[go: up one dir, main page]
More Web Proxy on the site http://driver.im/

CN105486246A - Spherical surface interference splicing measuring device and adjusting method thereof - Google Patents

Spherical surface interference splicing measuring device and adjusting method thereof Download PDF

Info

Publication number
CN105486246A
CN105486246A CN201510739697.9A CN201510739697A CN105486246A CN 105486246 A CN105486246 A CN 105486246A CN 201510739697 A CN201510739697 A CN 201510739697A CN 105486246 A CN105486246 A CN 105486246A
Authority
CN
China
Prior art keywords
dimensional
adjustment mechanism
adjust
platform
dimensional adjustment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201510739697.9A
Other languages
Chinese (zh)
Inventor
于瀛洁
宋琨鹏
汪清泉
郭红卫
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
University of Shanghai for Science and Technology
Original Assignee
University of Shanghai for Science and Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by University of Shanghai for Science and Technology filed Critical University of Shanghai for Science and Technology
Priority to CN201510739697.9A priority Critical patent/CN105486246A/en
Publication of CN105486246A publication Critical patent/CN105486246A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00Measuring arrangements characterised by the use of optical techniques
    • G01B11/24Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
    • G01B11/2441Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures using interferometry

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Instruments For Measurement Of Length By Optical Means (AREA)

Abstract

本发明涉及一种球面误差干涉拼接测量装置及其调整方法。装置包括干涉仪、支座、六维调整架、CGH、一维导轨平台、被测件、一维调整机构、二维调整机构、四维调整机构、电控升降台。调整方法用于对上述的球面干涉拼接测量装置进行调整。本装置能够方便、快速、准确调整球面被测件以满足测量要求,有效的解决了被测球面零件在测量中安装和调整困难的问题,实现其全口径检测。

The invention relates to a spherical error interference splicing measurement device and an adjustment method thereof. The device includes an interferometer, a support, a six-dimensional adjustment frame, a CGH, a one-dimensional rail platform, a test piece, a one-dimensional adjustment mechanism, a two-dimensional adjustment mechanism, a four-dimensional adjustment mechanism, and an electric control lifting platform. The adjustment method is used to adjust the above-mentioned spherical interference stitching measurement device. The device can conveniently, quickly and accurately adjust the spherical measured part to meet the measurement requirements, effectively solves the problem of difficult installation and adjustment of the measured spherical part during measurement, and realizes its full-caliber detection.

Description

球面干涉拼接测量装置及其调整方法Spherical surface interference splicing measuring device and its adjustment method

技术领域 technical field

本发明涉及一种球面误差检测装置及方法,特别是一种球面干涉拼接测量装置及其调整方法。 The invention relates to a spherical surface error detection device and method, in particular to a spherical surface interference splicing measurement device and an adjustment method thereof.

背景技术 Background technique

随着科技水平和工业水平的发展,在现代的工业生产中对大口径光学零件的要求越来越高。采用传统的方法,使用干涉仪对大型球面光学零件测量,需要较大的干涉仪和参考镜,加工周期长,而且加工成本高,采用拼接干涉方法可以解决这个问题。对于球面误差的拼接干涉测量装置及方法,虽然它能够高精度测量,但其被测件的安装调整较为困难,而且对被测件的调整精度要求非常高,阻挠了此方法的发展推广。 With the development of scientific and technological level and industrial level, the requirements for large-diameter optical parts are getting higher and higher in modern industrial production. Using the traditional method, using interferometers to measure large spherical optical parts requires large interferometers and reference mirrors, resulting in long processing cycles and high processing costs. The splicing interferometric method can solve this problem. For the splicing interferometry device and method of spherical error, although it can measure with high precision, it is difficult to install and adjust the tested part, and the adjustment accuracy of the tested part is very high, which hinders the development and promotion of this method.

发明内容 Contents of the invention

本发明的目的在于针对已有技术存在的缺陷,提供一种球面干涉拼接测量装置及其调整方法,能够实现对被测件的快速、有效、精确调整。 The purpose of the present invention is to provide a spherical interference splicing measurement device and its adjustment method for the defects in the prior art, which can realize fast, effective and accurate adjustment of the measured piece.

为了达到上述目的,本发明的构思是: In order to achieve the above object, design of the present invention is:

利用拼接思想测量球面零件,由于测量的子孔径较小,要进行拼接检测,被测件不仅要实现上下移动,还要调整使被测件的球心与计算全息片(Computer-GeneratedHologram,CGH)产生的球面波的焦点重合,并且实现在被测件旋转过程中其球心与球面波焦点始终重合。 Using the splicing idea to measure spherical parts, because the measured sub-aperture is small, to perform splicing detection, the tested part must not only move up and down, but also adjust the spherical center of the tested part to the computer-generated hologram (Computer-GeneratedHologram, CGH) The focus of the generated spherical wave coincides, and the center of the sphere and the focus of the spherical wave are always coincident during the rotation of the tested object.

