CN101169550B - Colorful filter substrate and pattern mask - Google Patents
Colorful filter substrate and pattern mask Download PDFInfo
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- CN101169550B CN101169550B CN2007101964979A CN200710196497A CN101169550B CN 101169550 B CN101169550 B CN 101169550B CN 2007101964979 A CN2007101964979 A CN 2007101964979A CN 200710196497 A CN200710196497 A CN 200710196497A CN 101169550 B CN101169550 B CN 101169550B
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- trapezoidal
- light
- projection
- protrusion
- filter substrate
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- 239000000758 substrate Substances 0.000 title claims abstract description 48
- 239000000463 material Substances 0.000 claims abstract description 45
- 238000001914 filtration Methods 0.000 claims description 10
- 238000000059 patterning Methods 0.000 abstract description 3
- 230000000149 penetrating effect Effects 0.000 abstract 4
- 238000010586 diagram Methods 0.000 description 9
- 239000000356 contaminant Substances 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- 239000012780 transparent material Substances 0.000 description 4
- 239000003086 colorant Substances 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 238000011109 contamination Methods 0.000 description 1
- 239000003999 initiator Substances 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 238000012827 research and development Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
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Abstract
The invention discloses a colorful filter-sheet substrate and a patterning mask. The colorful filter-sheet substrate comprises a shading layer and a filter material layer; wherein, the shading layer is provided with a penetrating opening, and the filter material layer at least covers the penetrating opening. The filter material layer is provided with a trapezoidal raised part, a long penetrating edge of which is corresponding to the penetrating opening and covers a part of the shading layer.
Description
[ technical field ] A method for producing a semiconductor device
The present invention relates to a color filter substrate and a patterned mask, and more particularly, to a color filter substrate and a patterned mask capable of reducing mask fogging.
[ background of the invention ]
The lcd panel has advantages of small size, high image quality and long service life, so that the lcd panel is widely applied to various electronic devices. The liquid crystal display panel mainly comprises a backlight module, a thin film transistor substrate and a color filter substrate. In the process of fabricating the tft substrate and the color filter substrate, a photolithography process is a common process step.
For color filters, a mask is used as a mask in the photolithography process for patterning a filter material layer, and a light beam is used to expose the filter material layer.
However, during exposure of the layer of filter material, the light beam will excite the light initiator of the layer of filter material, which in turn excites the contaminants. When the contaminants are volatilized, they adhere to the mask, causing fogging of the mask. A misted mask will affect the accuracy of the beam. At this point, the production line must replace the mask before production can resume. Therefore, the product quality is not only affected, but also the productivity is reduced. Therefore, how to improve the mask fogging situation is an important direction for research and development.
[ summary of the invention ]
The invention relates to a color filter substrate and a patterned mask, which change the scattering path of partial light beams by utilizing the structures of a trapezoid convex part and a trapezoid concave part. It is possible to avoid receiving too much light beam at the same position of the filter material layer to reduce the volatilization amount of the contaminants.
According to an aspect of the present invention, a color filter substrate is provided, which includes a light shielding layer and a filter material layer. The light shielding layer has a light-transmitting opening. The light filtering material layer at least covers the light-transmitting opening. The filtering material layer has a trapezoidal protrusion. The trapezoid protrusion corresponds to a long side of the light-transmitting opening and covers a portion of the light-shielding layer.
According to another aspect of the present invention, a patterned mask is provided for patterning a layer of filter material. The filtering material layer is formed on a color filtering substrate. The patterned mask comprises a transparent substrate and a light-shielding pattern layer. The shading pattern layer is formed on the transparent substrate. The light-shielding pattern layer is provided with an exposure opening, and the exposure opening is provided with a trapezoidal notch. The trapezoid notch is located on one exposure long side of the exposure opening.
In order to make the aforementioned and other objects of the present invention more comprehensible, preferred embodiments accompanied with figures are described in detail below:
[ description of the drawings ]
FIG. 1 is a schematic diagram of a Color filter substrate according to a first embodiment of the invention;
FIG. 2 is a flow chart illustrating the fabrication of the color filter substrate of FIG. 1;
FIGS. 3A-3H are schematic diagrams illustrating steps according to FIG. 2;
FIG. 4 is a schematic view of a color filter substrate according to a second embodiment of the invention;
FIG. 5 is a schematic view of a patterned mask according to a second embodiment of the present invention;
FIG. 6 is a schematic view of a color filter substrate according to a third embodiment of the invention; and
FIG. 7 is a schematic diagram illustrating a patterned mask according to a third embodiment of the invention.
