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"Improvement on Ge/GeOx/Tm2O3/HfO2 Gate Performance by Forming Gas Anneal."

Laura Zurauskaite, Mikael Östling, Per-Erik Hellström (2021)

Details and statistics

DOI: 10.1109/ESSDERC53440.2021.9631773

access: closed

type: Conference or Workshop Paper

metadata version: 2023-09-30