调整机构分两部分,一部分使被测件的球心与调整台的旋转中心线重合,保持这部分不变,调整另一部分使被测件的球心与CGH产生的球面波焦点重合,可以确保被测件在旋转过程中被测件的球心与CGH产生的球面波焦点重合,稳定测量;一维升降台实现被测件的上下移动;测量过程中,将被测表面反射光点控制在十字交叉线中心,确保每个子孔径都有干涉条纹。该调整机构及其调整方法最终实现球面零件的全口径检测。 The adjustment mechanism is divided into two parts, one part makes the spherical center of the tested part coincide with the rotation center line of the adjustment table, keep this part unchanged, and adjust the other part so that the spherical center of the tested part coincides with the focus of the spherical wave generated by CGH, which can ensure During the rotation of the tested piece, the spherical center of the tested piece coincides with the focal point of the spherical wave generated by CGH, and the measurement is stable; the one-dimensional lifting platform realizes the up and down movement of the tested piece; during the measurement process, the reflected light point on the tested surface is controlled at Center the crosshairs to ensure that each subaperture has interference fringes. The adjustment mechanism and its adjustment method finally realize the full-diameter detection of spherical parts.

根据上述的发明构思,本发明采用下述技术方案: According to above-mentioned inventive design, the present invention adopts following technical scheme:

一种球面干涉拼接测量装置,包括干涉仪、支座、六维调整架、CGH、一维导轨平台、被测件、一维调整机构、二维调整机构、四维调整机构、电控升降台;所述支座上安装干涉仪和一维导轨平台,所述一维导轨平台上安装六维调整架,所述CGH安装在六维调整架上,使干涉仪出射光轴能够通过CGH的中心,并且能调整CGH与被测件之间的距离;由所述一维调整机构、二维调整机构、四维调整机构和电控升降台组成被测件调节机构,被测件调节机构下端是电控升降台,所述电控升降台上面固定四维调整机构,用来调整被测件的球心与CGH产生的球面波焦点重合,所述四维调整机构上面固定二维调整机构,用来调整被测件的球心与被测件调节机构的旋转中心线重合,所述一维调节机构固定在二维调整机构上,一维调节机构上面固定被测件。 A spherical interference splicing measurement device, including an interferometer, a support, a six-dimensional adjustment frame, a CGH, a one-dimensional guide rail platform, a test piece, a one-dimensional adjustment mechanism, a two-dimensional adjustment mechanism, a four-dimensional adjustment mechanism, and an electric control lifting platform; An interferometer and a one-dimensional guide rail platform are installed on the support, a six-dimensional adjustment frame is installed on the one-dimensional guide rail platform, and the CGH is installed on the six-dimensional adjustment frame, so that the interferometer exit optical axis can pass through the center of the CGH, And it can adjust the distance between the CGH and the tested piece; the tested piece adjustment mechanism is composed of the one-dimensional adjustment mechanism, the two-dimensional adjustment mechanism, the four-dimensional adjustment mechanism and the electric control lifting platform. Lifting platform, a four-dimensional adjustment mechanism is fixed on the electric control lifting platform, which is used to adjust the spherical center of the measured piece to coincide with the focus of the spherical wave generated by CGH, and a two-dimensional adjustment mechanism is fixed on the four-dimensional adjustment mechanism, which is used to adjust the measured The sphere center of the piece coincides with the rotation center line of the adjustment mechanism of the tested piece, the one-dimensional adjustment mechanism is fixed on the two-dimensional adjustment mechanism, and the tested piece is fixed on the one-dimensional adjustment mechanism.

所述一维导轨平台是:安装板两侧固定滑轨,两个滑块分别沿滑轨的平行方向自由移动,两个滑块上面固定连接板;连接板上面固定六维调整架。 The one-dimensional guide rail platform is as follows: slide rails are fixed on both sides of the installation plate, two sliders move freely along the parallel direction of the slide rails, a connection plate is fixed on the two sliders, and a six-dimensional adjustment frame is fixed on the connection plate.

所述一维调整机构是:被测件固定在旋转轴上,旋转轴固定在第一精密转动平台上,第一精密转动平台固定在连接板上,满足被测件绕着旋转轴自转自由度的调节。 The one-dimensional adjustment mechanism is: the tested piece is fixed on the rotating shaft, the rotating shaft is fixed on the first precision rotating platform, and the first precision rotating platform is fixed on the connecting plate, so that the degree of freedom of the tested piece around the rotating shaft is satisfied. adjustment.

所述二维调整机构是:上二维直动平台上面固定连接板,满足被测件水平面上前后左右移动两个自由度的调节。 The two-dimensional adjustment mechanism is: the connecting plate is fixed on the upper two-dimensional direct motion platform, which satisfies the adjustment of the two degrees of freedom of the measured piece moving forward, backward, left, and right on the horizontal plane.

所述四维调整机构是:下二维直动平台上面固定一维竖直方向直动平台,而第二精密转动平台固定在该一维竖直直动平台上,满足被测件水平方向前后左右移动,水平旋转,上下移动四个自由度的调节。 The four-dimensional adjustment mechanism is: a one-dimensional vertical linear motion platform is fixed on the lower two-dimensional linear motion platform, and the second precision rotating platform is fixed on the one-dimensional vertical linear motion platform, so as to meet the requirements of the horizontal direction, front, back, left, and right of the measured piece Four degrees of freedom adjustment for movement, horizontal rotation, and up and down movement.

