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"Excursion prevention and increasing device performance using mask ..."

Thomas Scherübl et al. (2019)

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DOI: 10.1109/ESSDERC.2019.8901766

access: closed

type: Conference or Workshop Paper

metadata version: 2019-11-28

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  dblp key:
  - conf/essderc/ScherublSCSS19
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Thomas Scherübl, Yael Sufrin, Avi Cohen, Ofir Sharoni, Rolf Seltmann:
Excursion prevention and increasing device performance using mask correction for intrafield CD and Overlay improvement. ESSDERC 2019: 57-60

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