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Quantum lithography: status of the field

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Abstract

This contribution provides an analysis of progress in the field of quantum lithography. We review the conceptual foundations of this idea and the status of research aimed at implementing this idea in the laboratory. The selection of a highly sensitive recording material that functions by means of multiphoton absorption seems crucial to the success of the proposal of quantum lithography. This review thus devotes considerable attention to these materials considerations.

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References

  1. Boto N., Kok P., Abrams D.S., Braunstein S.L., Williams C.P., Dowling J.P.: Quantum interferometric optical lithography: exploiting entanglement to beat the diffraction limit. Phys. Rev. Lett. 85, 2733–2736 (2000)

    Article  ADS  Google Scholar 

  2. Hong C.K., Ou Z.Y., Mandel L.: Measurement of subpicosecond time intervals between two photons by interference. Phys. Rev. Lett. 59, 2044 (1987)

    Article  ADS  Google Scholar 

  3. Fonseca E.J.S., Monken C.H., Pádua S.: Measurement of the de Broglie wavelength of a multiphoton wave packet. Phys. Rev. Lett. 82, 2868–2871 (1999)

    Article  ADS  Google Scholar 

  4. Edamatsu K., Shimizu R., Itoh T.: Measurement of the photonic de Broglie wavelength of entangled photon pairs generated by spontaneous parametric down-conversion. Phys. Rev. Lett. 89, 213601 (2002)

    Article  ADS  Google Scholar 

  5. Angelo M.D., Chekhova M.V., Shih Y.: Two-photon diffraction and quantum lithography. Phys. Rev. Lett. 87, 013602 (2001)

    Article  ADS  Google Scholar 

  6. Dowling J.P.: Quantum optical metrology—the lowdown on high-N00N states. Contemp. Phys. 49, 125–143 (2008)

    Article  ADS  Google Scholar 

  7. Agarwal G.S., Boyd R.W., Nagasako E.M., Bentley S.J.: Comment on ‘Quantum interferometric optical lithography: exploiting entanglement to beat the diffraction limit’. Phys. Rev. Lett. 86, 1389 (2001)

    Article  ADS  Google Scholar 

  8. Nagasako E.M., Bentley S.J., Boyd R.W., Agarwal G.S.: Nonclassical two-photon interferometry and lithography with high-gain optical parametric amplifiers. Phys. Rev. A 64, 043802 (2001)

    Article  ADS  Google Scholar 

  9. Nagasako E.M., Bentley S.J., Boyd R.W., Agarwal G.S.: Parametric downconversion vs. optical parametric amplification: a comparison of their quantum statistics. J. Mod. Opt. 49, 529–537 (2002)

    Article  ADS  Google Scholar 

  10. Agarwal G.S., Chan K.W., Boyd R.W., Cable H., Dowling J.P.: Quantum states of light produced by a high-gain optical parametric amplifier for use in quantum lithography. J. Opt. Soc. Am. B 24, 270 (2007)

    Article  ADS  Google Scholar 

  11. Glasser R.T., Cable H., Dowling J.P., De Martini F., Sciarrino F., Vitelli C.: Entanglement-seeded, dual, optical parametric amplification: applications to quantum imaging and metrology. Phys. Rev. A 78, 012339 (2008)

    Article  ADS  Google Scholar 

  12. Cable H., Vyas R., Singh S., Dowling J.P.: An optical parametric oscillator as a high-flux source of two-mode light for quantum lithography. New J. Phys. 11, 113055 (2009)

    Article  ADS  Google Scholar 

  13. Sciarrino F., Vitelli C., De Martini F., Glasser R., Cable H., Dowling J.P.: Experimental sub-Rayleigh resolution by an unseeded high-gain optical parametric amplifier for quantum lithography. Phys. Rev. A 77, 012324 (2008)

    Article  ADS  Google Scholar 

  14. Gea-Banacloche J.: Two-photon absorption of nonclassical light. Phys. Rev. Lett. 62, 1603 (1989)

    Article  ADS  Google Scholar 

  15. Javanainen J., Gould P.L.: Linear intensity dependence of a two-photon transition rate. Phys. Rev. A 41, 5088 (1990)

    Article  ADS  Google Scholar 

  16. Georgiades N.Ph., Polzik E.S., Edamatsu K., Kimble H.J.: Nonclassical excitation for atoms in a squeezed vacuum. Phys. Rev. Lett. 75, 3426 (1995)

    Article  ADS  Google Scholar 

  17. Steuernagel O.: On the concentration behaviour of entangled photons. J. Opt. B: Quantum Semiclassical Opt. 6, S606 (2004)