一种球面干涉拼接测量装置的调整方法,用于对上述的球面干涉拼接测量装置进行调整,操作步骤如下: A method for adjusting a spherical interference stitching measuring device, which is used to adjust the above-mentioned spherical interference stitching measuring device, the operation steps are as follows:

1)安装调整CGH:CGH安装在六维调整架上,将六维调整架安装在一维导轨平台上; 1) Install and adjust CGH: CGH is installed on the six-dimensional adjustment frame, and the six-dimensional adjustment frame is installed on the one-dimensional guide rail platform;

2)调整二维调整机构:使用水平的千分表对被测件进行调心:调心是将千分表指针顶在被测件上,通过调整上二维直动平台来调节被测件球面的球心位置,直至千分表示数在被测件转动过程中几乎不变; 2) Adjust the two-dimensional adjustment mechanism: use a horizontal dial gauge to align the tested part: centering is to put the pointer of the dial indicator on the tested part, and adjust the tested part by adjusting the upper two-dimensional direct motion platform The position of the center of the sphere until the number expressed in thousand is almost unchanged during the rotation of the tested part;

3)调整一维导轨平台与电控升降台:移动一维导轨平台和电控升降台的位置,使CGH与被测件的球心距离为CGH产生的球面波的后焦点,并且调整被测件在适合的高度;调整CGH的方位,使干涉仪光轴垂直通过CGH的中心; 3) Adjust the one-dimensional guide rail platform and the electric control lifting platform: move the position of the one-dimensional guide rail platform and the electric control lifting platform, so that the distance between the CGH and the center of the test piece is the back focus of the spherical wave generated by the CGH, and adjust the measured The components are at a suitable height; adjust the orientation of the CGH so that the optical axis of the interferometer passes through the center of the CGH vertically;

4)调整四维调整机构:首先在光源模式下找到反射光斑,通过调节下二维直动平台和一维竖直直动平台,将反射光斑逐渐调至十字交叉线中心;再切换至条纹模式进行细调,根据干涉条纹不同而调节不同自由度:面对干涉仪,竖条纹则调节左右移动,横条纹则调节上下移动,中间疏两边密条纹则调节离焦;干涉条纹越少,被测件球心与球面波焦点重合越好; 4) Adjust the four-dimensional adjustment mechanism: first find the reflected light spot in the light source mode, and gradually adjust the reflected light spot to the center of the cross line by adjusting the two-dimensional linear motion platform and the one-dimensional vertical motion platform; then switch to the stripe mode for further adjustment. Fine adjustment, adjust different degrees of freedom according to different interference fringes: facing the interferometer, vertical stripes can be adjusted to move left and right, horizontal stripes can be adjusted to move up and down, and dense stripes in the middle can be adjusted to defocus; the less interference fringes, the better The better the center of the sphere coincides with the focal point of the spherical wave;

5)保持步骤3)的状态,对被测件再进行一次调心,并切换至光源模式,根据被测件的大小,调整第一精密转动平台至一定角度,重复步骤4); 5) Keep the state of step 3), perform another alignment on the tested part, and switch to the light source mode, adjust the first precision rotating platform to a certain angle according to the size of the tested part, and repeat step 4);

6)不断调整第一精密转动平台,并切换至光源模式,使光点不偏出十字交叉中心,确保在条纹模式下被测件转动一周,每个位置都有干涉条纹图,实现整周检测。 6) Constantly adjust the first precision rotating platform, and switch to the light source mode, so that the light spot does not deviate from the center of the cross, to ensure that the tested part rotates a circle in the stripe mode, and each position has an interference fringe pattern to realize the whole circle detection .

7)对于较大的被测件,重复步骤5)和6),直至被测件的所有区域测量完毕。 7) For a larger DUT, repeat steps 5) and 6) until all areas of the DUT are measured.

与现有技术相比,本发明球面干涉拼接测量装置及其调整方法的有益效果是: Compared with the prior art, the beneficial effects of the spherical interference splicing measurement device and its adjustment method of the present invention are:

本装置能够方便、快速、准确调整球面被测件以满足测量要求,有效的解决了被测球面零件在测量中安装和调整困难的问题,实现其全口径检测。 The device can conveniently, quickly and accurately adjust the spherical measured part to meet the measurement requirements, effectively solve the problem of difficult installation and adjustment of the measured spherical part during measurement, and realize its full-caliber detection.

附图说明 Description of drawings

图1是球面干涉拼接测量装置的整体结构示意图。 Figure 1 is a schematic diagram of the overall structure of a spherical interference stitching measurement device.

图2是球面干涉拼接测量装置中被测件调节机构的结构示意图。 Fig. 2 is a structural schematic diagram of the adjustment mechanism of the measured piece in the spherical interference splicing measurement device.

图3是一维调整机构的结构示意图。 Fig. 3 is a schematic structural diagram of the one-dimensional adjustment mechanism.

图4是二维调整机构的结构示意图。 Fig. 4 is a structural schematic diagram of a two-dimensional adjustment mechanism.

图5是四维调整机构的结构示意图。 Fig. 5 is a structural schematic diagram of a four-dimensional adjustment mechanism.

图6是CGH六维调整架的结构示意图。 Figure 6 is a schematic diagram of the structure of the CGH six-dimensional adjustment frame.

图7是一维导轨平台的结构示意图。 Fig. 7 is a schematic structural diagram of a one-dimensional rail platform.

