LMCsとは 意味・読み方・使い方

To prevent the adsorption of LMCS (low molecule siloxane) to a wafer, and to remove the LMCS adsorbed on the wafer.例文帳に追加

ウェハへのＬＭＣＳの吸着を防ぐことおよびウェハに吸着したＬＭＣＳを除去すること。 - 特許庁

To prevent adhesion of LMCS onto a wafer, and to remove LMCS adhering to the wafer.例文帳に追加

ウェハへのＬＭＣＳの吸着を防ぐことおよびウェハに吸着したＬＭＣＳを除去すること。 - 特許庁

(3) After the LMCS material generated in the atmosphere in which the LMCS generating process is performed, is subjected to a particle-forming process under high-energy states, processes other than this process are performed in an atmosphere, which is isolated from the atmosphere in which the LMCS generating process is performed.例文帳に追加

（３）ＬＭＣＳを発生する工程を行う雰囲気内で発生したＬＭＣＳの材料を高エネルギー状態下で粒子化した後、除去してＬＭＣＳを発生する工程を行う雰囲気とは隔離された雰囲気中でこの工程以外の工程を行う。 - 特許庁

(3) Fine particles are generated in a high energy state from a material of LMCS generated in the atmosphere for performing a process for generating LMCS and then removed, and each process other than the process is performed in an atmosphere separated from the atmosphere for performing the process for generating LMCS.例文帳に追加

（３）ＬＭＣＳを発生する工程を行う雰囲気内で発生したＬＭＣＳの材料を高エネルギー状態下で粒子化した後、除去してＬＭＣＳを発生する工程を行う雰囲気とは隔離された雰囲気中でこの工程以外の工程を行う。 - 特許庁

(5) A spare buffer chamber filled with inert gas is provided in the semiconductor element manufacturing device, and a member for the semiconductor element contaminated with LMCS is subjected to heating treatment in the chamber.例文帳に追加

（５）半導体素子製造装置内に不活性ガスを充満させた予備バッファ室を設け、この室内でＬＭＣＳで汚染された半導体素子用部材を加熱処理する。 - 特許庁

(5) A reserve buffer room in which inert gas is filled, is prepared in the device for manufacturing the semiconductor element, and a member for the semiconductor element contaminated with the LMCS in the room, is heat-treated.例文帳に追加

（５）半導体素子製造装置内に不活性ガスを充満させた予備バッファ室を設け、この室内でＬＭＣＳで汚染された半導体素子用部材を加熱処理する。 - 特許庁