    Article  ADS  Google Scholar 

  18. Tsang M.: Relationship between resolution enhancement and multiphoton absorption ratein quantum lithography. Phys. Rev. A 75, 043813 (2007)

    Article  ADS  Google Scholar 

  19. Tsang M.: Fundamental quantum limit to the multiphoton absorption rate for monochromatic light. Phys. Rev. Lett. 101, 033602 (2008)

    Article  ADS  Google Scholar 

  20. Kothe, C., Bjork, G., Inoue, S., Bourennane, M.: arxiv quant-phy 1106.2250v1

  21. Peeters W.H., Renema J.J., van Exter M.P.: Engineering of two-photon spatial quantum correlations behind a double slit. Phys. Rev. A 79, 043817 (2009)

    Article  ADS  Google Scholar 

  22. Plick W.N., Wildfeuer C.F., Anisimov P.N., Dowling J.P.: Optimizing the multiphoton absorption properties of maximally path-entangled number states. Phys. Rev. A 80, 063825 (2009)

    Article  ADS  Google Scholar 

  23. Tsang M.: Quantum imaging beyond the diffraction limit by optical centroid measurements. Phys. Rev. Lett. 102, 253601 (2009)

    Article  ADS  Google Scholar 

  24. Hemmer R.P., Muthukrishnan A., Scully M.O., Zubairy M.S.: Quantum lithography with classical light. Phys. Rev. Lett. 96, 163603 (2006)

    Article  ADS  Google Scholar 

  25. Kok P., Boto A.N., Abrams D.S., Williams C.P., Braunstein S.L., Dowling J.P.: Quantum interferometric optical lithography: towards arbitrary two-dimensional patterns. Phys. Rev. A 63, 063407 (2001)

    Article  ADS  Google Scholar 

  26. Bjork G., Sanchez-Soto L.L., Soderholm J.: Entangled-state lithography: tailoring any pattern with a single state. Phys. Rev. Lett. 86, 4516–4519 (2001)

    Article  ADS  Google Scholar 

  27. Davis C.C., Atia W.A., Gungor A., Mazzoni D.L., Pilevar S., Smolyaninov I.I.: Scanning near-field optical microscopy and lithography with bare tapered optical fibers. Laser Phys. 7, 243–256 (1997)

    Google Scholar 

  28. Strekalov D.V., Stowe M.C., Chekhova M.V. et al.: Two-photon processes in faint biphoton fields. J. Mod. Opt. 49, 2349–2364 (2002)

    Article  ADS  Google Scholar 

  29. Dayan B., Pe’er A., Friesem A.A. et al.: Nonlinear interactions with an ultrahigh flux of broadband entangled photons. Phys. Rev. Lett. 94, 043602 (2005)

    Article  ADS  Google Scholar 

  30. Sensarn S., Ali-Khan I., Yin G.Y. et al.: Resonant sum frequency generation with time-energy entangled photons. Phys. Rev. Lett. 102, 053602 (2009)

    Article  ADS  Google Scholar 

  31. Bentley S.J., Boyd R.W.: Nonlinear optical lithography with ultra-high sub-Rayleigh resolution. Opt. Express 12, 5735 (2004)

    Article  ADS  Google Scholar 

  32. Boyd R.W., Bentley S.J.: Recent progress in quantum and nonlinear optical lithography. J. Mod. Opt. 53, 713 (2006)

    Article  ADS  Google Scholar 

  33. Chang H.J., Shin H., O’Sullivan-Hale M.N., Boyd R.W.: Implementation of sub-Rayleigh-resolution lithography using an N-photon absorber. J. Mod. Opt. 53, 2271 (2006)

    Article  ADS  MATH  Google Scholar 

  34. See, for example, the data sheets for Type-D material of STX Aprilis, Inc. www.stxaprilis.com

  35. Maruo S., Nakamura O., Kawata S.: Three-dimensional microfabrication with two-photon-absorbed photopolymerization. Opt. Lett. 22, 132 (1997)

    Article  ADS  Google Scholar 

  36. Kawata S., Sun H.-B., Tanaka T., Takada K.: Finer features for functional microdevices. Nature 412, 697 (2001)

    Article  ADS  Google Scholar 

  37. von Freymann G., Ledermann A., Thiel M., Staude I., Essig S., Busch K., Wegener M.: Three-dimensional nanostructures for photonics. Adv. Funct. Mater. 20, 1038–1052 (2010)

