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Embedded tutorial: subwavelength lithography

Published: 28 January 2000 Publication History
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References

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M. D. Levenson, N. S. Viswanathan, and R. A. Sympson, "Improving Resolution in photolithography with a Phase-Shifting Mask", IEEE, Trans. Electron Devices, Vol. ED-29, No. 12, pp.1828-1836, 1982.
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  • (2012)Electrical Test Structures for the Characterization of Optical Proximity CorrectionIEEE Transactions on Semiconductor Manufacturing10.1109/TSM.2011.218166925:2(162-169)Online publication date: May-2012
  1. Embedded tutorial: subwavelength lithography

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    cover image ACM Conferences
    ASP-DAC '00: Proceedings of the 2000 Asia and South Pacific Design Automation Conference
    January 2000
    691 pages
    ISBN:0780359747
    DOI:10.1145/368434
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    • (2012)Electrical Test Structures for the Characterization of Optical Proximity CorrectionIEEE Transactions on Semiconductor Manufacturing10.1109/TSM.2011.218166925:2(162-169)Online publication date: May-2012

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