具体实施方式 detailed description

本发明实施例结合附图说明如下: Embodiments of the present invention are described as follows in conjunction with accompanying drawings:

实施例一:Embodiment one:

如图1所示,一种球面干涉拼接测量装置,包括干涉仪1、支座2、六维调整架3、CGH4、一维导轨平台5、被测件6、一维调整机构7、二维调整机构8、四维调整机构9、电控升降台10;所述支座2上安装干涉仪1和一维导轨平台5,所述一维导轨平台5上安装六维调整架3,所述CGH4安装在六维调整架3上,使干涉仪1出射光轴能够通过CGH4的中心,并且能调整CGH4与被测件6之间的距离;由所述一维调整机构7、二维调整机构8、四维调整机构9和电控升降台10组成被测件调节机构,被测件调节机构下端是电控升降台10,所述电控升降台10上面固定四维调整机构9,用来调整被测件6的球心与CGH4产生的球面波焦点重合,所述四维调整机构9上面固定二维调整机构8,用来调整被测件6的球心与被测件调节机构的旋转中心线重合,所述一维调节机构7固定在二维调整机构8上,一维调节机构7上面固定被测件6。 As shown in Figure 1, a spherical interference splicing measurement device includes an interferometer 1, a support 2, a six-dimensional adjustment frame 3, a CGH4, a one-dimensional guide rail platform 5, a test piece 6, a one-dimensional adjustment mechanism 7, a two-dimensional Adjustment mechanism 8, four-dimensional adjustment mechanism 9, electric control lifting platform 10; interferometer 1 and one-dimensional guide rail platform 5 are installed on the support 2, six-dimensional adjustment frame 3 is installed on the one-dimensional guide rail platform 5, and the CGH4 Installed on the six-dimensional adjustment frame 3, so that the exit optical axis of the interferometer 1 can pass through the center of the CGH4, and the distance between the CGH4 and the measured object 6 can be adjusted; by the one-dimensional adjustment mechanism 7 and the two-dimensional adjustment mechanism 8 , the four-dimensional adjustment mechanism 9 and the electronically controlled lifting platform 10 form the measured piece adjusting mechanism, the lower end of the tested piece adjusting mechanism is the electronically controlled lifting platform 10, and the four-dimensional adjusting mechanism 9 is fixed on the above described electronically controlled lifting platform 10, which is used to adjust the measured The center of the sphere of the piece 6 coincides with the focal point of the spherical wave generated by the CGH4, and the two-dimensional adjustment mechanism 8 is fixed on the four-dimensional adjustment mechanism 9, which is used to adjust the center of the sphere of the tested piece 6 to coincide with the rotation centerline of the tested piece adjustment mechanism, The one-dimensional adjustment mechanism 7 is fixed on the two-dimensional adjustment mechanism 8 , and the test piece 6 is fixed on the one-dimensional adjustment mechanism 7 .

所述装置中干涉仪1是:Zygo公司型号为GPIXP/D的干涉仪,640X480CCD图像采集,采用激光三维相移干涉法,激光发生器为氦-氖激光波长632.8nm,能产生一束标准平面波,平面测量精度达到λ/20。 Interferometer 1 in the described device is: Zygo company model is the interferometer of GPIXP/D, 640X480CCD image acquisition, adopts laser three-dimensional phase-shift interferometry, laser generator is helium-neon laser wavelength 632.8nm, can produce a standard plane wave , the plane measurement accuracy reaches λ/20.

所述CGH4及其配套的六维调整架3是:Zygo公司产品。干涉仪1产生的平面波经过CGH4转换为球面波入射到被测件6的表面,携带者被测球面6表面面形信息的反射波第二次反向通过CGH4,进入干涉仪1中,与标准平面波发生干涉,在CCD中显示干涉条纹图;所述六维调整架3的五个旋钮18,19,20,21,22通过不同的组合来控制CGH4六个自由度的姿态。 The CGH4 and its supporting six-dimensional adjustment frame 3 are products of Zygo Company. The plane wave generated by the interferometer 1 is converted into a spherical wave by CGH4 and incident on the surface of the measured object 6, and the reflected wave carrying the surface shape information of the measured spherical surface 6 passes through the CGH4 for the second time and enters the interferometer 1. The plane wave interferes, and the interference fringe pattern is displayed in the CCD; the five knobs 18, 19, 20, 21, and 22 of the six-dimensional adjustment frame 3 control the attitude of the six degrees of freedom of the CGH4 through different combinations.

所述一维导轨平台5是:安装板23两侧固定滑轨24,24’,两个滑块25,25’分别沿滑轨24,24’的平行方向自由移动,两个滑块25,25’上面固定连接板26;连接板26上面固定六维调整架3。 The one-dimensional guide rail platform 5 is: fixed slide rails 24, 24' on both sides of the mounting plate 23, two slide blocks 25, 25' move freely along the parallel directions of the slide rails 24, 24' respectively, two slide blocks 25, The connecting plate 26 is fixed on the top of 25 ′; the six-dimensional adjustment frame 3 is fixed on the connecting plate 26 .

所述一维调整机构7是:被测件6固定在旋转轴12上,旋转轴12固定在第一精密转动平台11上,第一精密转动平台11固定在连接板13,13’上,满足被测件6绕着旋转轴12自转自由度的调节。 The one-dimensional adjustment mechanism 7 is: the tested object 6 is fixed on the rotating shaft 12, the rotating shaft 12 is fixed on the first precision rotating platform 11, and the first precision rotating platform 11 is fixed on the connecting plates 13, 13', satisfying The adjustment of the degree of freedom of the measured object 6 around the rotation axis 12 .

所述二维调整机构8是:上二维直动平台14,14’上面固定连接板13,13’,满足被测件6水平面上前后左右移动两个自由度的调节。 The two-dimensional adjustment mechanism 8 is: the upper two-dimensional direct motion platform 14, 14' fixes the connecting plates 13, 13', which satisfies the adjustment of the two degrees of freedom of the measured piece 6 moving forward, backward, left, and right on the horizontal plane.

