[go: up one dir, main page]
More Web Proxy on the site http://driver.im/

Madey et al., 1985 - Google Patents

9. Experimental Methods in Electron-and Photon-Stimulated Desorption

Madey et al., 1985

Document ID
13469778664210743737
Author
Madey T
Stockbauer R
Publication year
Publication venue
Methods in Experimental Physics

External Links

Snippet

Publisher Summary This chapter discusses the theoretical developments and experimental advances in electron-stimulated desorption (ESD) and photon-stimulated desorption (PSD). It explains the basic experimental methodology of ESD and PSD; experimental techniques …
Continue reading at www.sciencedirect.com (other versions)

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation not covered by G01N21/00 or G01N22/00, e.g. X-rays or neutrons
    • G01N23/22—Investigating or analysing materials by the use of wave or particle radiation not covered by G01N21/00 or G01N22/00, e.g. X-rays or neutrons by measuring secondary emission
    • G01N23/225—Investigating or analysing materials by the use of wave or particle radiation not covered by G01N21/00 or G01N22/00, e.g. X-rays or neutrons by measuring secondary emission using electron or ion microprobe or incident electron or ion beam
    • G01N23/2251—Investigating or analysing materials by the use of wave or particle radiation not covered by G01N21/00 or G01N22/00, e.g. X-rays or neutrons by measuring secondary emission using electron or ion microprobe or incident electron or ion beam with incident electron beam
    • G01N23/2252—Investigating or analysing materials by the use of wave or particle radiation not covered by G01N21/00 or G01N22/00, e.g. X-rays or neutrons by measuring secondary emission using electron or ion microprobe or incident electron or ion beam with incident electron beam and measuring excited X-rays
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/07—Investigating materials by wave or particle radiation secondary emission
    • G01N2223/076—X-ray fluorescence
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation not covered by G01N21/00 or G01N22/00, e.g. X-rays or neutrons
    • G01N23/20—Investigating or analysing materials by the use of wave or particle radiation not covered by G01N21/00 or G01N22/00, e.g. X-rays or neutrons by using diffraction of the radiation, e.g. for investigating crystal structure; by using reflection of the radiation
    • G01N23/207—Investigating or analysing materials by the use of wave or particle radiation not covered by G01N21/00 or G01N22/00, e.g. X-rays or neutrons by using diffraction of the radiation, e.g. for investigating crystal structure; by using reflection of the radiation by means of diffractometry using detectors, e.g. using an analysing crystal or a crystal to be analysed in a central position and one or more displaceable detectors in circumferential positions
    • G01N23/2076—Investigating or analysing materials by the use of wave or particle radiation not covered by G01N21/00 or G01N22/00, e.g. X-rays or neutrons by using diffraction of the radiation, e.g. for investigating crystal structure; by using reflection of the radiation by means of diffractometry using detectors, e.g. using an analysing crystal or a crystal to be analysed in a central position and one or more displaceable detectors in circumferential positions for spectrometry, i.e. using an analysing crystal, e.g. for measuring X-ray fluorescence spectrum of a sample with wavelength-dispersion, i.e. WDXFS
    • H—ELECTRICITY
    • H01—BASIC ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/10—Different kinds of radiation or particles
    • G01N2223/102—Different kinds of radiation or particles beta or electrons
    • H—ELECTRICITY
    • H01—BASIC ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a micro-scale
    • H01J2237/3174—Etching microareas
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using infra-red, visible or ultra-violet light
    • G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
    • G01N21/71—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light thermally excited
    • H—ELECTRICITY
    • H01—BASIC ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00—Particle spectrometer or separator tubes
    • H01J49/02—Details
    • H01J49/10—Ion sources; Ion guns
    • H—ELECTRICITY
    • H01—BASIC ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00—Particle spectrometer or separator tubes
    • H01J49/26—Mass spectrometers or separator tubes

Similar Documents

Publication Publication Date Title
US5087815A (en) High resolution mass spectrometry of recoiled ions for isotopic and trace elemental analysis
Taglauer et al. Surface analysis with low energy ion scattering
Honig Surface and thin film analysis of semiconductor materials
Rabalais Direct recoil spectrometry
Binetti et al. Abstractive chemisorption of O 2 on Al (111)
US6291820B1 (en) Highly charged ion secondary ion mass spectroscopy
Madey et al. 9. Experimental Methods in Electron-and Photon-Stimulated Desorption
Heiland et al. 6. Ion Scattering and Secondary-Ion Mass Spectrometry
Evans Jr Ion probe mass spectrometry: Overview
Vasile The reaction probability of XeF2 with silicon
JP5480621B2 (en) Devices and methods for determining surface properties
Holloway et al. Chemical characterization of coatings by analytical techniques sensitive to the surface and near-surface
Djurić et al. Measurement of light fragments in dissociative excitation of molecular ions: CD+
Higatsberger Solid surfaces analysis
Whitten et al. Electron-stimulated desorption of neutrals from methanol-dosed Al (111)-velocity distributions and adsorbate decomposition determined by nonresonant laser ionization
David New trends in ion-beam analysis
Zhang et al. Electron diffraction as a structure tool for charged and neutral nanoclusters formed in superfluid helium droplets
Borg et al. Forensic analysis of samples from the nuclear fuel cycle
US5796101A (en) Method of processing nucleic acids
PARK Chemical analysis of surfaces
Madey et al. British vacuum council annual address—1988: Electron and photon stimulated deosrption: benefits and difficulties
Whitten Electron-stimulated desorption from aluminum surfaces
Winter Dissociation of Fast H+ 2-molecular ions in grazing surface collisions
Compton et al. Simple processes at the gas-solid interface
Wobrauschek et al. X-ray fluorescence analysis