[ detailed description ] embodiments
First embodiment
Referring to fig. 1, a schematic diagram of a color filter Substrate (ColorFilter Substrate)100 according to a first embodiment of the invention is shown. The color filter substrate 100 includes a light-shielding layer 110 and a filter material layer 120. The light-shielding layer 110 (also called Black Matrix) has a light-transmitting opening 111 (shown as a dotted line). The filter material layer 120 at least covers the light-transmitting opening 111, and in the present embodiment, the filter material layer 120 completely covers the light-transmitting opening 111 and a portion of the light-shielding layer 110. The filter material layer 120 has a trapezoid protrusion 121, and the trapezoid protrusion 121 corresponds to a first light-transmitting long side 111a of the light-transmitting opening 111 and covers a portion of the light-shielding layer 110. As shown in fig. 1, the filtering material layer 120 is not a straight line at the first long transparent side 111a, but protrudes outward with a trapezoidal protrusion 121.
The material of the filtering material layer 120 is a transparent material with a certain primary color, such as a red transparent material, a green transparent material, or a blue transparent material. Generally speaking, between two adjacent pixels, the two filter material layers 120 are separated by the light-shielding layer 110 to ensure that the two adjacent pixels will not contaminate each other and to improve the color contrast.
Although the trapezoid protrusion 121 protrudes outward, the trapezoid protrusion 121 is still located within the light-shielding layer 110 and does not exceed the range of another pixel. As shown in fig. 1, the protrusion height 121D of the trapezoidal protrusion 121 is smaller than the distance D120 between two adjacent filter material layers 120. Therefore, two adjacent pixels are still well separated by the light-shielding layer 110.
The trapezoidal protrusion 121 has a protrusion short side 121a and a protrusion long side 121 b. The tab short side 121a is located outside the tab long side 121 b. That is, the width of the trapezoidal protrusion 121 is gradually reduced from the inside to the outside.
The trapezoidal projection 121 has a projection inclined edge 121 c. The projection hypotenuse 121c is at an angle theta 121 greater than 30 degrees to the projection long side 121 b. In the present embodiment, the included angle θ 121 between the oblique protrusion edge 121 and the long protrusion edge 121b is 45 degrees.
The trapezoidal protrusion 121 of the present embodiment is an isosceles trapezoid. Therefore, the two protrusion oblique sides 121c of the trapezoidal protrusion 121 are equal to the two included angles θ 121 of the protrusion long sides 121 b.
Referring to fig. 2 and fig. 3A to 3H simultaneously, fig. 2 is a flowchart illustrating a manufacturing process of the color filter substrate 100 of fig. 1, and fig. 3A to 3H are schematic diagrams illustrating steps according to fig. 2. First, referring to fig. 3A, in step S102, a transparent substrate 130 is provided.
Next, referring to fig. 3B, in step S104, a light-shielding material 110' is formed on the transparent substrate 130.
Then, referring to fig. 3C, in step S106, the light-shielding layer 110 is patterned to form a plurality of light-transmitting openings 111.
Next, referring to fig. 3D, in step S108, a filter material layer 120 with a certain primary color is formed on the transparent substrate 130.
Then, referring to fig. 3E, in step S110, a patterned mask 200 is provided. The patterned mask 200 includes a transparent substrate 210 and a light-shielding pattern layer 220. The light-shielding pattern layer 220 is formed on the transparent substrate 210. The light-shielding pattern layer 220 has an exposure opening 230. The filter material layer 120 is a negative photoresist, and after the filter material layer 120 is exposed through the exposure opening 230 and developed by the developing solution, the exposed filter material layer 120 will remain. That is, the shape of the exposure opening 230 corresponds to the shape of the exposure material layer 120 to be left.
In more detail, please refer to fig. 1 and fig. 3E simultaneously. The exposure opening 230 has a trapezoidal recess 231. The trapezoid recess 231 is opposite to the trapezoid protrusion 121 of the exposure material layer 120. The trapezoid recess 231 is located on a first long exposure side 230a of the exposure opening 230. Therefore, the exposure opening 230 is not a straight line at the first exposure long side 230a, but is retracted outward by the trapezoidal notch 231.
