

As shown in FIG. 1 , FIG. 2 and FIG. 3 , the polishing shaft assembly includes a transmission shaft 505 , a split cavity 503 and a hollow polishing shaft 501 . The input end of the transmission shaft 505 is connected to the transmission shaft 202 The other end is connected, the half opening and closing cavity 503 is arranged on the L-shaped connector 402, the hollow polishing shaft 501 is supported by the half opening and closing cavity 503, and one end of the hollow polishing shaft 501 is connected with the supply The other end of the liquid supply pipe 305 in the liquid gas supply unit is connected, and the connection between the hollow polishing shaft 501 and the liquid supply pipe 305 is connected by a quick-plug rotary joint 504; the other end of the hollow polishing shaft 501 is connected with the The polishing disc 203 in the rotation unit is connected, and the connection between the hollow polishing shaft 501 and the polishing disc 203 is connected by a single-diaphragm flexible coupling to compensate for the clamping and installation errors of the workpiece or the polishing disc.

As shown in FIG. 1 and FIG. 3 , in the present invention, the revolution motor 101 drives the eccentric adjustment mechanism 103 to revolve around the axis O ₁ through the first-stage belt transmission pair 104 ; the present invention uses an arc tooth synchronous belt to revolve The motion of the motor 101 is transmitted to the hollow revolving shaft 102, which in turn drives the polishing disc 203 to achieve revolving motion.

The rotation motor 201 sequentially transmits the motion of the flexible transmission shaft 202 to the hollow polishing shaft 501 through the flexible transmission shaft 202, the transmission shaft 505 in the polishing shaft assembly and the gear pair 502 (one-stage gear transmission), thereby driving The polishing disc 203 realizes self-rotation around its axis O ₂ ; the present invention adopts the flexible transmission shaft 202 to flexibly transmit the motion of the rotation motor 201 to the polishing disc 203 staying at any position, and the rotation motor 201 itself does not participate in the revolution, reducing the rotation inertia, making the polishing process more stable. In the present invention, the range of the speed ratio between the rotation and revolution of the polishing disc 203 is (0-500].

In the present invention, when the loading unit is loading, the compressed air is pressed into the stator part of the hollow air path rotary joint 301, and then transmitted to the thin-walled cylinder 401 through the air supply pipe 304 to realize loading; The movement stroke of the piston rod of the wall cylinder 401 is the maximum stroke of the cylinder. The thin-walled cylinder 401 drives the polishing shaft assembly fixed on the L-shaped connecting piece 402 to move up and down through the linear guide rail pair 403, so as to realize the lateral pressure loading of the workpiece by the polishing disc 203 during the polishing process. The range is 0-100N.

In the present invention, the polishing disc 203 is provided with a central through hole, and when the device of the present invention is used for processing, the pre-mixed polishing liquid is injected at a certain pressure from the water inlet hole of the stator part of the hollow air path rotary joint 302, The liquid is passed through the liquid supply pipe 305 , the quick-plug rotary joint 504 and the hollow polishing shaft 501 in sequence, and finally flows from the central through hole of the polishing disc 203 to the processing area to realize central liquid supply. The polishing liquid can be any one of deionized water, cerium oxide polishing liquid, alumina polishing liquid, silicon oxide polishing liquid, silicon carbide polishing liquid and diamond polishing liquid. The diamond polishing liquid can be any one of polycrystalline diamond polishing liquid, single crystal diamond polishing liquid and nano diamond polishing liquid.

When using the center liquid supply planetary polishing device of the present invention, the device is installed on the moving axis of a common CNC machine tool or the end of an industrial robot or a self-built test bench through the base plate 600, and by controlling the supply pressure of the polishing liquid, Parameters such as loading pressure, revolution speed, and residence time of processing points control the material removal and processing accuracy in the processing area, and realize ultra-precision processing of large-diameter aspherical optical components.

