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Design rule optimization of regular layout for leakage reduction in nanoscale design

Published: 21 January 2008 Publication History

Abstract

The effect of non-rectilinear gate (NRG) due to sub-wavelength lithograph dramatically increases the leakage current by more than 15X. To mitigate this penalty, we have developed a systematic procedure to optimize key layout parameters in regular layout with minimum area and speed overhead. As demonstrated in 65nm technology, the optimization of regular layout achieves more than 70% reduction in leakage under NRG, with area penalty of ~10% and marginal impact on circuit speed and active power.

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Cited By

View all
  • (2010)Total sensitivity based dfm optimization of standard library cellsProceedings of the 19th international symposium on Physical design10.1145/1735023.1735053(113-120)Online publication date: 14-Mar-2010
  • (2009)A framework for early and systematic evaluation of design rulesProceedings of the 2009 International Conference on Computer-Aided Design10.1145/1687399.1687513(615-622)Online publication date: 2-Nov-2009
  • (2009)Modeling of layout-dependent stress effect in CMOS designProceedings of the 2009 International Conference on Computer-Aided Design10.1145/1687399.1687496(513-520)Online publication date: 2-Nov-2009
  • Show More Cited By

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  1. Design rule optimization of regular layout for leakage reduction in nanoscale design

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          cover image ACM Conferences
          ASP-DAC '08: Proceedings of the 2008 Asia and South Pacific Design Automation Conference
          January 2008
          812 pages
          ISBN:9781424419227

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          IEEE Computer Society Press

          Washington, DC, United States

          Publication History

          Published: 21 January 2008

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          ASP-DAC '08 Paper Acceptance Rate 122 of 350 submissions, 35%;
          Overall Acceptance Rate 466 of 1,454 submissions, 32%

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          View all
          • (2010)Total sensitivity based dfm optimization of standard library cellsProceedings of the 19th international symposium on Physical design10.1145/1735023.1735053(113-120)Online publication date: 14-Mar-2010
          • (2009)A framework for early and systematic evaluation of design rulesProceedings of the 2009 International Conference on Computer-Aided Design10.1145/1687399.1687513(615-622)Online publication date: 2-Nov-2009
          • (2009)Modeling of layout-dependent stress effect in CMOS designProceedings of the 2009 International Conference on Computer-Aided Design10.1145/1687399.1687496(513-520)Online publication date: 2-Nov-2009
          • (2008)Statistical modeling and simulation of threshold variation under dopant fluctuations and line-edge roughnessProceedings of the 45th annual Design Automation Conference10.1145/1391469.1391698(900-905)Online publication date: 8-Jun-2008

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