The trapezoid-shaped notch 231 has a notch short side 231a and a notch long side 231b, and the notch short side 231a is located outside the notch long side 231 b. That is, the width of the trapezoidal recess 231 is gradually reduced from the outside to the inside.
The trapezoidal recess 231 has a recess oblique side 231 c. Preferably, the angle θ 231 between the oblique edge 231c of the notch and the long edge 231b of the notch is greater than 30 degrees. In the present embodiment, the included angle θ 231 between the notch inclined edge 231c and the notch long edge 231b is 45 degrees.
The trapezoidal recess 231 of the present embodiment is an isosceles trapezoid. Therefore, the two notch oblique sides 231c of the trapezoidal notch 231 are equal to the two included angles θ 231 of the notch long side 231 b.
Then, referring to fig. 3F, in step S112, the filter material layer 120 is exposed by using the patterned mask 200 as a mask.
Next, referring to fig. 3G and 3H, in step S114, the exposed filter material layer 120 is developed with a developing solution. Wherein fig. 3G is a cross-sectional view of the patterned mask 200 of fig. 3E and the color filter substrate 100 of fig. 1 along a cross-sectional line G-G ', and fig. 3H is a cross-sectional view of the patterned mask 200 of fig. 3E and the color filter substrate 100 of fig. 1 along a cross-sectional line H-H'. As shown in fig. 3H, the trapezoidal recesses 231 of the patterned mask 200 correspond to the trapezoidal protrusions 121 of the color filter substrate 100. Therefore, the trapezoid-shaped recess 231 corresponds to a partial region of the light-shielding layer 110 of the color filter substrate 100, and does not exceed the range of the light-shielding layer 110. Therefore, the remaining filtering material layer 120 does not exceed the range of another pixel.
Thus, a pixel having the primary color is formed. The remaining pixels can also be formed with pixels of other primary colors in steps S108 to S114. For example, the steps S108 and S110 are repeated three times to form pixels of three primary colors (red, green and blue).
In the above exposure step, the trapezoidal notch 231 of the exposure opening 230 changes the scattering path of a part of the light beam, thereby reducing the chance of the light beam exciting the filter material layer 120. The amount of contamination that evaporates is greatly reduced, further reducing the instances of fogging of the patterned mask 200.
Although the color filter substrate 100 and the patterned mask 200 of the above-mentioned embodiments are described in which the filter material layer 120 is exemplified by one trapezoidal protrusion 121, the exposure opening 230 is exemplified by one trapezoidal recess 231. However, the number of the trapezoid projections 121 and the trapezoid recesses 231 is not limited to the invention, and the number of the trapezoid projections 121 and the trapezoid recesses 231 may be two, three, or even more. The designer can select the appropriate number of trapezoidal protrusions 121 and trapezoidal recesses 231 according to the product requirements and the process conditions. For clarity of description of various embodiments, the second embodiment and the third embodiment are further described below.
Second embodiment
Referring to fig. 4, a schematic diagram of a color filter substrate 300 according to a second embodiment of the invention is shown. The color filter substrate 300 of the present embodiment is different from the color filter substrate 100 of the first embodiment in that: the filter material layer 320 of the present embodiment has two trapezoidal protrusions, and the rest of the same parts are not repeated.
As shown in fig. 4, the filter material layer 320 has a first trapezoidal protrusion 321 and a second trapezoidal protrusion 322, and the first trapezoidal protrusion 321 and the second trapezoidal protrusion 322 correspond to the first light-transmitting long side 111a and the second light-transmitting long side 111b of the light-transmitting opening 111, respectively. The first trapezoidal protrusions 321 and the second trapezoidal protrusions 322 are staggered. The first trapezoidal protrusion 321 is located at one third of the first light-transmitting long side 111a, and the second trapezoidal protrusion 322 is located at two thirds of the second light-transmitting long side 111 b.
The first trapezoidal protrusion 321 and the second trapezoidal protrusion 322 of this embodiment are substantially similar to the trapezoidal protrusion 121 of the first embodiment, and will not be repeated here. And the area of the first trapezoidal protrusion 321 is substantially equal to the area of the second trapezoidal protrusion 322.
In addition, the patterned mask 400 corresponding to the color filter substrate 300 of the present embodiment also has a corresponding structure. Referring to fig. 5, a schematic diagram of a patterned mask 400 according to a second embodiment is shown. The patterned mask 400 of the present embodiment is different from the patterned mask 200 of the first embodiment in that: the exposure opening 430 of this embodiment has two trapezoidal openings, and the rest of the same points will not be repeated.