所述四维调整机构9是:下二维直动平台17,17’上面固定一维竖直方向直动平台16,而第二精密转动平台15固定在该一维竖直直动平台16上,满足被测件6水平方向前后左右移动,水平旋转,上下移动四个自由度的调节。 The four-dimensional adjustment mechanism 9 is: the lower two-dimensional linear motion platform 17, 17' is fixed with a one-dimensional vertical motion platform 16, and the second precision rotating platform 15 is fixed on the one-dimensional vertical motion platform 16, It satisfies the adjustment of four degrees of freedom for the measured piece 6 to move forward, backward, left, and right in the horizontal direction, to rotate horizontally, and to move up and down.

所述电控升降台10是:采购产品型号为PSAV100-ZF,配有一维42/57步进电机驱动控制器,产品编号为SC300-1B,可实现被测件6竖直方向的移动和定位。 The electronically controlled lifting platform 10 is: the purchased product model is PSAV100-ZF, equipped with a one-dimensional 42/57 stepper motor drive controller, and the product number is SC300-1B, which can realize the vertical movement and positioning of the tested part 6 .

实施例二:Embodiment two:

一种球面干涉拼接测量装置的调整方法,用于对上述的球面干涉拼接测量装置进行调整,操作步骤如下: A method for adjusting a spherical interference stitching measuring device, which is used to adjust the above-mentioned spherical interference stitching measuring device, the operation steps are as follows:

1)安装调整CGH4:CGH4安装在六维调整架3上,将六维调整架3安装在一维导轨平台5上; 1) Install and adjust CGH4: CGH4 is installed on the six-dimensional adjustment frame 3, and the six-dimensional adjustment frame 3 is installed on the one-dimensional guide rail platform 5;

2)调整二维调整机构8:使用水平的千分表对被测件6进行调心:调心是将千分表指针顶在被测件6上,通过调整上二维直动平台14,14’来调节被测件6球面的球心位置,直至千分表示数在被测件6转动过程中几乎不变; 2) Adjust the two-dimensional adjustment mechanism 8: use a horizontal dial indicator to align the tested part 6: centering is to put the pointer of the dial gauge on the tested part 6, and adjust the upper two-dimensional direct motion platform 14, 14' to adjust the position of the center of the spherical surface of the tested piece 6 until the thousandth indicator is almost constant during the rotation of the tested piece 6;

3)调整一维导轨平台5与电控升降台10:移动一维导轨平台5和电控升降台10的位置,使CGH4与被测件6的球心距离为CGH4产生的球面波的后焦点,并且调整被测件6在适合的高度;调整CGH4的方位,使干涉仪1光轴垂直通过CGH4的中心; 3) Adjust the one-dimensional guide rail platform 5 and the electric control lifting platform 10: move the positions of the one-dimensional guide rail platform 5 and the electric control lifting platform 10, so that the distance between the center of the sphere between CGH4 and the DUT 6 is the back focus of the spherical wave generated by CGH4 , and adjust the DUT 6 at a suitable height; adjust the orientation of CGH4 so that the optical axis of interferometer 1 passes through the center of CGH4 vertically;

4)调整四维调整机构9:首先在光源模式下找到反射光斑,通过调节下二维直动平台17,17’和一维竖直直动平台16,将反射光斑逐渐调至十字交叉线中心;再切换至条纹模式进行细调,根据干涉条纹不同而调节不同自由度:面对干涉仪1,竖条纹则调节左右移动,横条纹则调节上下移动,中间疏两边密条纹则调节离焦;干涉条纹越少,被测件6球心与球面波焦点重合越好; 4) Adjust the four-dimensional adjustment mechanism 9: first find the reflected light spot in the light source mode, and gradually adjust the reflected light spot to the center of the cross line by adjusting the two-dimensional linear motion platform 17, 17' and the one-dimensional vertical linear motion platform 16; Then switch to the fringe mode for fine adjustment, and adjust different degrees of freedom according to different interference fringes: facing the interferometer 1, the vertical stripes are adjusted to move left and right, the horizontal stripes are adjusted to move up and down, and the dense stripes in the middle are adjusted to defocus; interference The fewer fringes, the better the coincidence between the center of the test piece 6 and the focus of the spherical wave;

5)保持步骤3)的状态,对被测件6再进行一次调心,并切换至光源模式,根据被测件6的大小,调整第一精密转动平台11至一定角度,重复步骤4); 5) Keep the state of step 3), perform another alignment on the DUT 6, and switch to the light source mode, adjust the first precision rotating platform 11 to a certain angle according to the size of the DUT 6, and repeat step 4);

6)不断调整第一精密转动平台11,并切换至光源模式,使光点不偏出十字交叉中心,确保在条纹模式下被测件6转动一周,每个位置都有干涉条纹图,实现整周检测。 6) Constantly adjust the first precision rotating platform 11, and switch to the light source mode, so that the light spot does not deviate from the center of the cross, and ensure that the tested part 6 rotates once in the fringe mode, and each position has an interference fringe pattern, realizing the whole Weekly testing.

7)对于较大的被测件6,重复步骤5)和6),直至被测件6的所有区域测量完毕。 7) For a larger DUT 6, repeat steps 5) and 6) until all areas of the DUT 6 are measured.