Example 1:

As shown in Fig. 1, Fig. 2 and Fig. 3, in this example, it is necessary to vertically install the center liquid supply planetary polishing device of the present invention on the moving shaft above the CNC machine tool table, and connect the device to the polishing liquid with pipelines Circulation system and air pump to fix the workpiece on the machine table. Move the polishing disc 203 to a suitable position on the workpiece surface, use a pressure pump to pressurize the polishing liquid to the working pressure, inject it from the water inlet hole of the hollow waterway rotary joint 302, and finally flow out from the center of the polishing disc 203 to the workpiece surface processing area. Using an air pump, the compressed air is injected from the inlet hole of the hollow air path rotary joint 301 at a set pressure, and flows to the loaded thin-walled cylinder 401 to realize the loading of the polishing disc 203 on the workpiece surface during processing. During the processing, first set the revolution speed of 80rmp/min, the rotation speed of 500rmp/min, the eccentricity e of 10mm, the air pressure load of 0.1MPa, the hydraulic supply pressure of 0.5MPa, and the cerium oxide polishing liquid with a particle size of 5μm is selected for single grinding. The time is 5 minutes, the planetary motion trajectory is taken, and the dwell time is calculated according to the initial surface error of the workpiece to generate the CNC machining program, and the machining program is imported into the machine tool and the workpiece surface is deterministically polished.

Example 2:

As shown in Fig. 1, Fig. 2 and Fig. 3, in this example, the central liquid supply planetary polishing device of the present invention is installed at the end of the industrial robot, and the position of the end of the industrial robot is controlled to change the polishing disc relative to the workpiece surface pose to suit the machining of free-form surface components.

The device of the invention can not only be installed on the moving shaft of an ordinary numerical control machine tool, but also can be installed on the end of an industrial robot, or even on a simple test bench built by itself, and has strong versatility; by adjusting the size of the eccentricity e, the ideal The Gauss-like removal function makes the surface surface error converge quickly, and improves the machining accuracy and efficiency; the polishing liquid is supplied from the center of the polishing disc through the hollow polishing shaft to prevent the polishing from being thrown out due to excessive rotation speed, and the liquid supply is more sufficient; The motor is fixed on the base plate and does not participate in the revolving motion, which reduces the moment of inertia. In the process of the present invention, the revolution and rotation speed of the polishing disc is controlled by adjusting the revolution speed of the revolution motor and the revolution motor, and the material removal amount and processing in the processing area are controlled by controlling parameters such as eccentricity, hydraulic supply pressure, loading force and residence time of the processing point. High precision, realizing ultra-precision machining of large-diameter aspherical optical components.

Although the present invention has been described above in conjunction with the accompanying drawings, the present invention is not limited to the above-mentioned specific embodiments, which are merely illustrative rather than restrictive. Under the inspiration of the present invention, many modifications can be made without departing from the spirit of the present invention, which all belong to the protection of the present invention.

Claims (10)

1. A central liquid supply planetary polishing device is characterized in that: comprises a base plate (600), a revolution unit, a rotation unit, a liquid and gas supply unit, a loading unit and a polishing shaft assembly;

the revolution unit comprises a revolution motor (101) and a hollow revolution shaft (102), the revolution motor (101) is fixed on a base plate (600), the output end of the revolution motor (101) transmits power to the hollow revolution shaft (102) through a primary belt transmission pair (104), and two ends of the hollow revolution shaft (102) are respectively supported by two belt seat bearings (105) fixed on the base plate (600); one end of the hollow revolution shaft (102) is provided with a connecting flange (106), and the connecting flange (106) is provided with an eccentric adjusting mechanism (103);

the rotation unit comprises a rotation motor (201), a transmission flexible shaft (202) and a polishing disc (203); the rotation motor (201) is fixed on the base plate (600), and one end of the transmission flexible shaft (202) is connected with the output end of the rotation motor (201);

the liquid and gas supply unit comprises a hollow gas path rotary joint (301), a hollow water path rotary joint (302), a hollow rotating shaft (303), a gas supply pipe (304) and a liquid supply pipe (305); the hollow rotating shaft (303) is connected with the other end of the hollow revolution shaft (102), a rotor part of the hollow air path rotating joint (301) and a rotor part of the hollow water path rotating joint (302) are connected in series on the hollow rotating shaft (303), and a stator part of the hollow air path rotating joint (301) and a stator part of the hollow water path rotating joint (302) are fixed with the base plate (600); one end of the air supply pipe (304) is connected with the hollow air path rotary joint (301); one end of the liquid supply pipe (305) is connected with the hollow waterway rotary joint (302);