As shown in fig. 5, the exposure opening 430 has a first trapezoidal opening 431 and a second trapezoidal opening 432. The first trapezoidal recess 321 and the second trapezoidal recess 432 are respectively located on the first exposure long side 230a and the second exposure long side 230b of the exposure opening 430. The first trapezoidal recesses 431 and the second trapezoidal recesses 432 are staggered. The first trapezoidal notch 431 is located at one-third of the first exposed long side 230a, and the second trapezoidal notch 432 is located at two-thirds of the second exposed long side 230 b.
The first trapezoidal recess 431 and the second trapezoidal recess 432 of the present embodiment are substantially similar to the shape of the trapezoidal recess 231 of the first embodiment, and will not be repeated herein. And the area of the first trapezoidal recess 431 is substantially equal to the area of the second trapezoidal recess 432.
As described above, the first exposure long side 230a and the second exposure long side 230b of the exposure opening 430 can change the scattering path of the partial light beam through the first trapezoidal recess 431 and the second trapezoidal recess 432, respectively. Thus, excessive light beam reception at the same position of the filter material layer 320 can be avoided, so as to reduce the volatilization amount of the contaminants.
Third embodiment
Referring to fig. 6, a schematic diagram of a color filter substrate 500 according to a third embodiment of the invention is shown. The color filter substrate 500 of the present embodiment is different from the color filter substrate 100 of the first embodiment in that: the filter material layer 520 of the present embodiment has three trapezoidal protrusions, and the rest of the same parts will not be repeated.
As shown in fig. 6, the filter material layer 520 has a first trapezoidal protrusion 521, a second trapezoidal protrusion 522 and a third trapezoidal protrusion 523. The first trapezoidal protrusions 521, the second trapezoidal protrusions 522, and the third trapezoidal protrusions 523 are arranged in a staggered manner. The first trapezoidal protrusion 521 corresponds to a midpoint of the first light-transmitting long side 111a of the light-transmitting opening 111, and the second trapezoidal protrusion 522 and the third trapezoidal protrusion 523 correspond to one quarter and three quarters of the second light-transmitting long side 111b of the light-transmitting opening 111, respectively.
The first trapezoidal protrusion 521, the second trapezoidal protrusion 522 and the third trapezoidal protrusion 523 of the present embodiment are substantially similar to the trapezoidal protrusion 121 of the first embodiment, and will not be repeated here. Wherein the area of the first trapezoidal protrusion 521 is larger than that of the second trapezoidal protrusion 522, and the area of the second trapezoidal protrusion 522 is equal to that of the third trapezoidal protrusion 523.
In addition, the patterned mask 600 corresponding to the color filter substrate 500 of the present embodiment also has a corresponding structure. Referring to fig. 7, a schematic diagram of a patterned mask 600 according to a third embodiment of the invention is shown. The patterned mask 600 of the present embodiment is different from the patterned mask 200 of the first embodiment in that: the exposure opening 630 of the present embodiment has three trapezoidal openings, and the rest of the same points are not repeated.
As shown in fig. 7, the exposure opening 630 has a first trapezoid recess 631, a second trapezoid recess 632 and a third trapezoid recess 633. The first trapezoid notch 631 is located at the midpoint of the first exposure long side 230a of the exposure opening 630, and the second trapezoid notch 632 and the third trapezoid notch 633 are located at one quarter and three quarters of the second exposure long side 230b of the exposure opening 630.
The first, second and third trapezoidal recesses 631, 632 and 633 of the present embodiment are substantially similar to the trapezoidal recess 230 of the first embodiment, and will not be repeated here. Wherein the area of the first trapezoidal recess 631 is greater than the area of the second trapezoidal recess 632, and the area of the second trapezoidal recess 632 is equal to the area of the third trapezoidal recess 633.
As described above, the first exposure long edge 230a and the second exposure long edge 230b of the exposure opening 630 can respectively pass through the first trapezoidal notch 631, the second trapezoidal notch 632, and the third trapezoidal notch 633 to change the scattering path of the partial light beam. In this way, excessive light beam reception at the same location of the filter material layer 520 can be avoided, so as to reduce the volatilization of the contaminants.
While the invention has been described with reference to the preferred embodiments, it is to be understood that the invention is not limited thereto. Those skilled in the art can make various changes and modifications without departing from the spirit and scope of the invention. Therefore, the protection scope of the present invention should be determined by the appended claims.
