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"Self-aligned double patterning layout decomposition with complementary ..."

Jhih-Rong Gao, Bei Yu, David Z. Pan (2014)

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DOI: 10.1109/ASPDAC.2014.6742880

access: closed

type: Conference or Workshop Paper

metadata version: 2018-01-30

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Jhih-Rong Gao, Bei Yu, David Z. Pan:
Self-aligned double patterning layout decomposition with complementary e-beam lithography. ASP-DAC 2014: 143-148

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