Editors-in-Chief
Dan Luss, University of Houston, USA, dluss@uh.edu
Neima Brauner, Tel Aviv University, Israel, brauner@tauex.tau.ac.il
Editorial Board
David Agar, Technical University of Dortmund, Germany
Mark E. Davis, California Institute of Technology, USA
Lidietta Giorno, CNR-ITM, Italy
J.B. Joshi, Institute of Chemical Technology, Mumbai, India
Johannes Khinast, Graz University of Technology, Austria
Joseph Kost, Ben-Gurion University of the Negev, Israel
Jinghai Li, Institute of Process Engineering, Chinese Academy of Sciences, China
L. Gary Leal, University of California, Santa Barbara, USA
Patrick L. Mills, Texas A&M University Kingsville, USA
Massimo Morbidelli, ETH Zurich, Switzerland
Ka Ming Ng, The Hong Kong University of Science and Technology, China
Michael Nikolaou, University of Houston, USA
Avi Schroeder, Technion – Israel Institute of Technology, Israel
John H. Seinfeld, California Institute of Technology, USA
E. Hugh Stitt, Johnson Matthey plc, UK
Enrico Tronconi, Politecnico di Milano, Italy
Constantinos G. Vayenas, University of Patras, Greece
Peter Vekilov, University of Houston, USA
Andrey N. Zagoruiko, Boreskov Institute of Catalysis, Russia
Edwin Zondervan, University of Twente, the Netherlands
Editorial Office
Gunda Stöber
De Gruyter
Genthiner Str. 13
10785 Berlin, Germany
Tel. +49-30-26005-279
E-mail: rev.chem.eng.editorial@degruyter.com