Claims (5)

1.一种球面干涉拼接测量装置,其特征在于:包括干涉仪(1)、支座(2)、六维调整架(3)、CGH(4)、一维导轨平台(5)、被测件(6)、一维调整机构(7)、二维调整机构(8)、四维调整机构(9)、电控升降台(10);所述支座(2)上安装干涉仪(1)和一维导轨平台(5),所述一维导轨平台(5)上安装六维调整架(3),所述CGH(4)安装在六维调整架(3)上,使干涉仪(1)出射光轴能够通过CGH(4)的中心,并且能调整CGH(4)与被测件(6)之间的距离;由所述一维调整机构(7)、二维调整机构(8)、四维调整机构(9)和电控升降台(10)组成被测件调节机构,被测件调节机构下端是电控升降台(10),所述电控升降台(10)上面固定四维调整机构(9),用来调整被测件(6)的球心与CGH(4)产生的球面波焦点重合,所述四维调整机构(9)上面固定二维调整机构(8),用来调整被测件(6)的球心与被测件调节机构的旋转中心线重合,所述一维调节机构(7)固定在二维调整机构(8)上,一维调节机构(7)上面固定被测件(6)。 1. A spherical interference splicing measurement device, characterized in that it includes an interferometer (1), a support (2), a six-dimensional adjustment frame (3), a CGH (4), a one-dimensional guide rail platform (5), and a measured (6), one-dimensional adjustment mechanism (7), two-dimensional adjustment mechanism (8), four-dimensional adjustment mechanism (9), electric control lifting platform (10); the interferometer (1) is installed on the support (2) and a one-dimensional guide rail platform (5), the six-dimensional adjustment frame (3) is installed on the one-dimensional guide rail platform (5), and the CGH (4) is installed on the six-dimensional adjustment frame (3), so that the interferometer (1 ) The outgoing optical axis can pass through the center of the CGH (4), and the distance between the CGH (4) and the measured object (6) can be adjusted; the one-dimensional adjustment mechanism (7), the two-dimensional adjustment mechanism (8) , the four-dimensional adjustment mechanism (9) and the electric control lifting platform (10) constitute the adjustment mechanism of the tested piece, the lower end of the testing piece adjustment mechanism is the electric control lifting platform (10), and the four-dimensional adjustment mechanism is fixed on the electric control lifting platform (10). The mechanism (9) is used to adjust the spherical center of the test piece (6) to coincide with the focal point of the spherical wave generated by the CGH (4), and the two-dimensional adjustment mechanism (8) is fixed on the four-dimensional adjustment mechanism (9) to adjust The sphere center of the tested piece (6) coincides with the rotation center line of the tested piece adjustment mechanism, the one-dimensional adjustment mechanism (7) is fixed on the two-dimensional adjustment mechanism (8), and the one-dimensional adjustment mechanism (7) is fixed on the DUT (6). 2.根据权利要求1所述的球面干涉拼接测量装置,其特征在于:所述一维调整机构(7)是:被测件(6)固定在旋转轴(12)上,旋转轴(12)固定在第一精密转动平台(11)上,第一精密转动平台(11)固定在连接板(13,13’)上,满足被测件(6)绕着旋转轴(12)自转自由度的调节。 2. The spherical interference splicing measurement device according to claim 1, characterized in that: the one-dimensional adjustment mechanism (7) is: the measured piece (6) is fixed on the rotating shaft (12), and the rotating shaft (12) It is fixed on the first precision rotating platform (11), and the first precision rotating platform (11) is fixed on the connecting plate (13, 13'), satisfying the degree of freedom of the test piece (6) around the rotation axis (12) adjust. 3.根据权利要求1所述的球面干涉拼接测量装置,其特征在于:所述二维调整机构(8)是:上二维直动平台(14,14’)上面固定连接板(13,13’),满足被测件(6)水平面上前后左右移动两个自由度的调节。 3. The spherical surface interference splicing measurement device according to claim 1, characterized in that: the two-dimensional adjustment mechanism (8) is: the upper two-dimensional linear motion platform (14, 14') is fixed on the connecting plate (13, 13 ') to meet the adjustment of the two degrees of freedom of the measured piece (6) moving forward, backward, left, and right on the horizontal plane. 4.根据权利要求1所述的球面干涉拼接测量装置,其特征在于:所述四维调整机构(9)是:下二维直动平台(17,17’)上面固定一维竖直方向直动平台(16),而第二精密转动平台(15)固定在该一维竖直直动平台(16)上,满足被测件(6)水平方向前后左右移动,水平旋转,上下移动四个自由度的调节。 4. The spherical interference splicing measuring device according to claim 1, characterized in that: the four-dimensional adjustment mechanism (9) is: a one-dimensional vertical motion fixed on the lower two-dimensional linear motion platform (17, 17') platform (16), and the second precision rotating platform (15) is fixed on the one-dimensional vertical linear motion platform (16), satisfying the four freedoms of the tested piece (6) moving back and forth, horizontally, horizontally, and up and down. degree of adjustment. 5.