Claims (7)
1. A color filter substrate, comprising:
a light-shielding layer having a light-transmitting opening; and
a light filtering material layer at least covering the light transmitting opening, the light filtering material layer having a first trapezoidal protrusion corresponding to a first long light transmitting side of the light transmitting opening and covering a part of the light shielding layer, wherein the light filtering material layer is formed by exposing a patterned mask, the patterned mask includes a light shielding pattern layer having an exposure opening with a first trapezoidal notch located at a first long exposure side of the exposure opening, the first trapezoidal notch corresponding to the trapezoidal protrusion; wherein,
the filter material layer further has a second trapezoidal protrusion and a third trapezoidal protrusion, the first trapezoidal protrusion is corresponding to the midpoint of the first light-transmitting long side of the light-transmitting opening, and the second trapezoidal protrusion and the third trapezoidal protrusion are respectively corresponding to one quarter and three quarters of a second light-transmitting long side of the light-transmitting opening.
2. The color filter substrate according to claim 1, wherein the filter material layer further has a second trapezoidal protrusion, and the first trapezoidal protrusion and the second trapezoidal protrusion correspond to the first light-transmissive long side and the second light-transmissive long side of the light-transmissive opening, respectively.
3. The color filter substrate according to claim 2, wherein the first trapezoidal projection has an area larger than that of the second trapezoidal projection, and the second trapezoidal projection has an area equal to that of the third trapezoidal projection.
4. The color filter substrate according to claim 1, wherein the first trapezoidal projection has a projection short side and a projection long side, the projection short side being located outside the projection long side.
5. The color filter substrate according to claim 4, wherein the first trapezoidal projection has a projection oblique side, and the projection oblique side forms an angle with the projection long side of more than 30 degrees.
6. The color filter substrate according to claim 1, wherein the first trapezoidal projection is an isosceles trapezoid.
7. The color filter substrate according to claim 1, wherein the first trapezoidal projection is located within the light-shielding layer.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2007101964979A CN101169550B (en) | 2007-12-04 | 2007-12-04 | Colorful filter substrate and pattern mask |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2007101964979A CN101169550B (en) | 2007-12-04 | 2007-12-04 | Colorful filter substrate and pattern mask |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNA2009101455624A Division CN101587200A (en) | 2007-12-04 | 2007-12-04 | Colored filter substrate and pattern mask |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN101169550A CN101169550A (en) | 2008-04-30 |
| CN101169550B true CN101169550B (en) | 2010-06-02 |
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| CN2007101964979A Expired - Fee Related CN101169550B (en) | 2007-12-04 | 2007-12-04 | Colorful filter substrate and pattern mask |
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Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9454073B2 (en) * | 2014-02-10 | 2016-09-27 | SK Hynix Inc. | Photomask blank and photomask for suppressing heat absorption |
| CN106324933B (en) * | 2016-10-12 | 2019-08-13 | 深圳市华星光电技术有限公司 | Thin-film transistor array base-plate and preparation method thereof and liquid crystal display panel |
| CN106707609B (en) * | 2017-03-24 | 2019-09-03 | 京东方科技集团股份有限公司 | Manufacturing method, color membrane substrates and the display panel of color membrane substrates |
| CN118483845A (en) | 2019-01-07 | 2024-08-13 | 群创光电股份有限公司 | Electronic device |
| CN111929993A (en) * | 2020-08-20 | 2020-11-13 | 深圳市爱普拓思科技有限公司 | Exposure device |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1523380A (en) * | 2003-02-18 | 2004-08-25 | 夏普株式会社 | Composite membrane and manufacturing method of the same, color filter and display device equipped therewith |
| CN1580916A (en) * | 2003-08-06 | 2005-02-16 | Nec液晶技术株式会社 | Active-matrix color LCD device having a polished color filter substrate |
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2007
- 2007-12-04 CN CN2007101964979A patent/CN101169550B/en not_active Expired - Fee Related
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1523380A (en) * | 2003-02-18 | 2004-08-25 | 夏普株式会社 | Composite membrane and manufacturing method of the same, color filter and display device equipped therewith |
| CN1580916A (en) * | 2003-08-06 | 2005-02-16 | Nec液晶技术株式会社 | Active-matrix color LCD device having a polished color filter substrate |
Non-Patent Citations (1)
| Title |
|---|
| JP特开平11-194070A 1999.07.21 |
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