[go: up one dir, main page]
More Web Proxy on the site http://driver.im/

Soliman et al., 2018 - Google Patents

Vacuum Ultraviolet Treatment of Acid-and Ester-Terminated Self-Assembled Monolayers: Chemical Conversions and Friction Reduction

Soliman et al., 2018

Document ID
12273586518081517923
Author
Soliman A
Utsunomiya T
Ichii T
Sugimura H
Publication year
Publication venue
Langmuir

External Links

Snippet

We have prepared COOH-and COOCH3-terminated self-assembled monolayers (SAMs) from undec-10-enoic acid (UDA) and methyl undec-10-enoate (MUDO) molecules on hydrogen-terminated silicon (H–Si) substrates through ultraviolet (UV) irradiation. The as …
Continue reading at pubs.acs.org (other versions)

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/165—Monolayers, e.g. Langmuir-Blodgett
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANO-TECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANO-STRUCTURES; MEASUREMENT OR ANALYSIS OF NANO-STRUCTURES; MANUFACTURE OR TREATMENT OF NANO-STRUCTURES
    • B82Y30/00—Nano-technology for materials or surface science, e.g. nano-composites

Similar Documents

Publication Publication Date Title
Peters et al. Using self-assembled monolayers exposed to X-rays to control the wetting behavior of thin films of diblock copolymers
Jung et al. Vapor-phase self-assembled monolayer for improved mold release in nanoimprint lithography
Wang et al. Growth of ultrasmooth octadecyltrichlorosilane self-assembled monolayers on SiO2
Zhou et al. Molecular layer deposition of functional thin films for advanced lithographic patterning
Peters et al. A near edge X-ray absorption fine structure spectroscopy investigation of the structure of self-assembled films of octadecyltrichlorosilane
Jeon et al. Structure and stability of patterned self-assembled films of octadecyltrichlorosilane formed by contact printing
Ye et al. Mechanism of UV photoreactivity of alkylsiloxane self-assembled monolayers
Peng et al. A route to nanoscopic materials via sequential infiltration synthesis on block copolymer templates
Liu et al. A study of alkyl chain conformational changes in self-assembled n-octadecyltrichlorosilane monolayers on fused silica surfaces
Childs et al. Masterless Soft Lithography: Patterning UV/Ozone− Induced Adhesion on Poly (dimethylsiloxane) Surfaces
Genzer et al. Molecular orientation and grafting density in semifluorinated self-assembled monolayers of mono-, di-, and trichloro silanes on silica substrates
Li et al. Patterned polymer films via reactive silane infusion-induced wrinkling
Suh et al. Orientation of block copolymer resists on interlayer dielectrics with tunable surface energy
Julthongpiput et al. Gradient chemical micropatterns: a reference substrate for surface nanometrology
Alang Ahmad et al. Protein Patterning by UV-Induced Photodegradation of Poly (oligo (ethylene glycol) methacrylate) Brushes
Pan et al. Photochemical modification and patterning of polymer surfaces by surface adsorption of photoactive block copolymers
Hobbs et al. Selective sidewall wetting of polymer blocks in hydrogen silsesquioxane directed self-assembly of PS-b-PDMS
Vos et al. Chemical vapor deposition of azidoalkylsilane monolayer films
Niwa et al. Formation of molecular templates for fabricating on-chip biosensing devices
Zhou et al. Highly sensitive, patternable organic films at the nanoscale made by bottom-up assembly
Mischki et al. Reaction of alkenes with hydrogen-terminated and photooxidized silicon surfaces. A comparison of thermal and photochemical processes
Soliman et al. Low damage reductive patterning of oxidized alkyl self-assembled monolayers through vacuum ultraviolet light irradiation in an evacuated environment
Jung et al. Improved pattern transfer in nanoimprint lithography at 30 nm half-pitch by substrate− surface functionalization
Luo et al. Hydrophobic modification of silica surfaces via grafting alkoxy groups
Ito et al. Nanometer-resolved fluidity of an oleophilic monomer between silica surfaces modified with fluorinated monolayers for nanoimprinting