• Lu Y, Chang Y and Chang Y. WB-trees. Proceedings of the 55th Annual Design Automation Conference. (1-6).

    https://doi.org/10.1145/3195970.3196137

  • Kuang J and Young E. Fixed-Parameter Tractable Algorithms for Optimal Layout Decomposition and Beyond. Proceedings of the 54th Annual Design Automation Conference 2017. (1-6).

    https://doi.org/10.1145/3061639.3062250

  • Zhang Y, Luk W, Yang Y, Zhou H, Yan C, Pan D and Zeng X. (2015). Layout Decomposition with Pairwise Coloring and Adaptive Multi-Start for Triple Patterning Lithography. ACM Transactions on Design Automation of Electronic Systems. 21:1. (1-25). Online publication date: 2-Dec-2015.

    https://doi.org/10.1145/2764904

  • Pan D, Liebmann L, Yu B, Xu X and Lin Y. Pushing multiple patterning in sub-10nm. Proceedings of the 52nd Annual Design Automation Conference. (1-6).

    https://doi.org/10.1145/2744769.2747940

  • Zhang Y, Luk W, Zhou H, Yan C and Zeng X. Layout decomposition with pairwise coloring for multiple patterning lithography. Proceedings of the International Conference on Computer-Aided Design. (170-177).

    /doi/10.5555/2561828.2561864

  • Yu B, Lin Y, Luk-Pat G, Ding D, Lucas K and Pan D. A high-performance triple patterning layout decomposer with balanced density. Proceedings of the International Conference on Computer-Aided Design. (163-169).

    /doi/10.5555/2561828.2561863

  • Kuang J and Young E. An efficient layout decomposition approach for triple patterning lithography. Proceedings of the 50th Annual Design Automation Conference. (1-6).

    https://doi.org/10.1145/2463209.2488818

  • Ghaida R and Gupta P. Role of design in multiple patterning. Proceedings of the Conference on Design, Automation and Test in Europe. (314-319).

    /doi/10.5555/2485288.2485366

  • Yu B, Gao J, Ding D, Ban Y, Yang J, Yuan K, Cho M and Pan D. Dealing with IC manufacturability in extreme scaling. Proceedings of the International Conference on Computer-Aided Design. (240-242).

    https://doi.org/10.1145/2429384.2429430

  • Gao J and Pan D. Flexible self-aligned double patterning aware detailed routing with prescribed layout planning. Proceedings of the 2012 ACM international symposium on International Symposium on Physical Design. (25-32).

    https://doi.org/10.1145/2160916.2160923

  • Abed I and Wassal A. Double-patterning friendly grid-based detailed routing with online conflict resolution. Proceedings of the Conference on Design, Automation and Test in Europe. (1475-1478).

    /doi/10.5555/2492708.2493069

  • Lin Y, Ban Y, Pan D and Li Y. DOPPLER. Proceedings of the International Conference on Computer-Aided Design. (283-289).

    /doi/10.5555/2132325.2132398

  • Ghaida R, Agarwal K, Nassif S, Yuan X, Liebmann L and Gupta P. A framework for double patterning-enabled design. Proceedings of the International Conference on Computer-Aided Design. (14-20).

    /doi/10.5555/2132325.2132329

  • Tang X and Cho M. Optimal layout decomposition for double patterning technology. Proceedings of the International Conference on Computer-Aided Design. (9-13).

    /doi/10.5555/2132325.2132328

  • Yu B, Yuan K, Zhang B, Ding D and Pan D. Layout decomposition for triple patterning lithography. Proceedings of the International Conference on Computer-Aided Design. (1-8).

    /doi/10.5555/2132325.2132327

  • Ban Y, Lucas K and Pan D. Flexible 2D layout decomposition framework for spacer-type double pattering lithography. Proceedings of the 48th Design Automation Conference. (789-794).

    https://doi.org/10.1145/2024724.2024901

  • Yuan K and Pan D. E-beam lithography stencil planning and optimization with overlapped characters. Proceedings of the 2011 international symposium on Physical design. (151-158).

    https://doi.org/10.1145/1960397.1960433

  • Marek-Sadowska M. On old and new routing problems. Proceedings of the 2011 international symposium on Physical design. (13-20).

    https://doi.org/10.1145/1960397.1960404

  • Luk W and Huang H. Fast and lossless graph division method for layout decomposition using SPQR-tree. Proceedings of the International Conference on Computer-Aided Design. (112-115).

    /doi/10.5555/2133429.2133451

  • Hsu C, Chang Y and Nassif S. Template-mask design methodology for double patterning technology. Proceedings of the International Conference on Computer-Aided Design. (107-111).

    /doi/10.5555/2133429.2133450

  • Yuan K and Pan D. WISDOM. Proceedings of the International Conference on Computer-Aided Design. (32-38).

    /doi/10.5555/2133429.2133436

  • Pan D. (2009). What is double patterning lithography and its impact on nanometer design?. ACM SIGDA Newsletter. 39:10. (1-1). Online publication date: 1-Oct-2009.

    https://doi.org/10.1145/1862879.1862880