一种球面干涉拼接测量装置的调整方法,用于对权利要求1所述的球面干涉拼接测量装置进行调整,其特征在于,操作步骤如下: 5. A method for adjusting a spherical interference stitching measurement device, used to adjust the spherical interference stitching measurement device according to claim 1, characterized in that the operating steps are as follows: 1)安装调整CGH(4):CGH(4)安装在六维调整架(3)上,将六维调整架(3)安装在一维导轨平台(5)上; 1) Install and adjust CGH (4): CGH (4) is installed on the six-dimensional adjustment frame (3), and the six-dimensional adjustment frame (3) is installed on the one-dimensional guide rail platform (5); 2)调整二维调整机构(8):使用水平的千分表对被测件(6)进行调心:调心是将千分表指针顶在被测件(6)上,通过调整上二维直动平台(14,14’)来调节被测件(6)球面的球心位置,直至千分表示数在被测件(6)转动过程中几乎不变; 2) Adjust the two-dimensional adjustment mechanism (8): Use a horizontal dial gauge to align the tested piece (6): centering is to put the pointer of the dial gauge on the tested piece (6), and adjust the upper two Adjust the position of the center of the spherical surface of the test piece (6) with a three-dimensional straight-moving platform (14, 14') until the thousandth indicator is almost unchanged during the rotation of the test piece (6); 3)调整一维导轨平台(5)与电控升降台(10):移动一维导轨平台(5)和电控升降台(10)的位置,使CGH(4)与被测件(6)的球心距离为CGH(4)产生的球面波的后焦点,并且调整被测件(6)在适合的高度;调整CGH(4)的方位,使干涉仪(1)光轴垂直通过CGH(4)的中心; 3) Adjust the one-dimensional guide rail platform (5) and the electric control lifting platform (10): move the position of the one-dimensional guide rail platform (5) and the electric control lifting platform (10), so that the CGH (4) and the DUT (6) The distance from the center of the sphere is the back focus of the spherical wave generated by the CGH (4), and adjust the measured object (6) at a suitable height; adjust the orientation of the CGH (4) so that the optical axis of the interferometer (1) passes through the CGH ( 4) the center; 4)调整四维调整机构(9):首先在光源模式下找到反射光斑,通过调节下二维直动平台(17,17’)和一维竖直直动平台(16),将反射光斑逐渐调至十字交叉线中心;再切换至条纹模式进行细调,根据干涉条纹不同而调节不同自由度:面对干涉仪(1),竖条纹则调节左右移动,横条纹则调节上下移动,中间疏两边密条纹则调节离焦;干涉条纹越少,被测件(6)球心与球面波焦点重合越好; 4) Adjust the four-dimensional adjustment mechanism (9): first find the reflected light spot in the light source mode, and gradually adjust the reflected light spot by adjusting the two-dimensional linear motion platform (17, 17') and the one-dimensional vertical linear motion platform (16). To the center of the cross line; then switch to the fringe mode for fine adjustment, and adjust different degrees of freedom according to different interference fringes: facing the interferometer (1), the vertical stripes are adjusted to move left and right, and the horizontal stripes are adjusted to move up and down, and the two sides are sparse in the middle The dense fringes adjust the defocus; the less the interference fringes, the better the center of the test piece (6) coincides with the focus of the spherical wave; 5)保持步骤3)的状态,对被测件(6)再进行一次调心,并切换至光源模式,根据被测件(6)的大小,调整第一精密转动平台(11)至一定角度,重复步骤4); 5) Keep the state of step 3), and then adjust the center of the test piece (6) again, and switch to the light source mode, and adjust the first precision rotating platform (11) to a certain angle according to the size of the test piece (6) , repeat step 4); 6)不断调整第一精密转动平台(11),并切换至光源模式,使光点不偏出十字交叉中心,确保在条纹模式下被测件(6)转动一周,每个位置都有干涉条纹图,实现整周检测; 6) Constantly adjust the first precision rotating platform (11), and switch to the light source mode, so that the light spot does not deviate from the center of the cross, and ensure that the tested part (6) rotates once in the fringe mode, and there are interference fringes at each position Figure, to achieve the whole week detection; 7)对于较大的被测件(6),重复步骤5)和6),直至被测件(6)的所有区域测量完毕。 7) For a larger DUT (6), repeat steps 5) and 6) until all areas of the DUT (6) are measured.
CN201510739697.9A 2015-11-04 2015-11-04 Spherical surface interference splicing measuring device and adjusting method thereof Pending CN105486246A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201510739697.9A CN105486246A (en) 2015-11-04 2015-11-04 Spherical surface interference splicing measuring device and adjusting method thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201510739697.9A CN105486246A (en) 2015-11-04 2015-11-04 Spherical surface interference splicing measuring device and adjusting method thereof