    Article  Google Scholar 

  38. Data sheets for SU-8 are available from one of its commercial suppliers. Microchem, at www.microchem.com

  39. Schaffer D.B., Brodeurm A., Garcia J.F., Mazur E.: Micromachinging bulk glass by use of femtosecond laser pulses with nanojoule energy. Opt. Lett. 26, 93 (2001)

    Article  ADS  Google Scholar 

  40. Shimotsuma Y., Kazansky P.G., Qiu J., Hirao K.: Self-organized nanogratings in glass irradiated by ultrashort light pulses. Phys. Rev. Lett. 91, 247405 (2003)

    Article  ADS  Google Scholar 

  41. Rajeev P.P., Gertsvolf M., Simova E., Hnatovsky C., Taylor R.S., Bhardwaj V.R., Rayner D.M., Corkum P.B.: Memory in nonlinear ionization of transparent solids. Phys. Rev. Lett. 97, 253001 (2006)

    Article  ADS  Google Scholar 

  42. Rajeev P.P., Gertsvolf M., Corkum P.B., Rayner D.M.: Field dependent avalanche ionization rates in dielectrics. Phys. Rev. Lett. 102, 083001 (2009)

    Article  ADS  Google Scholar 

  43. Park S.H., Lim T.W., Yang D.-Y., Cho N.C., Lee K.-S.: Fabrication of a bunch of sub-30-nm nanofibers inside microchannels using photopolymerization via a long exposure technique. Appl. Phys. Lett. 89, 173133 (2006)

    Article  ADS  Google Scholar 

  44. Farsari M., Ovsianikov A., Vamvakaki M., Sakellari I., Gray D., Chichkov B.N., Fotakis C.: Fabrication of three-dimensional photonic crystal structures containing an active nonlinear optical chromophore. Appl. Phys. A 93, 11–15 (2008)

    Article  ADS  Google Scholar 

  45. He G.S., Tan L-S., Zheng Q., Prasad P.N.: Multiphoton absorbing materials: molecular designs, characterizations, and applications. Chem. Rev. 108, 1245–1330 (2008)

    Article  Google Scholar 

  46. Larson D.R., Zipfel W.R., Williams R.M., Clark S.W., Bruchez M.P., Wise F.W., Webb W.W.: Water-soluble quantum dots for multiphoton fluorescence imaging in vivo. Science 300, 1434 (2008)

    Article  ADS  Google Scholar 

  47. Cohanoschi I., Hernández F.E.: Surface plasmon enhancement of two- and three-photon absorption of hoechst 33 258 dye in activated gold colloid solution. J. Phys. Chem. B 2005(109), 14506–14512 (2005)

    Article  Google Scholar 

  48. Cohanoschi I., Yao S., Belfield K.D., Hernández F.E.: Effect of the concentration of organic dyes on their surface plasmon enhanced two-photon absorption cross section using activated Au nanoparticles. J. Appl. Phys. 101, 086112 (2007)

    Article  ADS  Google Scholar 

  49. Dolgaleva K., Shin H., Boyd R.W.: Observation of a microscopic cascaded contribution to the fifth-order nonlinear susceptibility. Phys. Rev. Lett. 103, 113902 (2007)

    Article  ADS  Google Scholar 

  50. Lee D.-I., Goodson T. III.: Entangled photon absorption in an organic porphyrin dendrimer. J. Phys. Chem. B Lett. 110, 25582–25585 (2006)

    Google Scholar 

  51. Harpham M.R., Suzer O., Ma C.-Q., Bauerle P., Goodson T. III.: Thiophene dendrimers as entangled photon sensor materials. J. Am. Chem. Soc. 131, 973–979 (2009)

    Article  Google Scholar 

  52. Fei H.-B., Jost B.M., Popescu S., Saleh B.E.A., Teich M.C.: Entanglement-induced two-photon transparency. Phys. Rev. Lett. 78, 1679 (1997)

    Article  ADS  Google Scholar 

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Authors and Affiliations

  1. Institute of Optics and Department of Physics and Astronomy, University of Rochester, Rochester, NY, 14627, USA

    Robert W. Boyd

  2. Department of Physics and School of Information Technology and Engineering, University of Ottawa, Ottawa, ON, K1N 6N5, Canada

    Robert W. Boyd

  3. Department of Physics and Astronomy, Hearne Institute for Theoretical Physics, Louisiana State University, Baton Rouge, Louisiana, 70803-4001, USA

    Jonathan P. Dowling

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Correspondence to Robert W. Boyd.

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Boyd, R.W., Dowling, J.P. Quantum lithography: status of the field. Quantum Inf Process 11, 891–901 (2012). https://doi.org/10.1007/s11128-011-0253-y

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