Due to concerns regarding substrate damage, wet photoresist removal has been adopted over dry etch techniques for certain metal lift-off processes on substrates and metals that are susceptible to plasma damage. Wet photoresist removal ...
Display Omitted Patterning by EBL of epitaxial SiGe semiconductor material film.Fabrication method to realize free-standing semiconductor nanostructures.Tuning of the FIB process on epitaxial SiGe material. We target the nanofabrication of free-standing ...
Graphical abstractDisplay Omitted Highlights We have developed simple and low-cost fabrication method of metal stamps. The stamps are intended for fast and cheap replication of microfluidic structures. Inherent metal hardness allows hundreds of ...
IEEE Computer Society
United States
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