Publications (1)

Publication Number Publication Date
CN105486246A true CN105486246A (en) 2016-04-13

Family

ID=55673385

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201510739697.9A Pending CN105486246A (en) 2015-11-04 2015-11-04 Spherical surface interference splicing measuring device and adjusting method thereof

Country Status (1)

Country Link
CN (1) CN105486246A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105911647A (en) * 2016-05-18 2016-08-31 华中科技大学 Multi-core fan-in and fan-out module coupling encapsulation system
CN108151645A (en) * 2018-01-25 2018-06-12 武汉工程大学 A kind of detachable globular measuring instrument for white light interferometer
CN111536896A (en) * 2020-04-09 2020-08-14 中国科学院长春光学精密机械与物理研究所 A kind of laser interference surface shape detection automatic detection device and method
CN113515003A (en) * 2021-03-25 2021-10-19 深圳市海塞姆科技有限公司 Integrated light source radiating support
CN115036046A (en) * 2022-05-19 2022-09-09 中国人民解放军火箭军工程大学 Wide-angle VISAR ball cavity target assembly error simulation device

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101251435A (en) * 2008-03-14 2008-08-27 中国人民解放军国防科学技术大学 Large optical mirror sub-aperture stitching workstation
CN101709955A (en) * 2009-11-24 2010-05-19 中国科学院长春光学精密机械与物理研究所 Device for detecting surface shape of optical aspheric surface by sub-aperture stitching interferometer
CN103175486A (en) * 2013-03-07 2013-06-26 上海大学 Device and method for splicing interferometry of cylindricity errors
US20140132960A1 (en) * 2012-04-16 2014-05-15 National University Of Defense Technology Near-Null Compensator and Figure Metrology Apparatus for Measuring Aspheric Surfaces by Subaperture Stitching and Measuring Method Thereof
CN103913127A (en) * 2013-11-26 2014-07-09 北京航空航天大学 Digital holography spherical surface type detection device based on subaperture phase stitching
CN103994731A (en) * 2014-05-26 2014-08-20 上海大学 Cylindrical surface interference splicing measuring device and adjusting method thereof
CN104330050A (en) * 2014-11-05 2015-02-04 上海大学 Dynamic interference splicing measuring device and method for large-caliber optical elements

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101251435A (en) * 2008-03-14 2008-08-27 中国人民解放军国防科学技术大学 Large optical mirror sub-aperture stitching workstation
CN101709955A (en) * 2009-11-24 2010-05-19 中国科学院长春光学精密机械与物理研究所 Device for detecting surface shape of optical aspheric surface by sub-aperture stitching interferometer
US20140132960A1 (en) * 2012-04-16 2014-05-15 National University Of Defense Technology Near-Null Compensator and Figure Metrology Apparatus for Measuring Aspheric Surfaces by Subaperture Stitching and Measuring Method Thereof
CN103175486A (en) * 2013-03-07 2013-06-26 上海大学 Device and method for splicing interferometry of cylindricity errors
CN103913127A (en) * 2013-11-26 2014-07-09 北京航空航天大学 Digital holography spherical surface type detection device based on subaperture phase stitching
CN103994731A (en) * 2014-05-26 2014-08-20 上海大学 Cylindrical surface interference splicing measuring device and adjusting method thereof
CN104330050A (en) * 2014-11-05 2015-02-04 上海大学 Dynamic interference splicing measuring device and method for large-caliber optical elements

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105911647A (en) * 2016-05-18 2016-08-31 华中科技大学 Multi-core fan-in and fan-out module coupling encapsulation system
CN105911647B (en) * 2016-05-18 2018-04-03 华中科技大学 A kind of multicore fan-in fan-out modular coupling package system
CN108151645A (en) * 2018-01-25 2018-06-12 武汉工程大学 A kind of detachable globular measuring instrument for white light interferometer
CN108151645B (en) * 2018-01-25 2024-01-16 武汉工程大学 Detachable spherical measuring instrument for white light interferometer
CN111536896A (en) * 2020-04-09 2020-08-14 中国科学院长春光学精密机械与物理研究所 A kind of laser interference surface shape detection automatic detection device and method
CN111536896B (en) * 2020-04-09 2022-06-07 中国科学院长春光学精密机械与物理研究所 A kind of laser interference surface shape detection automatic detection device and method
CN113515003A (en) * 2021-03-25 2021-10-19 深圳市海塞姆科技有限公司 Integrated light source radiating support
CN115036046A (en) * 2022-05-19 2022-09-09 中国人民解放军火箭军工程大学 Wide-angle VISAR ball cavity target assembly error simulation device
CN115036046B (en) * 2022-05-19 2025-03-07 中国人民解放军火箭军工程大学 Wide-angle VISAR spherical cavity target assembly error simulation device

Similar Documents

Publication Publication Date Title
CN103994731B (en) Cylinder interferes splicing measuring device and its method of adjustment
CN105627947B (en) A kind of measuring method and its measurement apparatus of the unknown aspheric surface error of rotational symmetry
CN107121095B (en) A method and device for accurately measuring a super large radius of curvature
CN105157606B (en) Contactless complicated optical surface profile high precision three-dimensional measurement method and measurement apparatus
CN105486246A (en) Spherical surface interference splicing measuring device and adjusting method thereof
CN102175433B (en) Lens center error measuring system based on interference principle
CN106643550B (en) Three-dimensional shape measuring device and method based on digital holographic scanning
CN106092514B (en) Optical heterogeneity measuring device and method based on dual wavelength fizeau interferometer
CN106840001A (en) The non-contact measurement apparatus and measuring method of optical lens center thickness
CN113899321B (en) Method and system for three-dimensional shape measurement of mirror object with concave mirror-assisted imaging
CN103822605B (en) Splicing measuring device of optical elements of large caliber profile
CN106813594A (en) Heavy caliber glancing incidence reflects focus lamp high-precision surface shape detection method
CN104315985B (en) Interferometric method for measuring central thickness of lens
CN106289111A (en) A kind of hexahedron vertical error measurement apparatus and method
CN102175189B (en) Double-beam interference lens center error measuring system
CN102305596A (en) Rotation error control device and method in spherical surface shape interference detection
CN106918301A (en) Plane surface shape sub-aperture stitching interferometer measurement apparatus and measuring method
CN105371782A (en) A rotating spherical interference splicing measurement device and its adjustment method
CN107063122B (en) The detection method and its device of surface shape of optical aspheric surface
CN113203553B (en) A lens center error measuring system and measuring method
CN103884270B (en) Measurement apparatus and the method for two dimension minute angle is produced when Circular gratings is installed
CN102865829B (en) Vertical wide-range high-precision optical plane proving installation
CN114577125B (en) Non-contact optical lens center thickness measuring method and measuring device
JP6232207B2 (en) Surface shape measuring device
CN105318843A (en) Method for detecting absolute surface shape of cylindrical lens using conjugate difference approach

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
WD01 Invention patent application deemed withdrawn after publication
WD01 Invention patent application deemed withdrawn after publication

Application publication date: 20160413