CN108155126B - 晶圆转移装置及晶圆清洗装置 - Google Patents
晶圆转移装置及晶圆清洗装置 Download PDFInfo
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- CN108155126B CN108155126B CN201711438787.XA CN201711438787A CN108155126B CN 108155126 B CN108155126 B CN 108155126B CN 201711438787 A CN201711438787 A CN 201711438787A CN 108155126 B CN108155126 B CN 108155126B
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- wafer
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- cleaning
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67023—Apparatus for fluid treatment for general liquid treatment, e.g. etching followed by cleaning
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
Description
Claims (9)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201711438787.XA CN108155126B (zh) | 2017-12-26 | 2017-12-26 | 晶圆转移装置及晶圆清洗装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201711438787.XA CN108155126B (zh) | 2017-12-26 | 2017-12-26 | 晶圆转移装置及晶圆清洗装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN108155126A CN108155126A (zh) | 2018-06-12 |
CN108155126B true CN108155126B (zh) | 2021-07-16 |
Family
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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CN201711438787.XA Active CN108155126B (zh) | 2017-12-26 | 2017-12-26 | 晶圆转移装置及晶圆清洗装置 |
Country Status (1)
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CN (1) | CN108155126B (zh) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109015314A (zh) * | 2018-09-07 | 2018-12-18 | 杭州众硅电子科技有限公司 | 一种化学机械平坦化设备 |
CN110534472B (zh) * | 2019-09-06 | 2021-05-25 | 杭州众硅电子科技有限公司 | 一种晶圆传输机械手及其晶圆翻转方法 |
US11908720B2 (en) | 2018-10-15 | 2024-02-20 | Hangzhou Sizone Electronic Technology Inc. | CMP wafer cleaning equipment, wafer transfer robot and wafer flipping method |
CN110752169B (zh) * | 2019-10-21 | 2022-03-22 | 西安奕斯伟材料科技有限公司 | 一种晶圆处理装置和上下料方法 |
CN115241103A (zh) * | 2020-05-06 | 2022-10-25 | 杭州众硅电子科技有限公司 | 一种晶圆传输装置、传输方法及cmp设备清洗模块 |
CN112371611B (zh) * | 2020-10-13 | 2022-02-01 | 江苏亚电科技有限公司 | 一种无篮晶圆清洗装置 |
CN112992747B (zh) * | 2021-02-10 | 2022-01-25 | 江苏亚电科技有限公司 | 一种晶圆清洗的进出料装置 |
CN112614802B (zh) * | 2021-03-08 | 2021-07-06 | 杭州众硅电子科技有限公司 | 一种用于cmp清洗单元搬运晶圆的机械手及方法 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1577760A (zh) * | 2003-07-11 | 2005-02-09 | 株式会社三社电机制作所 | 半导体晶片的清洗方法和清洗装置 |
CN104658953A (zh) * | 2013-11-21 | 2015-05-27 | 斯克林集团公司 | 基板搬运方法及基板处理装置 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100402947B1 (ko) * | 2000-11-30 | 2003-10-30 | 내일시스템주식회사 | 웨이퍼 프레임에 접착된 테이프제거기용 트랜스퍼 |
KR101452095B1 (ko) * | 2013-03-27 | 2014-10-17 | 세메스 주식회사 | 트레이 이송 장치 |
CN105870045B (zh) * | 2016-05-04 | 2018-05-18 | 中国电子科技集团公司第四十五研究所 | 晶圆搬运装置及使用方法 |
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2017
- 2017-12-26 CN CN201711438787.XA patent/CN108155126B/zh active Active
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1577760A (zh) * | 2003-07-11 | 2005-02-09 | 株式会社三社电机制作所 | 半导体晶片的清洗方法和清洗装置 |
CN104658953A (zh) * | 2013-11-21 | 2015-05-27 | 斯克林集团公司 | 基板搬运方法及基板处理装置 |
Non-Patent Citations (1)
Title |
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CMP后清洗技术发展历程;周国安等;《电子工业专用设备》;20130820(第08期);全文 * |
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Publication number | Publication date |
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CN108155126A (zh) | 2018-06-12 |
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PB01 | Publication | ||
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SE01 | Entry into force of request for substantive examination | ||
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GR01 | Patent grant | ||
GR01 | Patent grant | ||
TR01 | Transfer of patent right | ||
TR01 | Transfer of patent right |
Effective date of registration: 20220316 Address after: 100176 Room 101, floor 2, building 2, No. 1, Taihe 3rd Street, Beijing Economic and Technological Development Zone, Daxing District, Beijing Patentee after: Beijing ShuoKe precision electronic equipment Co.,Ltd. Address before: 1 Taihe 3rd Street, Beijing Economic and Technological Development Zone, Beijing Patentee before: BEIJING SEMICONDUCTOR EQUIPMENT INSTITUTE (THE 45TH Research Institute OF CETC) |
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CP03 | Change of name, title or address | ||
CP03 | Change of name, title or address |
Address after: 100176 101, floor 2, building 2, No. 1, Taihe Third Street, economic and Technological Development Zone, Daxing District, Beijing Patentee after: Beijing Jingyi Precision Technology Co.,Ltd. Address before: 100176 Room 101, floor 2, building 2, No. 1, Taihe 3rd Street, Beijing Economic and Technological Development Zone, Daxing District, Beijing Patentee before: Beijing ShuoKe precision electronic equipment Co.,Ltd. |
|
IP01 | Partial invalidation of patent right |
Commission number: 4W117705 Conclusion of examination: The patent right is maintained valid based on the claims 1-8 submitted by the patentee on June 28, 2024. Decision date of declaring invalidation: 20241105 Decision number of declaring invalidation: 582725 Denomination of invention: Wafer transfer device wafer cleaning device Granted publication date: 20210716 Patentee: Beijing Jingyi Precision Technology Co.,Ltd. |