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CH601492A5 - - Google Patents

Info

Publication number
CH601492A5
CH601492A5 CH145176A CH145176A CH601492A5 CH 601492 A5 CH601492 A5 CH 601492A5 CH 145176 A CH145176 A CH 145176A CH 145176 A CH145176 A CH 145176A CH 601492 A5 CH601492 A5 CH 601492A5
Authority
CH
Switzerland
Application number
CH145176A
Inventor
Jiri Dlouhy
Original Assignee
Bbc Brown Boveri & Cie
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Bbc Brown Boveri & Cie filed Critical Bbc Brown Boveri & Cie
Priority to CH145176A priority Critical patent/CH601492A5/xx
Priority to DE19762608323 priority patent/DE2608323A1/en
Priority to DE19767606084 priority patent/DE7606084U1/en
Publication of CH601492A5 publication Critical patent/CH601492A5/xx

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
CH145176A 1976-02-06 1976-02-06 CH601492A5 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
CH145176A CH601492A5 (en) 1976-02-06 1976-02-06
DE19762608323 DE2608323A1 (en) 1976-02-06 1976-02-28 ARRANGEMENT FOR SPRAYING SOLIDS IN HIGH VACUUM, IN PARTICULAR DIELECTRIC MATERIALS IN AC CATHODE SPRAYING SYSTEMS
DE19767606084 DE7606084U1 (en) 1976-02-06 1976-02-28 ARRANGEMENT FOR SPRAYING SOLIDS IN HIGH VACUUM, IN PARTICULAR DIELECTRIC MATERIALS IN AC CATHODE SPRAYING SYSTEMS

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH145176A CH601492A5 (en) 1976-02-06 1976-02-06

Publications (1)

Publication Number Publication Date
CH601492A5 true CH601492A5 (en) 1978-07-14

Family

ID=4210768

Family Applications (1)

Application Number Title Priority Date Filing Date
CH145176A CH601492A5 (en) 1976-02-06 1976-02-06

Country Status (2)

Country Link
CH (1) CH601492A5 (en)
DE (2) DE2608323A1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19527476A1 (en) * 1995-07-27 1997-01-30 Leybold Ag Sputtering target with highly adherent sputtering material - bonded to base plate by inexpensive metal powder-contg. epoxide adhesive

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2685011B1 (en) * 1991-12-13 1994-02-04 Elf Aquitaine Ste Nale PROCESS FOR THE PREPARATION OF A TARGET ELEMENT FOR CATHODE SPRAYING AND TARGETS, ESPECIALLY LARGE AREAS, MADE FROM THIS ELEMENT.
US6340415B1 (en) 1998-01-05 2002-01-22 Applied Materials, Inc. Method and apparatus for enhancing a sputtering target's lifetime
DE102006008973B4 (en) * 2006-02-23 2014-09-11 Von Ardenne Anlagentechnik Gmbh Coolable carrier plate for targets in vacuum atomizing systems
DE202015100433U1 (en) 2014-01-30 2015-02-09 Fhr Anlagenbau Gmbh Joining connection between two elements

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19527476A1 (en) * 1995-07-27 1997-01-30 Leybold Ag Sputtering target with highly adherent sputtering material - bonded to base plate by inexpensive metal powder-contg. epoxide adhesive

Also Published As

Publication number Publication date
DE2608323A1 (en) 1977-08-11
DE7606084U1 (en) 1978-01-26

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Legal Events

Date Code Title Description
PL Patent ceased
PL Patent ceased