the loading unit comprises a supporting seat (404) fixed with the eccentric adjusting mechanism (103), a thin-wall cylinder (401) and an L-shaped connecting piece (402) are arranged on the supporting seat (404), and the L-shaped connecting piece (402) is connected with the supporting seat (404) in a sliding mode through a linear guide rail pair (403); the thin-wall cylinder (401) is communicated with the other end of the gas supply pipe (304) of the liquid and gas supply unit;

the polishing shaft assembly comprises a transmission shaft (505), a pair of opening and closing cavities (503) and a hollow polishing shaft (501), the input end of the transmission shaft (505) is connected with the other end of the transmission flexible shaft (202), the pair of opening and closing cavities (503) are arranged on the L-shaped connecting piece (402), the hollow polishing shaft (501) is supported by the pair of opening and closing cavities (503), and one end of the hollow polishing shaft (501) is communicated with the other end of a liquid supply pipe (305) in a liquid and gas supply unit; the other end of the hollow polishing shaft (501) is connected with a polishing disc (203) in the rotation unit;

the revolution motor (101) drives the eccentric adjusting mechanism (103) to rotate around an axis O through the primary belt transmission pair (104)₁Revolution;

the rotation motor (201) drives the polishing disc (203) to rotate around the axis O of the polishing disc sequentially through the transmission flexible shaft (202), the transmission shaft (505) in the polishing shaft assembly and the gear pair₂Autorotation;

the rotation and revolution speed ratio range of the polishing disk (203) is (0-500).

2. The central liquid supply planetary polishing device according to claim 1, characterized in that the eccentric adjusting mechanism (103) comprises a sliding base, a sliding block, an adjusting screw rod (1031) and a locking screw (1032), the sliding base is fixed with the connecting flange (106), and the sliding block and the sliding base are in dovetail groove-dovetail block sliding fit; the eccentric adjustment mechanism (103) is around an axis O₁The revolution radius is e, and e is 0-32 mm.

3. The central liquid supply planetary polishing device according to claim 2, characterized in that the locking screw (1032) is used for locking when the eccentricity adjusting mechanism (103) reaches a set eccentricity.

4. The planetary polishing device with central liquid supply as claimed in claim 1, wherein when the loading unit is loaded, compressed air is pressed in from the stator part of the hollow air path rotary joint (301) and is transmitted to the thin-wall air cylinder (401) through the air supply pipe (304) in sequence to realize loading; the moving stroke of the piston rod of the thin-wall cylinder (401) is the maximum stroke of the cylinder.

5. The planetary polishing device with the central liquid supply function according to claim 4, characterized in that the thin-wall air cylinder (401) drives the polishing shaft assembly fixed on the L-shaped connecting piece (402) to move up and down through the linear guide rail pair (403), so that the transverse pressure loading of the polishing disc (203) on a workpiece is realized in the polishing process, and the loading range is 0-100N.

6. The central liquid supply planetary polishing device according to claim 1, characterized in that the connection between the hollow polishing shaft (501) and the polishing disk (203) is a single-diaphragm flexible coupling connection.

7. The central liquid supply planetary polishing device according to claim 1, characterized in that the connection between the hollow polishing shaft (501) and the liquid supply pipe (305) is connected by a quick-plug rotary joint (504).

8. A center-feed planetary polishing method, characterized by using the center-feed planetary polishing apparatus as claimed in claim 1, wherein said eccentric adjustment mechanism (103) is disposed around an axis O₁The revolution radius is e, and e is 0-32 mm; the polishing disc (203) is provided with a central through hole, and during machining, polishing liquid is injected from a stator part of the hollow air path rotary joint (302), sequentially passes through the liquid supply pipe (305) and the hollow polishing shaft (501), and finally flows to a machining area from the central through hole of the polishing disc (203), so that central liquid supply is realized.

9. The central liquid supply planetary polishing method according to claim 8, wherein the polishing liquid is any one of deionized water, cerium oxide polishing liquid, aluminum oxide polishing liquid, silicon carbide polishing liquid and diamond polishing liquid.

10. The planetary polishing method with central liquid supply according to claim 9, wherein the diamond polishing liquid is any one of polycrystalline diamond polishing liquid, single crystal diamond polishing liquid and nano diamond polishing liquid.

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