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"Investigation of Cu ion drift through CVD TiSiN into SiO2 under bias ..."

Takashi Kawanoue et al. (2005)

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DOI: 10.1587/ELEX.2.254

access: open

type: Journal Article

metadata version: 2021-02-12

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  dblp key:
  - journals/ieiceee/KawanoueOHY05
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  persistent URL:
  - https://dblp.org/rec/journals/ieiceee/KawanoueOHY05
Takashi Kawanoue, Seiichi Omoto, Masahiko Hasunuma, Takashi Yoda:
Investigation of Cu ion drift through CVD TiSiN into SiO2 under bias temperature stress conditions. IEICE Electron. Express 2(7): 254-259 (2005)

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